JP2014216520A - Cleaning device - Google Patents

Cleaning device Download PDF

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JP2014216520A
JP2014216520A JP2013093519A JP2013093519A JP2014216520A JP 2014216520 A JP2014216520 A JP 2014216520A JP 2013093519 A JP2013093519 A JP 2013093519A JP 2013093519 A JP2013093519 A JP 2013093519A JP 2014216520 A JP2014216520 A JP 2014216520A
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holding
cleaning liquid
cleaning
plate
workpiece
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JP6093638B2 (en
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武知 高谷
Taketomo Takaya
武知 高谷
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Disco Corp
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Disco Abrasive Systems Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

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  • Mechanical Treatment Of Semiconductor (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a device which is capable of efficiently and neatly cleaning washing surface of plate-like work.SOLUTION: Holding means 10 installed on a cleaning device 1 is equipped at least with a holding table 11 which sucks and holds a work set 5, holding means 14 holding a ring frame 4, and a lifting and lowering device 15 which lifts and lowers the holding means 14 to form an adhesive sheet 3 in a shape of mortar by the lifting and lowering device 15 which lifts the holding means 14 holding the ring frame 4 inside which a liquid layer 7 is formed by providing cleaning liquid 6 through a cleaning liquid supply nozzle 30 to submerge a plate-like work 2. Accordingly, machining chips adhering to an upper surface of the plate-like work 2 is capable of being floated into the liquid layer 7 of the cleaning liquid 6 and it is not necessary to clean by repeatedly spraying cleaning liquid onto the upper surface of the plate-like work 2. Thus it is capable of cleaning efficiently and neatly without producing washing spots on the upper surface of the plate-like work 2.

Description

本発明は、被加工物に洗浄を施す洗浄装置に関する。   The present invention relates to a cleaning apparatus for cleaning a workpiece.

板状ワークを切削加工もしくは研削加工する加工装置においては、板状ワークを加工する際に切削屑もしくは研削屑(加工屑)が発生する。板状ワークが半導体ウエーハである場合、加工屑が板状ワークに付着するとデバイスに悪影響を及ぼす可能性がある。そのため、板状ワークを切削加工もしくは研削加工した後は、洗浄装置に加工後の板状ワークを搬送し洗浄を行っている。   In a processing apparatus that cuts or grinds a plate-like workpiece, cutting waste or grinding waste (machining waste) is generated when the plate-like workpiece is processed. When the plate-like workpiece is a semiconductor wafer, there is a possibility that the device will be adversely affected if the processing waste adheres to the plate-like workpiece. For this reason, after cutting or grinding the plate-shaped workpiece, the processed plate-shaped workpiece is conveyed to a cleaning device for cleaning.

洗浄装置としては、例えば、板状ワークを保持し回転可能なスピンナーテーブルと、板状ワークに対して洗浄液を噴きつけるノズルと、を少なくとも備えている洗浄装置がある。このような洗浄装置において加工屑が付着した板状ワークを洗浄する際には、加工した直後の板状ワークをスピンナーテーブルに保持させるとともにスピンナーテーブルを回転させ、板状ワークに向けてノズルから洗浄液を噴きつけることにより、洗浄液とともに加工屑を吹き飛ばす方法を使用している(例えば、下記の特許文献1乃至特許文献3を参照)。   As the cleaning device, for example, there is a cleaning device including at least a spinner table that holds and rotates a plate-like workpiece and a nozzle that sprays a cleaning liquid onto the plate-like workpiece. When cleaning a plate-like workpiece to which machining debris adheres in such a cleaning device, the plate-like workpiece immediately after processing is held on the spinner table and the spinner table is rotated so that the cleaning liquid is directed from the nozzle toward the plate-like workpiece. Is used to blow off the processing waste together with the cleaning liquid (see, for example, Patent Document 1 to Patent Document 3 below).

特開平07−211685号公報Japanese Patent Application Laid-Open No. 07-211685 特開2006−128359号公報JP 2006-128359 A 特開2010−123858号公報JP 2010-123858 A

しかし、上記のようにノズルから洗浄液を板状ワークに噴きつけて洗浄する場合、洗浄液が強く噴きつけられる部分と弱く噴きつけられる部分とによって洗浄斑が発生することがある。したがって、板状ワークの被洗浄面の全域を綺麗に洗浄するためには、何度も板状ワークに洗浄液を噴きつける必要があるという問題がある。   However, when cleaning is performed by spraying the cleaning liquid from the nozzle onto the plate-like workpiece as described above, cleaning spots may occur depending on the portion where the cleaning liquid is strongly sprayed and the portion where the cleaning liquid is sprayed weakly. Therefore, in order to clean the entire surface of the plate-like workpiece to be cleaned, there is a problem that it is necessary to spray the cleaning liquid on the plate-like workpiece many times.

本発明は、上記の事情にかんがみてなされたものであり、板状ワークの被洗浄面を効率よく綺麗に洗浄できるようにすることに発明の解決すべき課題を有している。   The present invention has been made in view of the above circumstances, and has a problem to be solved by enabling the surface to be cleaned of a plate-shaped workpiece to be cleaned efficiently and cleanly.

本発明は、中央に開口部を備えるリンク状のリングフレームに貼着され該開口部から露出した粘着シートに粘着面に板状ワークを貼着することにより形成されたワークセットと、該ワークセットを保持する保持手段と、該保持手段が保持する該ワークセットに洗浄液を供給する洗浄液供給手段と、該保持手段を回転させる回転駆動手段と、を少なくとも備える洗浄装置であって、該保持手段は、該リングフレームを支持する支持手段と、該支持手段を昇降させる昇降手段と、保持面で該ワークセットの中央部分を吸引保持する保持テーブルと、を少なくとも備え、該ワークセットの該粘着シートの非粘着面を該保持テーブルで吸引保持するとともに該昇降手段によって該支持手段を上昇させることにより該リングフレームに貼着した該粘着シートをすり鉢形状に形成し、該洗浄液供給手段によって該すり鉢形状の内側に洗浄液を供給することにより該すり鉢形状の内側に溜められた洗浄液中に板状ワークを水没させて洗浄する。   The present invention relates to a work set formed by sticking a plate-like work on an adhesive surface to an adhesive sheet that is attached to a link-shaped ring frame having an opening at the center and exposed from the opening, and the work set A cleaning device comprising at least a holding means for holding the cleaning liquid, a cleaning liquid supply means for supplying a cleaning liquid to the work set held by the holding means, and a rotation driving means for rotating the holding means. A support means for supporting the ring frame; a lifting means for moving the support means up and down; and a holding table for sucking and holding a central portion of the work set with a holding surface. The adhesive sheet adhered to the ring frame by sucking and holding the non-adhesive surface with the holding table and raising the supporting means by the elevating means. The door is formed in a mortar shape, washed by submerging the plate workpiece into the cleaning liquid accumulated in the inside of the bowl shape by supplying a cleaning liquid to the inside of the bowl shape by the cleaning liquid supply means.

さらに、本発明は、超音波振動を発生させる超音波発生手段を含んで構成され、該超音波発生手段は、超音波振動を発振させる超音波発振部と、該超音波発振部を粘着シートで形成されるすり鉢形状の内側に溜められた洗浄液に対し着水及び離水させる移動部とを備え、該超音波発生手段で該すり鉢形状の内側に溜められた該洗浄液に超音波振動を伝播させ板状ワークを洗浄することを特徴としている。   Furthermore, the present invention is configured to include ultrasonic generation means for generating ultrasonic vibration, and the ultrasonic generation means includes an ultrasonic oscillation section for oscillating ultrasonic vibration, and the ultrasonic oscillation section using an adhesive sheet. A moving part for landing and releasing water on the cleaning liquid stored inside the mortar shape to be formed, and transmitting ultrasonic vibrations to the cleaning liquid stored inside the mortar shape by the ultrasonic wave generation means It is characterized by washing the workpiece.

本発明にかかる洗浄装置の保持手段は、ワークセットを吸引保持する保持テーブルと、リングフレームを支持する支持手段と、支持手段を昇降させる昇降手段と、保持手段が保持するワークセットに洗浄液を供給する洗浄液供給手段と、を少なくとも備えているため、昇降手段によってリングフレームを支持する支持手段が上昇することによりすり鉢形状に粘着シートを形成し、その内側に洗浄液供給手段から供給される洗浄液を溜めて板状ワークを水没させることができる。
したがって、板状ワークの上面に付着した加工屑を洗浄液中に浮き上がらせることができ、板状ワークの上面に何度も洗浄液を噴きつけて洗浄する必要がなくなる。これにより、板状ワークの上面に洗浄斑を発生させることなく効率よく綺麗に洗浄することができる。
The holding means of the cleaning apparatus according to the present invention includes a holding table for sucking and holding the work set, a support means for supporting the ring frame, an elevating means for raising and lowering the support means, and supplying a cleaning liquid to the work set held by the holding means. And a cleaning liquid supply means for forming the adhesive sheet in the shape of a mortar by raising the support means for supporting the ring frame by the lifting means, and storing the cleaning liquid supplied from the cleaning liquid supply means inside The plate-like workpiece can be submerged.
Therefore, it is possible to make the processing waste adhering to the upper surface of the plate-shaped workpiece float up in the cleaning liquid, and it is not necessary to spray the cleaning liquid on the upper surface of the plate-shaped workpiece for cleaning. Thereby, it can wash | clean efficiently and cleanly, without generating the cleaning spot on the upper surface of a plate-shaped workpiece.

さらに、洗浄装置は、超音波振動を発生させる超音波発生手段を含んで構成されているため、移動部が下降することにより、すり鉢形状の粘着シートの内側に溜められた洗浄液に超音波発振部を着水させ、超音波振動を超音波発振部から洗浄液に伝播させる。その結果、超音波振動の作用により板状ワークの上面に付着した加工屑が浮き上がりやすくなり、より効果的に板状ワークの洗浄を行うことができる。   Further, since the cleaning device is configured to include ultrasonic generation means for generating ultrasonic vibration, the ultrasonic wave generating unit is added to the cleaning liquid stored inside the mortar-shaped adhesive sheet when the moving unit descends. The ultrasonic vibration is propagated from the ultrasonic oscillator to the cleaning liquid. As a result, it becomes easy for the processing waste adhering to the upper surface of the plate-like workpiece to float due to the action of ultrasonic vibration, and the plate-like workpiece can be cleaned more effectively.

洗浄装置の構成を示す斜視図である。It is a perspective view which shows the structure of a washing | cleaning apparatus. 洗浄装置の構成を示す断面図である。It is sectional drawing which shows the structure of a washing | cleaning apparatus. ワークセット保持工程を示す断面図である。It is sectional drawing which shows a work set holding process. 洗浄液供給工程を示す断面図である。It is sectional drawing which shows a washing | cleaning liquid supply process. 洗浄工程を示す断面図である。It is sectional drawing which shows a washing | cleaning process. 純水洗浄工程を示す断面図である。It is sectional drawing which shows a pure water washing | cleaning process. 乾燥工程を示す断面図である。It is sectional drawing which shows a drying process. 超音波洗浄工程を示す断面図である。It is sectional drawing which shows an ultrasonic cleaning process.

図1に示す洗浄装置1は、被加工物を保持する保持手段10と、保持手段10を回転させる回転駆動手段20と、保持手段10が保持する被加工物に洗浄液を供給する洗浄液供給ノズル30と、を少なくとも備えている。   A cleaning apparatus 1 shown in FIG. 1 includes a holding unit 10 that holds a workpiece, a rotation driving unit 20 that rotates the holding unit 10, and a cleaning liquid supply nozzle 30 that supplies a cleaning liquid to the workpiece held by the holding unit 10. And at least.

保持手段10は、被加工物の面積以下の面積を有する面で被加工物を吸引保持する保持テーブル11を備えている。図1及び図2に示すように、保持テーブル11は、保持面11aを備えており、保持面11aの内側には、吸引源に接続された複数の吸引口12が形成されている。保持テーブル11は、軸部13によって支持されている。保持面11aは、被加工物よりも小さい面積を有することが望ましい。   The holding means 10 includes a holding table 11 that sucks and holds the workpiece on a surface having an area equal to or smaller than the area of the workpiece. As shown in FIGS. 1 and 2, the holding table 11 includes a holding surface 11a, and a plurality of suction ports 12 connected to a suction source are formed inside the holding surface 11a. The holding table 11 is supported by the shaft portion 13. The holding surface 11a desirably has a smaller area than the workpiece.

保持手段10は、被加工物のハンドリングを容易にするリング状のリングフレーム4を支持する支持手段14と、支持手段14を昇降させる昇降手段15とを備えており、支持手段14及び昇降手段15は、保持テーブル11の周りに複数配設されている。   The holding means 10 includes a support means 14 that supports a ring-shaped ring frame 4 that facilitates handling of a workpiece, and an elevating means 15 that elevates and lowers the support means 14. Are arranged around the holding table 11.

図1及び図2に示すように、支持手段14は、リングフレーム4を押さえるフレーム保持部14aと、リングフレーム4を載置させるフレーム載置部14bとにより少なくとも構成されており、リングフレーム4の上部を押さえて固定することができる。昇降手段15は、シリンダ15aと、フレーム載置部14bの下部に連結されたピストン15bとにより少なくとも構成されており、ピストン15bがシリンダ15a内を上下方向に移動することによって支持手段14を同一方向に昇降させることができる。   As shown in FIGS. 1 and 2, the support means 14 is configured at least by a frame holding portion 14 a that holds the ring frame 4 and a frame placement portion 14 b that places the ring frame 4. The upper part can be pressed and fixed. The lifting / lowering means 15 is composed at least of a cylinder 15a and a piston 15b connected to the lower part of the frame mounting portion 14b. The piston 15b moves in the vertical direction in the cylinder 15a so that the support means 14 is moved in the same direction. Can be moved up and down.

このように構成される保持手段10は、回転部21によって支持されている。回転部21は、回転駆動手段20に接続されており、回転駆動手段20の作動により回転部21が回転し、保持手段10を所定速度で回転させることができる。   The holding means 10 configured as described above is supported by the rotating unit 21. The rotation unit 21 is connected to the rotation drive unit 20, and the rotation unit 21 is rotated by the operation of the rotation drive unit 20, so that the holding unit 10 can be rotated at a predetermined speed.

図1及び図2に示すように、洗浄装置1は、保持手段10を囲繞して洗浄液などの飛散を防止するカバー部40を備えている。カバー部40には、洗浄液などを受け止める水受け部40aが形成されており、水受け部40aには図示しない排水口が形成されている。カバー部40の水受け部40aには、洗浄液の供給手段となる洗浄液供給ノズル30と、純水の供給手段となる純水供給ノズル32と、圧縮エアーの供給手段となるエアー供給ノズル34とがそれぞれ回転部21の周方向に沿って立設されている。洗浄液供給ノズル30は洗浄液供給源31に接続され、純水供給ノズル32は純水供給源33に接続され、エアー供給ノズル34は圧縮エアー供給源35に接続されている。   As shown in FIGS. 1 and 2, the cleaning device 1 includes a cover portion 40 that surrounds the holding unit 10 and prevents scattering of cleaning liquid and the like. The cover portion 40 is formed with a water receiving portion 40a for receiving the cleaning liquid and the like, and a water outlet (not shown) is formed in the water receiving portion 40a. The water receiving part 40a of the cover part 40 includes a cleaning liquid supply nozzle 30 serving as a cleaning liquid supply means, a pure water supply nozzle 32 serving as a pure water supply means, and an air supply nozzle 34 serving as a compressed air supply means. Each is erected along the circumferential direction of the rotating portion 21. The cleaning liquid supply nozzle 30 is connected to a cleaning liquid supply source 31, the pure water supply nozzle 32 is connected to a pure water supply source 33, and the air supply nozzle 34 is connected to a compressed air supply source 35.

図2に示すように、洗浄装置1は、被加工物に対する洗浄効果を高める超音波振動を発生させる超音波発生手段50を含んで構成されている。超音波発生手段50は、超音波を発振させる電力を供給する電力供給源51と、電力供給源51から供給される電力によって超音波を発振する超音波発振部52と、超音波発振部52を少なくとも上下方向に移動させる移動部53とを備えている。   As shown in FIG. 2, the cleaning apparatus 1 includes an ultrasonic generator 50 that generates ultrasonic vibrations that enhance the cleaning effect on the workpiece. The ultrasonic generator 50 includes a power supply source 51 that supplies power for oscillating ultrasonic waves, an ultrasonic oscillation unit 52 that oscillates ultrasonic waves using the power supplied from the power supply source 51, and an ultrasonic oscillation unit 52. And a moving unit 53 that moves at least in the vertical direction.

次に、洗浄装置1による被加工物の洗浄について説明する。図1に示す板状ワーク2は、被加工物の一例であって特に限定されるものではない。板状ワーク2を加工する際には、中央部に開口部を備えるリング状のリングフレーム4の下部に粘着シート3を貼着し、リングフレーム4の開口部から露出した粘着シート3の粘着面に板状ワーク2を貼着することによりワークセット5を形成する。   Next, cleaning of the workpiece by the cleaning apparatus 1 will be described. The plate-like workpiece 2 shown in FIG. 1 is an example of a workpiece and is not particularly limited. When processing the plate-like workpiece 2, the adhesive sheet 3 is attached to the lower part of the ring-shaped ring frame 4 having an opening at the center, and the adhesive surface of the adhesive sheet 3 exposed from the opening of the ring frame 4. The workpiece set 5 is formed by sticking the plate-like workpiece 2 to the substrate.

(1) ワークセット保持工程
ワークセット5を研削装置や切削装置等で加工した後、板状ワーク2の上面に付着した加工屑を除去するため、ワークセット5を洗浄装置1に搬送する。具体的には、図3に示すように、ワークセット5を構成する粘着シート3の非粘着面を下側に向けて、リングフレーム4に貼着された粘着シート3の周縁部をフレーム載置部14bに載置するとともに板状ワーク2の下面に貼着された粘着シート3の中央部を保持面11aに載置する。
(1) Work set holding process After processing the work set 5 with a grinding device, a cutting device, or the like, the work set 5 is conveyed to the cleaning device 1 in order to remove processing waste adhering to the upper surface of the plate-like work 2. Specifically, as shown in FIG. 3, the peripheral portion of the pressure-sensitive adhesive sheet 3 attached to the ring frame 4 is frame-mounted with the non-adhesive surface of the pressure-sensitive adhesive sheet 3 constituting the work set 5 facing downward. The central part of the pressure-sensitive adhesive sheet 3 placed on the lower surface of the plate-like workpiece 2 is placed on the holding surface 11a.

吸引源が作動することにより保持面11aにおいてワークセット5の中央部を吸引保持する。次いで、支持手段14のフレーム保持部14aによってリングフレーム4の上部を押さえてワークセット5が動かないように固定する。   By operating the suction source, the central portion of the work set 5 is sucked and held on the holding surface 11a. Next, the upper part of the ring frame 4 is pressed by the frame holding part 14a of the support means 14 and fixed so that the work set 5 does not move.

(2) 洗浄液供給工程
ワークセット保持工程を実施した後、図4に示すように、昇降手段15が作動することにより、シリンダ15aの内部をピストン15bが上昇し、リングフレーム4を支持する支持手段14を上昇させる。これにより、リングフレーム4に貼着した粘着シート3の周縁部を鉛直方向に引き伸ばし、粘着テープ3をすり鉢形状に形成する。その結果、すり鉢形状の粘着シート3の内側には窪みが形成される。
(2) Cleaning liquid supply process After performing the work set holding process, as shown in FIG. 4, the lifting / lowering means 15 is operated to raise the piston 15 b inside the cylinder 15 a to support the ring frame 4. 14 is raised. Thereby, the peripheral part of the adhesive sheet 3 stuck on the ring frame 4 is extended in the vertical direction, and the adhesive tape 3 is formed in a mortar shape. As a result, a depression is formed inside the mortar-shaped adhesive sheet 3.

図4に示すように、洗浄液供給ノズル30がすり鉢形状の粘着シート3の上方に移動し、洗浄液供給源31の作動により、洗浄液供給ノズル30から洗浄液6を粘着シート3の窪みに向けて供給する。そして、粘着シート3の窪みに洗浄液6を溜めて液体層7を形成し、液体層7の中に板状ワーク2を水没させる。このように板状ワーク2が液体層7に水没すると、板状ワーク2の上面に付着していた加工屑が浮き上がる。   As shown in FIG. 4, the cleaning liquid supply nozzle 30 moves above the mortar-shaped adhesive sheet 3, and the cleaning liquid supply nozzle 30 supplies the cleaning liquid 6 from the cleaning liquid supply nozzle 30 toward the depression of the adhesive sheet 3. . Then, the cleaning liquid 6 is accumulated in the depression of the adhesive sheet 3 to form the liquid layer 7, and the plate-like workpiece 2 is submerged in the liquid layer 7. When the plate-like workpiece 2 is submerged in the liquid layer 7 in this way, the machining waste adhering to the upper surface of the plate-like workpiece 2 is lifted.

洗浄液6は、特に限定されるものではないが、例えばアルコールや純水を使用することができる。なお、板状ワーク2に付着した加工屑をより浮上させるためには、アルコールを使用することが望ましい。   The cleaning liquid 6 is not particularly limited. For example, alcohol or pure water can be used. In addition, in order to raise the processing waste adhering to the plate-like workpiece 2 more, it is desirable to use alcohol.

(3) 洗浄工程
洗浄液供給工程を実施した後、図5に示すように、板状ワーク2の洗浄効果をより良好なものにするため、板状ワーク2の上面をさらに洗浄する。まず、昇降手段15が作動することにより、シリンダ15aの内部をピストン15bが下降し、リングフレーム4を支持する支持手段14を下降させる。これにより、図4に示したすり鉢形状の粘着シート3の窪みに溜められた洗浄液を浮上した加工屑とともに水受け部40aに流し、水受け部40aの排水口から外部へ排水する。
(3) Cleaning Step After performing the cleaning liquid supply step, as shown in FIG. 5, the upper surface of the plate workpiece 2 is further cleaned in order to improve the cleaning effect of the plate workpiece 2. First, when the elevating means 15 is operated, the piston 15b is lowered inside the cylinder 15a, and the supporting means 14 that supports the ring frame 4 is lowered. As a result, the cleaning liquid stored in the depression of the mortar-shaped pressure-sensitive adhesive sheet 3 shown in FIG.

その後、回転駆動手段20によって保持手段10を例えば矢印A方向に回転させながら、洗浄液供給ノズル30から板状ワーク2の上面に向けて洗浄液6aを噴射し、板状ワーク2の上面を洗浄する。このようにして板状ワーク2の上面に付着した加工屑を除去する。なお、洗浄液6は、上記洗浄液供給工程で使用したものと同様のものを使用することが望ましい。   Thereafter, while the holding means 10 is rotated in the direction of arrow A by the rotation driving means 20, the cleaning liquid 6 a is sprayed from the cleaning liquid supply nozzle 30 toward the upper surface of the plate-like workpiece 2 to clean the upper surface of the plate-like workpiece 2. In this way, the machining waste adhering to the upper surface of the plate-like workpiece 2 is removed. The cleaning liquid 6 is preferably the same as that used in the cleaning liquid supply step.

(4) 純水洗浄工程
洗浄工程を実施した後、図6に示すように、回転駆動手段20によって保持手段10を例えば矢印A方向に回転させるとともに、純水供給源33の作動により純水供給ノズル32から純水を板状ワーク2の上面に向けて供給し、板状ワーク2の上面を洗浄する。なお、洗浄液供給工程の後、洗浄工程を実施せずに純水洗浄工程を実施してもよい。
(4) Pure water cleaning step After performing the cleaning step, as shown in FIG. 6, the holding means 10 is rotated by, for example, the arrow A direction by the rotation driving means 20, and pure water is supplied by the operation of the pure water supply source 33. Pure water is supplied from the nozzle 32 toward the upper surface of the plate-like workpiece 2 to clean the upper surface of the plate-like workpiece 2. Note that after the cleaning liquid supply process, the pure water cleaning process may be performed without performing the cleaning process.

(5) 乾燥工程
純水洗浄工程を実施した後、図7に示すように、回転駆動手段20によって保持手段10を例えば矢印A方向に回転させるとともに、圧縮エアー供給源35の作動によりエアー供給ノズル34から圧縮エアーを板状ワーク2の上面に向けて供給する。そして、圧縮エアーが板状ワーク2の上面に付着した液体を吹き飛ばして板状ワーク2の上面を乾燥させる。このようにして、板状ワーク2に対する一連の洗浄工程が終了する。
(5) Drying step After performing the pure water washing step, as shown in FIG. 7, the holding means 10 is rotated by, for example, the arrow A direction by the rotation driving means 20 and the air supply nozzle 35 is operated by the operation of the compressed air supply source 35. Compressed air is supplied from 34 toward the upper surface of the plate-like workpiece 2. Then, the compressed air blows away the liquid adhering to the upper surface of the plate-like workpiece 2 to dry the upper surface of the plate-like workpiece 2. In this way, a series of cleaning steps for the plate-like workpiece 2 is completed.

(6) 超音波洗浄工程
次に、超音波振動を利用して板状ワーク2を洗浄する場合について説明する。上記ワークセット保持工程及び上記洗浄液供給工程を実施した後、図8に示すように、超音波発生手段50による超音波洗浄を実施する。超音波発生手段50は、移動部53が鉛直方向に下降することにより、すり鉢形状の粘着シート3の窪みに溜められた液体層7に超音波発振部52を着水させる。
(6) Ultrasonic cleaning process Next, the case where the plate-shaped workpiece 2 is cleaned using ultrasonic vibration will be described. After performing the work set holding step and the cleaning liquid supply step, as shown in FIG. 8, ultrasonic cleaning by the ultrasonic generator 50 is performed. The ultrasonic generator 50 causes the ultrasonic oscillator 52 to land on the liquid layer 7 stored in the depression of the mortar-shaped adhesive sheet 3 when the moving unit 53 descends in the vertical direction.

電力供給源51の作動により、超音波振動を超音波発振部52から液体層7に伝播させる。その結果、液体層7に伝播された超音波振動の作用により板状ワーク2の上面に付着した加工屑がより浮き上がりやすくなり洗浄効果をより高めることが可能となる。そして、所定時間超音波洗浄を行った後、移動部53が上昇し液体層7から超音波発振部52を離水させる。   By the operation of the power supply source 51, ultrasonic vibration is propagated from the ultrasonic oscillator 52 to the liquid layer 7. As a result, the processing waste adhering to the upper surface of the plate-like workpiece 2 is more likely to float due to the action of ultrasonic vibration propagated to the liquid layer 7 and the cleaning effect can be further enhanced. Then, after performing ultrasonic cleaning for a predetermined time, the moving unit 53 rises and separates the ultrasonic oscillation unit 52 from the liquid layer 7.

超音波洗浄工程を実施した後は、上記洗浄工程、上記純水洗浄工程及び上記乾燥工程を順次実施する。また、上記洗浄工程を実施せずに上記純水洗浄工程を実施してもよい。   After performing the ultrasonic cleaning process, the cleaning process, the pure water cleaning process, and the drying process are sequentially performed. Further, the pure water cleaning step may be performed without performing the cleaning step.

以上のように、洗浄装置1の保持手段10は、ワークセット5を吸引保持する保持テーブル11と、リングフレーム4を支持する支持手段14と、支持手段14を昇降させる昇降手段15と、を少なくとも備えているため、昇降手段15によってリングフレーム4を支持する支持手段14が上昇することによりすり鉢形状に粘着シート3を形成し、その内側に洗浄液供給ノズル30から洗浄液6を供給して液体層7を形成し、板状ワーク2を水没させることができる。したがって、板状ワーク2の上面に付着した加工屑を洗浄液6の液体層7中に浮き上がらせることができ、板状ワーク2の上面に何度も洗浄液を噴きつけて洗浄する必要がなくなる。このため、板状ワーク2の上面に洗浄斑を発生させることなく効率よく綺麗に洗浄することが可能となる。   As described above, the holding unit 10 of the cleaning apparatus 1 includes at least the holding table 11 that holds the work set 5 by suction, the support unit 14 that supports the ring frame 4, and the lifting unit 15 that lifts and lowers the support unit 14. Accordingly, the support means 14 that supports the ring frame 4 is raised by the elevating means 15 to form the adhesive sheet 3 in the shape of a mortar, and the cleaning liquid 6 is supplied from the cleaning liquid supply nozzle 30 to the inside of the liquid layer 7. And the plate-like workpiece 2 can be submerged. Therefore, it is possible to lift the processing waste adhering to the upper surface of the plate-like workpiece 2 into the liquid layer 7 of the cleaning liquid 6, and it is not necessary to spray the cleaning liquid on the upper surface of the plate-like workpiece 2 and clean it. For this reason, it becomes possible to clean efficiently and cleanly without generating cleaning spots on the upper surface of the plate-like workpiece 2.

また、洗浄装置1には、超音波振動を発生させる超音波発生手段50を含んで構成されているため、移動部53で超音波発振部52が下降することにより、すり鉢形状の粘着シート3の内側に溜められた液体層7に超音波発振部52を着水させ、電力供給源51の作動により超音波振動を超音波発振部52から液体層7に伝播させることができる。その結果、液体層7に伝播された超音波振動の作用により板状ワーク2の上面に付着した加工屑が浮き上がりやすくなるため、より効果的に板状ワーク2の洗浄を行うことができる。   Further, since the cleaning apparatus 1 includes an ultrasonic generator 50 that generates ultrasonic vibrations, the ultrasonic oscillator 52 is lowered by the moving unit 53, so that the mortar-shaped adhesive sheet 3 The ultrasonic oscillation unit 52 can be landed on the liquid layer 7 stored inside, and the ultrasonic vibration can be propagated from the ultrasonic oscillation unit 52 to the liquid layer 7 by the operation of the power supply source 51. As a result, since the processing waste adhering to the upper surface of the plate-like workpiece 2 is easily lifted by the action of ultrasonic vibration propagated to the liquid layer 7, the plate-like workpiece 2 can be cleaned more effectively.

1:洗浄装置 2:板状ワーク 3:粘着シート 4:リングフレーム
5:ワークセット 6,6a:洗浄液 7:液体層
10:保持手段 11:保持テーブル 11a:保持面 12:吸引口 13:軸部
14:支持手段 14a:フレーム保持部 14b:フレーム載置部 15:昇降手段
15a:シリンダ 15b:ピストン 20:回転駆動手段 21:回転部
30:洗浄液供給ノズル 31:洗浄液供給源 32:純水供給ノズル
33:純水供給源 34:エアー供給ノズル 35:圧縮エアー供給源
40:カバー部 50:超音波発生手段 51:電力供給源 52:超音波発振部
53:移動部
1: Cleaning device 2: Plate workpiece 3: Adhesive sheet 4: Ring frame 5: Work set 6, 6a: Cleaning liquid 7: Liquid layer 10: Holding means 11: Holding table 11a: Holding surface 12: Suction port 13: Shaft DESCRIPTION OF SYMBOLS 14: Support means 14a: Frame holding part 14b: Frame mounting part 15: Lifting means 15a: Cylinder 15b: Piston 20: Rotation drive means 21: Rotating part 30: Cleaning liquid supply nozzle 31: Cleaning liquid supply source 32: Pure water supply nozzle 33: Pure water supply source 34: Air supply nozzle 35: Compressed air supply source 40: Cover unit 50: Ultrasonic wave generating means 51: Power supply source 52: Ultrasonic oscillation unit 53: Moving unit

Claims (2)

中央に開口部を備えるリンク状のリングフレームに貼着され該開口部から露出した粘着シートの粘着面に板状ワークを貼着することにより形成されたワークセットと、該ワークセットを保持する保持手段と、該保持手段が保持する該ワークセットに洗浄液を供給する洗浄液供給手段と、該保持手段を回転させる回転駆動手段と、を少なくとも備える洗浄装置であって、
該保持手段は、該リングフレームを支持する支持手段と、
該支持手段を昇降させる昇降手段と、
該ワークセットの中央部分を吸引保持する保持面を有する保持テーブルと、を少なくとも備え、
該ワークセットの該粘着シートの非粘着面を該保持テーブルで吸引保持するとともに該昇降手段によって該支持手段を上昇させることにより該リングフレームに貼着した該粘着シートをすり鉢形状に形成し、該洗浄液供給手段によって該すり鉢形状の内側に洗浄液を供給することにより該すり鉢形状の内側に溜められた洗浄液中に板状ワークを水没させて洗浄する洗浄装置。
A work set formed by adhering a plate-like work to the adhesive surface of an adhesive sheet that is attached to a link-shaped ring frame having an opening at the center and exposed from the opening, and a holding for holding the work set A cleaning apparatus comprising at least: a means; a cleaning liquid supply means for supplying a cleaning liquid to the work set held by the holding means; and a rotation driving means for rotating the holding means,
The holding means includes support means for supporting the ring frame;
Elevating means for elevating and lowering the support means;
A holding table having a holding surface for sucking and holding the center portion of the work set,
The non-adhesive surface of the pressure-sensitive adhesive sheet of the work set is sucked and held by the holding table and the support means is lifted by the elevating means to form the pressure-sensitive adhesive sheet adhered to the ring frame in a mortar shape, A cleaning apparatus for cleaning a plate-like workpiece by immersing it in the cleaning liquid stored inside the mortar shape by supplying the cleaning liquid to the inside of the mortar shape by a cleaning liquid supply means.
超音波振動を発生させる超音波発生手段を含んで構成され、
該超音波発生手段は、超音波振動発振する超音波発振部と、
該超音波発振部を前記粘着シートで形成されるすり鉢形状の内側に溜められた洗浄液に対し着水及び離水させる移動部とを備え、
該超音波発生手段で該すり鉢形状の内側に溜められた該洗浄液に超音波振動を伝播させ板状ワークを洗浄することを特徴とする請求項1記載の洗浄装置。
Comprising ultrasonic generating means for generating ultrasonic vibration,
The ultrasonic wave generation means includes an ultrasonic wave oscillation unit that oscillates ultrasonically, and
A moving unit for landing and releasing water on the cleaning liquid stored inside the mortar shape formed of the pressure-sensitive adhesive sheet,
The cleaning apparatus according to claim 1, wherein ultrasonic vibration is propagated to the cleaning liquid stored inside the mortar shape by the ultrasonic wave generating means to clean the plate-like workpiece.
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JP2017092063A (en) * 2015-11-02 2017-05-25 東京エレクトロン株式会社 Cleaning device, peeling system, cleaning method, peeling method, program, and information storage medium
CN112845448A (en) * 2021-03-05 2021-05-28 安徽陆达智能装备科技有限公司 Full-automatic cleaning device for lithium battery anode material sintering pot

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JP2017092062A (en) * 2015-11-02 2017-05-25 東京エレクトロン株式会社 Cleaning device, peeling system, cleaning method, peeling method, program, and information storage medium
JP2017092063A (en) * 2015-11-02 2017-05-25 東京エレクトロン株式会社 Cleaning device, peeling system, cleaning method, peeling method, program, and information storage medium
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