JP2015111611A5 - - Google Patents
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- Publication number
- JP2015111611A5 JP2015111611A5 JP2013252844A JP2013252844A JP2015111611A5 JP 2015111611 A5 JP2015111611 A5 JP 2015111611A5 JP 2013252844 A JP2013252844 A JP 2013252844A JP 2013252844 A JP2013252844 A JP 2013252844A JP 2015111611 A5 JP2015111611 A5 JP 2015111611A5
- Authority
- JP
- Japan
- Prior art keywords
- gap
- processing gas
- processed
- transmission window
- light transmission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005540 biological transmission Effects 0.000 claims description 11
- 238000004380 ashing Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 5
- 125000006850 spacer group Chemical group 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013252844A JP5987815B2 (ja) | 2013-12-06 | 2013-12-06 | アッシング方法およびアッシング装置 |
| PCT/JP2014/076881 WO2015083435A1 (ja) | 2013-12-06 | 2014-10-08 | アッシング方法およびアッシング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013252844A JP5987815B2 (ja) | 2013-12-06 | 2013-12-06 | アッシング方法およびアッシング装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015111611A JP2015111611A (ja) | 2015-06-18 |
| JP2015111611A5 true JP2015111611A5 (cg-RX-API-DMAC7.html) | 2016-02-25 |
| JP5987815B2 JP5987815B2 (ja) | 2016-09-07 |
Family
ID=53273212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013252844A Active JP5987815B2 (ja) | 2013-12-06 | 2013-12-06 | アッシング方法およびアッシング装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5987815B2 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2015083435A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6550964B2 (ja) * | 2015-06-26 | 2019-07-31 | ウシオ電機株式会社 | 光処理装置およびその製造方法 |
| JP6763243B2 (ja) * | 2016-09-07 | 2020-09-30 | ウシオ電機株式会社 | 光照射器 |
| JP6828493B2 (ja) * | 2017-02-15 | 2021-02-10 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
| JP6780531B2 (ja) * | 2017-02-15 | 2020-11-04 | ウシオ電機株式会社 | 光照射装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3624384A1 (de) * | 1985-07-19 | 1987-01-29 | Fusion Systems Corp | Vorrichtung zum entfernen einer photoresistschicht von einem substrat |
| JPH0864542A (ja) * | 1994-08-25 | 1996-03-08 | Plasma Syst:Kk | 半導体処理装置用真空チャンバーおよびその製造方法 |
| JP2000323455A (ja) * | 1999-05-07 | 2000-11-24 | Hitachi Ltd | アッシング装置 |
| US6897162B2 (en) * | 2003-10-20 | 2005-05-24 | Wafermasters, Inc. | Integrated ashing and implant annealing method |
| JP2011014696A (ja) * | 2009-07-01 | 2011-01-20 | Mitsubishi Chemicals Corp | 有機質物除去方法 |
-
2013
- 2013-12-06 JP JP2013252844A patent/JP5987815B2/ja active Active
-
2014
- 2014-10-08 WO PCT/JP2014/076881 patent/WO2015083435A1/ja not_active Ceased
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