JP2015204768A - 細胞培養基材形成用の感光性樹脂組成物 - Google Patents
細胞培養基材形成用の感光性樹脂組成物 Download PDFInfo
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- JP2015204768A JP2015204768A JP2014086576A JP2014086576A JP2015204768A JP 2015204768 A JP2015204768 A JP 2015204768A JP 2014086576 A JP2014086576 A JP 2014086576A JP 2014086576 A JP2014086576 A JP 2014086576A JP 2015204768 A JP2015204768 A JP 2015204768A
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- cell culture
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- ZEYMDLYHRCTNEE-UHFFFAOYSA-N ethenyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OC=C ZEYMDLYHRCTNEE-UHFFFAOYSA-N 0.000 description 1
- VYATZCPFHGSBPG-UHFFFAOYSA-N ethenyl 3-phenylbutanoate Chemical compound C=COC(=O)CC(C)C1=CC=CC=C1 VYATZCPFHGSBPG-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- LZWYWAIOTBEZFN-UHFFFAOYSA-N ethenyl hexanoate Chemical compound CCCCCC(=O)OC=C LZWYWAIOTBEZFN-UHFFFAOYSA-N 0.000 description 1
- BGVWGPMAGMJLBU-UHFFFAOYSA-N ethenyl naphthalene-1-carboxylate Chemical compound C1=CC=C2C(C(=O)OC=C)=CC=CC2=C1 BGVWGPMAGMJLBU-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
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- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
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- 239000004615 ingredient Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
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- 239000007924 injection Substances 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
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- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- LXTZRIBXKVRLOA-UHFFFAOYSA-N padimate a Chemical compound CCCCCOC(=O)C1=CC=C(N(C)C)C=C1 LXTZRIBXKVRLOA-UHFFFAOYSA-N 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- 210000005259 peripheral blood Anatomy 0.000 description 1
- 239000011886 peripheral blood Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- CYFIHPJVHCCGTF-UHFFFAOYSA-N prop-2-enyl 2-hydroxypropanoate Chemical compound CC(O)C(=O)OCC=C CYFIHPJVHCCGTF-UHFFFAOYSA-N 0.000 description 1
- AXLMPTNTPOWPLT-UHFFFAOYSA-N prop-2-enyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC=C AXLMPTNTPOWPLT-UHFFFAOYSA-N 0.000 description 1
- ZQMAPKVSTSACQB-UHFFFAOYSA-N prop-2-enyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCC=C ZQMAPKVSTSACQB-UHFFFAOYSA-N 0.000 description 1
- HAFZJTKIBGEQKT-UHFFFAOYSA-N prop-2-enyl hexadecanoate Chemical compound CCCCCCCCCCCCCCCC(=O)OCC=C HAFZJTKIBGEQKT-UHFFFAOYSA-N 0.000 description 1
- HPCIWDZYMSZAEZ-UHFFFAOYSA-N prop-2-enyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC=C HPCIWDZYMSZAEZ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 231100000812 repeated exposure Toxicity 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
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- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/002—Component parts, details or accessories; Auxiliary operations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/003—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor characterised by the choice of material
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- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/02—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
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- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
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- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/0009—After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
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- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G03F7/031—Organic compounds not covered by group G03F7/029
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- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
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- B29C2071/0045—Washing using non-reactive liquids
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Abstract
【解決手段】3官能以上の多官能モノマーを光重合性モノマーの質量に対して10質量%以上含む光重合性モノマーと、光重合開始剤を組成物の質量に対して0.5〜5.0質量%含む、細胞培養基材形成用の感光性樹脂組成物。基板上に前記感光性樹脂組成物を塗布して塗布膜を形成する塗布工程と、前記塗布膜を露光して硬化させる露光工程と、を含む細胞培養基材の製造方法。さらに前記露光された塗布膜に対してプラズマ照射するプラズマ処理工程を含む、前記細胞培養基材の製造方法。
【選択図】なし
Description
(A)光重合性モノマーが、(A)光重合性モノマーの質量に対して10質量%以上の3官能以上の(A1)多官能モノマーを含み、
(B)光重合開始剤の含有量が、感光性樹脂組成物の質量に対して0.5〜5.0質量%である細胞培養基材形成用の感光性樹脂組成物である。
塗布膜を露光して硬化させる、露光工程と、を含む、細胞培養基材の製造方法である。
細胞培養基材形成用の感光性樹脂組成物(単に感光性樹脂組成物とも記載する。)は、(A)光重合性モノマーと、(B)光重合開始剤とを含む。そして、(A)光重合性モノマーは、(A)光重合性モノマーの質量に対して10質量%以上の3官能以上の(A1)多官能モノマーを含む。さらに、感光性樹脂組成物中の(B)光重合開始剤の含有量は、感光性樹脂組成物の質量に対して0.5〜5.0質量%である。
(A)光重合性モノマーは、光重合可能なものであれば特に限定されず、従来から感光性樹脂組成物に使用されている種々の光重合性化合物から選択することができる。(A)光重合性モノマーとしては、感光性樹脂組成物の保存安定性等の点から、エチレン性不飽和結合を有する化合物が好ましい。エチレン性不飽和結合を有する化合物に含まれる光重合性の官能基の好適な例としては、(メタ)アクリロイル基、ビニル基、及びアリル基等が挙げられる。エチレン性不飽和結合を有する化合物としては、例えば、単官能、2官能、又は3官能以上の多官能の、(メタ)アクリレート化合物、(メタ)アクリルアミド化合物、ビニル化合物、及びアリル化合物を用いることができる。
−(C2H4O)k−(C3H6O)l−(Y)j−(C2H4O)m−(C3H6O)n−・・・(2)
で表される2価の基であり、Yは下記式(Y1)〜(Y3):
で表される化合物が好ましい。
感光性樹脂組成物は、感光性樹脂組成物の質量に対して0.5〜5.0質量%、好ましくは1.0〜4.0質量%の(B)光重合開始剤を含む。感光性樹脂がこのような量の(B)光重合開始剤を含むことで、感光性樹脂組成物を露光により硬化させて得られる硬化物の、残留モノマーと、(B)光重合開始剤とに起因する細胞毒性を低減することができる。
感光性樹脂組成物は、(A)光重合性モノマー及び(B)光重合開始剤の他に、必要に応じて、溶剤、界面活性剤、密着性向上剤、熱重合禁止剤、消泡剤等の添加剤を含有させることができる。いずれの添加剤も、従来公知のものを用いることができる。界面活性剤としては、アニオン系、カチオン系、ノニオン系等の化合物が挙げられ、密着性向上剤としては、従来公知のシランカップリング剤が挙げられ、熱重合禁止剤としては、ヒドロキノン、ヒドロキノンモノエチルエーテル等が挙げられ、消泡剤としては、シリコーン系、フッ素系化合物等が挙げられる。
感光性樹脂組成物は、上記各成分を3本ロールミル、ボールミル、サンドミル等の撹拌機で混合(分散・混練)し、必要に応じて5μmメンブランフィルタ等のフィルタで濾過して調製することができる。
細胞培養基材は、上述の感光性樹脂組成物を用いて形成されたものであれば、形状、サイズ等は特に限定されない。
細胞培養基材の製造方法は、上述の感光性樹脂組成物を露光して硬化させ、所望する形状の細胞培養基材を形成できる方法であれば特に限定されない。好適な細胞培養基材の製造方法としては、
基板上に、細胞培養基材形成用の感光性樹脂組成物を塗布して塗布膜を形成する、塗布工程と、
基板上の塗布膜を露光して硬化させる、露光工程と、を含む方法が挙げられる。
上記の細胞培養基材の製造方法は、必要に応じて、基板上の塗布膜を露光して硬化させた後に、露光された塗布膜を基板から剥離させる、剥離工程を含んでいてもよい。
実施例及び比較例では、以下の(A1)多官能モノマーと、(A2)2官能モノマーと、(A3)単官能モノマーとを用いた。
P1:トリメチロールプロパントリアクリレート
P2:ジペンタエリスリトールヘキサアクリレート
P3:ペンタエリスリトールトリアクリレートとトルエンジイソシアネートとの反応物
B1:エトキシ化ビスフェノールAジメタクリレート(EO付加量:2.6モル)
B2:テトラエチレングリコールジアクリレート
M1:フェノールのEO付加物のアクリレート(EO付加量:2.0モル)
PI1:α−アミノアルキルフェノン系光重合開始剤、2−メチル−1−〔4−(メチルチオ)フェニル〕−2−モルフォリノプロパン−1−オン
PI2:オキシムエステル系光重合開始剤、エタノン,1−[9−エチル−6−(2−メチルベンゾイル)−9H−カルバゾル−3−イル],1−(o−アセチルオキシム)
実施例1〜7及び比較例1〜4の感光性樹脂組成物を用いて、以下の方法に従って、平滑な細胞培養表面を備える細胞培養基材を作成した。得られた細胞培養基材を用いて、以下の方法に従って細胞培養試験を行い、各基板の細胞毒性について評価した。実施例1〜7及び比較例1〜4の感光性樹脂組成物について、細胞毒性試験の評価結果を表1に記す。
ArFレジスト(TArF−6619(東京応化工業株式会社製))を用いて形成された膜を硬化させた基板を、細胞培養基材形成用の基板として用いた。3cm×3cmにカットされた前述の基板の平滑な表面に、各実施例及び比較例の感光性樹脂組成物を0.5mlずつスポイトを用いて滴下して、基板上に感光性樹脂組成物の塗布膜を形成した。次いで、感光性樹脂組成物の塗布膜を備える基板を、100Paの減圧条件下に30分置いて塗布膜を脱気した。脱気後の塗布膜に対して、大気中で紫外線照射装置(HMW−532D、ORC社製)を用いて999J/m2の露光量で露光を行った。その後、真空中で、紫外線照射装置(HMW−532D、ORC社製)を用いて999J/m2の露光量での露光を5回繰り返して塗布膜を硬化させた。硬化した塗布膜を基板から剥離した後、硬化した塗布膜をPGMEAに10分間浸漬してリンスした後、窒素ガスを硬化した塗布膜に吹き付けて乾燥させた。乾燥された硬化した塗布膜に対して、圧力40Pa、温度40℃、出力50W、処理時間20秒、酸素流量200ml/分の条件で、プラズマ処理装置(TCA−3822、東京応化工業株式会社製)を用いてO2プラズマ処理を行って、細胞培養基材を得た。
一穴当たり、300μlののMEMα培地と15μlのCell Count Reagent SFとを入れた後、37℃で1時間インキュベーションを行った。次いで、細胞培養プレートの各ウェルから、Cell Count Reagentを含むMEMα培地を100μlずつ採取した。採取された試料を、それぞれ、マイクロプレートリーダーに対応した96穴のマイクロプレートのウェル内に注入した。
次いで、各試料がウェル内に注入されたマイクロプレートを、マイクロプレートリーダー(VersaMax(Molecular Devices社製))を用いて処理し、各試料の波長450nmにおける吸光度(ABS)を測定した。
また、ポリスチレン製の細胞培養基材(IWAKIサイテック社製)を用いて、各実施例及び比較例と同様にして、MEMα培地を用いた培養と、Cell Count Reagentを含むMEMα培地を用いた培養とを行って得た、Cell Count Reagentを含むMEMα培地の試料について、波長450nmにおける吸光度(ABSst)を測定した。
ポリスチレン製の細胞培養基材の細胞毒性を標準として、各実施例及び比較例の細胞培養基材の細胞毒性を評価した。具体的には、各実施例及び比較例の細胞培養基材の細胞毒性を、ABS/ABSstの値に基づいて下記基準で評価した。なお、ABSstの値は、0.35であった。
○(低細胞毒性):ABS/ABSstの値が0.5以上である。
×(高細胞毒性):ABS/ABSstの値が0.5未満である。
細胞培養基材形成用の基板を、表面にパターン深さ60μm、幅30μmのラインアンドスペースパターンを備える基板に変更することの他は、細胞毒性試験用の細胞培養基材と同様にして、実施例1〜6、及び比較例1〜4の感光性樹脂組成物を用いて細胞培養基材を作成した。得られた細胞培養基材の断面を走査型電子顕微鏡(SEM SU−8000、株式会社日立ハイテクノロジーズ製)により観察し、パターン転写特性を評価した。基板表面のパターン形状が細胞培養基材に正確に転写されている場合を○と判定し、基板表面のパターン形状が細胞培養基材に正確に転写されていない場合を×と判定した。実施例1〜6及び比較例1〜4の感光性樹脂組成物について、パターン転写特性の評価結果を表2に記す。なお、実施例7の感光性樹脂組成物のパターン転写特性については、後述する実施例9−1〜9−8において評価した。
露光条件を、大気中での露光量999mJ/cm2での露光の5回繰り返し露光に変更することの他は実施例1と同様にして、実施例1の感光性樹脂組成物を用いて、細胞毒性試験用の細胞培養基材と、パターン転写特性試験用の細胞培養基材とを形成した。得られた細胞培養基材について、上記の方法で、細胞毒性と、パターン転写特性とを評価した。細胞毒性試験の結果を表3に記し、パターン転写特性試験の結果を表4に記す。
大気中での露光量999mJ/cm2での露光に次いで、水中で表2に記載の露光量で露光を行った後、真空下で表2に記載の露光量で露光を行うことと、実施例7の感光性樹脂組成物を用いることとの他は、実施例1と同様にして、細胞毒性試験用の細胞培養基材と、パターン転写特性試験用の細胞培養基材とを形成した。得られた細胞培養基材について、上記の方法で、細胞毒性と、パターン転写特性とを評価した。細胞毒性試験の結果を表3に記し、パターン転写特性試験の結果を表4に記す。
Claims (17)
- (A)光重合性モノマーと、(B)光重合開始剤とを含む感光性樹脂組成物であって、
前記(A)光重合性モノマーが、前記(A)光重合性モノマーの質量に対して10質量%以上の3官能以上の(A1)多官能モノマーを含み、
前記(B)光重合開始剤の含有量が、前記感光性樹脂組成物の質量に対して0.5〜5.0質量%である細胞培養基材形成用の感光性樹脂組成物。 - 前記(A)光重合性モノマーが、さらに前記(A)光重合性モノマーの質量に対して20質量%以上の(A2)2官能モノマーを含む、請求項1に記載の細胞培養基材形成用の感光性樹脂組成物。
- 前記(B)光重合開始剤が、α−アミノアルキルフェノン系光重合開始剤、及びオキシムエステル系光重合開始剤から選択される少なくとも1種である、請求項1〜3のいずれか1項に記載の細胞培養基材形成用の感光性樹脂組成物。
- 前記細胞培養基材が、凹凸のパターンが形成された面を備える硬化された樹脂で形成されている、請求項1〜4のいずれか1項に記載の細胞培養基材形成用の感光性樹脂組成物。
- 請求項1〜4のいずれか1項に記載の細胞培養基材形成用の感光性樹脂組成物を用いて形成された、細胞培養基材。
- ガラス転移温度(Tg)が37℃より高い、請求項6に記載の細胞培養基材。
- 凹凸のパターンが形成された面を備える、請求項6又は7に記載の細胞培養基材。
- 厚さが10nm〜100μmである、請求項6〜8のいずれか1項に記載の細胞培養基材。
- 前記細胞培養基材の細胞培養表面と反対側の表面に接する支持体により支持されている細胞培養基材であって、
前記支持体が、ガラス、ポリエチレンテレフタレート、ポリカーボネート、シクロオレフィンポリマー、ポリジメチルシロキサン、又はポリスチレンからなるディスク又はフィルムである、請求項7〜9のいずれか1項に記載の細胞培養基材。 - 基板上に、請求項1〜5のいずれか1項に記載の細胞培養基材形成用の感光性樹脂組成物を塗布して塗布膜を形成する、塗布工程と、
前記塗布膜を露光して硬化させる、露光工程と、を含む、細胞培養基材の製造方法。 - さらに、前記露光された塗布膜を前記基板から剥離させる、剥離工程を含む、請求項11に記載の細胞培養基材の製造方法。
- さらに、前記剥離工程で剥離された前記露光された塗布膜をリンス液によりリンスする、リンス工程を含む、請求項12に記載の細胞培養基材の製造方法。
- さらに、前記露光された塗布膜に対してプラズマ照射する、プラズマ処理工程を含む、請求項11〜13のいずれか1項に記載の細胞培養基材の製造方法。
- 前記基板が、凹凸のパターンが形成された面を備える、請求項11〜14のいずれか1項に記載の細胞培養基材の製造方法。
- 前記露光工程が、真空中での露光を含む、請求項11〜15のいずれか1項に記載の細胞培養基材の製造方法。
- 前記露光工程が、前記塗布膜に対する基板上面からの圧力の印加が行われる条件下での真空中での露光を含む、請求項16に記載の細胞培養基材の製造方法。
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US20170137767A1 (en) | 2017-05-18 |
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