JP2014528164A5 - - Google Patents
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- Publication number
- JP2014528164A5 JP2014528164A5 JP2014529637A JP2014529637A JP2014528164A5 JP 2014528164 A5 JP2014528164 A5 JP 2014528164A5 JP 2014529637 A JP2014529637 A JP 2014529637A JP 2014529637 A JP2014529637 A JP 2014529637A JP 2014528164 A5 JP2014528164 A5 JP 2014528164A5
- Authority
- JP
- Japan
- Prior art keywords
- target
- bearing
- processing tool
- target processing
- guide surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001459 lithography Methods 0.000 claims description 5
- 238000000059 patterning Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161533339P | 2011-09-12 | 2011-09-12 | |
| US61/533,339 | 2011-09-12 | ||
| PCT/NL2012/050630 WO2013039387A1 (en) | 2011-09-12 | 2012-09-07 | Guidance for target processing tool |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014528164A JP2014528164A (ja) | 2014-10-23 |
| JP2014528164A5 true JP2014528164A5 (cg-RX-API-DMAC10.html) | 2015-10-29 |
| JP5955964B2 JP5955964B2 (ja) | 2016-07-20 |
Family
ID=47003170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014529637A Active JP5955964B2 (ja) | 2011-09-12 | 2012-09-07 | ターゲット処理ツールのためのガイダンス |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9163664B2 (cg-RX-API-DMAC10.html) |
| EP (1) | EP2756354B1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP5955964B2 (cg-RX-API-DMAC10.html) |
| TW (1) | TW201314382A (cg-RX-API-DMAC10.html) |
| WO (1) | WO2013039387A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013039387A1 (en) | 2011-09-12 | 2013-03-21 | Mapper Lithography Ip B.V. | Guidance for target processing tool |
| KR101608625B1 (ko) * | 2015-07-30 | 2016-04-11 | 주식회사 재원 | 위치 결정 장치 |
| CN112658691A (zh) * | 2020-12-16 | 2021-04-16 | 惠州城市职业学院(惠州商贸旅游高级职业技术学校) | 一种冲浪板切割打磨一体装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4637738A (en) * | 1985-07-31 | 1987-01-20 | Vincent Barkley | Alignment compensator for linear bearings |
| US4802774A (en) * | 1987-10-14 | 1989-02-07 | Brown & Sharpe Manfacturing Co. | Gas bearing for guiding relative movement of precision machine parts |
| JPH01240246A (ja) * | 1988-03-22 | 1989-09-25 | Kazuya Hirose | テーブルの縦横移動機構 |
| US5180230A (en) * | 1991-06-12 | 1993-01-19 | Etec Systems, Inc. | Rolling element cage constraint |
| JP3353941B2 (ja) * | 1993-05-11 | 2002-12-09 | オリンパス光学工業株式会社 | 直線移動部材の支持装置 |
| US5760564A (en) | 1995-06-27 | 1998-06-02 | Nikon Precision Inc. | Dual guide beam stage mechanism with yaw control |
| US6114799A (en) * | 1997-02-10 | 2000-09-05 | Minolta Co., Ltd. | Driving mechanism |
| JP4073512B2 (ja) * | 1997-02-10 | 2008-04-09 | コニカミノルタホールディングス株式会社 | 駆動装置 |
| DE60032568T2 (de) | 1999-12-01 | 2007-10-04 | Asml Netherlands B.V. | Positionierungsapparat und damit versehener lithographischer Apparat |
| US6570155B1 (en) * | 2000-04-11 | 2003-05-27 | Applied Materials, Inc. | Bi-directional electron beam scanning apparatus |
| DE10140174B4 (de) | 2001-08-22 | 2005-11-10 | Leica Microsystems Semiconductor Gmbh | Koordinaten-Messtisch und Koordinaten-Messgerät |
| US7239369B2 (en) * | 2002-09-30 | 2007-07-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2313908B1 (en) | 2008-08-18 | 2014-09-24 | Mapper Lithography IP B.V. | Charged particle beam lithography system and target positioning device |
| NL2003846A (en) * | 2008-12-19 | 2010-06-22 | Asml Netherlands Bv | Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless. |
| WO2013039387A1 (en) | 2011-09-12 | 2013-03-21 | Mapper Lithography Ip B.V. | Guidance for target processing tool |
-
2012
- 2012-09-07 WO PCT/NL2012/050630 patent/WO2013039387A1/en not_active Ceased
- 2012-09-07 EP EP12769750.6A patent/EP2756354B1/en not_active Not-in-force
- 2012-09-07 JP JP2014529637A patent/JP5955964B2/ja active Active
- 2012-09-11 US US13/610,398 patent/US9163664B2/en active Active
- 2012-09-12 TW TW101133277A patent/TW201314382A/zh unknown