JP2018031873A5

JP2018031873A5 -

Info

Publication number: JP2018031873A5
Application number: JP2016163562A
Authority: JP
Filing date: 2016-08-24
Publication date: 2019-09-12
Anticipated expiration: 2036-08-24

Description

上記課題を解決するために、本発明は、マスクを照明する照明光学系であり、光を整形する開口を有するスリットを含む照明光学系と、照明光学系からの光で照明されたマスクの像を基板に投影する投影光学系を有し、マスクと基板との相対位置を所定方向に変えながら基板を露光する露光装置であって、開口を規定する曲線の曲率は、投影光学系のＮＡに応じて可変であることを特徴とする。 In order to solve the above problems, the present invention is an illumination optical system for light irradiation of the mask, an illumination optical system including a slit having an aperture for shaping the light and, of the mask illuminated with light from the illumination optical system An exposure apparatus having a projection optical system for projecting an image onto a substrate and exposing the substrate while changing the relative position between the mask and the substrate in a predetermined direction, and the curvature of the curve defining the aperture is determined by the NA of the projection optical system It is variable according to

Claims

An illumination optical system for light irradiation of the mask, an illumination optical system including a slit having an aperture for shaping the light,
A projection optical system that projects an image of the mask illuminated with light from the illumination optical system onto a substrate;
An exposure apparatus that exposes the substrate while changing a relative position between the mask and the substrate in a predetermined direction ,
The curvature of the curve defining the pre-Symbol opening, an exposure apparatus which is a variable depending on NA of the projection optical system.

The exposure apparatus according to claim 1, further comprising a changing unit that changes a curvature of a curve that defines the opening.

The exposure apparatus according to claim 2, wherein the changing unit changes a curvature of a curve that defines the opening by applying a force to the slit.

3. The change unit according to claim 2, wherein the changing unit replaces the slit with a second slit having a second curvature different from the first curvature from the first slit having the first curvature. The exposure apparatus described.

The exposure apparatus according to claim 4, wherein a width of the opening of the second slit in the predetermined direction is different from a width of the opening of the first slit in the predetermined direction.

The exposure apparatus according to claim 5 , wherein the changing unit changes a width in the predetermined direction.

The predetermined direction is an exposure apparatus according to any one of claims 1 to 6, characterized in that a better direction perpendicular to the optical axis of the projection optical system.

The exposure apparatus according to claim 1, wherein the curve is an arc.

An illumination optical system for illuminating a mask , comprising: an illumination optical system including a slit having an aperture for shaping light; and a projection optical system for projecting an image of the mask illuminated with light from the illumination optical system onto a substrate Using an exposure method for exposing the substrate ,
Changing the curvature of the curve defining the aperture so as to have a curvature determined based on the NA of the projection optical system;
An exposure method comprising: exposing the substrate with light that has passed through the opening .

Forming a pattern on the substrate using the exposure apparatus according to any one of claims 1 to 8 ,
And a step of processing the substrate on which the pattern has been formed in the step.