JP2015148746A - Polarizer, polarization light irradiation device, and polarization axis direction adjustment method - Google Patents

Polarizer, polarization light irradiation device, and polarization axis direction adjustment method Download PDF

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JP2015148746A
JP2015148746A JP2014022098A JP2014022098A JP2015148746A JP 2015148746 A JP2015148746 A JP 2015148746A JP 2014022098 A JP2014022098 A JP 2014022098A JP 2014022098 A JP2014022098 A JP 2014022098A JP 2015148746 A JP2015148746 A JP 2015148746A
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polarizer
light
wire grid
substrate
polarization axis
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JP6312454B2 (en
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和重 橋本
Kazushige Hashimoto
和重 橋本
敏成 新井
Toshinari Arai
敏成 新井
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V Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a polarization light irradiation device comprising a single polarizer or a plurality of polarizers in parallel arrangement, where a polarization axis direction of the polarizer(s) can be adjusted with high accuracy.SOLUTION: A polarizer comprises: a substrate 10 having a wire grid G formed on a surface thereof; and a light-shielding part 11 (11A) that is formed on the substrate 10 and blocks the light passing through the substrate 10. A border line L between a light transmitting area 12A through which light passes and the light-shielding part 11 (11A) is formed linearly in a direction set with respect to the extension direction of the wire grid G.

Description

本発明は、偏光子、偏光子を用いた偏光光照射装置、偏光光照射装置の偏光軸方向調整方法に関するものである。   The present invention relates to a polarizer, a polarized light irradiation apparatus using the polarizer, and a polarization axis direction adjusting method of the polarized light irradiation apparatus.

偏光していない光から直線偏光を得る偏光子として、ワイヤーグリッド偏光子が知られている。ワイヤーグリッド偏光子は、光透過性の基板上に電気導体の直線状細線を微細線巾・微細間隔で平行に配列形成したものである。その製造方法は、例えば、リフトオフ法で直線状細線を形成することが知られており、リフトオフ法によって直線状細線の形成を行う際のレジストに対するパターン形成を電子線リソグラフィ又はＸ線リソグラフィを用いて行うことが知られている（例えば、特許文献１参照）。   A wire grid polarizer is known as a polarizer that obtains linearly polarized light from unpolarized light. The wire grid polarizer is formed by arranging linear thin wires of an electric conductor in parallel with a fine line width and a fine interval on a light-transmitting substrate. The manufacturing method is known to form, for example, a linear thin line by a lift-off method, and pattern formation for a resist when forming a linear thin line by a lift-off method is performed using electron beam lithography or X-ray lithography. It is known to perform (for example, refer patent document 1).

偏光子を通った直線偏光を被照射面に照射する偏光光照射装置は、例えば、液晶パネル用配向膜を基板上に形成する光配向処理に用いられる。このような偏光光照射装置は、棒状ランプと反射鏡を備える光照射部と、ワイヤーグリッド偏光子を複数個並列配置した偏光子ユニットを備えており、ワークステージ上に設置した処理対象基板の幅方向に沿ってワイヤーグリッド偏光子を並べた光照射部を配置し、処理対象基板の幅方向と直交する方向にワークステージを移動させて処理対象基板上を直線偏光で走査露光するものである（下記特許文献２参照）。   A polarized light irradiation apparatus that irradiates a surface to be irradiated with linearly polarized light that has passed through a polarizer is used, for example, for optical alignment processing in which an alignment film for a liquid crystal panel is formed on a substrate. Such a polarized light irradiation apparatus includes a light irradiation unit including a rod-shaped lamp and a reflecting mirror, and a polarizer unit in which a plurality of wire grid polarizers are arranged in parallel, and the width of a processing target substrate installed on a work stage. A light irradiation unit in which wire grid polarizers are arranged along the direction is arranged, and the work stage is moved in a direction orthogonal to the width direction of the processing target substrate to scan and expose the processing target substrate with linearly polarized light ( See Patent Document 2 below).

特開平１０−１５３７０６号公報JP-A-10-153706 特開２００９−２６５２９０号公報JP 2009-265290 A

前述した偏光光照射装置では、複数個並列配置されるワイヤーグリッド偏光子の偏光軸方向を設定された方向に合わせることが必要になる。このため、従来は、個々の偏光子の偏光軸方向を個別に基準方向に合わせる調整が行われており、その調整方法としては、偏光軸の方向が既知の測定用偏光子（検光子）と、調整対象偏光子を通過し更に測定用偏光子を通過した光を受光する測定用照度センサを用い、測定用偏光子に対する調整対象偏光子の方向を角度調整しながら測定用照度センサの出力をモニタし、測定用照度センサの出力がピークとなるように調整対象偏光子の方向を調整している。   In the polarized light irradiation apparatus described above, it is necessary to match the polarization axis direction of a plurality of wire grid polarizers arranged in parallel with the set direction. For this reason, conventionally, adjustments have been made to individually adjust the polarization axis directions of the individual polarizers to the reference direction. As an adjustment method thereof, a measurement polarizer (analyzer) having a known polarization axis direction can be used. Using the measurement illuminance sensor that receives light that has passed through the adjustment polarizer and further passed through the measurement polarizer, the output of the measurement illuminance sensor is adjusted while adjusting the angle of the adjustment polarizer with respect to the measurement polarizer. The direction of the polarizer to be adjusted is adjusted so that the output of the illuminance sensor for measurement reaches a peak.

このような従来の調整方法によると、測定用照度センサの出力のピーク付近では、調整対象偏光子の微細な角度調整に対して測定用照度センサの出力に大きな違いが出てこない。このため、従来の偏光軸方向調整方法では、０．１ｄｅｇ単位での調整が要求されるような精度の高い調整を行うことが困難な問題があった。   According to such a conventional adjustment method, in the vicinity of the output peak of the measurement illuminance sensor, there is no significant difference in the output of the measurement illuminance sensor with respect to the fine angle adjustment of the adjustment target polarizer. For this reason, in the conventional polarization axis direction adjustment method, there is a problem that it is difficult to perform high-precision adjustment that requires adjustment in units of 0.1 deg.

本発明は、このような問題に対処することを課題の一例とするものである。すなわち、偏光子単体或いは偏光子を複数個並列配置した偏光光照射装置において、偏光子の偏光軸方向の調整を高い精度で行うことができること、等が本発明の目的である。   This invention makes it an example of a subject to cope with such a problem. That is, an object of the present invention is that, in a polarized light irradiation apparatus in which a single polarizer or a plurality of polarizers are arranged in parallel, the polarization axis direction of the polarizer can be adjusted with high accuracy.

このような目的を達成するために、本発明は、明細書に記載された幾つかの発明のうち以下の構成を具備するものである。   In order to achieve such an object, the present invention includes the following configurations among several inventions described in the specification.

偏光子、或いは偏光子を複数個並列配置した偏光子ユニットを備え、光源から出射して偏光子を透過した光を被照射面に照射する偏光光照射装置において、当該偏光子が、表面にワイヤーグリッドを形成した基板と、前記基板上に形成され前記基板を透過する光を遮光する遮光部とを備え、光が透過する光透過領域と前記遮光部との境界線が前記ワイヤーグリッドの延設方向に対して設定された方向で直線状に形成されていることを特徴とする。   In a polarized light irradiation apparatus that includes a polarizer or a polarizer unit in which a plurality of polarizers are arranged in parallel, and irradiates the irradiated surface with light emitted from a light source and transmitted through the polarizer, the polarizer is wired on the surface. A substrate on which a grid is formed; and a light shielding portion that is formed on the substrate and shields light that passes through the substrate; and a boundary line between the light transmitting region that transmits light and the light shielding portion extends from the wire grid. It is formed linearly in a direction set with respect to the direction.

このような特徴を有する本発明の偏光子或いは偏光子を複数個並列配置した偏光子ユニットを備えた偏光光照射装置は、光が透過する光透過領域と遮光部との境界線をカメラ画像で撮像することで、偏光子の偏光軸を基準方向に合わせることができる。これによって、偏光子の偏光軸方向を高い精度で調整することが可能になる。   The polarized light irradiation apparatus having the polarizer of the present invention having the above-described features or a polarizer unit in which a plurality of polarizers are arranged in parallel is provided with a camera image indicating a boundary line between a light transmission region through which light is transmitted and a light shielding portion. By imaging, the polarization axis of the polarizer can be aligned with the reference direction. This makes it possible to adjust the polarization axis direction of the polarizer with high accuracy.

本発明の一実施形態に係る偏光子を示した説明図である（（ａ）が全体平面図、（ｂ）がＳ部拡大図、（ｃ）がＴ部拡大図、（ｄ）がＵ部を撮像した撮像画面を示している）。It is explanatory drawing which showed the polarizer which concerns on one Embodiment of this invention ((a) is a whole top view, (b) is a S section enlarged view, (c) is a T section enlarged view, (d) is a U section.) Shows an imaging screen in which is captured). 本発明の一実施形態に係る偏光子を示した説明図である（（ａ）が全体平面図、（ｂ）がＳ部拡大図、（ｃ）がＴ部拡大図、（ｄ）がＵ部を撮像した撮像画面を示している）。It is explanatory drawing which showed the polarizer which concerns on one Embodiment of this invention ((a) is a whole top view, (b) is a S section enlarged view, (c) is a T section enlarged view, (d) is a U section.) Shows an imaging screen in which is captured). 本発明の一実施形態に係る偏光子を示した説明図である（（ａ）が全体平面図、（ｂ）がＳ部拡大図、（ｃ）がＴ部拡大図、（ｄ）がＵ部を撮像した撮像画面を示している）。It is explanatory drawing which showed the polarizer which concerns on one Embodiment of this invention ((a) is a whole top view, (b) is a S section enlarged view, (c) is a T section enlarged view, (d) is a U section.) Shows an imaging screen in which is captured). 本発明の実施形態に係る偏光子を用いた偏光光照射装置を示した説明図（（ａ）が平面図、（ｂ）が正面図）である。It is explanatory drawing ((a) is a top view, (b) is a front view) which showed the polarized light irradiation apparatus using the polarizer which concerns on embodiment of this invention. 図４に示した偏光光照射装置の偏光軸調整方法を示す説明図である。It is explanatory drawing which shows the polarization axis adjustment method of the polarized light irradiation apparatus shown in FIG. 本発明の実施形態に係る偏光光照射装置における偏光板の偏光軸方向調整方法の他の例を示した説明図である（（ａ）が第１工程、（ｂ）が第２工程、（ｃ）が第３工程を示している。）。It is explanatory drawing which showed the other example of the polarizing-axis direction adjustment method of the polarizing plate in the polarized light irradiation apparatus which concerns on embodiment of this invention ((a) is a 1st process, (b) is a 2nd process, (c) ) Shows the third step.)

以下、図面を参照して本発明の実施形態を説明する。図１，図２，図３は本発明の一実施形態に係る偏光子を示した説明図である（（ａ）が全体平面図、（ｂ）がＳ部拡大図、（ｃ）がＴ部拡大図、（ｄ）がＵ部を撮像した撮像画面を示している）。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. 1, 2, and 3 are explanatory views showing a polarizer according to an embodiment of the present invention ((a) is an overall plan view, (b) is an enlarged view of an S portion, and (c) is a T portion). Enlarged view, (d) shows an imaging screen that images the U portion).

偏光子１（１Ａ，１Ｂ，１Ｃ）は、基板１０の表面にワイヤーグリッドＧが形成されている。ワイヤーグリッドＧは、長さが幅よりもはるかに長い複数の直線状電気導体を等間隔で平行に配置したものであり、例えば、クロム、アルミニウム、酸化チタンなどで形成することができる。ここでは、直線状電気導体の長手方向をワイヤーグリッドＧの延設方向とする。   In the polarizer 1 (1A, 1B, 1C), a wire grid G is formed on the surface of the substrate 10. The wire grid G is formed by arranging a plurality of linear electric conductors whose length is much longer than the width in parallel at equal intervals, and can be formed of, for example, chromium, aluminum, titanium oxide, or the like. Here, the longitudinal direction of the linear electric conductor is defined as the extending direction of the wire grid G.

ワイヤーグリッドＧはその延設方向に平行な偏光成分の大部分を反射し、その延設方向に直交する偏光成分を通過させる。したがって、ワイヤーグリッドＧを通過した光は、ワイヤーグリッドＧの延設方向に直交する方向の偏光軸を有する偏光光となる。すなわち、偏光子１（１Ａ，１Ｂ，１Ｃ）の偏光軸Ｐは、ワイヤーグリッドＧの延設方向と直交する方向となる。ここで、ワイヤーグリッドＧの間隔は、その間隔を狭くすると偏光する光の波長が短くなる。   The wire grid G reflects most of the polarization component parallel to the extending direction and allows the polarization component orthogonal to the extending direction to pass therethrough. Therefore, the light that has passed through the wire grid G becomes polarized light having a polarization axis in a direction orthogonal to the extending direction of the wire grid G. That is, the polarization axis P of the polarizer 1 (1A, 1B, 1C) is a direction orthogonal to the extending direction of the wire grid G. Here, the interval between the wire grids G decreases the wavelength of polarized light when the interval is narrowed.

基板１０には、基板１０を透過する光を遮光する遮光部１１（１１Ａ，１１Ｂ，１１Ｃ）が形成されている。図１に示した例では、遮光部１１（１１Ａ）は、基板１０の角部に矩形状に形成されている。この例では、遮光部１１（１１Ａ）を除く基板１０の全体がワイヤーグリッド形成領域Ｇａになっており、このワイヤーグリッド形成領域Ｇａは光が透過する光透過領域１２Ａになっている。   The substrate 10 is formed with a light shielding portion 11 (11A, 11B, 11C) that shields light transmitted through the substrate 10. In the example shown in FIG. 1, the light shielding portion 11 (11 </ b> A) is formed in a rectangular shape at the corner portion of the substrate 10. In this example, the entire substrate 10 excluding the light shielding portion 11 (11A) is a wire grid formation region Ga, and the wire grid formation region Ga is a light transmission region 12A through which light is transmitted.

図２に示した例では、遮光部１１（１１Ｂ）は、基板１０の周縁部にて額縁状に形成されている。この例では、遮光部１１（１１Ｂ）の内側がワイヤーグリッド形成領域Ｇａになっており、このワイヤーグリッド形成領域Ｇａは光が透過する光透過領域１２Ｂになっている。   In the example shown in FIG. 2, the light shielding portion 11 (11 </ b> B) is formed in a frame shape at the peripheral portion of the substrate 10. In this example, the inner side of the light shielding portion 11 (11B) is a wire grid formation region Ga, and the wire grid formation region Ga is a light transmission region 12B through which light is transmitted.

図３に示した例では、遮光部１１（１１Ｃ）は、図２に示した例と同様に、基板１０の周縁部にて額縁状に形成されている。この例では、遮光部１１（１１Ｃ）の内側がワイヤーグリッド形成領域Ｇａになっており、このワイヤーグリッド形成領域Ｇａは光が透過する光透過領域１２Ｃになっている。また、遮光部１１（１１Ｃ）の一部に光透過領域１２Ｃ’が形成されている。   In the example illustrated in FIG. 3, the light shielding portion 11 (11 </ b> C) is formed in a frame shape at the peripheral edge of the substrate 10, as in the example illustrated in FIG. 2. In this example, the inner side of the light shielding portion 11 (11C) is a wire grid formation region Ga, and the wire grid formation region Ga is a light transmission region 12C through which light is transmitted. Further, a light transmission region 12C ′ is formed in a part of the light shielding portion 11 (11C).

ここで、遮光部１１（１１Ａ，１１Ｂ，１１Ｃ）と光透過領域１２Ａ，１２Ｂ，１２Ｃ’との境界線ＬがワイヤーグリッドＧの延設方向に対して設定された方向で直線状に形成されており、遮光部１１（１１Ａ，１１Ｂ，１１Ｃ）がアライメントマークとして機能している。ここでいう、設定された方向とは、ワイヤーグリッドＧの延設方向と同方向であってもよいし、ワイヤーグリッドＧの延設方向に対して直交或いは設定された角度で交差する方向であってもよい。図１〜図３に示した例は、いずれも境界線ＬがワイヤーグリッドＧの延設方向と同方向に形成されており、境界線Ｌの方向は偏光子１（１Ａ〜１Ｃ）における偏光軸Ｐの方向と直交する方向に形成されている。   Here, the boundary line L between the light shielding part 11 (11A, 11B, 11C) and the light transmission regions 12A, 12B, 12C ′ is formed in a straight line in a direction set with respect to the extending direction of the wire grid G. Therefore, the light shielding portion 11 (11A, 11B, 11C) functions as an alignment mark. Here, the set direction may be the same direction as the extending direction of the wire grid G, or a direction orthogonal to the extending direction of the wire grid G or intersecting at a set angle. May be. In each of the examples shown in FIGS. 1 to 3, the boundary line L is formed in the same direction as the extending direction of the wire grid G, and the direction of the boundary line L is the polarization axis of the polarizer 1 (1A to 1C). It is formed in a direction orthogonal to the direction of P.

図１に示した例では、矩形状の遮光部１１（１１Ａ）の一辺が前述した境界線Ｌになっており、この境界線Ｌが偏光軸Ｐの方向と直交する方向（すなわち、ワイヤーグリッドＧの延設方向と同方向）に形成されている。図２に示した例では、額縁状の遮光部１１（１１Ｂ）の内縁が前述した境界線Ｌになっており、この境界線Ｌが偏光軸Ｐの方向と直交する方向（すなわち、ワイヤーグリッドＧの延設方向と同方向）に形成されている。図３に示した例では、遮光部１１（１１Ｃ）の一部に矩形状に形成された光透過領域１２Ｃ’の一辺が前述した境界線Ｌになっており、この境界線Ｌが偏光軸Ｐの方向と直交する方向（すなわち、ワイヤーグリッドＧの延設方向と同方向）に形成されている。   In the example shown in FIG. 1, one side of the rectangular light shielding portion 11 (11A) is the boundary line L described above, and the boundary line L is perpendicular to the direction of the polarization axis P (that is, the wire grid G). Are formed in the same direction as the extending direction). In the example shown in FIG. 2, the inner edge of the frame-shaped light-shielding portion 11 (11B) is the boundary line L described above, and the boundary line L is perpendicular to the direction of the polarization axis P (that is, the wire grid G Are formed in the same direction as the extending direction). In the example shown in FIG. 3, one side of the light transmission region 12C ′ formed in a rectangular shape in a part of the light shielding portion 11 (11C) is the boundary line L described above, and this boundary line L is the polarization axis P. It is formed in a direction orthogonal to the direction of (i.e., the same direction as the extending direction of the wire grid G).

ここで、ワイヤーグリッドＧの延設方向と前述した境界線Ｌの方向は、同一のパターン形成工程によって、高い精度で方向を関連付けることができる。一例を挙げると、ワイヤーグリッドＧはリフトオフ法で形成することができるが、その際のレジストにワイヤーグリッドＧのパターンを描画する工程で、それと同時に遮光部１１（１１Ａ，１１Ｂ，１１Ｃ）における境界線Ｌの描画を実行する。その際の描画にはＸ線リソグラフィーや電子線リソグラフィーが用いられる。このように、ワイヤーグリッドＧの延設方向との関係が設定された遮光部１１（１１Ａ，１１Ｂ，１１Ｃ）の境界線Ｌを形成することで、ワイヤーグリッドＧ自体を光学的に撮像することはできないが、この境界線Ｌを光学的に撮像して偏光軸Ｐの調整を行うことが可能になる。   Here, the extending direction of the wire grid G and the direction of the boundary line L described above can be associated with each other with high accuracy by the same pattern forming process. For example, the wire grid G can be formed by a lift-off method, but at the same time, a boundary line in the light shielding portion 11 (11A, 11B, 11C) is drawn in the process of drawing the pattern of the wire grid G on the resist. L drawing is executed. X-ray lithography or electron beam lithography is used for drawing at that time. Thus, by forming the boundary line L of the light shielding part 11 (11A, 11B, 11C) in which the relationship with the extending direction of the wire grid G is set, it is possible to optically image the wire grid G itself. However, it is possible to adjust the polarization axis P by optically imaging the boundary line L.

図１〜図３の（ｄ）は、遮光部１１（１１Ａ，１１Ｂ，１１Ｃ）の境界線Ｌを含むＵ部を撮像した撮像画面を示している。図示のように画面内に基準線Ｌ１を有する撮像画面を用いることで、この基準線Ｌ１と境界線Ｌの方向を合わせるように偏光子１（１Ａ，１Ｂ，１Ｃ）の偏光軸方向を調整することで、簡易且つ精度の高い偏光軸方向の調整が可能になる。   (D) of FIGS. 1-3 has shown the imaging screen which imaged U part containing the boundary line L of the light-shielding part 11 (11A, 11B, 11C). By using an imaging screen having a reference line L1 in the screen as shown, the polarization axis direction of the polarizer 1 (1A, 1B, 1C) is adjusted so that the directions of the reference line L1 and the boundary line L are aligned. Thus, the polarization axis direction can be adjusted easily and with high accuracy.

図４は、前述した偏光子を用いた偏光光照射装置を示した説明図（（ａ）が平面図、（ｂ）が正面図）である。偏光光照射装置１００は、前述した偏光子１（１Ａ，１Ｂ，１Ｃ）を複数個並列配置した偏光子ユニット１Ｕを備えており、光源２から出射して偏光子１を透過した光（直線偏光）を被照射基板３の被照射面３ａに照射するものである。光源２と偏光子１との間には、必要に応じて特定波長透過フィルター４を設けることができる。   FIG. 4 is an explanatory diagram (a is a plan view and b is a front view) showing a polarized light irradiation apparatus using the above-described polarizer. The polarized light irradiation device 100 includes a polarizer unit 1U in which a plurality of the above-described polarizers 1 (1A, 1B, 1C) are arranged in parallel. Light that is emitted from the light source 2 and transmitted through the polarizer 1 (linearly polarized light) ) To the irradiated surface 3a of the irradiated substrate 3. A specific wavelength transmission filter 4 can be provided between the light source 2 and the polarizer 1 as necessary.

被照射基板３が、液晶パネルの配向膜形成基板である場合には、被照射面３ａは感光性の配向材料が塗布された面になる。この被照射面３ａの全面に特定方向の偏光軸を有する偏光光を照射することで光配向処理が施される。この際、偏光子１及び光源２は被照射基板３の幅方向（図示Ｘ方向）に沿って配列されており、光源２から出射して偏光子１を透過した偏光光を被照射面３ａに照射しながら、偏光子１及び光源２に対して被照射基板３をその延設方向（図示Ｙ方向）に沿って移動させ、被照射面３ａを走査露光する。   When the irradiated substrate 3 is an alignment film forming substrate of a liquid crystal panel, the irradiated surface 3a is a surface coated with a photosensitive alignment material. A photo-alignment process is performed by irradiating the entire irradiated surface 3a with polarized light having a polarization axis in a specific direction. At this time, the polarizer 1 and the light source 2 are arranged along the width direction (X direction in the drawing) of the substrate 3 to be irradiated, and the polarized light emitted from the light source 2 and transmitted through the polarizer 1 is applied to the surface 3a to be irradiated. While irradiating, the irradiated substrate 3 is moved along the extending direction (Y direction in the drawing) with respect to the polarizer 1 and the light source 2, and the irradiated surface 3a is scanned and exposed.

このような偏光光照射装置１００は、照射する偏光光の偏光軸を走査方向（図示Ｙ方向）に対して高い精度で調整することが必要になる。図５は、その調整方法を示す説明図である。この調整にはカメラＥを使用する。カメラＥは、図１〜図３の（ｄ）に示すように、基準線Ｌ１を有する撮像画面を得ることができるものであって、この基準線Ｌ１の方向（基準方向）が変わらないように、偏光子１の並列方向（図示Ｘ方向）に沿って移動自在に配備されている。   Such a polarized light irradiation apparatus 100 needs to adjust the polarization axis of the polarized light to be irradiated with high accuracy with respect to the scanning direction (Y direction in the drawing). FIG. 5 is an explanatory diagram showing the adjustment method. Camera E is used for this adjustment. The camera E can obtain an imaging screen having a reference line L1 as shown in FIG. 1 to FIG. 3D, and the direction of the reference line L1 (reference direction) does not change. The polarizer 1 is arranged so as to be movable along the parallel direction (X direction in the drawing) of the polarizer 1.

偏光光照射装置１００における偏光軸の調整方法は、カメラＥによって撮像される境界線Ｌの撮像画像を基準方向（基準線Ｌ１）に合わせるように個々の偏光子１を光軸周りに回転調整する。以下に、偏光子１の偏光軸Ｐの方向を全て走査方向（Ｙ方向）に合わせる例を説明する。ここでは、各偏光子１における境界線Ｌは偏光軸Ｐの方向に直交する方向（ワイヤーグリッドＧの延設方向と同方向）に形成されていることが既知である。   In the polarized light irradiation apparatus 100, the polarization axis is adjusted by rotating and adjusting the individual polarizers 1 around the optical axis so that the captured image of the boundary line L captured by the camera E matches the reference direction (reference line L1). . Hereinafter, an example in which the directions of the polarization axes P of the polarizer 1 are all aligned with the scanning direction (Y direction) will be described. Here, it is known that the boundary line L in each polarizer 1 is formed in a direction orthogonal to the direction of the polarization axis P (the same direction as the extending direction of the wire grid G).

カメラＥの撮像画面における基準線Ｌ１の方向を走査方向（Ｙ方向）と直交する方向（Ｘ方向）に合わせておき、このカメラＥを偏光子１の並列方向（Ｘ方向）に沿って移動自在に配備する。そして、１つの偏光子１（１−１）の境界線Ｌを撮像して、その方向を基準線Ｌ１の方向に合わせるように偏光子１（１−１）の方向を回転調整し、その調整が終わると、基準線Ｌ１の方向を一定にしたままカメラＥをＸ方向に沿って移動させ、次の偏光子１（１−２）の境界線Ｌを撮像して、その方向を基準線Ｌ１の方向に合わせるように偏光子１の方向を回転調整する。これを繰り返し、全ての偏光子１（１−１〜１−４）の境界線Ｌの方向が基準線Ｌ１の方向と一致するように調整する。   The direction of the reference line L1 on the imaging screen of the camera E is aligned with the direction (X direction) orthogonal to the scanning direction (Y direction), and the camera E can be moved along the parallel direction (X direction) of the polarizer 1. Deploy to. Then, the boundary line L of one polarizer 1 (1-1) is imaged, and the direction of the polarizer 1 (1-1) is rotated and adjusted so that the direction matches the direction of the reference line L 1. Is completed, the camera E is moved along the X direction while keeping the direction of the reference line L1 constant, the boundary line L of the next polarizer 1 (1-2) is imaged, and the direction is set to the reference line L1. The direction of the polarizer 1 is rotationally adjusted so as to match the direction. This is repeated, and adjustment is made so that the direction of the boundary line L of all the polarizers 1 (1-1 to 1-4) matches the direction of the reference line L1.

図６は、偏光光照射装置における偏光板の偏光軸方向調整方法の他の例を示した説明図である（図における（ａ）が第１工程、（ｂ）が第２工程、（ｃ）が第３工程を示している。）。この例は、偏光子１が額縁状の遮光部１１（１１Ｂ）を備えている。複数の偏光子１（１−１〜１−４）の偏光軸方向を個々に調整するに際して、先ず、（ａ）に示すように、一つ目の偏光子１（１−１）のＡ部をカメラＥで撮像してその撮像画面における基準軸Ｌ２と境界線Ｌを合わせる調整を行う。次に、（ｂ）に示すように、同じ偏光子１（１−１）のＢ部を撮像するために、カメラＥをＹ方向に沿って平行移動させる。ここで、Ｙ方向は、被照射基板の搬送方向（走査方向）であり、Ｘ方向はそれと直交する方向を示している。そして、Ｂ部をカメラＥで撮像してその撮像画面における基準軸Ｌ２と境界線Ｌがずれている場合には、偏光子１の方向を回転させて基準軸Ｌ２と境界線が合うように調整する。このように走査方向であるＹ方向に沿った複数箇所でカメラＥを平行移動させて偏光子１の方向を調整することで、走査方向（被照射基板の搬送方向）に対する偏光子１の偏光軸方向を精度良く調整することが可能になる。その後は、カメラＥをＸ方向に沿って移動させ、２つ目以降の偏光子１（１−２〜１−４）に対して同様の工程を繰り返し、全ての偏光子１を走査方向に対して精度良く調整する。   FIG. 6 is an explanatory view showing another example of the method for adjusting the polarization axis direction of the polarizing plate in the polarized light irradiation apparatus ((a) in the figure is the first step, (b) is the second step, and (c). Shows the third step). In this example, the polarizer 1 includes a frame-shaped light shielding portion 11 (11B). When individually adjusting the polarization axis directions of the plurality of polarizers 1 (1-1 to 1-4), first, as shown in (a), part A of the first polarizer 1 (1-1) Is adjusted by the camera E and the reference axis L2 and the boundary line L on the imaging screen are adjusted. Next, as shown in (b), the camera E is translated along the Y direction in order to image the B portion of the same polarizer 1 (1-1). Here, the Y direction is the conveyance direction (scanning direction) of the substrate to be irradiated, and the X direction indicates a direction orthogonal to the X direction. Then, when the part B is imaged by the camera E and the reference axis L2 and the boundary line L on the imaging screen are shifted, the direction of the polarizer 1 is rotated so that the reference axis L2 and the boundary line are aligned. To do. The polarization axis of the polarizer 1 with respect to the scanning direction (conveyance direction of the substrate to be irradiated) is adjusted by moving the camera E in parallel at a plurality of locations along the Y direction that is the scanning direction and adjusting the direction of the polarizer 1. It becomes possible to adjust the direction with high accuracy. Thereafter, the camera E is moved along the X direction, the same process is repeated for the second and subsequent polarizers 1 (1-2 to 1-4), and all the polarizers 1 are moved in the scanning direction. Adjust with high accuracy.

以上説明したように、本発明の実施形態に係る偏光子１、この偏光子１を用いた偏光光照射装置１００は、基準方向が特定されたカメラＥを用いて、アライメントマークとして機能する遮光部１１（１１Ａ，１１Ｂ，１１Ｃ）における境界線Ｌを撮像しながら偏光軸調整を行うことで、簡易且つ高い精度で偏光軸を調整することが可能になる。   As described above, the polarizer 1 according to the embodiment of the present invention and the polarized light irradiation apparatus 100 using the polarizer 1 use the camera E in which the reference direction is specified, and use a camera E whose alignment direction is specified. By adjusting the polarization axis while imaging the boundary line L at 11 (11A, 11B, 11C), the polarization axis can be easily adjusted with high accuracy.

以上、本発明の実施の形態について図面を参照して詳述してきたが、具体的な構成はこれらの実施の形態に限られるものではなく、本発明の要旨を逸脱しない範囲の設計の変更等があっても本発明に含まれる。また、上述の各実施の形態は、その目的及び構成等に特に矛盾や問題がない限り、互いの技術を流用して組み合わせることが可能である。   As described above, the embodiments of the present invention have been described in detail with reference to the drawings. However, the specific configuration is not limited to these embodiments, and the design can be changed without departing from the scope of the present invention. Is included in the present invention. In addition, the above-described embodiments can be combined by utilizing each other's technology as long as there is no particular contradiction or problem in the purpose and configuration.

１，１Ａ，１Ｂ，１Ｃ：偏光子，１Ｕ：偏光子ユニット，
１０：基板，１１，１１Ａ，１１Ｂ，１１Ｃ：遮光部，
１２Ａ，１２Ｂ，１２Ｃ，１２Ｃ’：光透過領域，
Ｇ：ワイヤーグリッド，Ｐ：偏光軸，Ｌ：境界線，Ｌ１，Ｌ２：基準線，
２：光源，３：被照射基板，３ａ：被照射面，４：特定波長透過フィルター，
１００：偏光光照射装置，Ｅ：カメラ 1, 1A, 1B, 1C: Polarizer, 1U: Polarizer unit,
10: Substrate, 11, 11A, 11B, 11C: Light shielding part,
12A, 12B, 12C, 12C ′: light transmission region,
G: wire grid, P: polarization axis, L: boundary line, L1, L2: reference line,
2: light source, 3: irradiated substrate, 3a: irradiated surface, 4: specific wavelength transmission filter,
100: Polarized light irradiation device, E: Camera

Claims (6)

表面にワイヤーグリッドを形成した基板と、前記基板上に形成され前記基板を透過する光を遮光する遮光部とを備え、
光が透過する光透過領域と前記遮光部との境界線が前記ワイヤーグリッドの延設方向に対して設定された方向で直線状に形成されていることを特徴とする偏光子。 A substrate having a wire grid formed on the surface, and a light-shielding portion that shields light that is formed on the substrate and transmits the substrate,
A polarizer, wherein a boundary line between a light transmission region through which light is transmitted and the light shielding portion is linearly formed in a direction set with respect to an extending direction of the wire grid. 前記遮光部が前記基板の周縁部にて額縁状に形成されていることを特徴とする請求項１記載の偏光子。   The polarizer according to claim 1, wherein the light shielding portion is formed in a frame shape at a peripheral edge portion of the substrate. 前記遮光部の一部に前記光透過領域が形成されていることを特徴とする請求項２記載の偏光子。   The polarizer according to claim 2, wherein the light transmission region is formed in a part of the light shielding portion. 前記遮光部の内側が前記ワイヤーグリッドを形成したワイヤーグリッド形成領域であり、前記遮光部の内縁が前記境界線であることを特徴とする請求項２記載の偏光子。   The polarizer according to claim 2, wherein an inner side of the light shielding part is a wire grid forming region in which the wire grid is formed, and an inner edge of the light shielding part is the boundary line. 請求項１〜４のいずれかに記載された偏光子を複数個並列配置した偏光子ユニットを備え、光源から出射して前記偏光子を透過した光を被照射面に照射することを特徴とする偏光光照射装置。   A polarizer unit in which a plurality of the polarizers according to claim 1 are arranged in parallel is provided, and the irradiated surface is irradiated with light emitted from a light source and transmitted through the polarizer. Polarized light irradiation device. 請求項５に記載された偏光光照射装置における偏光軸調整方法であって、
前記偏光子の並列方向に沿って移動自在なカメラによって撮像される前記境界線の撮像画像を基準方向に合わせるように前記偏光子を光軸周りに回転調整することを特徴とする偏光軸調整方法。 A polarization axis adjusting method in the polarized light irradiation apparatus according to claim 5,
A method for adjusting a polarization axis, wherein the polarizer is rotated around an optical axis so that a captured image of the boundary line captured by a camera movable along a parallel direction of the polarizer is aligned with a reference direction. .
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KR20200018697A (en) * 2017-10-24 2020-02-19 아사히 가세이 가부시키가이샤 Image display device, wire grid polarizer and manufacturing method thereof, observation method of wire grid polarizer, and estimation method of polarization axis direction of wire grid polarizer
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