JP2014534336A5 - - Google Patents

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Publication number
JP2014534336A5
JP2014534336A5 JP2014533979A JP2014533979A JP2014534336A5 JP 2014534336 A5 JP2014534336 A5 JP 2014534336A5 JP 2014533979 A JP2014533979 A JP 2014533979A JP 2014533979 A JP2014533979 A JP 2014533979A JP 2014534336 A5 JP2014534336 A5 JP 2014534336A5
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JP
Japan
Prior art keywords
layer
ald
oxide layer
inorganic oxide
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014533979A
Other languages
English (en)
Japanese (ja)
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JP6096783B2 (ja
JP2014534336A (ja
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Publication date
Priority claimed from GBGB1117242.6A external-priority patent/GB201117242D0/en
Application filed filed Critical
Publication of JP2014534336A publication Critical patent/JP2014534336A/ja
Publication of JP2014534336A5 publication Critical patent/JP2014534336A5/ja
Application granted granted Critical
Publication of JP6096783B2 publication Critical patent/JP6096783B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014533979A 2011-10-06 2012-09-26 大気圧プラズマ法によるコーティング作製方法 Expired - Fee Related JP6096783B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB1117242.6A GB201117242D0 (en) 2011-10-06 2011-10-06 Method and device for manufacturing a barrier layer on a flexible subtrate
GB1117242.6 2011-10-06
PCT/GB2012/052378 WO2013050741A1 (en) 2011-10-06 2012-09-26 A method for producing a coating by atmospheric pressure plasma technology

Publications (3)

Publication Number Publication Date
JP2014534336A JP2014534336A (ja) 2014-12-18
JP2014534336A5 true JP2014534336A5 (OSRAM) 2015-11-12
JP6096783B2 JP6096783B2 (ja) 2017-03-15

Family

ID=45035243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014533979A Expired - Fee Related JP6096783B2 (ja) 2011-10-06 2012-09-26 大気圧プラズマ法によるコーティング作製方法

Country Status (5)

Country Link
US (1) US20140242365A1 (OSRAM)
EP (1) EP2764133B1 (OSRAM)
JP (1) JP6096783B2 (OSRAM)
GB (1) GB201117242D0 (OSRAM)
WO (1) WO2013050741A1 (OSRAM)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104412425B (zh) * 2012-09-06 2017-07-21 株式会社吴羽 非水电解质二次电池负极用碳质材料及其制造方法
EP2935648B1 (en) * 2012-12-21 2019-08-28 AGC Inc. Pair of electrodes for dbd plasma process
KR102244070B1 (ko) * 2014-01-07 2021-04-26 삼성디스플레이 주식회사 기상 증착 장치, 기상 증착 방법 및 유기 발광 표시 장치 제조 방법
JP2015166170A (ja) * 2014-03-04 2015-09-24 東洋製罐グループホールディングス株式会社 ガスバリア性積層体
US20170067151A1 (en) * 2014-03-04 2017-03-09 Toyo Seikan Group Holdings, Ltd. Gas barrier laminate
JP2015178231A (ja) * 2014-03-19 2015-10-08 東洋製罐グループホールディングス株式会社 ガスバリア性積層構造体
WO2016017690A1 (ja) * 2014-07-29 2016-02-04 凸版印刷株式会社 積層体及びその製造方法、並びにガスバリアフィルム及びその製造方法
DE102015115329A1 (de) * 2015-09-11 2017-03-16 Hanwha Q Cells Gmbh Verfahren zur plasmaunterstützten Abscheidung von Aluminiumoxiddünnschichten auf Halbleiterwafern für die Herstellung von Wafersolarzellen und Inline-PECVD-Anlage
CN107254675B (zh) * 2017-06-07 2019-07-09 华中科技大学 一种纳米颗粒空间原子层沉积连续包覆装置及方法
WO2020154023A1 (en) 2019-01-25 2020-07-30 Applied Materials, Inc. Method of forming moisture and oxygen barrier coatings
EP4095283A1 (en) * 2021-05-25 2022-11-30 Molecular Plasma Group SA Method and system for coating filter media

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GB8427943D0 (en) * 1984-11-05 1984-12-12 Alcan Int Ltd Anodic aluminium oxide film
US6391785B1 (en) 1999-08-24 2002-05-21 Interuniversitair Microelektronica Centrum (Imec) Method for bottomless deposition of barrier layers in integrated circuit metallization schemes
US7098131B2 (en) 2001-07-19 2006-08-29 Samsung Electronics Co., Ltd. Methods for forming atomic layers and thin films including tantalum nitride and devices including the same
US7045010B2 (en) * 2001-09-06 2006-05-16 Alcatel Applicator for high-speed gel buffering of flextube optical fiber bundles
US6756318B2 (en) 2001-09-10 2004-06-29 Tegal Corporation Nanolayer thick film processing system and method
EP1351321B1 (en) * 2002-04-01 2013-12-25 Konica Corporation Support and organic electroluminescence element comprising the support
US6774569B2 (en) 2002-07-11 2004-08-10 Fuji Photo Film B.V. Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
US7288204B2 (en) 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
EP1403902A1 (en) 2002-09-30 2004-03-31 Fuji Photo Film B.V. Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)
ATE348497T1 (de) 2004-08-13 2007-01-15 Fuji Photo Film Bv Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druck
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JP5912228B2 (ja) * 2010-05-17 2016-04-27 凸版印刷株式会社 ガスバリア性積層体の製造方法

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