JP2014102507A - 金属フッ化物光学部品のコロイドシリカ仕上げ - Google Patents
金属フッ化物光学部品のコロイドシリカ仕上げ Download PDFInfo
- Publication number
- JP2014102507A JP2014102507A JP2013256893A JP2013256893A JP2014102507A JP 2014102507 A JP2014102507 A JP 2014102507A JP 2013256893 A JP2013256893 A JP 2013256893A JP 2013256893 A JP2013256893 A JP 2013256893A JP 2014102507 A JP2014102507 A JP 2014102507A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- optical element
- polished
- colloidal silica
- caf
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/268—Monolayer with structurally defined element
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
【解決手段】 アルカリ土類金属フッ化物単結晶光学素子であって、MgF2、CaF2、BaF2およびSrF2、およびそれらの混合物からなる群から選択されるアルカリ土類金属フッ化物からなる単結晶光学素子を含み、研磨されたがエッチングされていない表面の粗さが0.5nm rms未満であり、研磨されてエッチングされた表面の粗さが0.5nm rms未満であり、研磨されたがエッチングされていない表面が沈降Bielby層を実質的に含有しない。
【選択図】 なし
Description
● 0.25μのダイヤモンド研磨を実施し、アセトン/アルコールで拭いた(項目6および7)後、先行技術において用いられていない超音波(「US」)清浄工程(項目8)を導入し、
● 先行技術の0.1μmダイヤモンド研磨(項目10)の代わりにコロイドシリカ研磨工程(項目11)を使用し、
● コロイドシリカ研磨の後にメガソニック(「MS」)清浄工程(項目12)を導入する。
Claims (3)
- アルカリ土類金属フッ化物単結晶光学素子であって、前記光学素子が、MgF2、CaF2、BaF2およびSrF2、およびそれらの混合物からなる群から選択されるアルカリ土類金属フッ化物からなる単結晶光学素子を含み、前記光学素子は、研磨されたがエッチングされていない表面の粗さが0.5nm rms未満であり、研磨されてエッチングされた表面の粗さが0.5nm rms未満であり、前記研磨されたがエッチングされていない表面が沈降Bielby層を実質的に含有しないことを特徴とする、アルカリ土類金属フッ化物単結晶光学素子。
- 前記光学素子がCaF2単結晶材料からなることを特徴とする請求項1記載の光学素子。
- 研磨されたがエッチングされていない表面の粗さと研磨されてエッチングされた表面の粗さとの差が0.1nm rms未満であることを特徴とする請求項1記載の光学素子。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/200,214 | 2008-08-28 | ||
US12/200,214 US9254544B2 (en) | 2008-08-28 | 2008-08-28 | Colloidal silica finishing of metal fluoride optical components |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009196686A Division JP5483957B2 (ja) | 2008-08-28 | 2009-08-27 | 金属フッ化物光学部品のコロイドシリカ仕上げ |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2014102507A true JP2014102507A (ja) | 2014-06-05 |
Family
ID=41606382
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009196686A Active JP5483957B2 (ja) | 2008-08-28 | 2009-08-27 | 金属フッ化物光学部品のコロイドシリカ仕上げ |
JP2013256893A Pending JP2014102507A (ja) | 2008-08-28 | 2013-12-12 | 金属フッ化物光学部品のコロイドシリカ仕上げ |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009196686A Active JP5483957B2 (ja) | 2008-08-28 | 2009-08-27 | 金属フッ化物光学部品のコロイドシリカ仕上げ |
Country Status (3)
Country | Link |
---|---|
US (1) | US9254544B2 (ja) |
JP (2) | JP5483957B2 (ja) |
DE (1) | DE102009038908A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103009210A (zh) * | 2011-09-28 | 2013-04-03 | 上海双明光学科技有限公司 | 一种uv镜头用镜片的加工方法 |
CN116368409A (zh) * | 2020-10-30 | 2023-06-30 | 西默有限公司 | 用于深紫外光源的光学部件 |
CN114473647A (zh) * | 2022-03-04 | 2022-05-13 | 湖南高河硬质合金有限公司 | 一种硬质合金表面处理工艺 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000308950A (ja) * | 1999-04-27 | 2000-11-07 | Canon Inc | 研磨方法 |
JP2002082211A (ja) * | 2000-06-08 | 2002-03-22 | Canon Inc | 光学素子の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6595834B2 (en) * | 1999-06-25 | 2003-07-22 | Corning Incorporated | Method of making <200nm light transmitting optical fluoride crystals for transmitting less than 200nm light |
US6375551B1 (en) * | 1999-06-25 | 2002-04-23 | Corning Incorporated | Angstrom polishing of calcium fluoride optical VUV microlithography lens elements and preforms |
US6248002B1 (en) * | 1999-10-20 | 2001-06-19 | Taiwan Semiconductor Manufacturing Company | Obtaining the better defect performance of the fuse CMP process by adding slurry polish on more soft pad after slurry polish |
US6466365B1 (en) | 2000-04-07 | 2002-10-15 | Corning Incorporated | Film coated optical lithography elements and method of making |
JP3660318B2 (ja) | 2002-03-07 | 2005-06-15 | 株式会社日本グレーン研究所 | 化学反応性研磨材 |
US7128984B2 (en) * | 2004-08-31 | 2006-10-31 | Corning Incorporated | Surfacing of metal fluoride excimer optics |
US7242843B2 (en) * | 2005-06-30 | 2007-07-10 | Corning Incorporated | Extended lifetime excimer laser optics |
US20120057222A1 (en) * | 2010-09-03 | 2012-03-08 | Yasuhiro Hashimoto | Single crystal of magnesium fluoride, optical member and optical element comprising the same |
-
2008
- 2008-08-28 US US12/200,214 patent/US9254544B2/en active Active
-
2009
- 2009-08-26 DE DE102009038908A patent/DE102009038908A1/de not_active Withdrawn
- 2009-08-27 JP JP2009196686A patent/JP5483957B2/ja active Active
-
2013
- 2013-12-12 JP JP2013256893A patent/JP2014102507A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000308950A (ja) * | 1999-04-27 | 2000-11-07 | Canon Inc | 研磨方法 |
JP2002082211A (ja) * | 2000-06-08 | 2002-03-22 | Canon Inc | 光学素子の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE102009038908A1 (de) | 2010-03-04 |
US20100055453A1 (en) | 2010-03-04 |
JP5483957B2 (ja) | 2014-05-07 |
US9254544B2 (en) | 2016-02-09 |
JP2010089251A (ja) | 2010-04-22 |
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