JP2014130853A5 - - Google Patents
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- Publication number
- JP2014130853A5 JP2014130853A5 JP2012286366A JP2012286366A JP2014130853A5 JP 2014130853 A5 JP2014130853 A5 JP 2014130853A5 JP 2012286366 A JP2012286366 A JP 2012286366A JP 2012286366 A JP2012286366 A JP 2012286366A JP 2014130853 A5 JP2014130853 A5 JP 2014130853A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- processed
- substrate
- manufacturing
- adhesive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 239000004065 semiconductor Substances 0.000 claims description 26
- 239000000853 adhesive Substances 0.000 claims description 18
- 239000012790 adhesive layer Substances 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 18
- 230000001070 adhesive effect Effects 0.000 claims description 16
- 239000000178 monomer Substances 0.000 claims description 12
- 239000007870 radical polymerization initiator Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000003999 initiator Substances 0.000 claims 1
- 239000003505 polymerization initiator Substances 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012286366A JP6170672B2 (ja) | 2012-12-27 | 2012-12-27 | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法 |
| PCT/JP2013/084442 WO2014103996A1 (ja) | 2012-12-27 | 2013-12-24 | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法 |
| KR1020157016999A KR101793583B1 (ko) | 2012-12-27 | 2013-12-24 | 반도체 장치 제조용 가접착제, 그것을 사용한 접착성 지지체, 및 반도체 장치의 제조방법 |
| TW102148337A TWI643925B (zh) | 2012-12-27 | 2013-12-26 | Temporary adhesive for semiconductor device manufacturing, adhesive support using the same, and method for manufacturing semiconductor device |
| US14/743,619 US20150284603A1 (en) | 2012-12-27 | 2015-06-18 | Temporary adhesive for production of semiconductor device, and adhesive support and production method of semiconductor device using the same |
| US14/953,697 US20160075922A1 (en) | 2012-12-27 | 2015-11-30 | Temporary adhesive for production of semiconductor device, and adhesive support and production method of semiconductor device using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012286366A JP6170672B2 (ja) | 2012-12-27 | 2012-12-27 | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014130853A JP2014130853A (ja) | 2014-07-10 |
| JP2014130853A5 true JP2014130853A5 (OSRAM) | 2015-05-28 |
| JP6170672B2 JP6170672B2 (ja) | 2017-07-26 |
Family
ID=51021078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012286366A Expired - Fee Related JP6170672B2 (ja) | 2012-12-27 | 2012-12-27 | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20150284603A1 (OSRAM) |
| JP (1) | JP6170672B2 (OSRAM) |
| KR (1) | KR101793583B1 (OSRAM) |
| TW (1) | TWI643925B (OSRAM) |
| WO (1) | WO2014103996A1 (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9865490B2 (en) | 2014-01-07 | 2018-01-09 | Brewer Science Inc. | Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes |
| US9496164B2 (en) * | 2014-01-07 | 2016-11-15 | Brewer Science Inc. | Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes |
| JP6379191B2 (ja) * | 2014-05-30 | 2018-08-22 | 富士フイルム株式会社 | 仮接着膜、積層体、仮接着用組成物、デバイスの製造方法およびキット |
| JP6384234B2 (ja) * | 2014-09-25 | 2018-09-05 | デクセリアルズ株式会社 | ラジカル重合型接着剤組成物、及び電気接続体の製造方法 |
| CN107428890B (zh) | 2015-04-22 | 2020-12-22 | 电化株式会社 | 组合物 |
| KR20170046468A (ko) | 2015-10-21 | 2017-05-02 | 에스프린팅솔루션 주식회사 | 감광층 상에 형성된 보호층을 포함하는 감광체 |
| GB2544335A (en) | 2015-11-13 | 2017-05-17 | Oculus Vr Llc | A method and apparatus for use in the manufacture of a display element |
| DE102016106351A1 (de) * | 2016-04-07 | 2017-10-12 | Ev Group E. Thallner Gmbh | Verfahren und Vorrichtung zum Bonden zweier Substrate |
| WO2018003981A1 (ja) * | 2016-07-01 | 2018-01-04 | デンカ株式会社 | 組成物 |
| TWI732005B (zh) * | 2016-07-29 | 2021-07-01 | 日商富士軟片股份有限公司 | 套組、洗淨劑組成物及半導體元件的製造方法 |
| JP7043173B2 (ja) * | 2017-02-07 | 2022-03-29 | 東京応化工業株式会社 | ダイシング用保護膜基材、ダイシング用保護膜組成物、ダイシング用保護シート、及び被加工ウエーハの製造方法 |
| DE102017103095A1 (de) * | 2017-02-15 | 2018-08-16 | Infineon Technologies Ag | Handhaben eines dünnen Wafers während der Chipherstellung |
| JP7064857B2 (ja) * | 2017-12-14 | 2022-05-11 | 三星エスディアイ株式会社 | 粘着剤組成物、その溶液、粘着剤層および表面保護フィルム |
| KR102541924B1 (ko) * | 2018-01-08 | 2023-06-13 | 한국전자통신연구원 | 접착 필름 및 이를 이용한 반도체 패키지의 제조 방법 |
| US20190211231A1 (en) * | 2018-01-08 | 2019-07-11 | Electronics And Telecommunications Research Institute | Adhesive film for electric device and method of fabricating semiconductor package using the same |
| KR102588785B1 (ko) * | 2019-02-25 | 2023-10-12 | 미쓰비시덴키 가부시키가이샤 | 반도체 소자의 제조 방법 |
| US11682600B2 (en) * | 2019-08-07 | 2023-06-20 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Protection layer for panel handling systems |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06177098A (ja) * | 1992-12-10 | 1994-06-24 | Mitsui Toatsu Chem Inc | ウエハ裏面研削用テープおよびその使用方法 |
| EP1041624A1 (en) * | 1999-04-02 | 2000-10-04 | Interuniversitair Microelektronica Centrum Vzw | Method of transferring ultra-thin substrates and application of the method to the manufacture of a multilayer thin film device |
| JP4474854B2 (ja) * | 2003-07-02 | 2010-06-09 | Jsr株式会社 | 感放射線性接着剤組成物およびこれを用いたウェハーの加工方法 |
| DE112009000140B4 (de) * | 2008-01-24 | 2022-06-15 | Brewer Science, Inc. | Verfahren zum reversiblen Anbringen eines Vorrichtungswafers an einem Trägersubstrat und ein daraus erhaltener Gegenstand |
| WO2009117729A2 (en) * | 2008-03-21 | 2009-09-24 | Designer Molecules, Inc. | Anti-bleed compounds, compositions and methods for use thereof |
| JP2011052142A (ja) * | 2009-09-03 | 2011-03-17 | Jsr Corp | 接着剤組成物、それを用いた基材の加工または移動方法および半導体素子 |
| JP5010668B2 (ja) * | 2009-12-03 | 2012-08-29 | 信越化学工業株式会社 | 積層型半導体集積装置の製造方法 |
| JP2011236261A (ja) * | 2010-05-06 | 2011-11-24 | Furukawa Electric Co Ltd:The | 半導体用接着フィルム及び半導体装置の製造方法 |
| US20130220533A1 (en) * | 2010-09-16 | 2013-08-29 | Toru Tonegawa | Pressure-sensitive adhesive compound, pressure-sensitive adhesive tape, and wafer treatment method |
| US9029269B2 (en) * | 2011-02-28 | 2015-05-12 | Dow Corning Corporation | Wafer bonding system and method for bonding and debonding thereof |
-
2012
- 2012-12-27 JP JP2012286366A patent/JP6170672B2/ja not_active Expired - Fee Related
-
2013
- 2013-12-24 WO PCT/JP2013/084442 patent/WO2014103996A1/ja not_active Ceased
- 2013-12-24 KR KR1020157016999A patent/KR101793583B1/ko not_active Expired - Fee Related
- 2013-12-26 TW TW102148337A patent/TWI643925B/zh not_active IP Right Cessation
-
2015
- 2015-06-18 US US14/743,619 patent/US20150284603A1/en not_active Abandoned
- 2015-11-30 US US14/953,697 patent/US20160075922A1/en not_active Abandoned
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