JP2015099916A5 - - Google Patents

Download PDF

Info

Publication number
JP2015099916A5
JP2015099916A5 JP2014208234A JP2014208234A JP2015099916A5 JP 2015099916 A5 JP2015099916 A5 JP 2015099916A5 JP 2014208234 A JP2014208234 A JP 2014208234A JP 2014208234 A JP2014208234 A JP 2014208234A JP 2015099916 A5 JP2015099916 A5 JP 2015099916A5
Authority
JP
Japan
Prior art keywords
coil
movable part
movable portion
movable
stroke range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014208234A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015099916A (ja
JP6444127B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014208234A priority Critical patent/JP6444127B2/ja
Priority claimed from JP2014208234A external-priority patent/JP6444127B2/ja
Priority to US14/515,172 priority patent/US9804507B2/en
Publication of JP2015099916A publication Critical patent/JP2015099916A/ja
Publication of JP2015099916A5 publication Critical patent/JP2015099916A5/ja
Application granted granted Critical
Publication of JP6444127B2 publication Critical patent/JP6444127B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014208234A 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法 Expired - Fee Related JP6444127B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014208234A JP6444127B2 (ja) 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法
US14/515,172 US9804507B2 (en) 2013-10-16 2014-10-15 Stage apparatus, lithography apparatus, and article manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013215359 2013-10-16
JP2013215359 2013-10-16
JP2014208234A JP6444127B2 (ja) 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015099916A JP2015099916A (ja) 2015-05-28
JP2015099916A5 true JP2015099916A5 (https=) 2017-11-16
JP6444127B2 JP6444127B2 (ja) 2018-12-26

Family

ID=52809400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014208234A Expired - Fee Related JP6444127B2 (ja) 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法

Country Status (2)

Country Link
US (1) US9804507B2 (https=)
JP (1) JP6444127B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11003095B2 (en) * 2016-09-13 2021-05-11 Asml Netherlands B.V. Positioning system and lithographic apparatus
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2568588A (en) * 1950-06-07 1951-09-18 Automatic Temperature Control Co Inc Differential transformer with long stroke and linear output
FR2194067B1 (https=) * 1972-07-26 1976-05-14 Moyse Sa
JPS5423404B2 (https=) * 1973-01-20 1979-08-14
JPH1198811A (ja) * 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JP2001085503A (ja) 1999-09-17 2001-03-30 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2006211873A (ja) * 2005-01-31 2006-08-10 Canon Inc 移動体制御装置及び移動体制御方法
JP2006237069A (ja) * 2005-02-22 2006-09-07 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP2006287121A (ja) * 2005-04-04 2006-10-19 Canon Inc 位置決め装置及びその制御方法
JP4824424B2 (ja) * 2006-02-21 2011-11-30 オークマ株式会社 リニアモータ
JP4817116B2 (ja) * 2006-04-21 2011-11-16 株式会社安川電機 ステージ装置
US7880864B2 (en) * 2006-12-27 2011-02-01 Canon Kabusiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
JP2008193056A (ja) * 2007-01-12 2008-08-21 Canon Inc ステージ装置、露光装置及びデバイス製造方法
US20080170213A1 (en) * 2007-01-12 2008-07-17 Canon Kabushiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
JP5339729B2 (ja) * 2008-01-08 2013-11-13 キヤノン株式会社 ステージ装置及びそれを有する露光装置
JP2012004201A (ja) * 2010-06-15 2012-01-05 Nikon Corp 移動体装置、露光装置、デバイス製造方法、フラットパネルディスプレイの製造方法、及び移動体装置の制御方法

Similar Documents

Publication Publication Date Title
KR20180084713A (ko) 패턴 형성 방법, 리소그래피 장치, 리소그래피 시스템, 및 물품의 제조 방법
JP2015201556A5 (https=)
IL265607A (en) Motor assembly, lithographic device and device manufacturing method
JP2016193716A5 (https=)
JP2017528372A5 (https=)
WO2015054340A3 (en) Apparatus and method for forming three-dimensional objects using a curved build platform or curved solidification substrate
JP2015061509A5 (https=)
WO2016038533A8 (en) Method for manufacturing a sensorized braking element, in particular a brake pad and a sensorized brake pad obtained thereby
JP2017211493A5 (ja) 露光装置、および、物品の製造方法
JP2016505220A5 (https=)
JP2015111657A5 (https=)
JP2013004744A5 (https=)
SG10201804930VA (en) Semiconductor device and method for manufacturing the same
JP2015099916A5 (https=)
EP3035120A3 (en) Decreasing the critical dimensions in integrated circuits
EP2942667A3 (en) Patterning method using imprint mold, pattern structure fabricated by the method, and imprinting system
SG11201808293UA (en) Method for manufacturing semiconductor device
JP2019212674A5 (https=)
JP2018006450A5 (https=)
KR102468188B1 (ko) 임프린트 장치, 임프린트 방법, 및 물품 제조 방법
JP2016012649A5 (https=)
JP2008244447A5 (https=)
JP2016074417A5 (https=)
JP2015079887A5 (https=)
JP2015023210A5 (https=)