JP6444127B2 - ステージ装置、リソグラフィ装置、それを用いた物品の製造方法 - Google Patents

ステージ装置、リソグラフィ装置、それを用いた物品の製造方法 Download PDF

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Publication number
JP6444127B2
JP6444127B2 JP2014208234A JP2014208234A JP6444127B2 JP 6444127 B2 JP6444127 B2 JP 6444127B2 JP 2014208234 A JP2014208234 A JP 2014208234A JP 2014208234 A JP2014208234 A JP 2014208234A JP 6444127 B2 JP6444127 B2 JP 6444127B2
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Japan
Prior art keywords
coil
movable part
movable
stroke range
movable portion
Prior art date
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Expired - Fee Related
Application number
JP2014208234A
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English (en)
Japanese (ja)
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JP2015099916A5 (https=
JP2015099916A (ja
Inventor
勇人 星野
勇人 星野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014208234A priority Critical patent/JP6444127B2/ja
Priority to US14/515,172 priority patent/US9804507B2/en
Publication of JP2015099916A publication Critical patent/JP2015099916A/ja
Publication of JP2015099916A5 publication Critical patent/JP2015099916A5/ja
Application granted granted Critical
Publication of JP6444127B2 publication Critical patent/JP6444127B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Linear Motors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2014208234A 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法 Expired - Fee Related JP6444127B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014208234A JP6444127B2 (ja) 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法
US14/515,172 US9804507B2 (en) 2013-10-16 2014-10-15 Stage apparatus, lithography apparatus, and article manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013215359 2013-10-16
JP2013215359 2013-10-16
JP2014208234A JP6444127B2 (ja) 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015099916A JP2015099916A (ja) 2015-05-28
JP2015099916A5 JP2015099916A5 (https=) 2017-11-16
JP6444127B2 true JP6444127B2 (ja) 2018-12-26

Family

ID=52809400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014208234A Expired - Fee Related JP6444127B2 (ja) 2013-10-16 2014-10-09 ステージ装置、リソグラフィ装置、それを用いた物品の製造方法

Country Status (2)

Country Link
US (1) US9804507B2 (https=)
JP (1) JP6444127B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11003095B2 (en) * 2016-09-13 2021-05-11 Asml Netherlands B.V. Positioning system and lithographic apparatus
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2568588A (en) * 1950-06-07 1951-09-18 Automatic Temperature Control Co Inc Differential transformer with long stroke and linear output
FR2194067B1 (https=) * 1972-07-26 1976-05-14 Moyse Sa
JPS5423404B2 (https=) * 1973-01-20 1979-08-14
JPH1198811A (ja) * 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JP2001085503A (ja) 1999-09-17 2001-03-30 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2006211873A (ja) * 2005-01-31 2006-08-10 Canon Inc 移動体制御装置及び移動体制御方法
JP2006237069A (ja) * 2005-02-22 2006-09-07 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP2006287121A (ja) * 2005-04-04 2006-10-19 Canon Inc 位置決め装置及びその制御方法
JP4824424B2 (ja) * 2006-02-21 2011-11-30 オークマ株式会社 リニアモータ
JP4817116B2 (ja) * 2006-04-21 2011-11-16 株式会社安川電機 ステージ装置
US7880864B2 (en) * 2006-12-27 2011-02-01 Canon Kabusiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
JP2008193056A (ja) * 2007-01-12 2008-08-21 Canon Inc ステージ装置、露光装置及びデバイス製造方法
US20080170213A1 (en) * 2007-01-12 2008-07-17 Canon Kabushiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
JP5339729B2 (ja) * 2008-01-08 2013-11-13 キヤノン株式会社 ステージ装置及びそれを有する露光装置
JP2012004201A (ja) * 2010-06-15 2012-01-05 Nikon Corp 移動体装置、露光装置、デバイス製造方法、フラットパネルディスプレイの製造方法、及び移動体装置の制御方法

Also Published As

Publication number Publication date
US9804507B2 (en) 2017-10-31
US20150103329A1 (en) 2015-04-16
JP2015099916A (ja) 2015-05-28

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