JP2015050362A5 - - Google Patents
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- Publication number
- JP2015050362A5 JP2015050362A5 JP2013181753A JP2013181753A JP2015050362A5 JP 2015050362 A5 JP2015050362 A5 JP 2015050362A5 JP 2013181753 A JP2013181753 A JP 2013181753A JP 2013181753 A JP2013181753 A JP 2013181753A JP 2015050362 A5 JP2015050362 A5 JP 2015050362A5
- Authority
- JP
- Japan
- Prior art keywords
- processing apparatus
- dispersion plate
- generation unit
- plasma processing
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000006185 dispersion Substances 0.000 claims description 15
- 239000012212 insulator Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013181753A JP2015050362A (ja) | 2013-09-03 | 2013-09-03 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013181753A JP2015050362A (ja) | 2013-09-03 | 2013-09-03 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015050362A JP2015050362A (ja) | 2015-03-16 |
| JP2015050362A5 true JP2015050362A5 (cg-RX-API-DMAC7.html) | 2016-04-07 |
Family
ID=52700115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013181753A Pending JP2015050362A (ja) | 2013-09-03 | 2013-09-03 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2015050362A (cg-RX-API-DMAC7.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6454488B2 (ja) * | 2014-07-10 | 2019-01-16 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| KR102085044B1 (ko) | 2015-05-22 | 2020-03-05 | 가부시키가이샤 히다치 하이테크놀로지즈 | 플라스마 처리 장치 및 그것을 이용한 플라스마 처리 방법 |
| JP6902991B2 (ja) | 2017-12-19 | 2021-07-14 | 株式会社日立ハイテク | プラズマ処理装置 |
| KR102851427B1 (ko) * | 2019-10-07 | 2025-08-28 | 주식회사 테스 | 기판 처리 방법 |
| KR102560323B1 (ko) | 2020-04-03 | 2023-07-28 | 주식회사 히타치하이테크 | 플라스마 처리 장치 및 플라스마 처리 방법 |
| US12444582B2 (en) | 2020-04-21 | 2025-10-14 | Hitachi High-Tech Corporation | Plasma processing apparatus |
| CN113709959A (zh) * | 2020-05-22 | 2021-11-26 | 江苏鲁汶仪器有限公司 | 一种防击穿离子源放电装置 |
| US12451364B2 (en) | 2022-04-26 | 2025-10-21 | Hitachi High-Tech Corporation | Plasma processing method |
| JP2023182374A (ja) * | 2022-06-14 | 2023-12-26 | コミヤマエレクトロン株式会社 | プラズマ処理装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03123022A (ja) * | 1989-10-05 | 1991-05-24 | Toshiba Corp | プラズマ成膜装置 |
| US5241245A (en) * | 1992-05-06 | 1993-08-31 | International Business Machines Corporation | Optimized helical resonator for plasma processing |
| JPH08148473A (ja) * | 1994-11-15 | 1996-06-07 | Toshiba Corp | プラズマ処理装置 |
| JP3353514B2 (ja) * | 1994-12-09 | 2002-12-03 | ソニー株式会社 | プラズマ処理装置、プラズマ処理方法及び半導体装置の作製方法 |
| JP3561080B2 (ja) * | 1996-04-23 | 2004-09-02 | 松下電器産業株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| JP4382265B2 (ja) * | 2000-07-12 | 2009-12-09 | 日本電気株式会社 | 酸化シリコン膜の形成方法及びその形成装置 |
| JP5199595B2 (ja) * | 2007-03-27 | 2013-05-15 | 東京エレクトロン株式会社 | プラズマ処理装置及びそのクリーニング方法 |
| US9520275B2 (en) * | 2008-03-21 | 2016-12-13 | Tokyo Electron Limited | Mono-energetic neutral beam activated chemical processing system and method of using |
| JP2010077489A (ja) * | 2008-09-25 | 2010-04-08 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| JP2012227307A (ja) * | 2011-04-19 | 2012-11-15 | Japan Steel Works Ltd:The | プラズマ処理装置及び被処理体のプラズマ処理方法 |
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2013
- 2013-09-03 JP JP2013181753A patent/JP2015050362A/ja active Pending