JP2014201829A5 - Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board - Google Patents

Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board Download PDF

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JP2014201829A5
JP2014201829A5 JP2013088812A JP2013088812A JP2014201829A5 JP 2014201829 A5 JP2014201829 A5 JP 2014201829A5 JP 2013088812 A JP2013088812 A JP 2013088812A JP 2013088812 A JP2013088812 A JP 2013088812A JP 2014201829 A5 JP2014201829 A5 JP 2014201829A5
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layer
carrier
copper foil
copper
ultrathin
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キャリアと、キャリア上に積層された剥離層と、剥離層上に積層された極薄銅層と、極薄銅層上に積層された絶縁基板との接着層とを備えたキャリア付銅箔であって、
前記極薄銅層は10cm角シートとして、重量厚み法で算出した重量厚み測定値の平均値をW10とし、標準偏差をσ10としたときの厚み精度:P10=3σ10×100/W10としたとき、P10が3.0%以下であり、
極薄銅層の絶縁基板との接着層において、接触式粗さ計でJIS B0601−1994に準拠して測定した粗さRzが1.5μm以下を満たすキャリア付銅箔。
A carrier-attached copper foil comprising a carrier, a release layer laminated on the carrier, an ultrathin copper layer laminated on the release layer, and an adhesive layer between the insulating substrate laminated on the ultrathin copper layer There,
The ultrathin copper layer is a 10 cm square sheet, and the thickness accuracy when the average thickness measurement value calculated by the weight thickness method is W 10 and the standard deviation is σ 10 : P 10 = 3σ 10 × 100 / W when I was 10, not more than P 10 is 3.0%,
A copper foil with a carrier satisfying a roughness Rz of 1.5 μm or less measured with a contact-type roughness meter in accordance with JIS B0601-1994 in an adhesive layer with an insulating substrate of an ultrathin copper layer.
以下の(A)または(B)のいずれか一つ以上を満たすキャリア付銅箔。
(A)前記極薄銅層は5cm角シートとして、重量厚み法で算出した重量厚み測定値の平均値をW5とし、標準偏差をσ3としたときの厚み精度:P5=3σ5×100/W5としたとき、P5が3.0%以下である
(B)前記極薄銅層は四探針法で測定した厚みの平均値をTとし、標準偏差をσ T としたときの厚み精度:P T =3σ T ×100/Tとしたとき、P T が10.0%以下である。
The copper foil with a carrier satisfy | filling any one or more of the following (A) or (B).
(A) Thickness accuracy when the ultrathin copper layer is a 5 cm square sheet and the average value of weight thickness measurement values calculated by the weight thickness method is W 5 and the standard deviation is σ 3 : P 5 = 3σ 5 × When 100 / W 5 is set, P 5 is 3.0% or less .
(B) The thickness of the ultrathin copper layer measured by the four-probe method is T, and when the standard deviation is σ T , the thickness accuracy is P T = 3σ T × 100 / T, P T is 10.0% or less.
前記極薄銅層の絶縁基板との接着層には、Ni、Mo、Ti、Zn、Co、V、Sn、Mn、W、P、Fe及びCrの単体、またはNi、Mo、Ti、Zn、Co、V、Sn、Mn、W、P、Fe及びCrの少なくともいずれか1種を含む合金、または酸化物、または水和酸化物が存在する請求項1または2に記載のキャリア付銅箔。 For the adhesive layer of the ultra-thin copper layer with the insulating substrate, Ni, Mo, Ti, Zn, Co, V, Sn, Mn, W, P, Fe and Cr alone, or Ni, Mo, Ti, Zn, The copper foil with a carrier according to claim 1 or 2 , wherein an alloy containing at least one of Co, V, Sn, Mn, W, P, Fe, and Cr, or an oxide or a hydrated oxide is present. 前記極薄銅層の絶縁基板との接着層は、極薄銅層表面から順に積層した、金属の単体又は合金からなる中間層、及び、Crの金属単体、または酸化物、または水和酸化物からなる表層で構成され、表層のCrの付着量が10〜200μg/dmであり、
前記中間層が、Ni、Mo、Ti、Zn、Co、V、Sn、Mn、W、P、Fe及びCrの少なくともいずれか1種を含む請求項1〜のいずれかに記載のキャリア付銅箔。
The adhesion layer of the ultrathin copper layer to the insulating substrate is an intermediate layer made of a single metal or an alloy, and a single metal of Cr, an oxide, or a hydrated oxide, which are laminated in order from the surface of the ultrathin copper layer. The surface layer is composed of 10 to 200 μg / dm 2 of Cr.
The copper with a carrier according to any one of claims 1 to 3 , wherein the intermediate layer includes at least one of Ni, Mo, Ti, Zn, Co, V, Sn, Mn, W, P, Fe, and Cr. Foil.
前記中間層が、Ni、Mo、Ti、Zn及びCoのいずれか1種の単体で構成され、該中間層には、Ni、Mo、Ti、Zn及びCoのいずれか1種が10〜2000μg/dm2の付着量で存在する請求項に記載のキャリア付銅箔。 The intermediate layer is composed of any one of Ni, Mo, Ti, Zn, and Co. The intermediate layer includes any one of Ni, Mo, Ti, Zn, and Co at 10 to 2000 μg / The copper foil with a carrier according to claim 4 , wherein the copper foil is present in an amount of dm 2 . 前記中間層が、Ni、Mo、Zn、Co、V、Sn、Mn、W、P、Feの少なくともいずれか2種の合金で構成され、該中間層には、Ni、Mo、Zn、Co、V、Sn、Mn、W、P、Fe及びCrのいずれか2種が10〜2000μg/dm2の付着量で存在する請求項に記載のキャリア付銅箔。 The intermediate layer is composed of an alloy of at least any two of Ni, Mo, Zn, Co, V, Sn, Mn, W, P, and Fe, and the intermediate layer includes Ni, Mo, Zn, Co, The copper foil with a carrier according to claim 4 , wherein any two of V, Sn, Mn, W, P, Fe and Cr are present in an adhesion amount of 10 to 2000 μg / dm 2 . 前記中間層が、Niと、Mo、Zn、Co、V、Sn、Mn、W、P、Fe、Mn及びCrのいずれか1種とからなるNi合金で構成された請求項4または6に記載のキャリア付銅箔。 The intermediate layer, Ni and, Mo, Zn, Co, V , Sn, Mn, W, P, Fe, according to claim 4 or 6 composed of Ni alloy consisting of any one of Mn and Cr Copper foil with carrier. 以下の(C)〜(E)のいずれか一つを満たす請求項1〜7のいずれかに記載のキャリア付銅箔。
(C)前記接着層の表面に、耐熱層、防錆層、クロメート処理層及びシランカップリング処理層からなる群から選択された1種以上の層を有する
(D)前記接着層上に樹脂層を備える、
(E)前記接着層の表面に、耐熱層、防錆層、クロメート処理層及びシランカップリング処理層からなる群から選択された1種以上の層を有し、且つ、前記耐熱層、防錆層、クロメート処理層及びシランカップリング処理層からなる群から選択された1種以上の層の上に樹脂層を備える。
The copper foil with a carrier according to any one of claims 1 to 7, which satisfies any one of the following (C) to (E).
(C) The surface of the adhesive layer has one or more layers selected from the group consisting of a heat-resistant layer, a rust-proof layer, a chromate treatment layer, and a silane coupling treatment layer .
(D) A resin layer is provided on the adhesive layer.
(E) The surface of the adhesive layer has one or more layers selected from the group consisting of a heat-resistant layer, a rust-proof layer, a chromate-treated layer, and a silane coupling-treated layer, and the heat-resistant layer and the rust-proof layer A resin layer is provided on one or more layers selected from the group consisting of a layer, a chromate treatment layer, and a silane coupling treatment layer.
ロール・ツウ・ロール搬送方式により長さ方向に搬送される長尺状のキャリアの表面を処理することで、キャリアと、キャリア上に積層された剥離層と、剥離層上に積層された極薄銅層とを備えたキャリア付銅箔を製造する方法であり、
搬送ロールで搬送されるキャリアの表面に剥離層を形成する工程と、
搬送ロールで搬送される前記剥離層が形成されたキャリアをドラムで支持しながら、電解めっきにより前記剥離層表面に極薄銅層を形成する工程と、
を含む請求項1〜のいずれかに記載のキャリア付銅箔の製造方法。
By treating the surface of a long carrier conveyed in the length direction by the roll-to-roll conveyance method, the carrier, the release layer laminated on the carrier, and the ultrathin layer laminated on the release layer It is a method of manufacturing a copper foil with a carrier provided with a copper layer,
Forming a release layer on the surface of the carrier conveyed by the conveyance roll;
Forming an ultrathin copper layer on the surface of the release layer by electrolytic plating while supporting the carrier on which the release layer is transported by a transport roll with a drum;
The manufacturing method of the copper foil with a carrier in any one of Claims 1-8 containing these.
請求項1〜のいずれかに記載のキャリア付銅箔を用いてプリント配線板を製造する方法 Method of making a print wiring board using the copper foil with carrier according to any one of claims 1-8. 請求項1〜のいずれかに記載のキャリア付銅箔を用いて銅張積層板を製造する方法 Method of producing a copper-clad laminate using a copper foil with carrier according to any one of claims 1-8. 請求項1〜のいずれかに記載のキャリア付銅箔と絶縁基板とを準備する工程、
前記キャリア付銅箔と絶縁基板とを積層する工程、
前記キャリア付銅箔と絶縁基板とを積層した後に、前記キャリア付銅箔のキャリアを剥がす工程を経て銅張積層板を形成し、
その後、セミアディティブ法、サブトラクティブ法、パートリーアディティブ法又はモディファイドセミアディティブ法のいずれかの方法によって、回路を形成する工程を含むプリント配線板の製造方法。
Preparing the carrier-attached copper foil according to any one of claims 1 to 8 and an insulating substrate;
Laminating the copper foil with carrier and an insulating substrate;
After laminating the carrier-attached copper foil and the insulating substrate, forming a copper-clad laminate through a step of peeling the carrier of the carrier-attached copper foil,
Then, the manufacturing method of a printed wiring board including the process of forming a circuit by any method of a semi-additive method, a subtractive method, a partly additive method, or a modified semi-additive method.
JP2013088812A 2013-04-03 2013-04-03 Copper foil with carrier, method for producing copper foil with carrier, method for producing copper-clad laminate, and method for producing printed wiring board Active JP6134569B2 (en)

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JP6246486B2 (en) * 2013-04-03 2017-12-13 Jx金属株式会社 Copper foil with carrier and method for producing the same, method for producing copper-clad laminate and method for producing printed wiring board
JP6190500B2 (en) * 2015-08-06 2017-08-30 Jx金属株式会社 Copper foil with carrier, laminate, printed wiring board manufacturing method and electronic device manufacturing method
JP7017369B2 (en) * 2017-10-27 2022-02-08 Jx金属株式会社 Surface-treated copper foil, copper-clad laminate and printed wiring board
KR102660753B1 (en) * 2018-02-01 2024-04-26 미쓰이금속광업주식회사 Resin composition, copper foil containing resin, dielectric layer, copper clad laminate, capacitor element, and printed wiring board with built-in capacitor

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