JP2014522302A5 - - Google Patents
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- Publication number
- JP2014522302A5 JP2014522302A5 JP2014512834A JP2014512834A JP2014522302A5 JP 2014522302 A5 JP2014522302 A5 JP 2014522302A5 JP 2014512834 A JP2014512834 A JP 2014512834A JP 2014512834 A JP2014512834 A JP 2014512834A JP 2014522302 A5 JP2014522302 A5 JP 2014522302A5
- Authority
- JP
- Japan
- Prior art keywords
- target
- filter
- holes
- mixture
- reservoir
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/112,784 | 2011-05-20 | ||
| US13/112,784 US9029813B2 (en) | 2011-05-20 | 2011-05-20 | Filter for material supply apparatus of an extreme ultraviolet light source |
| PCT/US2012/029838 WO2012161860A1 (en) | 2011-05-20 | 2012-03-20 | Filter for material supply apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014522302A JP2014522302A (ja) | 2014-09-04 |
| JP2014522302A5 true JP2014522302A5 (OSRAM) | 2015-05-07 |
| JP6117188B2 JP6117188B2 (ja) | 2017-04-19 |
Family
ID=47174252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014512834A Active JP6117188B2 (ja) | 2011-05-20 | 2012-03-20 | 材料供給装置のためのフィルタ |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9029813B2 (OSRAM) |
| EP (1) | EP2709743A4 (OSRAM) |
| JP (1) | JP6117188B2 (OSRAM) |
| KR (1) | KR101899418B1 (OSRAM) |
| CN (1) | CN103561839B (OSRAM) |
| TW (1) | TWI587903B (OSRAM) |
| WO (1) | WO2012161860A1 (OSRAM) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012216768A (ja) * | 2011-03-30 | 2012-11-08 | Gigaphoton Inc | レーザシステム、極端紫外光生成システム、およびレーザ光生成方法 |
| US9029813B2 (en) | 2011-05-20 | 2015-05-12 | Asml Netherlands B.V. | Filter for material supply apparatus of an extreme ultraviolet light source |
| NL2009358A (en) * | 2011-09-23 | 2013-03-26 | Asml Netherlands Bv | Radiation source. |
| JP2013140771A (ja) * | 2011-12-09 | 2013-07-18 | Gigaphoton Inc | ターゲット供給装置 |
| JP6087105B2 (ja) * | 2012-10-23 | 2017-03-01 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| JP6168797B2 (ja) * | 2013-03-08 | 2017-07-26 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| US9699876B2 (en) * | 2013-03-14 | 2017-07-04 | Asml Netherlands, B.V. | Method of and apparatus for supply and recovery of target material |
| JP6426602B2 (ja) | 2013-05-21 | 2018-11-21 | ギガフォトン株式会社 | 極端紫外光生成装置及び極端紫外光の生成方法 |
| JP6416766B2 (ja) | 2013-08-01 | 2018-10-31 | ギガフォトン株式会社 | ターゲット供給装置 |
| WO2015040674A1 (ja) | 2013-09-17 | 2015-03-26 | ギガフォトン株式会社 | ターゲット供給装置およびeuv光生成装置 |
| WO2015087454A1 (ja) * | 2013-12-13 | 2015-06-18 | ギガフォトン株式会社 | ターゲット供給装置 |
| US9611163B2 (en) * | 2014-03-05 | 2017-04-04 | Owens-Brockway Glass Container Inc. | Process and apparatus for refining molten glass |
| WO2016071972A1 (ja) * | 2014-11-05 | 2016-05-12 | ギガフォトン株式会社 | フィルタ構造体、ターゲット生成装置およびフィルタ構造体の製造方法 |
| CN104493127B (zh) * | 2014-12-18 | 2017-12-19 | 绍兴柯桥恒松针纺有限公司 | 一种压铸铝合金液的过滤装置 |
| JP6513106B2 (ja) | 2015-01-28 | 2019-05-15 | ギガフォトン株式会社 | ターゲット供給装置 |
| JP6824985B2 (ja) * | 2015-12-17 | 2021-02-03 | エーエスエムエル ネザーランズ ビー.ブイ. | Euvソースのためのノズル及び液滴発生器 |
| CN105771354B (zh) * | 2016-03-04 | 2018-05-01 | 绍兴南燕染整有限公司 | 一种印染水液颗粒过滤装置 |
| JP6237825B2 (ja) * | 2016-05-27 | 2017-11-29 | ウシオ電機株式会社 | 高温プラズマ原料供給装置および極端紫外光光源装置 |
| CN106334365B (zh) * | 2016-10-08 | 2018-03-09 | 黄正集 | 一种水能制氢用水体初步过滤除杂装置 |
| US10499485B2 (en) | 2017-06-20 | 2019-12-03 | Asml Netherlands B.V. | Supply system for an extreme ultraviolet light source |
| JP7078706B2 (ja) | 2017-07-06 | 2022-05-31 | インテグリス・インコーポレーテッド | 炭化ケイ素フィルター膜および使用方法 |
| US10437162B2 (en) * | 2017-09-21 | 2019-10-08 | Asml Netherlands B.V. | Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system |
| US10331035B2 (en) * | 2017-11-08 | 2019-06-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Light source for lithography exposure process |
| US20210028002A1 (en) * | 2018-02-09 | 2021-01-28 | Hamamatsu Photonics K.K. | Sample supporting body, method for ionizing sample, and mass spectrometry method |
| US11404256B2 (en) | 2018-02-09 | 2022-08-02 | Hamamatsu Photonics K.K. | Sample support, ionization method, and mass spectrometry method |
| NL2024077A (en) | 2018-10-25 | 2020-05-13 | Asml Netherlands Bv | Target material supply apparatus and method |
| NL2024324A (en) * | 2018-12-31 | 2020-07-10 | Asml Netherlands Bv | Apparatus for controlling introduction of euv target material into an euv chamber |
| JP7504114B2 (ja) * | 2019-03-15 | 2024-06-21 | エーエスエムエル ネザーランズ ビー.ブイ. | Euv光源におけるターゲット材料制御 |
| JP7660572B2 (ja) * | 2019-12-17 | 2025-04-11 | エーエスエムエル ネザーランズ ビー.ブイ. | 極端紫外光源用のターゲット材料タンク |
| JP7491737B2 (ja) * | 2020-05-21 | 2024-05-28 | ギガフォトン株式会社 | ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法 |
| JP2022006351A (ja) * | 2020-06-24 | 2022-01-13 | ギガフォトン株式会社 | ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法 |
| CN112138452A (zh) * | 2020-10-14 | 2020-12-29 | 杭州师范大学钱江学院 | 一种中药渣药液分离器及其分离方法 |
| ES2938351B2 (es) * | 2021-10-06 | 2024-03-12 | Univ Navarra Publica | Filtro de material cerámico electroconductor |
| CN116264753B (zh) * | 2021-12-15 | 2025-09-12 | 北京锐德康科技有限公司 | 用于重频激光打靶的靶片及可装卸靶盘 |
| US12214303B2 (en) * | 2022-11-18 | 2025-02-04 | Collins Engine Nozzles, Inc. | Airfoil last chance screen utilizing EDM and AFM |
| WO2024170295A1 (en) | 2023-02-17 | 2024-08-22 | Asml Netherlands B.V. | Target material storage and delivery system for an euv radiation source |
| CN120677368A (zh) * | 2023-08-08 | 2025-09-19 | 株式会社日立高新技术 | 过滤装置、过滤系统及过滤方法 |
| WO2025224250A1 (de) * | 2024-04-25 | 2025-10-30 | Carl Zeiss Smt Gmbh | Strahlführungseinsatz für eine quellkammer einer euv-strahlungsquelle |
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| US3955953A (en) | 1974-07-31 | 1976-05-11 | Teletype Corporation | Methods of making self filtering nozzles |
| US5045111A (en) * | 1986-06-27 | 1991-09-03 | The Carborundum Company | Filtration of molten ferrous metal |
| DE3742770A1 (de) * | 1987-12-17 | 1989-06-29 | Akzo Gmbh | Mikro-/ultrafiltrationsmembranen mit definierter porengroesse durch bestrahlung mit gepulsten lasern und verfahren zur herstellung |
| US5503721A (en) * | 1991-07-18 | 1996-04-02 | Hri Research, Inc. | Method for photoactivation |
| DE4012093C1 (OSRAM) * | 1990-04-14 | 1991-07-04 | Didier-Werke Ag, 6200 Wiesbaden, De | |
| US5590383A (en) * | 1993-03-12 | 1996-12-31 | Micropyretics Heaters International, Inc. | Porous membranes and methods for making |
| NL9401260A (nl) * | 1993-11-12 | 1995-06-01 | Cornelis Johannes Maria Van Ri | Membraan voor microfiltratie, ultrafiltratie, gasscheiding en katalyse, werkwijze ter vervaardiging van een dergelijk membraan, mal ter vervaardiging van een dergelijk membraan, alsmede diverse scheidingssystemen omvattende een dergelijk membraan. |
| JP3769739B2 (ja) * | 1994-11-17 | 2006-04-26 | 住友電気工業株式会社 | 多孔質セラミックス膜及びその製造方法 |
| US5673902A (en) * | 1996-02-01 | 1997-10-07 | Selee Corporation | Dual stage ceramic foam filtration system and method |
| US5973902A (en) * | 1998-08-13 | 1999-10-26 | King; Kenneth A. | Modified surge protector |
| JP3291488B2 (ja) | 1999-05-27 | 2002-06-10 | 三洋電機株式会社 | 流体の被除去物除去方法 |
| JP3291487B2 (ja) * | 1999-05-27 | 2002-06-10 | 三洋電機株式会社 | 流体の被除去物除去方法 |
| US6491872B1 (en) * | 1999-09-17 | 2002-12-10 | The United States Of America As Represented By The Secretary Of The Army | Method and system for detecting and recording submicron sized particles |
| US6331351B1 (en) | 1999-09-22 | 2001-12-18 | Gore Enterprise Holdings, Inc. | Chemically active filter material |
| WO2001041905A1 (en) | 1999-12-08 | 2001-06-14 | Baxter International Inc. | Microporous filter membrane, method of making microporous filter membrane and separator employing microporous filter membranes |
| US20060255298A1 (en) * | 2005-02-25 | 2006-11-16 | Cymer, Inc. | Laser produced plasma EUV light source with pre-pulse |
| US7378673B2 (en) * | 2005-02-25 | 2008-05-27 | Cymer, Inc. | Source material dispenser for EUV light source |
| US7465946B2 (en) * | 2004-03-10 | 2008-12-16 | Cymer, Inc. | Alternative fuels for EUV light source |
| US7405416B2 (en) | 2005-02-25 | 2008-07-29 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery |
| US7491954B2 (en) | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
| DE10153284A1 (de) | 2001-10-29 | 2003-05-15 | Emitec Emissionstechnologie | Filterverbund und Verfahren zu seiner Herstellung |
| US20030150294A1 (en) * | 2002-01-25 | 2003-08-14 | Njall Stefansson | Filters for filtering molten metals and alloys field |
| US20030150791A1 (en) * | 2002-02-13 | 2003-08-14 | Cho Steven T. | Micro-fluidic anti-microbial filter |
| US20050133613A1 (en) * | 2002-03-10 | 2005-06-23 | Yaron Mayer | System and method for more efficient automatic irrigation based on a large number of cheap humidity sensors and automatic faucets |
| US6835944B2 (en) | 2002-10-11 | 2004-12-28 | University Of Central Florida Research Foundation | Low vapor pressure, low debris solid target for EUV production |
| JP4637476B2 (ja) | 2002-12-19 | 2011-02-23 | 東京応化工業株式会社 | ホトレジスト組成物の製造方法 |
| JP2004316428A (ja) * | 2003-02-26 | 2004-11-11 | Ngk Insulators Ltd | 排気ガス浄化フィルタのスート堆積量予測方法およびプログラム |
| DE10353894B4 (de) | 2003-07-11 | 2007-02-15 | Nft Nanofiltertechnik Gmbh | Filterelement und Verfahren zu dessen Herstellung |
| US7906023B2 (en) * | 2005-01-25 | 2011-03-15 | Pss Acquisitionco Llc | Wastewater treatment method and apparatus |
| US20050172896A1 (en) | 2004-02-10 | 2005-08-11 | Tihiro Ohkawa | Injector for plasma mass filter |
| US20050199560A1 (en) * | 2004-03-11 | 2005-09-15 | Blasch Precision Ceramics, Inc. | Interchangeable ceramic filter assembly and molten metal processing apparatus including same |
| JP4878108B2 (ja) * | 2004-07-14 | 2012-02-15 | キヤノン株式会社 | 露光装置、デバイス製造方法、および測定装置 |
| US7303603B2 (en) | 2004-11-12 | 2007-12-04 | General Motors Corporation | Diesel particulate filter system with meta-surface cavity |
| US7449703B2 (en) | 2005-02-25 | 2008-11-11 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery target material handling |
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| US8308851B2 (en) * | 2007-03-27 | 2012-11-13 | David Roberts | Removal of contaminants from water and gas by filtration |
| KR100917271B1 (ko) * | 2007-10-30 | 2009-09-21 | 대창공업 주식회사 | 금속 용탕 중의 불순물 제거를 위한 다층구조를 가지는필터 |
| AU2007362807A1 (en) * | 2007-12-20 | 2009-07-02 | The Regents Of The University Of California | Sintered porous structure and method of making same |
| AT506640B1 (de) * | 2008-03-17 | 2010-07-15 | Siemens Vai Metals Tech Gmbh | Verfahren und vorrichtung zur herstellung von flüssigem roheisen oder flüssigen stahlvorprodukten |
| US7872245B2 (en) | 2008-03-17 | 2011-01-18 | Cymer, Inc. | Systems and methods for target material delivery in a laser produced plasma EUV light source |
| WO2009148959A2 (en) * | 2008-05-29 | 2009-12-10 | Lawrence Livermore National Security, Llc | Membranes with functionalized carbon nanotube pores for selective transport |
| JP5455661B2 (ja) * | 2009-01-29 | 2014-03-26 | ギガフォトン株式会社 | 極端紫外光源装置 |
| US20110097215A1 (en) * | 2009-10-23 | 2011-04-28 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Flexible Solid-State Pump Constructed of Surface-Modified Glass Fiber Filters and Metal Mesh Electrodes |
| CN102740947A (zh) * | 2009-12-21 | 2012-10-17 | 美商绩优图科技股份有限公司 | 经纤维强化的多孔性基材 |
| MX350977B (es) * | 2010-05-05 | 2017-09-27 | Basf Corp Star | Filtro catalítico de hollín y sistemas y métodos de tratamiento de emisiones. |
| US9029813B2 (en) | 2011-05-20 | 2015-05-12 | Asml Netherlands B.V. | Filter for material supply apparatus of an extreme ultraviolet light source |
-
2011
- 2011-05-20 US US13/112,784 patent/US9029813B2/en active Active
-
2012
- 2012-03-20 EP EP12790335.9A patent/EP2709743A4/en not_active Withdrawn
- 2012-03-20 KR KR1020137032828A patent/KR101899418B1/ko active Active
- 2012-03-20 CN CN201280024335.6A patent/CN103561839B/zh active Active
- 2012-03-20 WO PCT/US2012/029838 patent/WO2012161860A1/en not_active Ceased
- 2012-03-20 JP JP2014512834A patent/JP6117188B2/ja active Active
- 2012-03-26 TW TW101110362A patent/TWI587903B/zh active
-
2015
- 2015-03-31 US US14/674,724 patent/US9669334B2/en active Active
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