JP2010171031A5 - - Google Patents

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Publication number
JP2010171031A5
JP2010171031A5 JP2009009423A JP2009009423A JP2010171031A5 JP 2010171031 A5 JP2010171031 A5 JP 2010171031A5 JP 2009009423 A JP2009009423 A JP 2009009423A JP 2009009423 A JP2009009423 A JP 2009009423A JP 2010171031 A5 JP2010171031 A5 JP 2010171031A5
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JP
Japan
Prior art keywords
optical element
reflective optical
light
wavelength
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009009423A
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English (en)
Japanese (ja)
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JP5305938B2 (ja
JP2010171031A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009009423A priority Critical patent/JP5305938B2/ja
Priority claimed from JP2009009423A external-priority patent/JP5305938B2/ja
Priority to US12/690,503 priority patent/US20100182583A1/en
Publication of JP2010171031A publication Critical patent/JP2010171031A/ja
Publication of JP2010171031A5 publication Critical patent/JP2010171031A5/ja
Application granted granted Critical
Publication of JP5305938B2 publication Critical patent/JP5305938B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009009423A 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法 Expired - Fee Related JP5305938B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009009423A JP5305938B2 (ja) 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法
US12/690,503 US20100182583A1 (en) 2009-01-20 2010-01-20 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009009423A JP5305938B2 (ja) 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2010171031A JP2010171031A (ja) 2010-08-05
JP2010171031A5 true JP2010171031A5 (cg-RX-API-DMAC7.html) 2012-03-01
JP5305938B2 JP5305938B2 (ja) 2013-10-02

Family

ID=42336715

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009009423A Expired - Fee Related JP5305938B2 (ja) 2009-01-20 2009-01-20 露光装置、光源装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US20100182583A1 (cg-RX-API-DMAC7.html)
JP (1) JP5305938B2 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102436152B (zh) * 2011-12-22 2013-06-19 北京理工大学 一种深紫外光刻照明系统
JP5729517B1 (ja) 2014-03-28 2015-06-03 Toto株式会社 反応焼結炭化珪素部材

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3309890B2 (ja) * 1995-04-06 2002-07-29 日本電信電話株式会社 多層膜ｘ線反射鏡
JP2003315532A (ja) * 2002-04-22 2003-11-06 Sony Corp 極短紫外光の反射体およびその製造方法、位相シフトマスク、並びに露光装置
US7959310B2 (en) * 2006-09-13 2011-06-14 Carl Zeiss Smt Gmbh Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
DE102008002403A1 (de) * 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung

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