JP2014531704A5 - - Google Patents

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Publication number
JP2014531704A5
JP2014531704A5 JP2014527556A JP2014527556A JP2014531704A5 JP 2014531704 A5 JP2014531704 A5 JP 2014531704A5 JP 2014527556 A JP2014527556 A JP 2014527556A JP 2014527556 A JP2014527556 A JP 2014527556A JP 2014531704 A5 JP2014531704 A5 JP 2014531704A5
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JP
Japan
Prior art keywords
seed laser
beam splitter
laser beam
radiation source
optical amplifier
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Application number
JP2014527556A
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English (en)
Japanese (ja)
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JP2014531704A (ja
JP6047573B2 (ja
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Priority claimed from PCT/EP2012/064775 external-priority patent/WO2013029895A1/en
Publication of JP2014531704A publication Critical patent/JP2014531704A/ja
Publication of JP2014531704A5 publication Critical patent/JP2014531704A5/ja
Application granted granted Critical
Publication of JP6047573B2 publication Critical patent/JP6047573B2/ja
Active legal-status Critical Current
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JP2014527556A 2011-09-02 2012-07-27 放射源 Active JP6047573B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161530782P 2011-09-02 2011-09-02
US61/530,782 2011-09-02
PCT/EP2012/064775 WO2013029895A1 (en) 2011-09-02 2012-07-27 Radiation source

Publications (3)

Publication Number Publication Date
JP2014531704A JP2014531704A (ja) 2014-11-27
JP2014531704A5 true JP2014531704A5 (https=) 2015-09-10
JP6047573B2 JP6047573B2 (ja) 2016-12-21

Family

ID=46640658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014527556A Active JP6047573B2 (ja) 2011-09-02 2012-07-27 放射源

Country Status (4)

Country Link
US (1) US9516732B2 (https=)
JP (1) JP6047573B2 (https=)
TW (1) TWI586222B (https=)
WO (1) WO2013029895A1 (https=)

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Publication number Priority date Publication date Assignee Title
WO1997020305A1 (en) 1995-11-30 1997-06-05 Virtual Technologies, Inc. Tactile feedback man-machine interface device
CN104577685B (zh) * 2015-01-04 2017-10-20 中国科学院上海光学精密机械研究所 光纤激光双程泵浦1.2μm波段范围激光器
JP2018512723A (ja) * 2015-02-19 2018-05-17 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
US10048199B1 (en) * 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
US10524345B2 (en) 2017-04-28 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Residual gain monitoring and reduction for EUV drive laser
JP7239491B2 (ja) * 2017-05-30 2023-03-14 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
JP6720333B2 (ja) * 2017-06-12 2020-07-08 ユニカルタ・インコーポレイテッド 基板上に個別部品を並列に組み立てる方法
WO2021204481A1 (en) * 2020-04-09 2021-10-14 Asml Netherlands B.V. Seed laser system for radiation source

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4194813A (en) * 1978-10-13 1980-03-25 The United States Of America As Represented By The United States Department Of Energy Vacuum aperture isolator for retroreflection from laser-irradiated target
US5790574A (en) * 1994-08-24 1998-08-04 Imar Technology Company Low cost, high average power, high brightness solid state laser
US6999491B2 (en) * 1999-10-15 2006-02-14 Jmar Research, Inc. High intensity and high power solid state laser amplifying system and method
US7491954B2 (en) 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7087914B2 (en) 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
FR2871622B1 (fr) 2004-06-14 2008-09-12 Commissariat Energie Atomique Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet
JP2006172898A (ja) 2004-12-15 2006-06-29 National Institute Of Advanced Industrial & Technology レーザープラズマｘ線発生装置
US7308007B2 (en) 2004-12-23 2007-12-11 Colorado State University Research Foundation Increased laser output energy and average power at wavelengths below 35 nm
WO2006075535A1 (ja) 2005-01-12 2006-07-20 Nikon Corporation レーザプラズマｅｕｖ光源、ターゲット部材、テープ部材、ターゲット部材の製造方法、ターゲットの供給方法、及びｅｕｖ露光装置
JP2006228998A (ja) 2005-02-18 2006-08-31 Komatsu Ltd 極端紫外線光源装置
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7289263B1 (en) 2006-08-02 2007-10-30 Coherent, Inc. Double-pass fiber amplifier
US20080181266A1 (en) 2007-01-26 2008-07-31 Institut National D'optique Enhanced seeded pulsed fiber laser source
NL1036272A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
WO2009089619A1 (en) 2008-01-16 2009-07-23 Pyrophotonics Lasers Inc. Method and system for tunable pulsed laser source
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8605355B2 (en) 2009-11-24 2013-12-10 Applied Energetics Off axis walk off multi-pass amplifiers
JP5722061B2 (ja) 2010-02-19 2015-05-20 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
US9113540B2 (en) 2010-02-19 2015-08-18 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection

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