JP2014522302A5 - - Google Patents

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Publication number
JP2014522302A5
JP2014522302A5 JP2014512834A JP2014512834A JP2014522302A5 JP 2014522302 A5 JP2014522302 A5 JP 2014522302A5 JP 2014512834 A JP2014512834 A JP 2014512834A JP 2014512834 A JP2014512834 A JP 2014512834A JP 2014522302 A5 JP2014522302 A5 JP 2014522302A5
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JP
Japan
Prior art keywords
target
filter
holes
mixture
reservoir
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JP2014512834A
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English (en)
Japanese (ja)
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JP6117188B2 (ja
JP2014522302A (ja
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Priority claimed from US13/112,784 external-priority patent/US9029813B2/en
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Publication of JP2014522302A5 publication Critical patent/JP2014522302A5/ja
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JP2014512834A 2011-05-20 2012-03-20 材料供給装置のためのフィルタ Active JP6117188B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/112,784 US9029813B2 (en) 2011-05-20 2011-05-20 Filter for material supply apparatus of an extreme ultraviolet light source
US13/112,784 2011-05-20
PCT/US2012/029838 WO2012161860A1 (en) 2011-05-20 2012-03-20 Filter for material supply apparatus

Publications (3)

Publication Number Publication Date
JP2014522302A JP2014522302A (ja) 2014-09-04
JP2014522302A5 true JP2014522302A5 (https=) 2015-05-07
JP6117188B2 JP6117188B2 (ja) 2017-04-19

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JP2014512834A Active JP6117188B2 (ja) 2011-05-20 2012-03-20 材料供給装置のためのフィルタ

Country Status (7)

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US (2) US9029813B2 (https=)
EP (1) EP2709743A4 (https=)
JP (1) JP6117188B2 (https=)
KR (1) KR101899418B1 (https=)
CN (1) CN103561839B (https=)
TW (1) TWI587903B (https=)
WO (1) WO2012161860A1 (https=)

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CN114830832B (zh) * 2019-12-17 2025-09-05 Asml荷兰有限公司 用于极紫外光源的目标材料储槽
JP7491737B2 (ja) * 2020-05-21 2024-05-28 ギガフォトン株式会社 ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法
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CN116264753B (zh) * 2021-12-15 2025-09-12 北京锐德康科技有限公司 用于重频激光打靶的靶片及可装卸靶盘
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