CN105573059A - Shading device of exposure machine - Google Patents

Abstract

The invention discloses a shading device of an exposure machine, which comprises a main shading mechanism and an auxiliary shading mechanism. And a main shading mechanism arranged on the light advancing path. The auxiliary shading mechanism is arranged on the light traveling line and is positioned on one side of the main shading mechanism. Wherein, the shape of the exposure opening formed by the main shading mechanism and the auxiliary shading mechanism corresponds to the shape of the exposure area on the wafer.

Description

Shading device for exposure machine

technical field

The invention relates to a light shielding device, and in particular to a light shielding device for an exposure machine.

Background technique

In the integrated circuit manufacturing process, the photolithography process is to irradiate the exposure area (shot) on the wafer through the exposure machine, so as to transfer the photomask pattern to the photosensitive film on the wafer.

Existing exposure machines can perform one exposure process on a rectangular exposure area to complete the exposure. However, when the existing exposure equipment exposes the non-complete rectangular exposure area on the edge of the wafer, it needs to perform at least two exposure manufacturing processes on the same non-complete rectangular exposure area to complete the exposure, so the exposure time will increase and The problem of lower die yield.

Taking the existing stepper exposure machine as an example, since the same non-complete rectangular exposure area is exposed by the superposition exposure method of performing more than two exposure manufacturing processes, the exposure path increases, and the exposure of each wafer Time increases. In addition, the overlay exposure method is prone to repeated exposure or non-exposure at the overlay, which reduces the yield of the die.

Contents of the invention

The object of the present invention is to provide a light-shielding device for an exposure machine, which can effectively reduce the exposure time and improve the die yield.

To achieve the above purpose, the present invention proposes a light shielding device for an exposure machine, including a main light shielding mechanism and an auxiliary light shielding mechanism. The main shading mechanism is arranged on the light traveling path. The auxiliary light-shielding mechanism is arranged on the light traveling route and on one side of the main light-shielding mechanism. Wherein, the shape of the exposure opening formed by the main light shielding mechanism and the auxiliary light shielding mechanism corresponds to the shape of the exposure area on the wafer.

According to an embodiment of the present invention, in the above-mentioned light-shielding device of the exposure machine, the main light-shielding mechanism includes a first carrier plate, a first driving mechanism, and a plurality of main light-shielding plates. The first driving mechanism is arranged on the first carrier board. The main shade is connected to the first driving mechanism.

According to an embodiment of the present invention, in the above-mentioned light shielding device of the exposure machine, the first driving mechanism includes a plurality of first guide rails and a plurality of first stepping motors. The first guide rail is disposed on the first carrier board. The first stepping motor is arranged on the first guide rail and connected to the main shade.

According to an embodiment of the present invention, in the above-mentioned light shielding device of the exposure machine, the first driving mechanism further includes a plurality of first connecting parts. The first stepping motor is connected with the main shade plate through the first connecting piece.

According to an embodiment of the present invention, in the above-mentioned light-shielding device of the exposure machine, the auxiliary light-shielding mechanism includes a second carrier plate, a second driving mechanism, and a plurality of auxiliary light-shielding plates. The second driving mechanism is arranged on the second carrier board. A plurality of auxiliary shading plates are connected to the second driving mechanism.

According to an embodiment of the present invention, in the above-mentioned shading device of the exposure machine, the second driving mechanism includes at least one second guide rail, multiple second stepping motors, multiple third guide rails, and multiple third guide rails. stepper motor. The second guide rail is arranged on the second carrier board. The second stepping motor is arranged on the second guide rail. The third guide rail is connected to the second stepping motor. The third stepping motor is arranged on the third guide rail and connected to the auxiliary light shielding plate.

According to an embodiment of the present invention, in the above-mentioned light shielding device of the exposure machine, the second driving mechanism further includes a plurality of second connecting parts. The third stepping motor is connected with the auxiliary shading plate through the second connecting piece.

According to an embodiment of the present invention, in the above light shielding device of the exposure machine, the exposure area may be an incomplete rectangular exposure area or a rectangular exposure area.

According to an embodiment of the present invention, in the above-mentioned light shielding device of the exposure machine, the auxiliary light shielding mechanism may be located on a side away from or close to the light source of the main light shielding mechanism.

According to an embodiment of the present invention, in the light shielding device of the above-mentioned exposure machine, the exposure machine may be a stepper exposure machine.

Based on the above, in the light-shielding device of the exposure machine table proposed by the present invention, since the shape of the exposure opening formed by the main light-shielding mechanism and the auxiliary light-shielding mechanism can be made to correspond to the shape of the exposure area on the wafer, the Both the incomplete rectangular exposure area and the rectangular exposure area can be exposed by one exposure manufacturing process, so the exposure time can be effectively reduced and the die yield can be improved.

In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

Description of drawings

FIG. 1 is a side view of a light shielding device of an exposure machine according to an embodiment of the present invention;

2 is a front view of the main light-shielding mechanism in the light-shielding device of the exposure machine according to an embodiment of the present invention;

3 is a front view of the auxiliary light-shielding mechanism in the light-shielding device of the exposure machine according to an embodiment of the present invention;

Fig. 4 is the top view of the wafer of an embodiment of the present invention;

5 is a front view of the main light-shielding mechanism in FIG. 2 when an exposure opening corresponding to the shape of the rectangular exposure area is formed;

FIG. 6 is a front view of the auxiliary light-shielding mechanism in FIG. 3 when an exposure opening corresponding to a shape of an incomplete rectangular exposure area is formed.

Symbol Description

100: shading device

102: Main shading mechanism

104: Auxiliary shading mechanism

106: The first carrier board

108: The first driving mechanism

110a, 110b, 110c, 110d: main visor

112a, 112b: first guide rail

114a, 114b, 114c, 114d: first stepping motor

116a, 116b, 116c, 116d: first connector

118: Second carrier board

120: Second drive mechanism

122a, 122b, 122c, 122d: auxiliary visor

124: Second guide rail

126a, 126b: second stepping motor

128a, 128b: the third guide rail

130a, 130b, 130c, 130d: third stepping motor

132a, 132b, 132c, 132d: second connector

134, 136: Exposure opening

200: light source

202: Light travel path

300: chip

302: Exposure area

304: Photosensitive film

306: Incomplete rectangular exposure area

308: Rectangular exposure area

X: axis

Y: axis

X1, X2, X3, Y1, Y2, Y3, Y4: direction

detailed description

FIG. 1 is a side view of a light shielding device of an exposure machine according to an embodiment of the present invention. FIG. 2 is a front view of the main light shielding mechanism in the light shielding device of the exposure machine according to an embodiment of the present invention. 3 is a front view of an auxiliary light-shielding mechanism in the light-shielding device of the exposure machine according to an embodiment of the present invention. FIG. 4 is a top view of a wafer according to an embodiment of the present invention. FIG. 5 is a front view of the main light-shielding mechanism in FIG. 2 when a rectangular exposure opening corresponding to the shape of the exposure area is formed. FIG. 6 is a front view of the auxiliary light-shielding mechanism in FIG. 3 when an exposure opening corresponding to a shape of an incomplete rectangular exposure area is formed.

Please refer to FIGS. 1 to 4 at the same time. The light shielding device 100 of the exposure machine includes a main light shielding mechanism 102 and an auxiliary light shielding mechanism 104 . The exposure tool can irradiate the exposure region 302 of the wafer 300 to transfer the photomask pattern to the photosensitive film 304 on the wafer 300 . The exposure area 302 can be a non-complete rectangular exposure area 306 or a rectangular exposure area 308 . The exposure machine can be a stepper exposure machine.

Referring to FIG. 1 , FIG. 2 and FIG. 4 , the main light shielding mechanism 102 can be disposed on the light traveling path 202 of the light source 200 . The main light shielding mechanism 102 can be used to form an exposure opening, and the shape of the formed exposure opening can correspond to the shape of the rectangular exposure area 308 on the wafer 300 . In this embodiment, "corresponding" in shape means that the shapes are substantially the same, but there may be differences in magnification or direction depending on the design of the lens. Those with ordinary knowledge in this technical field can adjust the magnification or direction according to requirements. The main light shielding mechanism 102 may include a first carrier plate 106 , a first driving mechanism 108 and main light shielding plates 110 a , 110 b , 110 c , 110 d.

The first driving mechanism 108 is disposed on the first carrier 106 . For example, the first driving mechanism 108 may include first guide rails 112a, 112b and first stepping motors 114a, 114b, 114c, 114d. In addition, the first driving mechanism 108 may further include first connecting members 116a, 116b, 116c, 116d.

The first guide rails 112 a , 112 b are disposed on the first carrier board 106 . The first guide rails 112a, 112b can be respectively arranged along the X-axis direction and the Y-axis direction of the X-Y plane coordinate system.

The first stepping motors 114a, 114b are disposed on the first guide rail 112a and respectively connected to the main shades 110a, 110b. The first stepping motors 114a, 114b can move the main visors 110a, 110b in the X-axis direction. The first stepping motors 114c, 114d are disposed on the first guide rail 112b and respectively connected to the main shades 110c, 110d. The first stepper motors 114c, 114d can move the main visors 110c, 110d in the Y-axis direction. The first stepping motors 114a, 114b, 114c, 114d and the main shades 110c, 110d, 110c, 110d can be connected through the first connecting pieces 116a, 116b, 116c, 116d respectively. In this way, the main visors 110 c , 110 d , 110 c , and 110 d can be connected to the first driving mechanism 108 .

However, the main light shielding mechanism 102 is not limited to the above-mentioned embodiments as long as the main light shielding mechanism 102 can form an exposure opening corresponding to the shape of the rectangular exposure area 308 on the wafer 300 . Those with ordinary knowledge in this technical field can adjust the appearance of the main shading mechanism 102 according to the design requirements. As far as the above embodiment is concerned, those skilled in the art can adjust the driving method, shape, quantity and arrangement of the main visor, as well as the quantity and arrangement of the first guide rail and the first stepping motor.

Referring to FIG. 1 , FIG. 3 and FIG. 4 , the auxiliary light-shielding mechanism 104 is disposed on the light traveling route 202 and is located at one side of the main light-shielding mechanism 102 . In this embodiment, the auxiliary light shielding mechanism 104 is located on the side of the main light shielding mechanism 102 away from the light source 200 as an example for illustration. In another embodiment, the auxiliary shading mechanism 104 can also be located on a side of the main shading mechanism 102 close to the light source 200 .

The auxiliary light-shielding mechanism 104 can be used to modify the exposure opening formed by the main light-shielding mechanism 102, so the shape of the exposure opening formed by the main light-shielding mechanism 102 and the auxiliary light-shielding mechanism 104 can correspond to the shape of the exposure region 302 on the wafer 300, such as The shape of the incomplete rectangular exposure area 306 or the shape of the rectangular exposure area 308 . The auxiliary light shielding mechanism 104 may include a second carrier plate 118 , a second driving mechanism 120 and auxiliary light shielding plates 122 a , 122 b , 122 c , 122 d.

The second driving mechanism 120 is disposed on the second carrier board 118 . For example, the second driving mechanism 120 may include at least one second guide rail 124 , second stepping motors 126 a , 126 b , third guide rails 128 a , 128 b and third stepping motors 130 a , 130 b , 130 c , 130 d. In addition, the second driving mechanism 120 may further include second connecting parts 132a, 132b, 132c, 132d.

The second guide rail 124 is disposed on the second carrier board 118 . The second guide rails 124 can be respectively arranged along the X-axis direction of the X-Y plane coordinate system. The second stepping motors 126a, 126b are disposed on the second guide rail 124 .

The third guide rails 128a, 128b are respectively connected to the second stepping motors 126a, 126b. The third guide rails 128a, 128b can be respectively arranged along the Y-axis direction of the X-Y plane coordinate system.

The third stepping motors 130a, 130b are disposed on the third guide rail 128a and respectively connected to the auxiliary light-shielding plates 122a, 122b. The third stepping motors 130a, 130b can respectively move the auxiliary light-shielding plates 122a, 122b in the Y-axis direction. The third stepping motors 130c, 130d are disposed on the third guide rail 128b and respectively connected to the auxiliary light-shielding plates 122c, 122d. The third stepping motors 130c, 130d can respectively move the auxiliary light-shielding plates 122c, 122d in the Y-axis direction. The third stepping motors 130a, 130b, 130c, 130d and the auxiliary light-shielding plates 122a, 122b, 122c, 122d can be connected through the second connecting pieces 132a, 132b, 132c, 132d respectively. Thus, the auxiliary shades 122 a , 122 b , 122 c , and 122 d can be connected to the second driving mechanism 120 .

In addition, the third guide rails 128a, 128b can be respectively driven by the second stepping motors 126a, 126b, so that the auxiliary light-shielding plates 122a, 122b, 122c, 122d can move in the X-axis direction.

However, the auxiliary light-shielding mechanism 104 is not limited to the above-mentioned embodiments, as long as the auxiliary light-shielding mechanism 104 can be used to modify the exposure opening formed by the main light-shielding mechanism 102, so that the exposure opening formed by the main light-shielding mechanism 102 and the auxiliary light-shielding mechanism 104 The shape may correspond to the shape of the exposure region 302 on the wafer 300 . Those with ordinary knowledge in this technical field can adjust the aspect of the auxiliary light-shielding mechanism 104 according to the design requirements. As far as the above-mentioned embodiment is concerned, those who have ordinary knowledge in this technical field can adjust the driving method, shape, quantity and arrangement of the auxiliary shading plates, and can also adjust the second guide rail, the second stepping motor, the third guide rail and the third guide rail. The number and setting method of stepping motors, etc.

Next, taking the light shielding device 100 of the exposure machine in the above embodiment as an example, the method of forming the exposure opening by the main light shielding mechanism 102 and the auxiliary light shielding mechanism 104 will be described.

Please refer to FIG. 2 to FIG. 5 at the same time. When the light-shielding device 100 is to form the exposure opening 134 corresponding to the shape of the rectangular exposure area 308, the main light-shielding plates 110a, 110b, 110c, 110d can be moved from FIG. The position in FIG. 5 is moved to the position in FIG. 5 to form the exposure opening 134 . In detail, the first driving mechanism 108 operates as follows: the first stepping motors 114a, 114b, 114c, and 114d are respectively moved along the X1 direction, the X2 direction, the Y1 direction, and the Y2 direction to adjust the main visor 110a , 110b in the X-axis direction and adjust the positions of the main light-shielding plates 110c, 110d in the Y-axis direction until the shape of the exposure opening 134 corresponds to the shape of the rectangular exposure area 308 . At this time, since there is no need to use the auxiliary light-shielding mechanism 104 to modify the exposure opening 134 formed by the main light-shielding mechanism 102, the 122a, 122b, 122c, and 122d in the auxiliary light-shielding mechanism 104 only need to be located at positions that do not shade the exposure opening 134. That's it.

Similarly, in other embodiments, if the rectangular exposure area 308 on the wafer 300 has other shapes, in order to make the shape of the exposure opening 134 correspond to the rectangular exposure area 308 of various shapes, the main shading mechanism 102 can be adjusted to Exposure openings 134 of various shapes are formed according to the positions of the light shielding plates 110a, 110b, 110c, and 110d.

Please refer to FIG. 2 to FIG. 6 at the same time. When the light-shielding device 100 is to form the exposure opening 136 corresponding to the shape of the incomplete rectangular exposure area 306, the main light-shielding plates 110a, 110b, 110c, 110d can be moved by the first driving mechanism 108. Moving from the position in FIG. 2 to the position in FIG. 5 to form the exposure opening 134, the auxiliary light-shielding plates 122c, 122d can be moved from the position in FIG. 3 to the position in FIG. The shape of the exposure opening 134 is modified to form the exposure opening 136 . In detail, the operation mode of the second driving mechanism 120 is as follows: the second stepping motor 126b is moved along the X3 direction to adjust the positions of the auxiliary light-shielding plates 122c and 122d in the X-axis direction, and the third stepping motor 126b is moved along the X3 direction. The motors 130c, 130d move along the Y3 direction and the Y4 direction respectively, and adjust the positions of the auxiliary light-shielding plates 122c, 122d in the Y-axis direction until the shape of the exposure opening 136 corresponds to the shape of the incomplete rectangular exposure area 306 .

Similarly, when exposing non-complete rectangular exposure regions 306 of other shapes on the wafer 300, in order to make the shape of the exposure opening 136 correspond to the non-complete rectangular exposure regions 306 of various shapes, the main light-shielding mechanism 102 can be adjusted to Exposure openings 136 of various shapes are formed by the positions of the main light-shielding plates 110a, 110b, 110c, and 110d and the positions of the auxiliary light-shielding plates 122a, 122b, 122c, and 122d of the auxiliary light-shielding mechanism 104 .

Based on the above, it can be known that the shapes of the exposure openings 134, 136 formed by the main light-shielding mechanism 102 and the auxiliary light-shielding mechanism 104 respectively correspond to the shapes of the exposure regions 302 on the wafer 300 through the light-shielding device 100 of the exposure machine of the above-mentioned embodiment. Therefore, only one exposure process can be performed on the incomplete rectangular exposure area 306 and the rectangular exposure area 308 on the wafer 300 to complete the exposure, so the exposure time can be effectively reduced. In addition, when exposing through the light-shielding device 100 of the exposure machine of the above embodiment, since overlapping exposure is not required, repeated exposure or non-exposure can be avoided, thereby effectively improving die yield.

To sum up, the light shielding device of the exposure machine in the above embodiment has at least the following features. Since the light-shielding device of the exposure machine in the above embodiment can make the shape of the formed exposure opening correspond to the shape of each exposure area on the wafer, the exposure can be completed as long as the exposure process is performed once, so the exposure time can be effectively reduced And improve the die yield.

Although the present invention has been disclosed in conjunction with the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention should be defined by the appended claims.

Claims (10)

1. a shade for exposure bench, comprising:

Main chopping mechanism, is arranged on a smooth travel path; And

Auxiliary chopping mechanism, to be arranged in this light course and to be positioned at the side of this main chopping mechanism, wherein

Formed by this main chopping mechanism and this auxiliary chopping mechanism one shape exposing opening corresponds to the shape of the exposure area on a wafer.

2. the shade of exposure bench as claimed in claim 1, wherein this main chopping mechanism comprises:

First support plate;

First driving mechanism, is arranged on this first support plate; And

Multiple main shadow shield, is connected to this first driving mechanism.

3. the shade of exposure bench as claimed in claim 2, wherein this first driving mechanism comprises:

Multiple first guide rail, is arranged on this first support plate; And

Multiple first step motor, to be arranged on those first guide rails and to be connected to those main shadow shields.

4. the shade of exposure bench as claimed in claim 3, wherein this first driving mechanism also comprises multiple first web member, and those first step motor are connected by those first web members with those main shadow shields.

5. the shade of exposure bench as claimed in claim 1, wherein this auxiliary chopping mechanism comprises:

Second support plate;

Second driving mechanism, is arranged on this second support plate; And

Multiple supplementary sun visor, is connected to this second driving mechanism.

6. the shade of exposure bench as claimed in claim 5, wherein this second driving mechanism comprises:

At least one second guide rail, is arranged on this second support plate;

Multiple second step motor, is arranged on those second guide rails;

Multiple 3rd guide rail, is connected to those the second step motor; And

Multiple 3rd step motor, to be arranged on those the 3rd guide rails and to be connected to those supplementary sun visors.

7. the shade of exposure bench as claimed in claim 6, wherein this second driving mechanism also comprises multiple second web member, and those the 3rd step motor are connected by those second web members with those supplementary sun visors.

8. the shade of exposure bench as claimed in claim 1, wherein this exposure area comprises incomplete rectangular exposed area or rectangular exposed area.

9. the shade of exposure bench as claimed in claim 1, wherein this auxiliary chopping mechanism be positioned at this main chopping mechanism away from or near the side of light source.

10. the shade of exposure bench as claimed in claim 1, wherein this exposure bench comprises stepping exposure bench.