JP2015135871A5 - - Google Patents
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- Publication number
- JP2015135871A5 JP2015135871A5 JP2014006218A JP2014006218A JP2015135871A5 JP 2015135871 A5 JP2015135871 A5 JP 2015135871A5 JP 2014006218 A JP2014006218 A JP 2014006218A JP 2014006218 A JP2014006218 A JP 2014006218A JP 2015135871 A5 JP2015135871 A5 JP 2015135871A5
- Authority
- JP
- Japan
- Prior art keywords
- plate
- holding device
- injection port
- fluid
- holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000002347 injection Methods 0.000 claims description 30
- 239000007924 injection Substances 0.000 claims description 30
- 239000012530 fluid Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims 2
- 238000001459 lithography Methods 0.000 claims 1
- 238000012423 maintenance Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014006218A JP6418740B2 (ja) | 2014-01-16 | 2014-01-16 | 保持装置、リソグラフィ装置及び物品の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014006218A JP6418740B2 (ja) | 2014-01-16 | 2014-01-16 | 保持装置、リソグラフィ装置及び物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015135871A JP2015135871A (ja) | 2015-07-27 |
| JP2015135871A5 true JP2015135871A5 (enrdf_load_stackoverflow) | 2017-03-23 |
| JP6418740B2 JP6418740B2 (ja) | 2018-11-07 |
Family
ID=53767546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014006218A Active JP6418740B2 (ja) | 2014-01-16 | 2014-01-16 | 保持装置、リソグラフィ装置及び物品の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6418740B2 (enrdf_load_stackoverflow) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55123131A (en) * | 1979-03-16 | 1980-09-22 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Exposer for mask alignment |
| JPH1126376A (ja) * | 1997-07-09 | 1999-01-29 | Canon Inc | 投影露光装置およびディバイス製造方法 |
| JP2000243684A (ja) * | 1999-02-18 | 2000-09-08 | Canon Inc | 露光装置およびデバイス製造方法 |
| JP2002198277A (ja) * | 2000-12-22 | 2002-07-12 | Canon Inc | 補正装置、露光装置、デバイス製造方法及びデバイス |
| JP2004080059A (ja) * | 2003-11-26 | 2004-03-11 | Oki Electric Ind Co Ltd | 投影露光装置及び投影露光方法 |
| KR100707307B1 (ko) * | 2005-05-10 | 2007-04-12 | 삼성전자주식회사 | 레티클의 열적 변형을 방지할 수 있는 노광 설비 및 노광방법 |
| JP5717045B2 (ja) * | 2010-06-14 | 2015-05-13 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
| US9513566B2 (en) * | 2012-03-14 | 2016-12-06 | Asml Netherlands B.V. | Lithographic apparatus |
-
2014
- 2014-01-16 JP JP2014006218A patent/JP6418740B2/ja active Active
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