JP2015203606A5 - - Google Patents
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- Publication number
- JP2015203606A5 JP2015203606A5 JP2014082310A JP2014082310A JP2015203606A5 JP 2015203606 A5 JP2015203606 A5 JP 2015203606A5 JP 2014082310 A JP2014082310 A JP 2014082310A JP 2014082310 A JP2014082310 A JP 2014082310A JP 2015203606 A5 JP2015203606 A5 JP 2015203606A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- sensor
- scintillator layer
- manufacturing
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 65
- 230000005855 radiation Effects 0.000 claims description 12
- 238000003384 imaging method Methods 0.000 claims description 10
- 239000010410 layer Substances 0.000 claims 20
- 238000004519 manufacturing process Methods 0.000 claims 16
- 230000002093 peripheral effect Effects 0.000 claims 5
- 238000000151 deposition Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 238000007740 vapor deposition Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- 239000012790 adhesive layer Substances 0.000 claims 1
- 238000005520 cutting process Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014082310A JP6333034B2 (ja) | 2014-04-11 | 2014-04-11 | 放射線撮像装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014082310A JP6333034B2 (ja) | 2014-04-11 | 2014-04-11 | 放射線撮像装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015203606A JP2015203606A (ja) | 2015-11-16 |
| JP2015203606A5 true JP2015203606A5 (enExample) | 2017-05-25 |
| JP6333034B2 JP6333034B2 (ja) | 2018-05-30 |
Family
ID=54597130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014082310A Active JP6333034B2 (ja) | 2014-04-11 | 2014-04-11 | 放射線撮像装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6333034B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3121513B2 (ja) | 1994-12-14 | 2001-01-09 | 株式会社巴技術研究所 | デュアルプレート逆止め弁 |
| JP3121546B2 (ja) | 1996-09-09 | 2001-01-09 | 株式会社巴技術研究所 | デュアルプレート逆止弁 |
| CN107398844B (zh) * | 2017-06-26 | 2019-05-28 | 东软医疗系统股份有限公司 | 一种探测器制造夹具和闪烁体定位方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4447752B2 (ja) * | 2000-08-03 | 2010-04-07 | 浜松ホトニクス株式会社 | 放射線検出器 |
| US20050008291A1 (en) * | 2003-07-08 | 2005-01-13 | Baney Dougas M. | Optical wave-guide microstructured environment absorption cell |
| JP5680943B2 (ja) * | 2010-11-16 | 2015-03-04 | キヤノン株式会社 | シンチレータ、放射線検出装置および放射線撮影装置 |
| JP6071283B2 (ja) * | 2012-07-04 | 2017-02-01 | キヤノン株式会社 | 放射線検出装置及びその製造方法 |
| JP2014048061A (ja) * | 2012-08-29 | 2014-03-17 | Canon Inc | 放射線撮像装置、その製造方法、及び放射線撮像システム |
-
2014
- 2014-04-11 JP JP2014082310A patent/JP6333034B2/ja active Active
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