JP2014533441A5 - - Google Patents
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- Publication number
- JP2014533441A5 JP2014533441A5 JP2014541542A JP2014541542A JP2014533441A5 JP 2014533441 A5 JP2014533441 A5 JP 2014533441A5 JP 2014541542 A JP2014541542 A JP 2014541542A JP 2014541542 A JP2014541542 A JP 2014541542A JP 2014533441 A5 JP2014533441 A5 JP 2014533441A5
- Authority
- JP
- Japan
- Prior art keywords
- modulator
- range
- tilt
- modulator according
- mirrors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2011/005737 WO2013071940A1 (en) | 2011-11-15 | 2011-11-15 | Light modulator and illumination system of a microlithographic projection exposure apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014533441A JP2014533441A (ja) | 2014-12-11 |
| JP2014533441A5 true JP2014533441A5 (enExample) | 2015-01-29 |
| JP5918858B2 JP5918858B2 (ja) | 2016-05-18 |
Family
ID=44983490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014541542A Active JP5918858B2 (ja) | 2011-11-15 | 2011-11-15 | マイクロリソグラフィ投影露光装置の光変調器及び照明系 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9274434B2 (enExample) |
| JP (1) | JP5918858B2 (enExample) |
| WO (1) | WO2013071940A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013212613B4 (de) * | 2013-06-28 | 2015-07-23 | Carl Zeiss Sms Gmbh | Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik |
| DE102013219057A1 (de) * | 2013-09-23 | 2015-03-26 | Carl Zeiss Smt Gmbh | Facettenspiegel für eine Projektionsbelichtungsanlage |
| JP6558529B2 (ja) * | 2015-03-30 | 2019-08-14 | 株式会社ニコン | 空間光変調器及びその使用方法、変調方法、露光方法及び装置、並びにデバイス製造方法 |
| JP6558528B2 (ja) * | 2015-03-30 | 2019-08-14 | 株式会社ニコン | 空間光変調器及びその使用方法、変調方法、露光方法及び装置、並びにデバイス製造方法 |
| US11307335B2 (en) * | 2017-08-09 | 2022-04-19 | Maradin Ltd. | Optical apparatus and methods and computer program products useful for manufacturing same |
| DE102020123024B4 (de) * | 2020-09-03 | 2024-12-24 | Universität Kassel | Spiegel-Shutter-System |
| DE102020211173A1 (de) * | 2020-09-04 | 2022-03-10 | Robert Bosch Gesellschaft mit beschränkter Haftung | Mikrospiegelanordnung |
| DE102021211619A1 (de) | 2021-10-14 | 2023-04-20 | Carl Zeiss Smt Gmbh | EUV- Mehrfachspiegelanordnung |
| TWI842293B (zh) * | 2021-12-30 | 2024-05-11 | 南韓商細美事有限公司 | 遮罩處理設備及基板處理設備 |
| DE102022213143A1 (de) * | 2022-12-06 | 2024-06-06 | Carl Zeiss Smt Gmbh | Spiegelanordnung zur Absorption von Strahlung und Lithographiesystem |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5719695A (en) * | 1995-03-31 | 1998-02-17 | Texas Instruments Incorporated | Spatial light modulator with superstructure light shield |
| US6275325B1 (en) * | 2000-04-07 | 2001-08-14 | Microsoft Corporation | Thermally activated microelectromechanical systems actuator |
| JP2001356282A (ja) * | 2000-06-13 | 2001-12-26 | Ricoh Co Ltd | 表示媒体 |
| US7167297B2 (en) | 2000-08-30 | 2007-01-23 | Reflectivity, Inc | Micromirror array |
| US6737662B2 (en) | 2001-06-01 | 2004-05-18 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product |
| US6728023B1 (en) * | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
| KR100480620B1 (ko) | 2002-09-19 | 2005-03-31 | 삼성전자주식회사 | 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법 |
| US6844959B2 (en) * | 2002-11-26 | 2005-01-18 | Reflectivity, Inc | Spatial light modulators with light absorbing areas |
| US7483198B2 (en) * | 2003-02-12 | 2009-01-27 | Texas Instruments Incorporated | Micromirror device and method for making the same |
| EP1668421A2 (en) | 2003-09-12 | 2006-06-14 | Carl Zeiss SMT AG | Illumination system for a microlithography projection exposure installation |
| US20060087634A1 (en) | 2004-10-25 | 2006-04-27 | Brown Jay M | Dynamic illumination uniformity and shape control for lithography |
| US7502155B2 (en) | 2005-03-15 | 2009-03-10 | Texas Instruments Incorporated | Antireflective coating for semiconductor devices and method for the same |
| CN101669071B (zh) | 2007-04-25 | 2012-03-21 | 卡尔蔡司Smt有限责任公司 | 微光刻曝光装置中照明掩模的照明系统 |
| WO2008131930A1 (en) | 2007-04-25 | 2008-11-06 | Carl Zeiss Smt Ag | Mirror matrix for a microlithographic projection exposure apparatus |
| US8102506B2 (en) * | 2007-06-26 | 2012-01-24 | Carl Zeiss Smt Gmbh | Method and device for controlling a plurality of actuators and an illumination device for lithography |
| SG10201602750RA (en) * | 2007-10-16 | 2016-05-30 | Nikon Corp | Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method |
| EP2209135A4 (en) | 2007-11-06 | 2011-06-08 | Nikon Corp | OPTICAL LIGHTING DEVICE AND EXPOSURE DEVICE |
| EP2233960A4 (en) * | 2007-12-17 | 2012-01-25 | Nikon Corp | SPATIAL LIGHT MODULATION UNIT, OPTICAL LIGHTING SYSTEM, ALIGNMENT DEVICE AND COMPONENT MANUFACTURING METHOD |
| JP2011528449A (ja) * | 2008-07-15 | 2011-11-17 | フサオ イシイ | 凹凸のない平面ミラーを有するミラー素子 |
| DE102008050446B4 (de) | 2008-10-08 | 2011-07-28 | Carl Zeiss SMT GmbH, 73447 | Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln |
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2011
- 2011-11-15 JP JP2014541542A patent/JP5918858B2/ja active Active
- 2011-11-15 WO PCT/EP2011/005737 patent/WO2013071940A1/en not_active Ceased
-
2014
- 2014-04-10 US US14/249,730 patent/US9274434B2/en active Active