JP2014508414A5 - - Google Patents

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Publication number
JP2014508414A5
JP2014508414A5 JP2013555773A JP2013555773A JP2014508414A5 JP 2014508414 A5 JP2014508414 A5 JP 2014508414A5 JP 2013555773 A JP2013555773 A JP 2013555773A JP 2013555773 A JP2013555773 A JP 2013555773A JP 2014508414 A5 JP2014508414 A5 JP 2014508414A5
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JP
Japan
Prior art keywords
spectral purity
radiation
purity filter
recesses
radiation beam
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013555773A
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English (en)
Japanese (ja)
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JP2014508414A (ja
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Priority claimed from PCT/EP2011/073537 external-priority patent/WO2012119672A1/en
Publication of JP2014508414A publication Critical patent/JP2014508414A/ja
Publication of JP2014508414A5 publication Critical patent/JP2014508414A5/ja
Pending legal-status Critical Current

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JP2013555773A 2011-03-04 2011-12-21 リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法 Pending JP2014508414A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161449381P 2011-03-04 2011-03-04
US61/449,381 2011-03-04
PCT/EP2011/073537 WO2012119672A1 (en) 2011-03-04 2011-12-21 Lithograpic apparatus, spectral purity filter and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017078096A Division JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Publications (2)

Publication Number Publication Date
JP2014508414A JP2014508414A (ja) 2014-04-03
JP2014508414A5 true JP2014508414A5 (https=) 2015-02-19

Family

ID=45420654

Family Applications (2)

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JP2013555773A Pending JP2014508414A (ja) 2011-03-04 2011-12-21 リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法
JP2017078096A Active JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2017078096A Active JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Country Status (5)

Country Link
US (2) US9594306B2 (https=)
EP (1) EP2681625A1 (https=)
JP (2) JP2014508414A (https=)
TW (1) TWI534557B (https=)
WO (1) WO2012119672A1 (https=)

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JP2014508414A (ja) 2011-03-04 2014-04-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法
KR102176709B1 (ko) * 2012-01-19 2020-11-10 수프리야 자이스왈 리소그래피 및 다른 적용분야에서 극자외 방사선을 이용하는 재료, 성분 및 사용을 위한 방법
KR102390697B1 (ko) * 2013-01-28 2022-04-26 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
KR102604554B1 (ko) * 2014-07-04 2023-11-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 내에서 사용하는 멤브레인 및 이러한멤브레인을 포함한 리소그래피 장치
EP3257054B1 (en) * 2015-02-10 2019-10-16 Carl Zeiss SMT GmbH Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror
NL2017272A (en) * 2015-08-25 2017-03-01 Asml Netherlands Bv Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter
DE102016213247A1 (de) * 2016-07-20 2017-05-18 Carl Zeiss Smt Gmbh Optisches Element, insbesondere Kollektorspiegel einer EUV-Lichtquelle einer mikrolithographischen Projektionsbelichtungsanlage
US10691024B2 (en) * 2018-01-26 2020-06-23 Kla-Tencor Corporation High-power short-pass total internal reflection filter
DE102018220629A1 (de) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel
NL2025558A (en) * 2019-05-21 2020-11-30 Asml Netherlands Bv Mirror for use in a lithographic apparatus
DE102019212017A1 (de) * 2019-08-09 2021-02-11 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102019213063A1 (de) * 2019-08-30 2021-03-04 Carl Zeiss Smt Gmbh Optische Beugungskomponente
JP7403271B2 (ja) * 2019-10-10 2023-12-22 ギガフォトン株式会社 極端紫外光集光ミラー、極端紫外光生成装置、及び電子デバイスの製造方法
WO2021183756A1 (en) * 2020-03-11 2021-09-16 LabForInvention Energy-efficient window coatings
EP4208755A1 (en) * 2020-09-03 2023-07-12 ASML Netherlands B.V. Pellicle membrane for a lithographic apparatus
DE102020212367A1 (de) * 2020-09-30 2022-03-31 Carl Zeiss Smt Gmbh Optische Komponente
DE102021214237A1 (de) 2021-12-13 2022-12-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine EUV-Projektionsbelichtungsanlage
DE102022202059A1 (de) * 2022-03-01 2023-09-07 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks
US20240369939A1 (en) * 2023-05-03 2024-11-07 Taiwan Semiconductor Manufacturing Company Ltd. Extreme ultraviolet (euv) radiation source apparatus, euv lithography system, and method for generating extreme ultraviolet radiation
US20260050112A1 (en) * 2024-08-14 2026-02-19 Kla Corporation Blazed grating based reflective spectral purity filter for euv imaging systems

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US6577442B2 (en) * 2001-09-27 2003-06-10 Intel Corporation Reflective spectral filtering of high power extreme ultra-violet radiation
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US7336416B2 (en) 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
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JP5534647B2 (ja) 2008-02-28 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
NL1036891A1 (nl) 2008-05-02 2009-11-03 Asml Netherlands Bv Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor.
JP5061063B2 (ja) 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
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US8390788B2 (en) 2008-07-11 2013-03-05 Asml Netherlands B.V. Spectral purity filters for use in a lithographic apparatus
NL2003152A1 (nl) 2008-08-14 2010-02-16 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
KR20110063789A (ko) 2008-08-29 2011-06-14 에이에스엠엘 네델란즈 비.브이. 스펙트럼 퓨리티 필터, 이러한 스펙트럼 퓨리티 필터를 포함하는 리소그래피 장치 및 디바이스 제조 방법
JP2010087312A (ja) 2008-09-30 2010-04-15 Canon Inc 露光装置およびデバイス製造方法
KR101395733B1 (ko) * 2009-06-17 2014-05-15 에이에스엠엘 네델란즈 비.브이. 오버레이 측정 방법, 리소그래피 장치, 검사 장치, 처리 장치, 및 리소그래피 처리 셀
NL2004787A (en) 2009-06-30 2011-01-04 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter.
NL2005111A (en) * 2009-08-21 2011-02-22 Asml Netherlands Bv Spectral purity filters for use in a lithographic apparatus.
JP2013503357A (ja) 2009-08-27 2013-01-31 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタ、リソグラフィ装置およびスペクトル純度フィルタを製造する方法
US20120170015A1 (en) 2009-09-16 2012-07-05 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
JP5752786B2 (ja) * 2010-05-27 2015-07-22 エーエスエムエル ネザーランズ ビー．ブイ． 多層ミラー及びそのロバスト性を改善する方法
JP2014508414A (ja) 2011-03-04 2014-04-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法

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