JP2015076521A5 - - Google Patents

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Publication number
JP2015076521A5
JP2015076521A5 JP2013212021A JP2013212021A JP2015076521A5 JP 2015076521 A5 JP2015076521 A5 JP 2015076521A5 JP 2013212021 A JP2013212021 A JP 2013212021A JP 2013212021 A JP2013212021 A JP 2013212021A JP 2015076521 A5 JP2015076521 A5 JP 2015076521A5
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movable member
appendix
substrate
moving
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JP2013212021A
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JP2015076521A (ja
JP6318534B2 (ja
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JP2013212021A 2013-10-09 2013-10-09 露光装置及び露光方法、並びにデバイス製造方法 Active JP6318534B2 (ja)

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Application Number Priority Date Filing Date Title
JP2013212021A JP6318534B2 (ja) 2013-10-09 2013-10-09 露光装置及び露光方法、並びにデバイス製造方法

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JP2013212021A JP6318534B2 (ja) 2013-10-09 2013-10-09 露光装置及び露光方法、並びにデバイス製造方法

Related Child Applications (1)

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JP2018072471A Division JP6575629B2 (ja) 2018-04-04 2018-04-04 露光装置及び露光方法、並びにデバイス製造方法

Publications (3)

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JP2015076521A JP2015076521A (ja) 2015-04-20
JP2015076521A5 true JP2015076521A5 (https=) 2016-11-10
JP6318534B2 JP6318534B2 (ja) 2018-05-09

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JP2013212021A Active JP6318534B2 (ja) 2013-10-09 2013-10-09 露光装置及び露光方法、並びにデバイス製造方法

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3184250B2 (ja) 1991-06-26 2001-07-09 竹原 芳子 停止表示器及び停止表示器用停止表示板
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
CN105116688B (zh) * 2015-09-01 2017-06-23 浙江大学 一种用于浸没式光刻机的浸没液体控制装置
KR102215539B1 (ko) 2015-11-20 2021-02-16 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 리소그래피 장치를 작동시키는 방법
EP3510446B1 (en) 2016-09-12 2022-10-05 ASML Netherlands B.V. Fluid handling structure for lithographic apparatus
KR102649164B1 (ko) 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007287824A (ja) * 2006-04-14 2007-11-01 Nikon Corp 露光装置及びデバイス製造方法
US20070273856A1 (en) * 2006-05-25 2007-11-29 Nikon Corporation Apparatus and methods for inhibiting immersion liquid from flowing below a substrate
JP2010267656A (ja) * 2009-05-12 2010-11-25 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
JP2013102029A (ja) * 2011-11-08 2013-05-23 Nikon Corp 露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体

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