JP6418740B2 - 保持装置、リソグラフィ装置及び物品の製造方法 - Google Patents

保持装置、リソグラフィ装置及び物品の製造方法 Download PDF

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JP6418740B2
JP6418740B2 JP2014006218A JP2014006218A JP6418740B2 JP 6418740 B2 JP6418740 B2 JP 6418740B2 JP 2014006218 A JP2014006218 A JP 2014006218A JP 2014006218 A JP2014006218 A JP 2014006218A JP 6418740 B2 JP6418740 B2 JP 6418740B2
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plate
holding device
injection port
fluid
reticle
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JP2015135871A5 (enrdf_load_stackoverflow
JP2015135871A (ja
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寛大 桜川
寛大 桜川
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Canon Inc
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Canon Inc
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014006218A 2014-01-16 2014-01-16 保持装置、リソグラフィ装置及び物品の製造方法 Active JP6418740B2 (ja)

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JP2014006218A JP6418740B2 (ja) 2014-01-16 2014-01-16 保持装置、リソグラフィ装置及び物品の製造方法

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JP2014006218A JP6418740B2 (ja) 2014-01-16 2014-01-16 保持装置、リソグラフィ装置及び物品の製造方法

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JP2015135871A JP2015135871A (ja) 2015-07-27
JP2015135871A5 JP2015135871A5 (enrdf_load_stackoverflow) 2017-03-23
JP6418740B2 true JP6418740B2 (ja) 2018-11-07

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Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55123131A (en) * 1979-03-16 1980-09-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposer for mask alignment
JPH1126376A (ja) * 1997-07-09 1999-01-29 Canon Inc 投影露光装置およびディバイス製造方法
JP2000243684A (ja) * 1999-02-18 2000-09-08 Canon Inc 露光装置およびデバイス製造方法
JP2002198277A (ja) * 2000-12-22 2002-07-12 Canon Inc 補正装置、露光装置、デバイス製造方法及びデバイス
JP2004080059A (ja) * 2003-11-26 2004-03-11 Oki Electric Ind Co Ltd 投影露光装置及び投影露光方法
KR100707307B1 (ko) * 2005-05-10 2007-04-12 삼성전자주식회사 레티클의 열적 변형을 방지할 수 있는 노광 설비 및 노광방법
JP5717045B2 (ja) * 2010-06-14 2015-05-13 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US9513566B2 (en) * 2012-03-14 2016-12-06 Asml Netherlands B.V. Lithographic apparatus

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