JP2014146740A5 - - Google Patents
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- Publication number
- JP2014146740A5 JP2014146740A5 JP2013015301A JP2013015301A JP2014146740A5 JP 2014146740 A5 JP2014146740 A5 JP 2014146740A5 JP 2013015301 A JP2013015301 A JP 2013015301A JP 2013015301 A JP2013015301 A JP 2013015301A JP 2014146740 A5 JP2014146740 A5 JP 2014146740A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- substrate
- processing method
- substrate processing
- coating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 18
- 229920001400 block copolymer Polymers 0.000 claims description 10
- 239000012670 alkaline solution Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims 9
- 238000010438 heat treatment Methods 0.000 claims 3
- 229920001477 hydrophilic polymer Polymers 0.000 claims 2
- 229920001600 hydrophobic polymer Polymers 0.000 claims 2
- 239000004793 Polystyrene Substances 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 claims 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims 1
- 239000004926 polymethyl methacrylate Substances 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013015301A JP5847738B2 (ja) | 2013-01-30 | 2013-01-30 | 基板処理方法、プログラム及びコンピュータ記憶媒体 |
| PCT/JP2014/051225 WO2014119444A1 (ja) | 2013-01-30 | 2014-01-22 | 基板処理方法及びコンピュータ記憶媒体 |
| KR1020157019983A KR102122343B1 (ko) | 2013-01-30 | 2014-01-22 | 기판 처리 방법 및 컴퓨터 기억 매체 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013015301A JP5847738B2 (ja) | 2013-01-30 | 2013-01-30 | 基板処理方法、プログラム及びコンピュータ記憶媒体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014146740A JP2014146740A (ja) | 2014-08-14 |
| JP2014146740A5 true JP2014146740A5 (enExample) | 2015-03-19 |
| JP5847738B2 JP5847738B2 (ja) | 2016-01-27 |
Family
ID=51262157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013015301A Active JP5847738B2 (ja) | 2013-01-30 | 2013-01-30 | 基板処理方法、プログラム及びコンピュータ記憶媒体 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5847738B2 (enExample) |
| KR (1) | KR102122343B1 (enExample) |
| WO (1) | WO2014119444A1 (enExample) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62136028A (ja) * | 1985-12-10 | 1987-06-19 | Matsushita Electric Ind Co Ltd | 有機膜のパタ−ン形成方法 |
| JP4673266B2 (ja) * | 2006-08-03 | 2011-04-20 | 日本電信電話株式会社 | パターン形成方法及びモールド |
| JP5300799B2 (ja) * | 2010-07-28 | 2013-09-25 | 株式会社東芝 | パターン形成方法及びポリマーアロイ下地材料 |
| JP5721164B2 (ja) * | 2010-09-14 | 2015-05-20 | 東京応化工業株式会社 | ブロックコポリマーを含む層のパターン形成方法 |
| JP5885143B2 (ja) * | 2010-10-07 | 2016-03-15 | 東京応化工業株式会社 | ガイドパターン形成用ネガ型現像用レジスト組成物、ガイドパターン形成方法、ブロックコポリマーを含む層のパターン形成方法 |
-
2013
- 2013-01-30 JP JP2013015301A patent/JP5847738B2/ja active Active
-
2014
- 2014-01-22 KR KR1020157019983A patent/KR102122343B1/ko active Active
- 2014-01-22 WO PCT/JP2014/051225 patent/WO2014119444A1/ja not_active Ceased
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