JP2014508414A5 - - Google Patents

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Publication number
JP2014508414A5
JP2014508414A5 JP2013555773A JP2013555773A JP2014508414A5 JP 2014508414 A5 JP2014508414 A5 JP 2014508414A5 JP 2013555773 A JP2013555773 A JP 2013555773A JP 2013555773 A JP2013555773 A JP 2013555773A JP 2014508414 A5 JP2014508414 A5 JP 2014508414A5
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JP
Japan
Prior art keywords
spectral purity
radiation
purity filter
recesses
radiation beam
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013555773A
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English (en)
Japanese (ja)
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JP2014508414A (ja
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Priority claimed from PCT/EP2011/073537 external-priority patent/WO2012119672A1/en
Publication of JP2014508414A publication Critical patent/JP2014508414A/ja
Publication of JP2014508414A5 publication Critical patent/JP2014508414A5/ja
Pending legal-status Critical Current

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JP2013555773A 2011-03-04 2011-12-21 リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法 Pending JP2014508414A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161449381P 2011-03-04 2011-03-04
US61/449,381 2011-03-04
PCT/EP2011/073537 WO2012119672A1 (en) 2011-03-04 2011-12-21 Lithograpic apparatus, spectral purity filter and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017078096A Division JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Publications (2)

Publication Number Publication Date
JP2014508414A JP2014508414A (ja) 2014-04-03
JP2014508414A5 true JP2014508414A5 (cg-RX-API-DMAC7.html) 2015-02-19

Family

ID=45420654

Family Applications (2)

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JP2013555773A Pending JP2014508414A (ja) 2011-03-04 2011-12-21 リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法
JP2017078096A Active JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2017078096A Active JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Country Status (5)

Country Link
US (2) US9594306B2 (cg-RX-API-DMAC7.html)
EP (1) EP2681625A1 (cg-RX-API-DMAC7.html)
JP (2) JP2014508414A (cg-RX-API-DMAC7.html)
TW (1) TWI534557B (cg-RX-API-DMAC7.html)
WO (1) WO2012119672A1 (cg-RX-API-DMAC7.html)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012119672A1 (en) 2011-03-04 2012-09-13 Asml Netherlands B.V. Lithograpic apparatus, spectral purity filter and device manufacturing method
KR102176709B1 (ko) * 2012-01-19 2020-11-10 수프리야 자이스왈 리소그래피 및 다른 적용분야에서 극자외 방사선을 이용하는 재료, 성분 및 사용을 위한 방법
JP6438412B2 (ja) 2013-01-28 2018-12-12 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のための投影システム、ミラーおよび放射源
EP3164764B1 (en) * 2014-07-04 2021-02-24 ASML Netherlands B.V. Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
EP3257054B1 (en) * 2015-02-10 2019-10-16 Carl Zeiss SMT GmbH Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror
JP2018527612A (ja) * 2015-08-25 2018-09-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のための抑制フィルタ、放射コレクタ及び放射源、並びに抑制フィルタの少なくとも２つの反射面レベル間の分離距離を決定する方法
DE102016213247A1 (de) * 2016-07-20 2017-05-18 Carl Zeiss Smt Gmbh Optisches Element, insbesondere Kollektorspiegel einer EUV-Lichtquelle einer mikrolithographischen Projektionsbelichtungsanlage
US10691024B2 (en) * 2018-01-26 2020-06-23 Kla-Tencor Corporation High-power short-pass total internal reflection filter
DE102018220629A1 (de) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel
WO2020234043A1 (en) * 2019-05-21 2020-11-26 Asml Netherlands B.V. Mirror for use in a lithographic apparatus
DE102019212017A1 (de) * 2019-08-09 2021-02-11 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102019213063A1 (de) * 2019-08-30 2021-03-04 Carl Zeiss Smt Gmbh Optische Beugungskomponente
JP7403271B2 (ja) * 2019-10-10 2023-12-22 ギガフォトン株式会社 極端紫外光集光ミラー、極端紫外光生成装置、及び電子デバイスの製造方法
EP4118465A4 (en) * 2020-03-11 2024-03-13 Labforinvention ENERGY EFFICIENT WINDOW COVERINGS
DE102020212367A1 (de) * 2020-09-30 2022-03-31 Carl Zeiss Smt Gmbh Optische Komponente
DE102021214237A1 (de) 2021-12-13 2022-12-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine EUV-Projektionsbelichtungsanlage
DE102022202059A1 (de) * 2022-03-01 2023-09-07 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks
US20240369939A1 (en) * 2023-05-03 2024-11-07 Taiwan Semiconductor Manufacturing Company Ltd. Extreme ultraviolet (euv) radiation source apparatus, euv lithography system, and method for generating extreme ultraviolet radiation

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US6469827B1 (en) * 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
TWI240151B (en) 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6577442B2 (en) * 2001-09-27 2003-06-10 Intel Corporation Reflective spectral filtering of high power extreme ultra-violet radiation
SG108933A1 (en) * 2002-08-23 2005-02-28 Asml Netherlands Bv Lithographic projection apparatus and particle barrier for use in said apparatus
US7230703B2 (en) 2003-07-17 2007-06-12 Tokyo Electron Limited Apparatus and method for measuring overlay by diffraction gratings
EP1515188A1 (en) * 2003-09-10 2005-03-16 ASML Netherlands B.V. Method for protecting an optical element, and optical element
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US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
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NL2003152A1 (nl) 2008-08-14 2010-02-16 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
NL2003303A (en) 2008-08-29 2010-03-11 Asml Netherlands Bv Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby.
JP2010087312A (ja) 2008-09-30 2010-04-15 Canon Inc 露光装置およびデバイス製造方法
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NL2004787A (en) 2009-06-30 2011-01-04 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter.
NL2005111A (en) * 2009-08-21 2011-02-22 Asml Netherlands Bv Spectral purity filters for use in a lithographic apparatus.
NL2005098A (en) 2009-08-27 2011-03-01 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter.
US20120170015A1 (en) 2009-09-16 2012-07-05 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
JP5752786B2 (ja) * 2010-05-27 2015-07-22 エーエスエムエル ネザーランズ ビー．ブイ． 多層ミラー及びそのロバスト性を改善する方法
WO2012119672A1 (en) 2011-03-04 2012-09-13 Asml Netherlands B.V. Lithograpic apparatus, spectral purity filter and device manufacturing method

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