JP2014192255A5 - - Google Patents
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- JP2014192255A5 JP2014192255A5 JP2013064919A JP2013064919A JP2014192255A5 JP 2014192255 A5 JP2014192255 A5 JP 2014192255A5 JP 2013064919 A JP2013064919 A JP 2013064919A JP 2013064919 A JP2013064919 A JP 2013064919A JP 2014192255 A5 JP2014192255 A5 JP 2014192255A5
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- shape
- exposure apparatus
- light
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- irradiation region
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- 239000000758 substrate Substances 0.000 claims description 6
- 230000000903 blocking Effects 0.000 claims 2
- 230000005484 gravity Effects 0.000 claims 2
- 230000003287 optical Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
Description
上記目的を達成するために、本発明の一側面としての露光装置は、基板を走査露光する露光装置であって、前記露光装置は、複数回の走査露光で露光される複数の部分領域が走査方向と直交する直交方向に一部の繋ぎ領域を互いに重複させて配列される繋ぎ露光を行い、光が照射される前記基板上の照射領域における前記走査方向の前後の境界形状が曲線形状となるように前記境界形状を規定する第１遮光部と、前記繋ぎ領域を形成するために、前記照射領域における前記直交方向の端部の形状を規定するエッジ部を含む第２遮光部と、を含み、１回の走査露光での前記繋ぎ領域における前記直交方向の露光量分布の形状が傾斜した直線になるように、前記第２遮光部の前記エッジ部の形状が曲線形状に構成されている、ことを特徴とする。 To achieve the above object, an exposure apparatus according to one aspect of the present invention is an exposure apparatus that scans and exposes the board, said exposure apparatus, a plurality of partial regions which are exposed by the plurality of scanning exposure perform stitching exposure being arranged perpendicular direction to overlap the joint area of the part perpendicular to the scanning direction, before and after the boundary shape of the scanning direction in the irradiation region on the substrate where the light is irradiated and curved shape a first light-shielding portion defining the boundary shape such that, in order to form the joint region, and a second light-shielding portion including the edge portion defining the shape of the end portion of the perpendicular direction in the irradiation region, the wherein, as the shape of the exposure amount distribution of the orthogonal direction in the joint region in one scanning exposure is a straight line which is inclined, the shape of the edge portion of the second light-shielding portion is formed in a curved shape It is characterized by that.
Claims (15)
前記露光装置は、複数回の走査露光で露光される複数の部分領域が走査方向と直交する直交方向に一部の繋ぎ領域を互いに重複させて配列される繋ぎ露光を行い、
光が照射される前記基板上の照射領域における前記走査方向の前後の境界形状が曲線形状となるように前記境界形状を規定する第１遮光部と、
前記繋ぎ領域を形成するために、前記照射領域における前記直交方向の端部の形状を規定するエッジ部を含む第２遮光部と、
を含み、
１回の走査露光での前記繋ぎ領域における前記直交方向の露光量分布の形状が傾斜した直線になるように、前記第２遮光部の前記エッジ部の形状が曲線形状に構成されている、ことを特徴とする露光装置。 An exposure apparatus that scans and exposes a board,
The exposure apparatus performs stitching exposure being multiple sequences by overlap the joint area of the part in a direction orthogonal to the plurality of partial regions to be exposed is orthogonal to the scanning direction in scanning exposure,
A first light-shielding portion that defines the boundary shape so that the boundary shape before and after the scanning direction in the irradiation region on the substrate irradiated with light is a curved shape ;
A second light-shielding portion including an edge portion defining the shape of the end portion in the orthogonal direction in the irradiation region in order to form the connection region;
Including
As the shape of the exposure amount distribution of the orthogonal direction in the joint region in one scanning exposure is a straight line which is inclined, the shape of the edge portion of the second light-shielding portion is formed in a curved shape, it An exposure apparatus characterized by the above.
ｙ＝ｇ（ｘ）＋ｓ（ｘ−ａ）／ｂ
によって表される、ことを特徴とする請求項１又は２に記載の露光装置。 The shape of the edge part of the second light shielding part is g (x), a function representing the boundary shape before and after the scanning direction in the irradiation region, s the width of the irradiation region in the scanning direction , and the shape of the irradiation region. When the distance in the orthogonal direction between the center of gravity and the connecting region is a, the width of the connecting region in the orthogonal direction is b, the orthogonal direction is x, and the scanning direction is y,
y = g (x) + s (x−a) / b
The exposure apparatus according to claim 1, wherein the exposure apparatus is represented by:
ｙ＝ｇ（ｘ）＋ｓ−ｓ（ｘ−ａ）／ｂ
によって表される、ことを特徴とする請求項１又は２に記載の露光装置。 The shape of the edge part of the second light shielding part is g (x), a function representing the boundary shape before and after the scanning direction in the irradiation region, s the width of the irradiation region in the scanning direction , and the shape of the irradiation region. When the distance in the orthogonal direction between the center of gravity and the connecting region is a, the width of the connecting region in the orthogonal direction is b, the orthogonal direction is x, and the scanning direction is y,
y = g (x) + s−s (x−a) / b
The exposure apparatus according to claim 1, wherein the exposure apparatus is represented by:
前記制御部は、前記部分領域の前記直交方向における幅に応じて、前記第２遮光部を前記走査方向に移動させる、ことを特徴とする請求項１乃至４のうちいずれか１項に記載の露光装置。 A control unit for controlling movement of the second light shielding unit;
5. The control unit according to claim 1, wherein the control unit moves the second light shielding unit in the scanning direction according to a width of the partial region in the orthogonal direction. 6. Exposure device.
前記第２遮光部を回転させることによって、前記繋ぎ領域の露光量分布の形状が変わる、ことを特徴とする請求項５に記載の露光装置。 The second light blocking section, rotating capable constructed,
The exposure apparatus according to claim 5 , wherein the shape of the exposure amount distribution in the joint region is changed by rotating the second light shielding unit .
前記第２遮光部の前記エッジ部の形状が円弧形状に構成されている、ことを特徴とする請求項１乃至６のうちいずれか１項に記載の露光装置。 The first light-shielding portion, the front and rear boundary shape of the scanning direction of the irradiation region defines the boundary shape such that an arc shape,
The exposure apparatus according to any one of claims 1 to 6 the shape of the edge portion of the second light-shielding portion is formed in an arc shape, it is characterized.
２つの前記エッジ部のうち一方は、前記照射領域の外側に向かった凸形状を有し、他方は、前記照射領域の内側に向かった凸形状を有する、ことを特徴とする請求項１乃至８のうちいずれか１項に記載の露光装置。 The second light-shielding portion has two edge portions that respectively define the shapes of two end portions in the orthogonal direction in the irradiation region,
The one of the two edge portions has a convex shape that faces the outside of the irradiation region, and the other has a convex shape that faces the inside of the irradiation region. The exposure apparatus according to any one of the above.
前記第２遮光部は、前記投影光学系と前記基板との間に配置されている、ことを特徴とする請求項１乃至１３のうちいずれか1項に記載の露光装置。 The pattern of the original plate further comprises a projection optical system for projecting onto the substrate,
The second light blocking section, the exposure apparatus according to any one of claims 1 to 13, characterized in that is disposed between the substrate and the projection optical system.
前記工程で露光された前記基板を現像する工程と、
を含むことを特徴とする物品の製造方法。 A step of exposing a substrate using an exposure apparatus according to any one of claims 1 to 14,
Developing the substrate exposed in the step;
A method for producing an article comprising:
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013064919A JP6243616B2 (en) | 2013-03-26 | 2013-03-26 | Exposure apparatus and article manufacturing method |
| KR1020140031370A KR101662882B1 (en) | 2013-03-26 | 2014-03-18 | Exposure apparatus, and method of manufacturing article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013064919A JP6243616B2 (en) | 2013-03-26 | 2013-03-26 | Exposure apparatus and article manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014192255A JP2014192255A (en) | 2014-10-06 |
| JP2014192255A5 true JP2014192255A5 (en) | 2016-05-19 |
| JP6243616B2 JP6243616B2 (en) | 2017-12-06 |
Family
ID=51838271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013064919A Active JP6243616B2 (en) | 2013-03-26 | 2013-03-26 | Exposure apparatus and article manufacturing method |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6243616B2 (en) |
| KR (1) | KR101662882B1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017150388A1 (en) * | 2016-02-29 | 2017-09-08 | 株式会社ニコン | Exposure device, flat panel display manufacturing method, device manufacturing method, light blocking device and exposure method |
| CN105511236B (en) * | 2016-02-29 | 2018-01-09 | 深圳市华星光电技术有限公司 | Light conduction device and exposure machine |
| KR102567319B1 (en) | 2016-04-28 | 2023-08-16 | 엘지디스플레이 주식회사 | Apparatus for divisional exposure and method of fabricating liquid crystal display device using thereof |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3316697B2 (en) * | 1992-10-22 | 2002-08-19 | 株式会社ニコン | Projection optical apparatus, laser apparatus, scanning exposure apparatus, scanning exposure method, and device manufacturing method using the method |
| US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| JP3316710B2 (en) * | 1993-12-22 | 2002-08-19 | 株式会社ニコン | Exposure equipment |
| JP3711586B2 (en) * | 1995-06-02 | 2005-11-02 | 株式会社ニコン | Scanning exposure equipment |
| JP4135824B2 (en) * | 1998-03-04 | 2008-08-20 | 学校法人東京電機大学 | Scan projection exposure method and scan projection exposure apparatus |
| JP2000284494A (en) * | 1999-03-31 | 2000-10-13 | Seiko Epson Corp | Exposure device |
| JP2001215718A (en) * | 1999-11-26 | 2001-08-10 | Nikon Corp | Exposure system and exposure method |
| JP2002025897A (en) * | 2000-07-10 | 2002-01-25 | Nikon Corp | Illuminating optical device, aligner provided with the illuminating optical device, and microdevice manufacturing method using the aligner |
| JP2004335864A (en) * | 2003-05-09 | 2004-11-25 | Nikon Corp | Aligner and exposure method |
| KR101006435B1 (en) * | 2003-09-01 | 2011-01-06 | 삼성전자주식회사 | exposure mask and method for manufacturing a panel for a display device using the mask |
| JP4838698B2 (en) * | 2006-12-19 | 2011-12-14 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
| JP5853343B2 (en) * | 2011-07-29 | 2016-02-09 | 株式会社ブイ・テクノロジー | Scan exposure equipment using microlens array |
| JP2013238670A (en) * | 2012-05-11 | 2013-11-28 | Canon Inc | Exposure apparatus, exposure method, method for manufacturing device, and aperture plate |
-
2013
- 2013-03-26 JP JP2013064919A patent/JP6243616B2/en active Active
-
2014
- 2014-03-18 KR KR1020140031370A patent/KR101662882B1/en active IP Right Grant
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