JP2015169861A - 回折格子、レーザ装置、および回折格子の製造方法 - Google Patents
回折格子、レーザ装置、および回折格子の製造方法 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
- H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
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- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
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Abstract
Description
まず、本発明の第1実施形態に係る回折格子について説明する。本実施形態に係る回折格子は、反射層を有し、非対称三角形状が連続して配置される断面構造の反射型回折格子である。本回折格子は、例えばArFエキシマレーザ装置用(ArFエキシマレーザ光生成時の分光用)として用いられるものであり、狭帯域化と同時に、放電チャンバー内の出力鏡と合わせて共振器の一端としての役割も果たす。
mλ=2d・sinθ (1)
アルゴン−フッ素により励起、放出され、回折格子1に照射される光の波長λを193.00nmとし、次数mを105とすると、式(1)より、格子間隔dは、10.32953μmとなる。
φ+θ≦169.25 (2)
すなわち、この領域内で高効率解を導出すれば、高効率で、かつ製造に困難を伴わない回折格子が得られることになる。ここで、本実施形態でいう「高効率」とは、効率が図2に示される上記の計算条件下の最高効率に対して98.5%以上である場合と定義する。この程度の効率を有する回折素子であれば、ほぼ効率が最適に近く、効率的に良好な回折素子であると言える。そして、高効率条件を満たす条件を図2に示す領域において検討すると、頂角φおよびブレーズ角θは、以下の範囲に規定される。
θ=0.3663159φ+48.8441033 (3)
また、高効率条件の境界を表す曲線は、式(4)で表される。
θ=0.1127291φ2−19.6745343φ
+938.7421566 (4)
すなわち、3つの線に囲まれる領域は、既出の式(2)で表される第1直線の条件に加え、式(5)で表される。
0.1127291φ2−19.67453φ+938.74+θd≦θ≦0.36631φ+48.84+θd (5)
次に、本発明の第2実施形態に係る回折格子について説明する。第1実施形態では、光線入射角αを79.25度とした場合の回折格子を例示したが、本実施形態では、光線入射角αを変数と考える。なお、本実施形態の回折格子の各構成要素および部分には、第1実施形態に係る回折格子1の各構成要素および部分と同一の符号を付す。ここで、カウンタ面9に光線5が入射しない条件は、式(6)で表される。
φ+θ≦90+α (6)
0.1127291(φ−φd)2−19.67453(φ−φd)+938.74+θd≦θ≦0.36631(φ−φd)+48.84+θd (7)
6 ブレーズ面
9 カウンタ面
α 光線入射角
θ ブレーズ角
φ 頂角
Claims (5)
- 断面が非対称な三角形状の格子を有する反射型の回折格子であって、
前記三角形状の短辺と平面とのなす角をθとし、前記短辺と前記三角形状の長辺とのなす角をφとし、前記平面の法線に対する光の入射角をαとすると、前記なす角θ、φは、
φ+θ≦90+α、
0.1127291(φ−φd)2−19.67453(φ−φd)+938.74+θd≦θ≦0.36631(φ−φd)+48.84+θd
(ただし、σ=α−79.25のとき、φd=0.845σ、θd=1.065σ)
の式で表される条件を満たすことを特徴とする回折格子。 - 前記光の入射角は、79.1度から79.5度までの範囲にあることを特徴とする請求項1に記載の回折格子。
- 前記光の波長は、150nmから300nmまでの範囲にあることを特徴とする請求項1または2に記載の回折素子。
- 請求項1ないし3のいずれか1項に記載の回折格子を用いることを特徴とするレーザ装置。
- 断面が非対称な三角形状の格子を有する反射型の回折格子の製造方法であって、
前記三角形状の短辺と平面とのなす角をθとし、前記短辺と前記三角形状の長辺とのなす角をφとし、前記平面の法線に対する光の入射角をαとすると、
前記なす角θ、φが下記の条件式を満たすように、下記の条件式を用いて前記なす角θ、φを設計するステップと、
φ+θ≦90+α、
0.1127291(φ−φd)2−19.67453(φ−φd)+938.74+θd≦θ≦0.36631(φ−φd)+48.84+θd
(ただし、σ=α−79.25のとき、φd=0.845σ、θd=1.065σ)
該設計された前記なす角θ、φとなるように前記格子を形成するステップと、
を有することを特徴とする製造方法。
Priority Applications (3)
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JP2014045908A JP6362364B2 (ja) | 2014-03-10 | 2014-03-10 | 回折格子、および回折格子の製造方法 |
EP15000643.5A EP2919047B1 (en) | 2014-03-10 | 2015-03-05 | Diffraction grating of the reflective-type |
US14/641,890 US9583910B2 (en) | 2014-03-10 | 2015-03-09 | Diffraction grating, laser apparatus, and manufacturing method for diffraction grating |
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JP2014045908A JP6362364B2 (ja) | 2014-03-10 | 2014-03-10 | 回折格子、および回折格子の製造方法 |
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Cited By (1)
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KR101923821B1 (ko) * | 2017-06-05 | 2018-11-29 | 국방과학연구소 | 유전체 다층박막 회절격자의 설계방법 |
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US10180520B2 (en) | 2015-08-24 | 2019-01-15 | Akonia Holographics, Llc | Skew mirrors, methods of use, and methods of manufacture |
US11988854B2 (en) | 2015-08-24 | 2024-05-21 | Akonia Holographics Llc | Wide field-of-view holographic skew mirrors |
US10317679B2 (en) | 2016-04-04 | 2019-06-11 | Akonia Holographics, Llc | Light homogenization |
EP3420415A4 (en) * | 2016-04-06 | 2019-11-06 | Akonia Holographics, LLC | HOLOGRAPHIC DEFLECTION MIRRORS WITH GREAT FIELD OF VIEW |
US10649143B2 (en) | 2016-06-20 | 2020-05-12 | Akonia Holographics Llc | Polarization management |
CN108802879B (zh) * | 2017-04-27 | 2020-08-11 | 清华大学 | 松树状金属纳米光栅的制备方法 |
US11782273B2 (en) | 2017-10-04 | 2023-10-10 | Akonia Holographics Llc | Comb-shifted skew mirrors |
US11598958B2 (en) | 2019-01-15 | 2023-03-07 | Lumus Ltd. | Method of fabricating a symmetric light guide optical element |
CN111399202B (zh) * | 2020-05-12 | 2020-12-15 | 西安交通大学 | 无零级衍射光的空间光调制器耦合装置 |
Citations (4)
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JP2000214315A (ja) * | 1998-12-23 | 2000-08-04 | Spectronic Instr Inc | 2つの波長における向上したブレ―ズ性能を有する回折格子 |
US20100328775A1 (en) * | 2009-06-26 | 2010-12-30 | Carl Zeiss Laser Optics Gmbh | Optical arrangement, method of use, and method for determining a diffraction grating |
JP2013092756A (ja) * | 2011-10-06 | 2013-05-16 | Canon Inc | エシェル型回折格子、エキシマレーザ、エシェル型回折格子の製造方法、ArFエキシマレーザ |
JP2013092754A (ja) * | 2011-10-06 | 2013-05-16 | Canon Inc | エシェル型回折格子およびその製造方法、エキシマレーザおよびその製造方法 |
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US6511703B2 (en) | 1997-09-29 | 2003-01-28 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
DE10158638A1 (de) * | 2001-11-29 | 2003-06-26 | Zeiss Carl Laser Optics Gmbh | Optische Anordnung, Littrow-Gitter zur Verwendung in einer optischen Anordnung sowie Verwendung eines Littrow-Gitters |
US6958859B2 (en) * | 2002-08-02 | 2005-10-25 | Chromaplex, Inc. | Grating device with high diffraction efficiency |
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2014
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- 2015-03-05 EP EP15000643.5A patent/EP2919047B1/en not_active Not-in-force
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000214315A (ja) * | 1998-12-23 | 2000-08-04 | Spectronic Instr Inc | 2つの波長における向上したブレ―ズ性能を有する回折格子 |
US20100328775A1 (en) * | 2009-06-26 | 2010-12-30 | Carl Zeiss Laser Optics Gmbh | Optical arrangement, method of use, and method for determining a diffraction grating |
JP2013092756A (ja) * | 2011-10-06 | 2013-05-16 | Canon Inc | エシェル型回折格子、エキシマレーザ、エシェル型回折格子の製造方法、ArFエキシマレーザ |
JP2013092754A (ja) * | 2011-10-06 | 2013-05-16 | Canon Inc | エシェル型回折格子およびその製造方法、エキシマレーザおよびその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101923821B1 (ko) * | 2017-06-05 | 2018-11-29 | 국방과학연구소 | 유전체 다층박막 회절격자의 설계방법 |
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US9583910B2 (en) | 2017-02-28 |
JP6362364B2 (ja) | 2018-07-25 |
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