JP2015110837A5 - - Google Patents

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Publication number
JP2015110837A5
JP2015110837A5 JP2014231137A JP2014231137A JP2015110837A5 JP 2015110837 A5 JP2015110837 A5 JP 2015110837A5 JP 2014231137 A JP2014231137 A JP 2014231137A JP 2014231137 A JP2014231137 A JP 2014231137A JP 2015110837 A5 JP2015110837 A5 JP 2015110837A5
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JP
Japan
Prior art keywords
trays
support member
liquid precursor
precursor
conduit
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JP2014231137A
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English (en)
Japanese (ja)
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JP2015110837A (ja
JP6945269B2 (ja
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Priority claimed from US14/089,009 external-priority patent/US9334566B2/en
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Publication of JP2015110837A publication Critical patent/JP2015110837A/ja
Publication of JP2015110837A5 publication Critical patent/JP2015110837A5/ja
Application granted granted Critical
Publication of JP6945269B2 publication Critical patent/JP6945269B2/ja
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JP2014231137A 2013-11-25 2014-11-14 マルチトレイバラスト蒸気引き込みシステム Active JP6945269B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/089,009 US9334566B2 (en) 2013-11-25 2013-11-25 Multi-tray ballast vapor draw systems
US14/089,009 2013-11-25

Publications (3)

Publication Number Publication Date
JP2015110837A JP2015110837A (ja) 2015-06-18
JP2015110837A5 true JP2015110837A5 (https=) 2017-12-14
JP6945269B2 JP6945269B2 (ja) 2021-10-06

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JP2014231137A Active JP6945269B2 (ja) 2013-11-25 2014-11-14 マルチトレイバラスト蒸気引き込みシステム

Country Status (5)

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US (1) US9334566B2 (https=)
JP (1) JP6945269B2 (https=)
KR (1) KR102369254B1 (https=)
CN (2) CN109536923B (https=)
TW (2) TWI700120B (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) * 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
CN118360588A (zh) 2018-07-05 2024-07-19 朗姆研究公司 衬底处理系统中的衬底支撑件的动态温度控制
US11183400B2 (en) 2018-08-08 2021-11-23 Lam Research Corporation Progressive heating of components of substrate processing systems using TCR element-based heaters
KR20200020608A (ko) 2018-08-16 2020-02-26 에이에스엠 아이피 홀딩 비.브이. 고체 소스 승화기
JP7240993B2 (ja) * 2019-08-27 2023-03-16 東京エレクトロン株式会社 原料ガス供給システム及び原料ガス供給方法
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system
US12571096B2 (en) 2019-09-18 2026-03-10 Tokyo Electron Limited Raw material gas supply system and raw material gas supply method
US12540390B2 (en) * 2020-03-17 2026-02-03 Tokyo Electron Limited Raw material supply system
JP7519829B2 (ja) * 2020-03-17 2024-07-22 東京エレクトロン株式会社 原料供給システム及び原料供給方法
CN115867999A (zh) 2020-06-06 2023-03-28 朗姆研究公司 用于半导体处理的可移除喷头面板
CN115917039A (zh) * 2020-07-29 2023-04-04 朗姆研究公司 使用起泡器的浓度控制
US20230374657A1 (en) * 2020-10-09 2023-11-23 Lam Research Corporation Vapor delivery device
CN114277358B (zh) * 2021-11-12 2023-10-27 北京北方华创微电子装备有限公司 一种液态源瓶及半导体工艺设备
US20240133033A1 (en) * 2021-12-08 2024-04-25 Asm Ip Holding B.V. Reactant delivery system and reactor system including same
US20260098337A1 (en) * 2024-10-07 2026-04-09 L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude Metal chloride precursors and deposition of metal-containing films

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US550317A (en) * 1895-11-26 Carburetor
US55950A (en) * 1866-06-26 Improved apparatus for carbureting air
US24200A (en) * 1859-05-31 hall covel
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