JP2015035273A5 - - Google Patents

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Publication number
JP2015035273A5
JP2015035273A5 JP2013164427A JP2013164427A JP2015035273A5 JP 2015035273 A5 JP2015035273 A5 JP 2015035273A5 JP 2013164427 A JP2013164427 A JP 2013164427A JP 2013164427 A JP2013164427 A JP 2013164427A JP 2015035273 A5 JP2015035273 A5 JP 2015035273A5
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JP
Japan
Prior art keywords
electron beam
voltage
image
measurement object
image acquisition
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JP2013164427A
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English (en)
Japanese (ja)
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JP2015035273A (ja
JP6305703B2 (ja
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Priority to JP2013164427A priority Critical patent/JP6305703B2/ja
Priority claimed from JP2013164427A external-priority patent/JP6305703B2/ja
Priority to US14/453,099 priority patent/US20150041645A1/en
Publication of JP2015035273A publication Critical patent/JP2015035273A/ja
Publication of JP2015035273A5 publication Critical patent/JP2015035273A5/ja
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JP2013164427A 2013-08-07 2013-08-07 画像取得装置、画像取得方法及び欠陥検査装置 Active JP6305703B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013164427A JP6305703B2 (ja) 2013-08-07 2013-08-07 画像取得装置、画像取得方法及び欠陥検査装置
US14/453,099 US20150041645A1 (en) 2013-08-07 2014-08-06 Image acquisition apparatus, image acquisition method and defect inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013164427A JP6305703B2 (ja) 2013-08-07 2013-08-07 画像取得装置、画像取得方法及び欠陥検査装置

Publications (3)

Publication Number Publication Date
JP2015035273A JP2015035273A (ja) 2015-02-19
JP2015035273A5 true JP2015035273A5 (enExample) 2016-10-06
JP6305703B2 JP6305703B2 (ja) 2018-04-04

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ID=52447799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013164427A Active JP6305703B2 (ja) 2013-08-07 2013-08-07 画像取得装置、画像取得方法及び欠陥検査装置

Country Status (2)

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US (1) US20150041645A1 (enExample)
JP (1) JP6305703B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6641011B2 (ja) 2015-11-30 2020-02-05 エーエスエムエル ネザーランズ ビー．ブイ． 複数の荷電粒子ビームの装置
JP2017135046A (ja) * 2016-01-29 2017-08-03 株式会社荏原製作所 検査装置
WO2021159285A1 (zh) * 2020-02-12 2021-08-19 深圳华大智造科技股份有限公司 光学成像系统及应用所述光学成像系统的生化物质检测系统
US20230221541A1 (en) * 2020-03-30 2023-07-13 The United States Of America, As Represented By The Secretary, Department Of Health And Human Servic Systems and methods for multiview super-resolution microscopy

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2810216B2 (ja) * 1990-06-20 1998-10-15 株式会社日立製作所 パターン検査方法及びその装置
JP3515063B2 (ja) * 2000-09-28 2004-04-05 株式会社日立製作所 走査形電子顕微鏡
WO2003044821A1 (en) * 2001-11-21 2003-05-30 Hitachi High-Technologies Corporation Sample imaging method and charged particle beam system
JP2004014229A (ja) * 2002-06-05 2004-01-15 Hitachi High-Technologies Corp 荷電粒子線装置
JP3984870B2 (ja) * 2002-06-12 2007-10-03 株式会社日立ハイテクノロジーズ ウェハ欠陥検査方法及びウェハ欠陥検査装置
ATE477586T1 (de) * 2002-10-09 2010-08-15 Applied Materials Israel Ltd System und verfahren für schnelle änderungen der brennweite
JP2004327121A (ja) * 2003-04-22 2004-11-18 Ebara Corp 写像投影方式電子線装置
JP4708854B2 (ja) * 2005-05-13 2011-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置
TWI435361B (zh) * 2007-04-16 2014-04-21 Ebara Corp 電子射線裝置及使用該電子射線裝置之試料觀察方法
JP5802128B2 (ja) * 2008-10-09 2015-10-28 カリフォルニア インスティテュート オブ テクノロジー 四次元イメージング超高速電子顕微鏡
JP2012521541A (ja) * 2009-03-18 2012-09-13 ユニバーシティ オブ ユタ リサーチ ファウンデーション ノンコヒーレント光学顕微鏡
EP2942801A1 (en) * 2009-09-24 2015-11-11 Protochips, Inc. Methods of using temperature control devices in electron microscopy
JP5542478B2 (ja) * 2010-03-02 2014-07-09 株式会社日立ハイテクノロジーズ 荷電粒子線顕微鏡
JP5963453B2 (ja) * 2011-03-15 2016-08-03 株式会社荏原製作所 検査装置
US8461554B1 (en) * 2011-12-07 2013-06-11 Varian Semiconductor Equipment Associates, Inc. Apparatus and method for charge neutralization during processing of a workpiece

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