JP2010204588A5 - - Google Patents
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- JP2010204588A5 JP2010204588A5 JP2009052773A JP2009052773A JP2010204588A5 JP 2010204588 A5 JP2010204588 A5 JP 2010204588A5 JP 2009052773 A JP2009052773 A JP 2009052773A JP 2009052773 A JP2009052773 A JP 2009052773A JP 2010204588 A5 JP2010204588 A5 JP 2010204588A5
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本発明の第１の態様に従えば、円筒面を有し、感光性の基板を前記円筒面に沿って保持した状態で前記円筒面の軸線の方向に沿って移動する移動機構と、
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動するステージ機構と、
前記ステージ機構に保持された前記マスク上に照明領域を形成する照明光学系と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って楕円弧状に延びる結像領域に形成する投影光学系とを備え、
前記軸線を斜めに交差する面と前記円筒面との交線の一部が前記楕円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記円筒面の軸線とを所定角度で傾けて配置することを特徴とする露光装置が提供される。
According to the first aspect of the present invention, the moving mechanism has a cylindrical surface and moves along the axial direction of the cylindrical surface while holding the photosensitive substrate along the cylindrical surface;
A stage mechanism that holds a planar mask having a pattern and moves in a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
An illumination optical system that forms an illumination area on the mask held by the stage mechanism;
A projection optical system for forming a projection image of the pattern in the illumination area in an imaging area extending in an elliptical arc along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the cylindrical plane are set to be predetermined so that a part of the intersection line between the plane obliquely intersecting the axis and the cylindrical plane substantially coincides with the imaging region extending in the elliptical arc shape. There is provided an exposure apparatus characterized by being disposed at an angle .
本発明の第２の態様に従えば、楕円筒面を有し、感光性の基板を前記楕円筒面に沿って保持した状態で前記楕円筒面の軸線の方向に沿って移動する移動機構と、
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動するステージ機構と、
前記ステージ機構に保持された前記マスク上に照明領域を形成する照明光学系と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って円弧状に延びる結像領域に形成する投影光学系とを備え、
前記軸線を斜めに交差する面と前記楕円筒面との交線の一部が前記円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記楕円筒面の軸線とを所定角度で傾けて配置することを特徴とする露光装置が提供される。
According to the second aspect of the present invention, the moving mechanism has an elliptic cylinder surface and moves along the direction of the axis of the elliptic cylinder surface while holding a photosensitive substrate along the elliptic cylinder surface; ,
A stage mechanism that holds a planar mask having a pattern and moves in a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
An illumination optical system that forms an illumination area on the mask held by the stage mechanism;
A projection optical system for forming a projection image of the pattern in the illumination area in an imaging area extending in an arc shape along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the elliptic cylinder surface are arranged so that a part of the intersection line between the plane obliquely intersecting the axis and the elliptic cylinder plane substantially coincides with the imaging region extending in the arc shape. An exposure apparatus is provided that is arranged to be inclined at a predetermined angle .
本発明の第３の態様に従えば、感光性の基板を円筒面に沿って保持した状態で前記円筒面の軸線の方向に沿って移動させる工程と、
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動させる工程と、
前記マスク上に照明領域を形成する工程と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って楕円弧状に延びる結像領域に形成する工程と、
前記軸線を斜めに交差する面と前記円筒面との交線の一部が前記楕円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記円筒面の軸線とを所定角度で傾けて配置する工程と、を含むことを特徴とする露光方法が提供される。
According to the third aspect of the present invention, the step of moving the photosensitive substrate along the cylindrical surface while holding the photosensitive substrate along the cylindrical surface;
Holding a planar mask having a pattern and moving the substrate along a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
Forming an illumination area on the mask;
Forming a projection image of the pattern in the illumination area in an imaging area extending in an elliptical arc along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the cylindrical plane are set to be predetermined so that a part of the intersection line between the plane obliquely intersecting the axis and the cylindrical plane substantially coincides with the imaging region extending in the elliptical arc shape. And an exposure method characterized in that it includes a step of inclining and arranging at an angle .
本発明の第４の態様に従えば、感光性の基板を楕円筒面に沿って保持した状態で前記楕円筒面の軸線の方向に沿って移動させる工程と、
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動させる工程と、
前記マスク上に照明領域を形成する工程と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って円弧状に延びる結像領域に形成する工程と、
前記軸線を斜めに交差する面と前記楕円筒面との交線の一部が前記円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記楕円筒面の軸線とを所定角度で傾けて配置する工程と、を含むことを特徴とする露光方法が提供される。
According to the fourth aspect of the present invention, the photosensitive substrate is moved along the direction of the axis of the elliptic cylinder surface while being held along the elliptic cylinder surface;
Holding a planar mask having a pattern and moving the substrate along a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
Forming an illumination area on the mask;
Forming a projected image of the pattern in the illumination region in an imaging region extending in an arc along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the elliptic cylinder surface are arranged so that a part of the intersection line between the plane obliquely intersecting the axis and the elliptic cylinder plane substantially coincides with the imaging region extending in the arc shape. And inclining the substrate at a predetermined angle to provide an exposure method.
Claims (4)
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動するステージ機構と、
前記ステージ機構に保持された前記マスク上に照明領域を形成する照明光学系と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って楕円弧状に延びる結像領域に形成する投影光学系とを備え、
前記軸線を斜めに交差する面と前記円筒面との交線の一部が前記楕円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記円筒面の軸線とを所定角度で傾けて配置することを特徴とする露光装置。
A moving mechanism that has a cylindrical surface and moves along the direction of the axis of the cylindrical surface while holding the photosensitive substrate along the cylindrical surface;
A stage mechanism that holds a planar mask having a pattern and moves in a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
An illumination optical system that forms an illumination area on the mask held by the stage mechanism;
A projection optical system for forming a projection image of the pattern in the illumination area in an imaging area extending in an elliptical arc along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the cylindrical plane are set to be predetermined so that a part of the intersection line between the plane obliquely intersecting the axis and the cylindrical plane substantially coincides with the imaging region extending in the elliptical arc shape. An exposure apparatus characterized by being arranged at an angle .
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動するステージ機構と、
前記ステージ機構に保持された前記マスク上に照明領域を形成する照明光学系と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って円弧状に延びる結像領域に形成する投影光学系とを備え、
前記軸線を斜めに交差する面と前記楕円筒面との交線の一部が前記円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記楕円筒面の軸線とを所定角度で傾けて配置することを特徴とする露光装置。
A moving mechanism that has an elliptic cylinder surface and moves along the direction of the axis of the elliptic cylinder surface in a state where the photosensitive substrate is held along the elliptic cylinder surface;
A stage mechanism that holds a planar mask having a pattern and moves in a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
An illumination optical system that forms an illumination area on the mask held by the stage mechanism;
A projection optical system for forming a projection image of the pattern in the illumination area in an imaging area extending in an arc shape along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the elliptic cylinder surface are arranged so that a part of the intersection line between the plane obliquely intersecting the axis and the elliptic cylinder plane substantially coincides with the imaging region extending in the arc shape. An exposure apparatus characterized by being disposed at a predetermined angle .
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動させる工程と、
前記マスク上に照明領域を形成する工程と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って楕円弧状に延びる結像領域に形成する工程と、
前記軸線を斜めに交差する面と前記円筒面との交線の一部が前記楕円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記円筒面の軸線とを所定角度で傾けて配置する工程と、を含むことを特徴とする露光方法。
Moving along the direction of the axis of the cylindrical surface while holding the photosensitive substrate along the cylindrical surface;
Holding a planar mask having a pattern and moving the substrate along a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
Forming an illumination area on the mask;
Forming a projection image of the pattern in the illumination area in an imaging area extending in an elliptical arc along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the cylindrical plane are set to be predetermined so that a part of the intersection line between the plane obliquely intersecting the axis and the cylindrical plane substantially coincides with the imaging region extending in the elliptical arc shape. An exposure method comprising the steps of: inclining and arranging at an angle .
パターンを有する平面状のマスクを保持し、前記基板の前記軸線の方向への移動に同期して、前記軸線の方向に対応する走査方向に沿って移動させる工程と、
前記マスク上に照明領域を形成する工程と、
前記照明領域内のパターンの投影像を、前記マスクのパターン面と光学的に共役な共役面に沿って円弧状に延びる結像領域に形成する工程と、
前記軸線を斜めに交差する面と前記楕円筒面との交線の一部が前記円弧状に延びる結像領域とほぼ一致するように、前記パターン面の共役面と前記楕円筒面の軸線とを所定角度で傾けて配置する工程と、を含むことを特徴とする露光方法。
Moving along the direction of the axis of the elliptical cylinder surface in a state where the photosensitive substrate is held along the elliptical cylinder surface;
Holding a planar mask having a pattern and moving the substrate along a scanning direction corresponding to the direction of the axis in synchronization with the movement of the substrate in the direction of the axis;
Forming an illumination area on the mask;
Forming a projected image of the pattern in the illumination region in an imaging region extending in an arc along a conjugate plane optically conjugate with the pattern surface of the mask ;
The conjugate plane of the pattern plane and the axis of the elliptic cylinder surface are arranged so that a part of the intersection line between the plane obliquely intersecting the axis and the elliptic cylinder plane substantially coincides with the imaging region extending in the arc shape. And inclining and arranging at a predetermined angle . An exposure method comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009052773A JP5282895B2 (en) | 2009-03-06 | 2009-03-06 | Exposure apparatus, exposure method, and device manufacturing method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009052773A JP5282895B2 (en) | 2009-03-06 | 2009-03-06 | Exposure apparatus, exposure method, and device manufacturing method |
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| Publication Number | Publication Date |
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| JP2010204588A JP2010204588A (en) | 2010-09-16 |
| JP2010204588A5 true JP2010204588A5 (en) | 2012-08-16 |
| JP5282895B2 JP5282895B2 (en) | 2013-09-04 |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101914895B1 (en) * | 2012-07-13 | 2018-11-02 | 가부시키가이샤 니콘 | Exposing apparatus and exposing method |
| JP6160620B2 (en) * | 2012-08-06 | 2017-07-12 | 株式会社ニコン | Processing apparatus and device manufacturing method |
| JP6069941B2 (en) * | 2012-08-08 | 2017-02-01 | 株式会社ニコン | Projection exposure apparatus and device manufacturing method |
| JP6256338B2 (en) * | 2012-09-14 | 2018-01-10 | 株式会社ニコン | Substrate processing apparatus and device manufacturing method |
| WO2014073535A1 (en) * | 2012-11-06 | 2014-05-15 | 株式会社ニコン | Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method |
| CN108710263B (en) * | 2013-04-18 | 2021-01-26 | 株式会社尼康 | Scanning exposure device |
| KR20160073415A (en) * | 2013-10-22 | 2016-06-24 | 어플라이드 머티어리얼스, 인코포레이티드 | Roll to roll mask-less lithography with active alignment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001313241A (en) * | 2000-04-28 | 2001-11-09 | Canon Inc | Aligner and aligning method |
| JP3652329B2 (en) * | 2002-06-28 | 2005-05-25 | キヤノン株式会社 | Scanning exposure apparatus, scanning exposure method, device manufacturing method, and device |
| JP2006098719A (en) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | Exposure apparatus |
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