JP2014201829A5 - Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board - Google Patents
Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board Download PDFInfo
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- JP2014201829A5 JP2014201829A5 JP2013088812A JP2013088812A JP2014201829A5 JP 2014201829 A5 JP2014201829 A5 JP 2014201829A5 JP 2013088812 A JP2013088812 A JP 2013088812A JP 2013088812 A JP2013088812 A JP 2013088812A JP 2014201829 A5 JP2014201829 A5 JP 2014201829A5
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- layer
- carrier
- copper foil
- copper
- ultrathin
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- 239000000969 carrier Substances 0.000 title claims 23
- 239000011889 copper foil Substances 0.000 title claims 19
- 238000004519 manufacturing process Methods 0.000 title claims 7
- 239000010410 layer Substances 0.000 claims 51
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 12
- 229910052802 copper Inorganic materials 0.000 claims 12
- 239000010949 copper Substances 0.000 claims 12
- 229910052803 cobalt Inorganic materials 0.000 claims 8
- 229910052750 molybdenum Inorganic materials 0.000 claims 8
- 229910052725 zinc Inorganic materials 0.000 claims 8
- 229910052748 manganese Inorganic materials 0.000 claims 7
- 229910052759 nickel Inorganic materials 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 7
- 239000000853 adhesive Substances 0.000 claims 6
- 230000001070 adhesive Effects 0.000 claims 6
- 229910052742 iron Inorganic materials 0.000 claims 6
- 229910052698 phosphorus Inorganic materials 0.000 claims 6
- 229910052718 tin Inorganic materials 0.000 claims 6
- 229910052721 tungsten Inorganic materials 0.000 claims 6
- 229910052720 vanadium Inorganic materials 0.000 claims 6
- 229910052719 titanium Inorganic materials 0.000 claims 5
- 229910052804 chromium Inorganic materials 0.000 claims 4
- 239000000654 additive Substances 0.000 claims 3
- 229910045601 alloy Inorganic materials 0.000 claims 3
- 239000000956 alloy Substances 0.000 claims 3
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical class [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 claims 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims 3
- 230000001808 coupling Effects 0.000 claims 3
- 238000010168 coupling process Methods 0.000 claims 3
- 238000005859 coupling reaction Methods 0.000 claims 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 3
- 229910000077 silane Inorganic materials 0.000 claims 3
- 238000010030 laminating Methods 0.000 claims 2
- 238000005259 measurement Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 229910000990 Ni alloy Inorganic materials 0.000 claims 1
- 230000000996 additive Effects 0.000 claims 1
- 238000009713 electroplating Methods 0.000 claims 1
- 239000011888 foil Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000523 sample Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
Claims (12)
前記極薄銅層は10cm角シートとして、重量厚み法で算出した重量厚み測定値の平均値をW10とし、標準偏差をσ10としたときの厚み精度:P10=3σ10×100/W10としたとき、P10が3.0%以下であり、
極薄銅層の絶縁基板との接着層において、接触式粗さ計でJIS B0601−1994に準拠して測定した粗さRzが1.5μm以下を満たすキャリア付銅箔。 A carrier-attached copper foil comprising a carrier, a release layer laminated on the carrier, an ultrathin copper layer laminated on the release layer, and an adhesive layer between the insulating substrate laminated on the ultrathin copper layer There,
The ultrathin copper layer is a 10 cm square sheet, and the thickness accuracy when the average thickness measurement value calculated by the weight thickness method is W 10 and the standard deviation is σ 10 : P 10 = 3σ 10 × 100 / W when I was 10, not more than P 10 is 3.0%,
A copper foil with a carrier satisfying a roughness Rz of 1.5 μm or less measured with a contact-type roughness meter in accordance with JIS B0601-1994 in an adhesive layer with an insulating substrate of an ultrathin copper layer.
(A)前記極薄銅層は5cm角シートとして、重量厚み法で算出した重量厚み測定値の平均値をW5とし、標準偏差をσ3としたときの厚み精度:P5=3σ5×100/W5としたとき、P5が3.0%以下である、
(B)前記極薄銅層は四探針法で測定した厚みの平均値をTとし、標準偏差をσ T としたときの厚み精度:P T =3σ T ×100/Tとしたとき、P T が10.0%以下である。 The copper foil with a carrier satisfy | filling any one or more of the following (A) or (B).
(A) Thickness accuracy when the ultrathin copper layer is a 5 cm square sheet and the average value of weight thickness measurement values calculated by the weight thickness method is W 5 and the standard deviation is σ 3 : P 5 = 3σ 5 × When 100 / W 5 is set, P 5 is 3.0% or less .
(B) The thickness of the ultrathin copper layer measured by the four-probe method is T, and when the standard deviation is σ T , the thickness accuracy is P T = 3σ T × 100 / T, P T is 10.0% or less.
前記中間層が、Ni、Mo、Ti、Zn、Co、V、Sn、Mn、W、P、Fe及びCrの少なくともいずれか1種を含む請求項1〜3のいずれかに記載のキャリア付銅箔。 The adhesion layer of the ultrathin copper layer to the insulating substrate is an intermediate layer made of a single metal or an alloy, and a single metal of Cr, an oxide, or a hydrated oxide, which are laminated in order from the surface of the ultrathin copper layer. The surface layer is composed of 10 to 200 μg / dm 2 of Cr.
The copper with a carrier according to any one of claims 1 to 3 , wherein the intermediate layer includes at least one of Ni, Mo, Ti, Zn, Co, V, Sn, Mn, W, P, Fe, and Cr. Foil.
(C)前記接着層の表面に、耐熱層、防錆層、クロメート処理層及びシランカップリング処理層からなる群から選択された1種以上の層を有する、
(D)前記接着層上に樹脂層を備える、
(E)前記接着層の表面に、耐熱層、防錆層、クロメート処理層及びシランカップリング処理層からなる群から選択された1種以上の層を有し、且つ、前記耐熱層、防錆層、クロメート処理層及びシランカップリング処理層からなる群から選択された1種以上の層の上に樹脂層を備える。 The copper foil with a carrier according to any one of claims 1 to 7, which satisfies any one of the following (C) to (E).
(C) The surface of the adhesive layer has one or more layers selected from the group consisting of a heat-resistant layer, a rust-proof layer, a chromate treatment layer, and a silane coupling treatment layer .
(D) A resin layer is provided on the adhesive layer.
(E) The surface of the adhesive layer has one or more layers selected from the group consisting of a heat-resistant layer, a rust-proof layer, a chromate-treated layer, and a silane coupling-treated layer, and the heat-resistant layer and the rust-proof layer A resin layer is provided on one or more layers selected from the group consisting of a layer, a chromate treatment layer, and a silane coupling treatment layer.
搬送ロールで搬送されるキャリアの表面に剥離層を形成する工程と、
搬送ロールで搬送される前記剥離層が形成されたキャリアをドラムで支持しながら、電解めっきにより前記剥離層表面に極薄銅層を形成する工程と、
を含む請求項1〜8のいずれかに記載のキャリア付銅箔の製造方法。 By treating the surface of a long carrier conveyed in the length direction by the roll-to-roll conveyance method, the carrier, the release layer laminated on the carrier, and the ultrathin layer laminated on the release layer It is a method of manufacturing a copper foil with a carrier provided with a copper layer,
Forming a release layer on the surface of the carrier conveyed by the conveyance roll;
Forming an ultrathin copper layer on the surface of the release layer by electrolytic plating while supporting the carrier on which the release layer is transported by a transport roll with a drum;
The manufacturing method of the copper foil with a carrier in any one of Claims 1-8 containing these.
前記キャリア付銅箔と絶縁基板とを積層する工程、
前記キャリア付銅箔と絶縁基板とを積層した後に、前記キャリア付銅箔のキャリアを剥がす工程を経て銅張積層板を形成し、
その後、セミアディティブ法、サブトラクティブ法、パートリーアディティブ法又はモディファイドセミアディティブ法のいずれかの方法によって、回路を形成する工程を含むプリント配線板の製造方法。 Preparing the carrier-attached copper foil according to any one of claims 1 to 8 and an insulating substrate;
Laminating the copper foil with carrier and an insulating substrate;
After laminating the carrier-attached copper foil and the insulating substrate, forming a copper-clad laminate through a step of peeling the carrier of the carrier-attached copper foil,
Then, the manufacturing method of a printed wiring board including the process of forming a circuit by any method of a semi-additive method, a subtractive method, a partly additive method, or a modified semi-additive method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2013088812A JP6134569B2 (en) | 2013-04-03 | 2013-04-03 | Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2013088812A JP6134569B2 (en) | 2013-04-03 | 2013-04-03 | Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014201829A JP2014201829A (en) | 2014-10-27 |
JP2014201829A5 true JP2014201829A5 (en) | 2016-06-02 |
JP6134569B2 JP6134569B2 (en) | 2017-05-24 |
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Family Applications (1)
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JP2013088812A Active JP6134569B2 (en) | 2013-04-03 | 2013-04-03 | Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board |
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JP (1) | JP6134569B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6246486B2 (en) * | 2013-04-03 | 2017-12-13 | Jx金属株式会社 | Copper foil with carrier and method for producing the same, method for producing copper-clad laminate and method for producing printed wiring board |
JP6190500B2 (en) * | 2015-08-06 | 2017-08-30 | Jx金属株式会社 | Copper foil with carrier, laminate, printed wiring board manufacturing method and electronic device manufacturing method |
JP7017369B2 (en) * | 2017-10-27 | 2022-02-08 | Jx金属株式会社 | Surface-treated copper foil, copper-clad laminate and printed wiring board |
KR102660753B1 (en) * | 2018-02-01 | 2024-04-26 | 미쓰이금속광업주식회사 | Resin composition, copper foil containing resin, dielectric layer, copper clad laminate, capacitor element, and printed wiring board with built-in capacitor |
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JP5175992B1 (en) * | 2012-07-06 | 2013-04-03 | Jx日鉱日石金属株式会社 | Ultrathin copper foil, method for producing the same, and ultrathin copper layer |
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2013
- 2013-04-03 JP JP2013088812A patent/JP6134569B2/en active Active
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