JP2014058652A - Transparent film-forming coating liquid and substrate with transparent film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transparent film-forming coating liquid for forming a transparent film having refraction index which decreases gradually from a lower layer to an upper layer, excellent in light transmissivity, transparency, and having antistatic and antireflection performances.SOLUTION: A transparent film-forming coating liquid contains a surface finishing silica-based fine particle (A), surface finishing chain conductive metal oxide particles (B), a matrix forming component and a solvent. The average particle diameter of the surface finishing silica-based fine particle (A), (D) is in the range of 10 to 200 nm. The surface finishing chain conductive metal oxide particles (B) are chain conductive particles in which 2 to 30 metal oxide particles having an average particle diameter (D) in the range of 5 to 20 nm are connected in a chain, where the metal oxide particles have a volume resistivity value in the range of 10to 10Ω cm. The concentration of the surface finishing silica-based fine particle (A) is in the range of 0.05 to 35 wt.% as a solid content, the concentration of the surface finishing chain conductive metal oxide particles (B) is in the range of 0.025 to 25 wt.% as a solid content, the concentration of the matrix forming component is in the range of 0.1 to 42.5 wt.% as a solid content and the total solid content concentration is in the range of 0.5 to 50 wt.%.

Description

  The present invention provides at least antistatic performance and antireflection performance by applying a single coating solution containing a chain-like conductive metal oxide particle component having a high refractive index and a silica-based particle component having a low refractive index once. In particular, in the transparent film, the content gradually decreases as the conductive component is changed from the lower layer to the upper layer of the transparent film, while the content is decreased as the low refractive index component is changed from the upper layer to the lower layer of the transparent film. As a result, the refractive index gradually decreased from the lower layer to the upper layer, forming a transparent film to form a transparent film having excellent anti-reflection / anti-reflection performance with excellent light transmittance and transparency. The present invention relates to a coating liquid for coating and a substrate with a transparent coating.

  Conventionally, in order to prevent reflection of the surface of a substrate such as glass, plastic sheet, plastic lens, etc., it is known to form an antireflection film on the surface, for example, by coating method, vapor deposition method, CVD method, etc. A coating of a low refractive index substance such as fluororesin or magnesium fluoride is formed on the surface of a glass or plastic substrate, or a coating liquid containing low refractive index fine particles such as silica fine particles is applied to the surface of the substrate. A method of forming an antireflection coating is known (see, for example, JP-A-7-133105 (Patent Document 1) and the like). At this time, in order to improve the antireflection performance, it is also known to form a high refractive index film containing fine particles of high refractive index under the antireflection coating.

  Further, in order to impart antistatic performance and electromagnetic wave shielding performance to the base material, a conductive film containing conductive oxide fine particles, metal fine particles and the like is also formed. For example, for the purpose of antistatic and antireflection of the surfaces of transparent substrates such as display panels such as cathode ray tubes, fluorescent display tubes, and liquid crystal display panels, transparent coatings having antistatic and antireflection functions are provided on these surfaces. It was done to form.

  In particular, in recent years, such various functional coatings are laminated and used. For example, a hard coat film is formed on a substrate, a conductive film or a high refractive index film is formed, and an antireflection film is formed.

  However, since each film consists of a step of applying a paint, drying, and curing as necessary, many steps are required when forming the multilayer film, and the adhesion between the films is insufficient. There was also a problem in productivity and economy.

  Further, the applicant of the present application includes two kinds of fine particles having different average particle diameters, that is, conductive fine particles having a small particle size and low refractive index fine particles having a large particle size in Japanese Patent Application Laid-Open No. 2003-12965 (Patent Document 2). It has been proposed that by using a coating solution, a conductive film excellent in antireflection performance and antistatic performance can be formed in which particles are divided into upper and lower layers by one coating. However, in Patent Document 2, there are cases where the fine particle layer cannot be formed in such a manner that the two types of fine particles are completely separated from each other in the upper and lower sides, which may result in insufficient antireflection performance and antistatic performance. In some cases, the adhesion to the material is low, and the film strength is insufficient.

  In addition, the present applicant disclosed in Japanese Patent Application Laid-Open No. 2008-291175 (Patent Document 3) that two kinds of surface-treated metal oxide fine particles having different refractive indices and surface charge amounts are formed with a hydrophilic matrix forming component and a hydrophobic matrix forming component. Disclosed that a coating film dispersed in a component that forms a mixed matrix with a component is coated on a substrate once to form a transparent film having two types of metal oxide fine particles separated and a refractive index gradient. Yes.

  However, in the case of Patent Document 3, since two types of matrix forming components, hydrophilic and hydrophobic, are used, even if the refractive index of the transparent film has a gradient, the gradient does not become a gentle gradient, and the transparent layer is substantially separated into two layers. In some cases, the film becomes a coating, and high antireflection performance and high light transmittance cannot be obtained.

  Further, the present applicant has disclosed in Japanese Patent Application Laid-Open No. 2007-321049 (Patent Document 4) and Japanese Patent Application Laid-Open No. 2008-19358 (Patent Document 5) the surface charge of metal oxide fine particles surface-treated with an organosilicon compound or the like. It has been proposed that the metal oxide is unevenly distributed in the coating by dispersing the amount in a specific range in the matrix.

  However, since Patent Documents 4 and 5 are intended to be unevenly distributed, as in Patent Document 2, the target characteristics of the present invention cannot always be exhibited, and further, there is a problem of being applied to a substrate such as plastic. there were.

JP 7-133105 A JP 2003-012965 A JP 2008-291175 A JP 2007-321049 A JP 2008-019358 A

In order to further improve the antireflection performance, the present inventors considered that the two types of particles are not in a state of being separated into two layers in the film, but that both particles have a concentration gradient.
As a result of diligent investigations to solve such problems, it is possible to use two layers of mixed conductive metal oxide particles and surface-treated silica-based fine particles having different particle diameters and having a high refractive index and surface-treated silica particles. The present invention has been completed by finding that a concentration gradient is generated in the particle distribution without separating the particles, and that the conductive metal oxide particles can be distributed in such a manner that the number of conductive metal oxide particles increases toward the upper layer and increases toward the upper layer. It was.

The configuration of the present invention is as follows.
[1] Surface-treated silica-based fine particles (A), surface-treated chain conductive metal oxide particles (B), a matrix-forming component, and a solvent,
The average particle diameter (D _A ) of the surface-treated silica-based fine particles ( _A ) is in the range of 10 to 200 nm,
The surface-treated chain conductive metal oxide particles (B) are linked in the form of chains of 2 to 30 metal oxide particles having an average particle diameter (D _B ) in the range of 5 to 20 nm. The volume resistance value of the chain-like conductive particles is in the range of 10 ⁻² to 10 ⁰ Ω · cm, and the concentration of the surface-treated silica-based fine particles (A) is in the range of 0.05 to 35% by weight as the solid content. Yes,
The concentration of the surface-treated chain conductive metal oxide particles (B) is in the range of 0.025 to 25% by weight as a solid content,
The concentration of the matrix-forming component is in the range of 0.1 to 42.5% by weight as a solid content,
A coating solution for forming a transparent film, wherein the total solid concentration is in the range of 0.5 to 50% by weight.

[2] The surface-treated chain conductive metal oxide particles (B) have a refractive index in the range of 1.60 to 1.90, and the surface-treated silica-based fine particles (A) have a refractive index of 1.15. 1. The coating solution for forming a transparent film according to [1], which falls within the range of 1.46.
[3] The surface treatment agent for the surface-treated silica-based fine particles (A) is an organosilicon compound represented by the formula (1), and the surface treatment agent for the surface-treated chain conductive metal oxide particles (B) is: An organosilicon compound represented by the formula (2),
The amount ratio of silica based particles (A) and organosilicon compound (the weight of the solids / weight of silica-based particles of the organic silicon compound as a _{R n -SiX 4-n / 2} ) is 0.01 to 0.5 The ratio of the chain conductive metal oxide particles (B) to the organosilicon compound (weight of the organosilicon compound as SiO ₂ / weight as the solid content of the chain conductive metal oxide particles) The coating liquid for forming a transparent film according to [1] or [2], wherein is in the range of 0.005 to 0.2.
_{R n -SiX 4-n (1} )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 1 to 3)
SiX ₄ (2)
(However, in the formula, X represents an alkoxy group having 1 to 4 carbon atoms, a silanol group, halogen, or hydrogen, which may be the same or different.)

[4] The coating solution for forming a transparent film according to [1] to [3], wherein the surface-treated chain conductive metal oxide particles (B) are surface-treated chain antimony-doped tin oxide particles (ATO).
[5] The coating solution for forming a transparent film according to [1] to [3], wherein the surface-treated silica-based fine particles (A) are surface-treated silica-based hollow fine particles.
[6] The coating liquid for forming a transparent film according to [1], wherein the matrix forming component is an organic resin matrix forming component and / or a sol-gel matrix forming component.
[7] A substrate with a transparent film in which a transparent film is formed on the substrate,
The transparent coating comprises surface-treated silica-based fine particles (A), surface-treated chain-like conductive metal oxide particles (B), and a matrix component,
The average particle diameter (D _A ) of the surface-treated silica-based fine particles ( _A ) is in the range of 10 to 200 nm,
The surface-treated chain conductive metal oxide particles (B) are linked in the form of chains of 2 to 30 metal oxide particles having an average particle diameter (D _B ) in the range of 5 to 20 nm. Is a surface-treated chain conductive particle having a volume resistance value of 10 ⁻² to 10 ⁰ Ω · cm.
The content of the surface-treated silica-based fine particles (A) is in the range of 10 to 70% by weight as the solid content, and the content of the surface-treated chain conductive metal oxide particles (B) is 5 to 50% by weight as the solid content. In the range of
The content of the matrix component is in the range of 20 to 80% by weight, the content (C _U ) of the surface-treated chain conductive metal oxide particles in the lower part of the transparent coating, and the surface-treated chain conductive metal oxidation in the middle part The content of the product particles (C _M ), the content of the surface-treated chain-like conductive metal oxide particles (C _T ) in the upper part has a relationship of (C _U )> (C _M )> (C _T ), and , (C _U ) and (C _T ) are in a relationship of 1/100 ≦ (C _T ) / (C _U ) ≦ 1/2 (in addition, the upper, middle, and lower portions of the transparent coating are the cross sections of the transparent coating) The base material with a transparent coating is characterized in that the base material is equally divided into three parts, which are an upper part, a middle part and a lower part, respectively.

[8] The surface-treated chain-like conductive metal oxide particles (B) have a refractive index in the range of 1.60 to 1.90, and the surface-treated silica-based fine particles (A) have a refractive index of 1.15. [7] The substrate with a transparent film in the range of 1.46.
[9] The surface treatment agent for the surface-treated silica-based fine particles (A) is an organosilicon compound represented by the formula (1), and the surface treatment agent for the surface-treated chain conductive metal oxide particles (B) is: An organosilicon compound represented by the formula (2),
The amount ratio of silica based particles (A) and organosilicon compound (the weight of the solids / weight of silica-based particles of the organic silicon compound as a _{R n -SiX 4-n / 2} ) is 0.01 to 0.5 The ratio of the chain conductive metal oxide particles (B) to the organosilicon compound (weight of the organosilicon compound as SiO ₂ / weight as the solid content of the chain conductive metal oxide particles) [7] or [8] is a substrate with a transparent coating, in the range of 0.005 to 0.2.
_{R n -SiX 4-n (1} )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 1 to 3)
SiX ₄ (2)
(However, in the formula, X represents an alkoxy group having 1 to 4 carbon atoms, a silanol group, halogen, or hydrogen, which may be the same or different.)

[10] The transparent coated substrate according to any one of [7] to [9], wherein the surface-treated chain conductive metal oxide particles (B) are surface-treated chain antimony-doped tin oxide particles.
[11] The substrate with a transparent coating according to [7] to [9], wherein the surface-treated silica-based fine particles (A) are surface-treated silica-based hollow fine particles.
[12] The substrate with a transparent coating according to [7], wherein the matrix component is an organic resin matrix component and / or a sol-gel matrix component.

According to the present invention, the conductive component is formed into a transparent film by once applying a single coating solution containing a chain-like conductive metal oxide particle component having a high refractive index and a silica-based particle component having a low refractive index. The content gradually decreases from the lower layer to the upper layer, while the low refractive index component gradually decreases from the upper layer to the lower layer of the transparent coating. As a result, the refractive index of the transparent coating decreases from the lower layer. A transparent film that gradually decreases toward the upper layer can be formed.
As a result, the present invention relates to a coating solution for forming a transparent coating and a substrate with a transparent coating for forming a transparent coating having antistatic and antireflection properties excellent in light transmittance and transparency.

Hereinafter, first, the coating liquid for forming a transparent film according to the present invention will be specifically described.
[Transparent coating solution]
The coating liquid for forming a transparent film according to the present invention comprises surface-treated silica-based fine particles (A), surface-treated chain-like conductive metal oxide particles (B), a matrix-forming component, and a solvent.

Surface-treated silica-based fine particles (A)
As the surface-treated silica-based fine particles (A) used in the present invention, silica-based fine particles such as conventionally known silica sol can be used after surface treatment. In the present invention, silica-based hollow fine particles having cavities therein disclosed in Japanese Patent Application Laid-Open Nos. 2001-167637 and 2001-233611 filed by the present applicant can be suitably used because of their low refractive index.

The average particle diameter (D _A ) of the surface-treated silica-based fine particles (A) is preferably in the range of 10 to 200 nm, more preferably 10 to 150 nm.
When the average particle diameter (D _A ) of the surface-treated silica-based fine particles (A) is small, the surface-treated chain-like conductive particles (B) are between the surface-treated silica-based fine particles (A) or the surface-treated silica-based fine particles (A ) It is difficult to form a conductive path maintaining a chain on the surface, and the conductivity may be insufficient.

For this reason, the average particle diameter (D _A ) of the surface-treated silica-based fine particles (A) is the average of the average particle diameter (D _B ) (average primary particle diameter) of the surface-treated conductive particles (B) described later. The particle diameter ratio (D _A ) / (D _B ) is preferably 2 or more, and more preferably 4 to 40.

  By adopting such a particle size ratio, the surface-treated silica-based fine particles (A) can take a form in which conductive particles having a small primary particle diameter are attached in a chain-like state, or the surface-treated silica-based fine particles ( The surface-treated chain conductive particles (B) adhere to the surface of A) to form a conductive path, thereby forming a transparent film having excellent antistatic performance.

If the average particle diameter (D _A ) of the surface-treated silica-based fine particles (A) is too large, internal haze may occur due to Mie scattering and transparency may be insufficient.
In addition, the refractive index of the surface-treated silica-based fine particles (A) is preferably in the range of 1.15 to 1.46, more preferably 1.15 to 1.40.

  When the refractive index of the surface-treated silica-based fine particles (A) is in the above range, the antistatic performance is excellent, although it varies depending on the type, refractive index, blending amount, etc. of the chain conductive metal oxide particles (B) described later. In addition, a transparent film excellent in transparency and antireflection performance can be obtained.

As a surface treatment method for silica-based fine particles, a conventionally known method can be employed, and for example, surface treatment can be performed using an organosilicon compound represented by the following formula (1).
_{R n -SiX 4-n (1} )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 1 to 3)

  Specifically, methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, diphenyldimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, diphenyldiethoxysilane, isobutyltrimethoxysilane, vinyltri Methoxysilane, vinyltriethoxysilane, vinyltris (βmethoxyethoxy) silane, 3,3,3-trifluoropropyltrimethoxysilane, methyl-3,3,3-trifluoropropyldimethoxysilane, β- (3,4- Epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxymethyltrimethoxysilane, γ-glycidoxymethyltriethoxysilane, γ-glycidoxyethyltrimethoxysilane, γ-glycidoxyethyltriethoxysilane, γ- G Lysidoxypropyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriethoxysilane, γ- (β-glycidoxyethoxy) propyltrimethoxy Silane, γ- (meth) acrylooxymethyltrimethoxysilane, γ- (meth) acrylooxymethyltrioxysilane, γ- (meth) acrylooxyethyltrimethoxysilane, γ- (meth) acrylooxyethyl Triethoxysilane, γ- (meth) acrylooxypropyltrimethoxysilane, γ- (meth) acryloxypropyltrimethoxysilane, γ- (meth) acryloxypropyltriethoxysilane, γ- (meth) acrylo Oxypropyltriethoxysilane, butyltrimethoxysilane, isobutylto Riethoxysilane, hexyltriethoxysilaoctyltriethoxysilane, decyltriethoxysilane, butyltriethoxysilane, isobutyltriethoxysilane, hexyltriethoxysilane, octyltriethoxysilane, decyltriethoxysilane, 3-ureidoisopropylpropyltriethoxy Silane, perfluorooctylethyltrimethoxysilane, perfluorooctylethyltriethoxysilane, perfluorooctylethyltriisopropoxysilane, trifluoropropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane, N -Β (aminoethyl) γ-aminopropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-mercaptopropyltrimethoxy Orchids, trimethyl silanol, methyl trichlorosilane, and the like and mixtures thereof.

Of these, preferred are those containing a methacryloxyalkyl group.
When such an organic silicon compound is selected, it is possible to have a distribution in the transparent film, and a transparent film having excellent strength is obtained.

  The surface treatment of the silica-based fine particles (A) is performed by adding a predetermined amount of the organosilicon compound to the alcohol dispersion of the silica-based fine particles (A), adding water thereto, and if necessary, as a catalyst for hydrolysis of the organosilicon compound. It can be carried out by adding an acid or alkali to hydrolyze the organosilicon compound.

The amount ratio between the silica-based fine particles (A) and the organosilicon compound (the weight of the organosilicon compound as R _n —SiX _{4-n / 2} / weight as the solid content of the silica-based fine particles) is the ratio of the silica-based fine particles (A). Although it varies depending on the average particle size, it is preferably in the range of 0.01 to 0.5, more preferably 0.02 to 0.4.

If the weight ratio is small, the resulting surface-treated silica fine particles (A) are insufficiently hydrophobic, or are almost uniformly mixed with the surface-treated chain conductive metal oxide particles (B) to obtain a transparent film In some cases, the desired distribution is not achieved, and the antireflection performance and antistatic performance may be insufficient.
If the weight ratio is too high, an unreacted organosilicon compound may remain and bleed out depending on the type of the organosilicon compound, resulting in haze in the transparent film or insufficient scratch resistance.

Surface-treated chain conductive metal oxide particles (B)
As the chain metal oxide particles used for the surface-treated chain conductive metal oxide particles (B), Sb ₂ O ₅ , ZnO ₂ , SnO ₂ , In ₂ O ₃ , antimony-doped tin oxide (ATO), tin Examples include doped indium oxide (ITO), F-doped tin oxide (FTO), phosphorus-doped tin oxide (PTO), and aluminum-doped zinc oxide (AZO).

  Among them, the chain antimony-doped tin oxide particles (ATO) have a low volume resistance and excellent conductivity, so that a sufficient amount of antistatic performance can be obtained with a small amount of use, and the amount of use can be reduced. Therefore, a transparent film excellent in transparency and light transmittance can be obtained.

  In the surface-treated chain conductive metal oxide particles (B), metal oxide particles (sometimes referred to as primary particles) having an average particle diameter of 5 to 20 nm, preferably 5 to 15 nm are chain-shaped. It is preferable that it is a chain conductive metal oxide particle connected by 30 pieces, preferably 5-30 pieces.

When the number of connections is small, even in the case of undispersed monodisperse particles, the dispersibility is high, so that the predetermined distribution in the transparent film may not be achieved, and the antireflection performance and antistatic performance may be insufficient. .
When the number of connections exceeds 30, the chain conductive metal oxide particles (B) become too long, and when the film thickness of the transparent film is small, 1/100 ≦ (C _T ) / (C _U ) ≦ 1/2 relationship cannot be obtained, and the antireflection performance and antistatic performance may be insufficient.

When the average particle size is small, it is difficult to obtain monodispersed metal oxide particles (primary particles), and thus it is difficult to obtain chain-like conductive metal oxide particles (B).
Even if the average particle diameter is too large, the chain conductive metal oxide particles (B) consisting essentially of chain conductive metal oxide particles may not be obtained, and the reason is not clear. However, there is a case where the antireflection performance and the antistatic performance are insufficient without achieving the particle distribution intended by the present invention.

  The number of connections is measured by taking a TEM photograph of the surface-treated chain-like conductive metal oxide particles (B), and each of the 20 surface-treated chain-like conductive metal oxide particles (B) has a chain shape. The number of primary particles was counted and used as the average value.

The volume resistance values of the metal oxide particles and the chain conductive metal oxide particles are preferably in the range of 10 ⁻² to 10 ⁰ Ω · cm, more preferably 10 ⁻² to 10 ⁻¹ Ω · cm. Note that there is no difference in volume resistance value before and after connection.

The lower limit is the lower limit of the volume resistance value of the metal oxide particles, and if it exceeds 10 ⁰ Ω · cm, the surface resistance value of the transparent film described later increases, and sufficient antistatic performance may not be obtained.

The volume resistance value of such surface-treated chain-like conductive metal oxide particles (B) and metal oxide particles is a ceramic cell (having a cylindrical hollow inside (cross-sectional area: 0.5 cm ² )). First, the cell is placed on the gantry electrode, the sample powder is filled therein, the projection of the upper electrode having a cylindrical projection is inserted, and the upper and lower electrodes are pressurized with a hydraulic machine, and 100 kg / cm (9 .80 MPa) The resistance value (Ω) at the time of pressurization and the height (cm) of the sample are measured, and the resistance value (Ω) is multiplied by the cross-sectional area, which is divided by the height.

  The method for preparing the chain conductive metal oxide particles is not particularly limited as long as the conductive metal oxide particles can be chained, but (1) hydrothermal treatment of the conductive metal oxide particle dispersion at a high temperature. In this application (Examples), (2) Doping by calcination at high temperature or pulverizing metal oxide particles with improved crystallinity in the presence of an alkali and then removing them with an ion exchange resin or the like. Can also be prepared by alkalinizing

As a surface treatment method for the chain conductive metal oxide particles, a conventionally known method can be adopted, but in the present invention, the surface treatment may be performed using an organosilicon compound represented by the following formula (2). preferable.
SiX ₄ (2)
(However, in the formula, X represents an alkoxy group having 1 to 4 carbon atoms, a silanol group, halogen, or hydrogen, which may be the same or different.)

Specific examples include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, and the like, and mixtures thereof.
The surface treatment of the chain conductive metal oxide particles (B) is performed by adding a predetermined amount of the organosilicon compound to the alcohol dispersion of the chain conductive metal oxide particles (B), and adding water to the organosilicon compound. Can be carried out by hydrolysis. At this time, an acid or an alkali can be added as a catalyst for hydrolysis of the organosilicon compound, if necessary.

The amount ratio of the chain conductive metal oxide particles (B) to the organosilicon compound (weight of the organosilicon compound as SiO ₂ / weight as the solid content of the chain conductive metal oxide particles) is the chain conductivity. Although it varies depending on the average particle diameter, the number of connections, etc. of the metal oxide particles (B), it is preferably in the range of 0.005 to 0.2, more preferably 0.01 to 0.1.

  If the weight ratio is small, the dispersion stability of the particles in the coating solution may be reduced, the particles may aggregate, and haze may occur in the resulting transparent coating. If the weight ratio is too large, excessive organosilicon may impede conductivity, and sufficient antistatic performance may not be obtained.

Next, the refractive index of the surface-treated chain-like conductive metal oxide particles (B) is preferably in the range of 1.60 to 1.90, more preferably 1.65 to 1.90.
When the refractive index of the surface-treated chain-like conductive metal oxide particles (B) is low, the refractive index difference from the surface-treated silica-based fine particles (A) is small, and the antireflection performance is insufficient when there are many matrix forming components It may become. It is difficult to obtain a conductive metal oxide in which the refractive index of the surface-treated chain conductive metal oxide particles (B) exceeds the upper limit.

Matrix-forming component In the present invention, an organic resin matrix-forming component and / or a silicone (sol-gel) matrix-forming component can be used as the matrix-forming component.

A conventionally well-known organic resin can be used as an organic resin matrix formation component.
Specific examples include known thermosetting resins, thermoplastic resins, electron beam curable resins, and the like as coating resins. Examples of such resins include conventionally used thermoplastic resins such as polyester resins, polycarbonate resins, polyamide resins, polyphenylene oxide resins, thermoplastic acrylic resins, vinyl chloride resins, fluororesins, vinyl acetate resins, and silicone rubbers. , Urethane resin, melamine resin, silicon resin, butyral resin, reactive silicone resin, phenol resin, epoxy resin, unsaturated polyester resin, thermosetting acrylic resin, UV curable acrylic resin, etc., UV curable type An acrylic resin etc. are mentioned. Further, it may be a copolymer or modified body of two or more of these resins.
Among these, a hydrophilic resin is preferable, and an alkylene oxide-modified acrylic resin is particularly preferable.

  In this invention, the polyfunctional methacrylic ester resin which has 1 or more types of hydrophilic functional groups chosen from a hydroxyl group, an amino group, a carboxyl group, and a sulfo group is used suitably. Specifically, pentaerythritol triacrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tetraacrylate, ditrimethylolpropane tetra (meth) acrylate, dipentaerythritol hexaacrylate, etc., diethylaminomethyl methacrylate, dimethylaminomethyl methacrylate, Dimethylaminoethyl methacrylate, diethylaminoethyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxybutyl methacrylate, 2-hydroxy-3phenoxypropyl acrylate, 2-hydroxy-3-acryloyloxypropyl acrylate, methoxy Triethylene glycol dimethacrylate, butoxydiethylene glycol methacrylate, triethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, tritylene glycol dimethacrylate, polyethylene glycol # 200 dimethacrylate, polyethylene glycol # 400 dimethacrylate, polyethylene glycol # 600 di Methacrylate, polyethylene glycol # 1000 dimethacrylate, polyethylene glycol # 200 diacrylate, polyethylene glycol # 400 diacrylate, polyethylene glycol # 600 diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, polypropylene glycol # 400 diacrylate, polypropylene glycol # 700 diacrylate, 1,6-hexanediol diacrylate, 2-methacryloyloxyethyl succinic acid, 2-acryloyloxyethyl succinic acid, 2-acryloyloxyethyl phthalic acid, 2 -Methacryloyloxyethyl hexahydrophthalic acid, 2-acryloyloxyethyl-2-hydroxyethylphthalic acid, 2-methacryloyloxyethyl acid phosphate, 2-methacryloyloxyethyl acid phosphate, 2-acryloyloxyethyl acid phosphate Fate, a mixture thereof, or two or more copolymers or modified products of these resins may be used.

Further, a polyfunctional methacrylic ester resin having a hydrophobic functional group such as a vinyl group, a urethane group, an epoxy group, a (meth) acryloyl group, or a CF ₂ group can also be used.
Specifically, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane tri (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, dipentaerythritol hexaacrylate, methyl methacrylate, ethyl methacrylate, butyl methacrylate, isobutyl methacrylate, Examples include 2-ethylhexyl methacrylate, isodecyl methacrylate, n-lauryl acrylate, n-stearyl acrylate, 1,6-hexanediol dimethacrylate, perfluorooctylethyl methacrylate, trifluoroethyl methacrylate, urethane acrylate, and the like, and mixtures thereof.
Moreover, the polyfunctional methacrylic ester resin having the hydrophilic functional group and the polyfunctional methacrylic ester resin having the hydrophobic functional group can be mixed and used.

  In the present invention, an alkylene oxide-modified acrylic resin can be particularly preferably used. Examples of the alkylene oxide-modified acrylic resin include ethylene oxide-modified acrylic resins such as ethoxylated pentaerythritol tetraacrylate, propylene oxide-modified acrylic resins, and the like. In addition, the alkylene oxide-modified acrylic resin can be used by mixing with an unmodified acrylic resin.

  Non-modified acrylic resins include pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tetraacrylate, ditrimethylolpropane tetra (meth) acrylate, dipentaerythritol hexaacrylate, methyl methacrylate, Ethyl methacrylate, butyl methacrylate, isobutyl methacrylate, 2-ethylhexyl methacrylate, isodecyl methacrylate, n-lauryl acrylate, n-stearyl acrylate, 1,6-hexanediol dimethacrylate, perfluorooctylethyl methacrylate, trifluoroethyl methacrylate, urethane acrylate And mixtures thereof.

When such an alkylene oxide-modified acrylic resin is used, the surface-treated chain metal oxide particles (B) are highly dispersed without agglomerating with each other in the coating solution, and the surface in the transparent coating is described later. The order of the content in the lower, middle and upper parts of the treated chain conductive metal oxide particles (B) is in the relationship of (C _U )> (C _M )> (C _T ), that is, the surface treated chain metal The oxide particle (B) has a concentration gradient, and it is possible to obtain a substrate with a transparent coating that is excellent in antistatic performance and excellent in transparency, transmittance, and antireflection performance.

As the silicone-based (sol-gel) matrix-forming component, an organosilicon compound represented by the following formula (3) or a hydrolyzate or hydrolyzed polycondensate thereof can be used.
_{R n -SiX 4-n (3} )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 1 to 3)

  Specifically, methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, diphenyldimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, diphenyldiethoxysilane, isobutyltrimethoxysilane, vinyltri Methoxysilane, vinyltriethoxysilane, vinyltris (βmethoxyethoxy) silane, 3,3,3-trifluoropropyltrimethoxysilane, methyl-3,3,3-trifluoropropyldimethoxysilane, β- (3,4- Epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxymethyltrimethoxysilane, γ-glycidoxymethyltriethoxysilane, γ-glycidoxyethyltrimethoxysilane, γ-glycidoxyethyltriethoxysilane, γ- G Lysidoxypropyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriethoxysilane, γ- (β-glycidoxyethoxy) propyltrimethoxy Silane, γ- (meth) acrylooxymethyltrimethoxysilane, γ- (meth) acrylooxymethyltrioxysilane, γ- (meth) acrylooxyethyltrimethoxysilane, γ- (meth) acrylooxyethyl Triethoxysilane, γ- (meth) acrylooxypropyltrimethoxysilane, γ- (meth) acryloxypropyltrimethoxysilane, γ- (meth) acryloxypropyltriethoxysilane, γ- (meth) acrylo Oxypropyltriethoxysilane, butyltrimethoxysilane, isobutylto Riethoxysilane, hexyltriethoxysilaoctyltriethoxysilane, decyltriethoxysilane, butyltriethoxysilane, isobutyltriethoxysilane, hexyltriethoxysilane, octyltriethoxysilane, decyltriethoxysilane, 3-ureidoisopropylpropyltriethoxy Silane, perfluorooctylethyltrimethoxysilane, perfluorooctylethyltriethoxysilane, perfluorooctylethyltriisopropoxysilane, trifluoropropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane, N -Β (aminoethyl) γ-aminopropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-mercaptopropyltrimethoxy Orchids, trimethylsilanol, methyltrichlorosilane, and the like, and hydrolyzate thereof, and a hydrolytic polycondensate.

When the matrix forming component such as a polymerization initiator is an organic resin as described above, a photopolymerization initiator may be included when the resin is an ultraviolet curable resin, and a curing catalyst is included when the resin is a thermosetting resin. It may be.

  The polymerization initiator is not particularly limited as long as the matrix-forming component can be cured, and conventionally known ones can be used. For example, bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, bis (2, 6-dimethoxybenzoyl) 2,4,4-trimethyl-pentylphosphine oxide, 2-hydroxy-methyl-2-methyl-phenyl-propane-1-ketone, 2,2-dimethoxy-1,2-diphenylethane-1 -One, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-methyl-1- [4- (methylthiophenyl] -2-morpholinopropan-1-one, and the like.

  Examples of the curing catalyst include inorganic acids such as nitric acid, hydrochloric acid and sulfuric acid, organic acids such as formic acid, acetic acid and itaconic acid, and basic substances such as ammonia, ethylamine and ethanolamine.

Solvent As the solvent used in the present invention, the matrix-forming component, a polymerization initiator used as necessary, a curing catalyst can be dissolved or dispersed, and surface-treated silica-based fine particles (A), surface-treated chain-like conductive metal oxide particles ( A conventionally known solvent that can uniformly disperse B) can be used.

  For example, alcohols such as water, methanol, ethanol, propanol, 2-propanol (IPA), butanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol; methyl acetate, ethyl acetate, isopropyl acetate, isopropyl acetate, isobutyl acetate , Butyl acetate, isopentyl acetate, pentyl acetate, 3-methoxybutyl acetate, 2-ethylbutyl acetate, esters such as ethylene glycol monoacetate, glycols such as ethylene glycol and hexylene glycol; diethyl ether, ethylene glycol monomethyl ether, ethylene Glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol isopropyl ether, diethylene glycol monomethyl ether, Hydrophilic solvents including ethers such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether and purpylene glycol ethyl ether, propyl acetate, isobutyl acetate, butyl acetate, isopentyl acetate, pentyl acetate, 3-methoxybutyl acetate, acetic acid 2 -Ethylbutyl, cyclohexyl acetate, esters such as ethylene glycol acetate; polar solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, butyl methyl ketone, dipropyl ketone, methyl pentyl ketone, diisobutyl ketone and the like. These may be used singly or in combination of two or more.

Coating solution composition The total solid concentration of the coating solution for forming a transparent coating is preferably in the range of 0.5 to 50% by weight, more preferably 1 to 30% by weight.

  If the total solid concentration of the coating liquid for forming a transparent film is small, the film thickness of the formed transparent film may become too thin, depending on the coating method, and sufficient antireflection performance and antistatic performance may not be obtained. is there.

  Even if the total solid concentration of the coating solution for forming a transparent film is increased, the film thickness may become too thick, and thus cracks may occur. Further, even if the thickness is increased, the antistatic performance and the antireflection performance are not further improved.

The concentration of the surface-treated silica-based fine particles (A) in the coating liquid for forming a transparent film is preferably in the range of 0.05 to 35% by weight, more preferably 0.075 to 24% by weight as the solid content.
When the concentration of the surface-treated silica-based fine particles (A) is small, the content of the surface-treated silica-based fine particles (A) in the obtained transparent film is small, and sufficient antireflection performance may not be obtained. Even if the surface-treated silica-based fine particles (A) are too much, the content of the surface-treated silica-based fine particles (A) in the obtained transparent film is too large, while the surface-treated chain conductive metal oxide particles (B ) Content is reduced, the gradient of the refractive index of the transparent film to be described later cannot be obtained, and both the antireflection performance and the antistatic performance may be insufficient.

  The concentration of the surface-treated chain conductive metal oxide particles (B) in the coating solution for forming a transparent film is in the range of 0.025 to 25% by weight, more preferably 0.038 to 17.2% by weight as the solid content. It is preferable that it exists in.

  If the concentration of the surface-treated chain conductive metal oxide particles (B) is too low, the content of the surface-treated chain conductive metal oxide particles (B) in the resulting transparent film is reduced, and antistatic performance is improved. In addition to being insufficient, the gradient of the refractive index of the transparent film may not be obtained, and the antireflection performance may be insufficient. Even if the concentration of the surface-treated chain conductive metal oxide particles (B) is too high, the content of the surface-treated silica-based fine particles (A) in the resulting transparent film is too small, while the surface-treated chain-like conductive particles In some cases, the content of the conductive metal oxide particles (B) is excessively large, the gradient of the refractive index of the obtained transparent film cannot be obtained, and both the antireflection performance and the antistatic performance are insufficient.

The concentration of the matrix-forming component in the coating solution for forming a transparent film is preferably in the range of 0.1 to 42.5% by weight, more preferably 0.225 to 32% by weight as the solid content.
If the concentration of the matrix-forming component is low, the matrix-forming component is reduced, and the scratch resistance of the transparent film, adhesion to the substrate, etc. may be insufficient. Even if the concentration of the matrix forming component is too high, the surface-treated silica-based fine particles (A) and / or the surface-treated chain-like conductive metal oxide particles (B) are reduced, and the antireflection performance and antistatic performance are insufficient. There is a case.

  The above-mentioned coating liquid for forming a transparent film is applied to a substrate by a known method such as a dipping method, a spray method, a spinner method, a roll coating method, a bar coating method, a gravure printing method, or a micro gravure printing method, dried, and then irradiated with ultraviolet rays. A transparent film can be formed by curing by conventional methods such as irradiation and heat treatment.

[Base material with transparent film]
The substrate with a transparent coating according to the present invention is a substrate with a transparent coating in which a transparent coating is formed on the substrate, and the transparent coating is a surface-treated silica-based fine particle (A) and a surface-treated chain conductive metal oxide. It comprises physical particles (B) and a matrix component.

And the content (C _U ) of the surface-treated chain conductive metal oxide particles in the lower part of the transparent coating, the content (C _M ) of the surface-treated chain conductive metal oxide particles in the middle part, the surface treatment in the upper part The content (C _T ) of the chain conductive metal oxide particles is in a relationship of (C _U )> (C _M )> (C _T ), and (C _U ) and (C _T ) are 1 / 100 ≦ (C _T ) / (C _U ) ≦ 1/2.

Substrate As the substrate used in the present invention, conventionally known ones can be used without particular limitation, and glass, polycarbonate, acrylic resin, polyethylene terephthalate (PET), triacetyl cellulose (TAC), cyclopolyolefin And plastic sheets such as norbornene, plastic films, and plastic panels.

  Moreover, the well-known base material which has an unevenness | corrugation on the surface can be used, and the base material with a transparent film which has anti-glare property in this case can be obtained. Furthermore, a base material in which a film having irregularities is formed on a base material having a flat surface can be used. In this case, a base material with a transparent coating having antiglare properties can also be obtained. Furthermore, a base material in which another film such as a hard coat film or a primer film is formed on the base material can also be used.

As the surface-treated silica-based fine particles (A) contained in the transparent coating transparent film, the aforementioned surface-treated silica-based fine particles (A) can be used, and in the present invention, surface-treated silica-based fine particles having a low refractive index are used. preferable.

  The content of the surface-treated silica-based fine particles (A) in the transparent film is preferably 10 to 70% by weight, more preferably 15 to 60% by weight. When the content of the surface-treated silica-based fine particles (A) is small, the content of the surface-treated silica-based fine particles (A) present in the upper layer in the transparent film is small, and sufficient antireflection performance may not be obtained. Even if the content of the surface-treated silica-based fine particles (A) is too much, the content of the surface-treated silica-based fine particles (A) in the transparent film is too large, while the surface-treated chain-like conductive metal oxide particles ( The content of B) is reduced, the gradient of the refractive index of the transparent film described later cannot be obtained, and both the antireflection performance and the antistatic performance may be insufficient.

  As the surface-treated chain conductive metal oxide particles (B) contained in the transparent film, the aforementioned surface-treated chain conductive metal oxide particles (B) can be used. Surface-treated chain antimony-doped tin oxide particles (ATO) having excellent properties, high light transmittance and excellent transparency are preferably used.

  The content of the surface-treated chain-like conductive metal oxide particles (B) in the transparent film is preferably 5 to 50% by weight, more preferably 7.5 to 43% by weight as a solid content. If the content of the surface-treated chain-like conductive metal oxide particles (B) in the transparent film is small as the solid content, the content of the surface-treated silica-based fine particles (A) in the transparent film becomes too large, while the surface The content of the treated chain-like conductive metal oxide particles (B) is decreased, the gradient of the refractive index of the transparent film cannot be obtained, and both the antireflection performance and the antistatic performance may be insufficient. Even if the content of the surface-treated chain conductive metal oxide particles (B) in the transparent film is too large, the content of the surface-treated silica-based fine particles (A) in the transparent film is too small, while the surface treatment In some cases, the content of the chain conductive metal oxide particles (B) becomes too large, the gradient of the refractive index of the transparent film cannot be obtained, and the antireflection performance is insufficient.

As a matrix component, the hardened | cured material of the above-mentioned organic resin matrix formation component and the hardened | cured material of the above-mentioned silicone type (sol gel type) matrix formation component are contained in a transparent film.
The content of the matrix component in the transparent coating is preferably in the range of 20 to 85% by weight, more preferably 30 to 80% by weight as the solid content.

  When the content of the matrix component in the transparent film is small as a solid content, the strength of the transparent film, adhesion to the substrate, and scratch resistance may be insufficient. Even if the content of the matrix component in the transparent coating is too large, the surface-treated silica-based fine particles (A) and / or the surface-treated chain-like conductive metal oxide particles (B) are few, and antireflection performance and antistatic performance are achieved. It may be insufficient.

The transparent coating according to the present invention contains the surface-treated silica-based fine particles (A) and the surface-treated chain-like conductive metal oxide particles (B) in the above-mentioned range. Content of treated chain conductive metal oxide particles (C _U ), content of surface treated chain conductive metal oxide particles in the middle (C _M ), surface treated chain conductive metal oxide particles in the upper part Content (C _T ) is in a relationship of (C _U )> (C _M )> (C _T ). The (C _U ) and (C _T ) have a relationship of 1/100 ≦ (C _T ) / (C _U ) ≦ 1/2.

  That is, the distribution of the surface-treated chain-like conductive metal oxide particles (B) in the transparent film is gradually decreased from the lower part to the upper part of the transparent film. Correspondingly, the distribution of the surface-treated silica-based fine particles (A) contained simultaneously decreases sequentially from the upper part to the lower part of the transparent film.

The upper, middle, and lower portions of the transparent film are obtained by equally dividing the transparent film cross section into three parts, which are an upper part, a middle part, and a lower part, respectively.
The content of the surface-treated chain conductive metal oxide particles (B) in the lower, middle and upper parts of the surface-treated chain conductive metal oxide particles (B) is the surface-treated chain conductive metal oxide in the transparent film. The content (C _U ) of the surface-treated chain conductive metal oxide particles (B) in the lower part varies depending on the content (W) of the product particles (B). The ratio (C _U ) / (W) to the content (W) of the product particles (B) is preferably in the range of 0.34 to 0.99, more preferably in the range of 0.40 to 0.95. The content (C _M ) of the surface-treated chain metal oxide particles (B) in is approximately the same as the content (W) of the surface-treated chain metal oxide particles (B) in the transparent film. need not necessarily _{coincide, (C M) / (W} ) is 0.01 to 0.49, good be more in the range of 0.02 to 0.45 Ratio properly, the surface treatment chain metal oxide particles in the further upper content of (B) (C _T) content of the surface treatment chain conductive metal oxide particles in the transparent film (B) (W) (C _T ) / (W) is preferably in the range of 0 to 0.33, more preferably 0.01 to 0.30. Note that (C _U )> (C _M )> (C _T ), and 1/100 ≦ (C _T ) / (C _U ) ≦ 1/2.

  If the distribution of the content of the surface-treated chain-like conductive metal oxide particles (B) in the lower, middle and upper parts of the transparent coating is in the above range, the antistatic performance is excellent and the transparency, transmittance and antireflection performance are also achieved. Can be obtained.

When the ratio (C _T ) / (C _U ) exceeds 1/2, the refractive index and content of the surface-treated conductive metal oxide particles (B) and the refractive index of the surface-treated silica-based fine particles (A) Depending on the content of the surface-treated conductive metal oxide particles (B) in the transparent coating, the difference between the lower, middle and upper portions becomes smaller, and the light transmittance and antireflection performance of the transparent coating are reduced. May become insufficient.

If the ratio (C _T ) / (C _U ) is smaller than 1/100, if it is smaller than 1/100, a layer containing a large amount of surface-treated silica-based fine particles (A) is formed in the upper part, and a surface-treated chain is formed in the lower part. In some cases, a layer having a large amount of conductive metal oxide particles (B) is formed, resulting in a transparent coating substantially separated into two layers, and the effect of improving the antireflection performance due to the concentration gradient described above may not be sufficiently obtained. is there.

  Here, the measurement of each metal oxide content of the surface-treated chain-like conductive metal oxide particles (B) in the lower part, the middle part, and the upper part first measures a transmission electron micrograph (TEM) of the transparent film. . At this time, the surface-treated chain-like conductive metal oxide particles (B) are recognized as distinguished from the surface-treated silica-based fine particles (A) from the difference in average particle diameter and / or contrast.

  Divide the cross-section into three equal parts, top, middle and bottom, and count the number of primary particles of the surface-treated chain-like conductive metal oxide particles (B) at the top, middle and bottom, and total the number of primary particles at each part. The ratio in each part is obtained by dividing by the number of primary particles. The content of the surface-treated chain conductive metal oxide particles (B) in each part is obtained by multiplying the content of the surface-treated chain conductive metal oxide particles (B) in the transparent film by the ratio of each part. Can be sought.

In addition, about the particle | grains which exist on a dividing line, let it be the particle | grains of the site | part which exists mainly.
Such distribution can be achieved by using the coating solution described above.
For this reason, the coating liquid contains
-Use two types of surface-treated particles with different particle diameter ranges-If the surface treatment agent is silica-based fine particles, use n = 1 to 3 organosilicon compound (hydrophobic), and chain conductivity In the case of fine particles, use an n = 4 organosilicon compound (hydrophilic). A particle size ratio of 2 or more is an important factor, and the content of both particles is also important. If one is too small, an effective gradient distribution may not be obtained.

The film thickness of the formed transparent film is preferably in the range of 50 to 500 nm, more preferably 80 to 300 nm.
If the film thickness of the transparent coating is thin, antireflection performance and antistatic performance may be insufficient. Even if the film thickness of the transparent coating is too thick, the antireflection performance may be insufficient.

The surface resistance value of the transparent film is preferably in the range of 10 ³ to 10 ¹³ Ω / □, more preferably 10 ³ to 10 ¹² Ω / □. It is difficult to obtain a transparent film having a surface resistance value below the lower limit of the above range, and if it exceeds the upper limit, the antistatic performance may be insufficient.

  The substrate with a transparent coating according to the present invention can be produced by applying the above-described coating solution for forming a transparent coating on a substrate, drying and curing. Specifically, the coating liquid for forming a transparent film is formed by a known method such as dipping, spraying, spinner, roll coating, bar coating, slit coater printing, gravure printing, or micro gravure printing. A transparent coating film can be formed by applying to a substrate, drying, and curing by an ordinary method such as ultraviolet irradiation or heat treatment.

[Example]
EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these Examples.

[Example 1]
Preparation of surface-treated silica-based fine particle (A-1) dispersion
Pure water to 120 g of silica / alumina sol (manufactured by JGC Catalysts & Chemicals Co., Ltd .: USBB-120, average particle size 25 nm, SiO ₂ · Al ₂ O ₃ concentration 20 wt%, solid content Al ₂ O ₃ content 27 wt%) 3680 g was added and heated to 95 ° C. While maintaining this temperature, 2100 g of a 15 wt% sodium silicate aqueous solution as SiO ₂ and 2100 g of a 05 wt% sodium aluminate aqueous solution as Al ₂ O ₃ were added. Thus, a dispersion of SiO ₂ · Al ₂ O ₃ composite oxide fine particles (1-1) (average particle size 43 nm) was obtained. At this time, the Al ₂ O ₃ / SiO ₂ molar ratio was 0.2. Further, the pH of the reaction solution at this time was 12.0.

SiO ₂ / Al ₂ O ₃ composite oxide fine particles (1-2) (8800 g of 15 wt% sodium silicate aqueous solution as SiO ₂ and 3000 g of 05 wt% sodium aluminate aqueous solution as Al ₂ O ₃ were added. An average particle diameter of 60 nm) dispersion was obtained. The Al ₂ O ₃ / SiO ₂ molar ratio at this time was 0.07. Further, the pH of the reaction solution at this time was 12.0.

  Next, 1,125 g of pure water was added to 500 g of the dispersion of the composite oxide fine particles (1-2) washed with an ultrafiltration membrane to a solid content of 13 wt%, and concentrated hydrochloric acid (concentration 355 wt%). Was dropped to pH 10 and dealumination was performed. Next, the aluminum salt dissolved in the ultrafiltration membrane is separated and washed while adding 10 L of pH 3 hydrochloric acid aqueous solution and 5 L of pure water to obtain a silica-based hollow fine particle (1-3) aqueous dispersion having a solid content concentration of 20% by weight. It was.

Next, a mixture of 150 g of silica-based hollow fine particle (1-3) aqueous dispersion, 500 g of pure water, 1,750 g of ethanol, and 626 g of ammonia water having a concentration of 28% by weight was heated to 35 ° C. Silica system in which 140 g of silicate (SiO ₂ concentration 28 wt%) was added to form a silica coating layer and washed with an ultrafiltration membrane while adding 5 L of pure water to form a silica coating layer with a solid content concentration of 20 wt% An aqueous dispersion of hollow fine particles (1-4) was obtained.

Ammonia water is added to the dispersion of silica-based hollow fine particles (1-4) having a silica coating layer to adjust the pH of the dispersion to 10.5, and then aged at 200 ° C. for 11 hours, and then cooled to room temperature. Then, ion exchange is performed for 3 hours using 400 g of a cation exchange resin (Mitsubishi Chemical Corporation: Diaion SK1B), and further, 200 g of anion exchange resin (Mitsubishi Chemical Corporation: Diaion SA20A) is used for 3 hours. Silica-based hollow fine particles having a solid content concentration of 20% by weight were subjected to ion exchange for a period of time and further washed by ion exchange at 80 ° C. for 3 hours using 200 g of a cation exchange resin (manufactured by Mitsubishi Chemical Corporation: Diaion SK1B). (1-5) A dispersion was obtained. At this time, the Na ₂ O content and NH ₃ content of the aqueous dispersion of silica-based hollow fine particles (1-5) were 8 ppm and 1500 ppm per silica-based hollow fine particle.

Next, again, the silica-based hollow fine particle (1-5) dispersion was hydrothermally treated at 150 ° C. for 11 hours, then cooled to room temperature, and 400 g of a cation exchange resin (manufactured by Mitsubishi Chemical Corporation: Diaion SK1B) was added. And then ion exchange for 3 hours using 200 g of anion exchange resin (Mitsubishi Chemical Corporation: Diaion SA20A), and further cation exchange resin (Mitsubishi Chemical Corporation: Diamond) 200 g of ion SK1B) was used for ion exchange at 80 ° C. for 3 hours for washing to obtain a silica-based hollow fine particle (1-6) aqueous dispersion having a solid content concentration of 20% by weight. At this time, the Na ₂ O content and NH ₃ content of the aqueous dispersion of silica-based hollow fine particles (1-6) were 0.4 pm and 60 ppm per silica-based hollow fine particle.

  Furthermore, a silica-based hollow fine particle (1-6) alcohol dispersion having a solid content concentration of 20% by weight, in which the solvent was replaced with methanol using an ultrafiltration membrane, was prepared. The average particle diameter and refractive index of the silica-based hollow fine particles (1-6) were measured, and the results are shown in the table.

3 g of γ-methacrylooxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-503) is added to 100 g of an alcohol dispersion of silica-based hollow fine particles (1-6) having a solid content of 20% by weight, and 50 Heat treatment is performed at 0 ° C., and then the solvent is replaced with propylene glycol monomethyl ether (PGME) using a rotary evaporator, and the surface-treated silica-based fine particles (A-1) PGME dispersion having a solid content concentration of 20.5% by weight is obtained. Prepared.
The surface-treated silica-based fine particles (A-1) were measured for average particle diameter and refractive index, and the results are shown in the table.

Preparation of surface-treated chain conductive metal oxide particle (B-1) dispersion A mixed solution in which 130 g of potassium stannate and 30 g of potassium antimonyl tartrate were dissolved in 400 g of pure water was prepared. This prepared solution was dissolved in 1.0 g of ammonium nitrate under stirring at 60 ° C. over 12 hours, and added to 1000 g of pure water adjusted to pH 10.5 using potassium hydroxide for hydrolysis. At this time, a 10% nitric acid solution was simultaneously added so as to keep the pH at 10.5. The generated precipitate was washed by filtration and then dispersed again in water to prepare a metal oxide precursor hydroxide dispersion having a solid concentration of 20% by weight.

  This dispersion was spray-dried at a temperature of 100 ° C. to prepare a metal oxide precursor hydroxide powder. This powder was heat-treated at 550 ° C. for 2 hours in an air atmosphere to obtain Sb-doped tin oxide (ATO) powder.

60 g of this powder was dispersed in 140 g of an aqueous potassium hydroxide solution having a concentration of 4.3% by weight, and the dispersion was pulverized with a sand mill for 3 hours while maintaining the temperature at 30 ° C. to prepare a sol.
Next, this sol is subjected to dealkalization treatment with an ion exchange resin until the pH becomes 3.0, then pure water is added to dilute the solid content concentration to 20% by weight, and Sb dopant oxidation is performed. A chain-like conductive metal oxide particle (B-1) dispersion composed of tin fine particles was prepared. The chain conductive metal oxide particle (1) dispersion had a pH of 3.2. The average primary particle diameter of the chain conductive metal oxide particles (B-1) was 8 nm.

100 g of a chain conductive metal oxide particle (B-1) dispersion having a solid content concentration of 20% by weight was adjusted to 25 ° C., and tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: normal ethyl silicate, SiO ₂ concentration of 28.8 wt. %) 3.5 g was added in 3 minutes, followed by stirring for 30 minutes. Thereafter, 100 g of ethanol was added over 1 minute, the temperature was raised to 50 ° C. over 30 minutes, and a heat treatment was performed for 15 hours. The solid concentration at this time was 10% by weight.

Furthermore, the dispersion medium water and ethanol are replaced with ethanol in an ultrafiltration membrane, and the surface-treated chain conductive metal oxide particle (B-1) dispersion having a solid concentration of 20.5% by weight is obtained. Was prepared.
The average number of connected primary particles constituting the surface-treated chain conductive metal oxide particles (B-1), the refractive index, and the volume resistance value were measured, and the results are shown in the table.

Preparation of coating liquid for forming transparent film (1) Surface-treated silica-based fine particles (A-1) with a solid content concentration of 20.5% by weight. To 4.68 g of PGME dispersion, mixed alcohol of methanol, ethanol and isopropyl alcohol (Japanese alcohol) Sold by: Solmix AP-11) 76.76 g, PGME 13.24 g, solid content concentration 20.5 wt% surface-treated chain conductive metal oxide particle (B-1) dispersion 2.93 g, pentaerythritol Add 0.95 g of photoinitiator (Ciba Specialty Co., Ltd .: Irgacure 184) to 1.44 g of triacrylate (Kyoeisha Chemical Co., Ltd .: Light acrylate PE-3A, resin concentration 100% by weight) and mix well. A coating solution (1) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of coating liquid for hard coat film formation (1) Silica sol dispersion (manufactured by JGC Catalysts &Chemicals; Cataloid SI-30; average particle size 12 nm, SiO ₂ concentration 40.5% by weight, dispersion medium: isopropanol, Particle refractive index 1.46) 1.88 g of γ-methacryloxypropyltrimethoxysilane (Shin-Etsu Silicone Co., Ltd .: KBM-503, SiO ₂ component 81.2%) was mixed with 100 g of ultrapure water 3 0.1 g was added and stirred at 50 ° C. for 20 hours to obtain a surface-treated 12 nm silica sol dispersion (solid content concentration: 40.5% by weight). Thereafter, the solvent was replaced with propylene glycol monopropyl ether (PGME) by a rotary evaporator (solid content: 40.5% by weight).

  Subsequently, 51.85 g of a silica sol propylene glycol monopropyl ether dispersion having a solid content concentration of 40.5% by weight, 18.90 g of dihexaerythritol triacetate (manufactured by Kyoeisha Chemical Co., Ltd .: DPE-6A), and 1.6- Hexanediol diacrylate (manufactured by Kyoeisha Chemical Co., Ltd .; light acrylate SR-238F) 2.10 g, silicone leveling agent (manufactured by Enomoto Kasei Co., Ltd .; Disparon 1610) and photopolymerization initiator )) Made: Irgacure 184, dissolved in PGME to a solid content concentration of 10% by weight) 12.60 g and 14.54 g of PGME are thoroughly mixed to form a hard coat film forming coating solution having a solid content concentration of 42.0% by weight (1 ) Was prepared.

Preparation of substrate with transparent coating (1) Coating liquid (1) for hard coat film formation was applied to a TAC film (manufactured by Panac Corporation: FT-PB80UL-M, thickness: 80 μm, refractive index: 1.51). After applying by the bar coater method (# 14) and drying at 80 ° C. for 120 seconds, it was cured by irradiating with 300 mJ / cm ² of ultraviolet rays to form a substrate with a hard coat film. The film thickness of the hard coat film was 6 μm.

The coating liquid for forming a transparent film (1) was applied onto a substrate with a hard coat film by the bar coater method (bar # 4), dried at 80 ° C. for 120 seconds, and then 400 mJ / cm ^{2 in} an N ₂ atmosphere. A substrate (1) with a transparent coating was prepared by irradiating with ultraviolet rays and curing. The film thickness of the transparent coating was 240 nm.

  The total light transmittance, haze, reflectance, surface resistance value, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of the upper, middle and lower parts of the transparent film-coated substrate (1) The content of the conductive metal oxide particles (B-1) is shown in the table.

  The total light transmittance and haze were measured by a haze meter (manufactured by Suga Test Instruments Co., Ltd.), and the reflectance was measured by a spectrophotometer (JASCO Corporation, Ubest-55). The surface resistance value was measured with a surface resistance meter (manufactured by Mitsubishi Chemical Corporation: Hiresta).

The uncoated TAC film had a total light transmittance of 93.2%, a haze of 0.2%, and a reflectance of light having a wavelength of 550 nm of 6.0%.
Further, coloring, adhesion, scratch resistance, and pencil hardness were evaluated by the following methods and evaluation criteria, and the results are shown in the table.

The substrate with colored transparent coating (1) is irradiated with light from a fluorescent lamp, visually observed for the presence or absence of coloring by transmission, and evaluated according to the following criteria. The results are shown in Table 1.
Evaluation criteria:
Colorless and transparent, no coloration is recognized: ◎
Very thin and slightly colored: ◯
Lightly colored: △
Dark coloring is recognized: ×

Adhesive transparent film-coated substrate (1) The surface of the substrate (1) with a knife is made 11 parallel scratches at intervals of 1 mm in length and width to make 100 squares, cellophane tape is adhered to this, then cellophane tape is attached. Adhesion was evaluated by classifying the number of squares that remained without peeling off when the film was peeled into the following four stages. The results are shown in Table 1.
Evaluation criteria:
Number of remaining squares: ◎
Number of remaining squares 90-99: ○
Number of remaining squares: 85 to 89: Δ
Number of remaining squares: 84 or less: ×

Measurement of Scratch Resistance Using # 0000 steel wool, sliding 10 times at a load of 500 g / cm ² , visually observing the surface of the film and evaluating according to the following criteria, the results are shown in Table 1.
Evaluation criteria:
No streak injury is found: ◎
Slightly scratched streak: ○
Many scratches are found in the streak: △
The surface has been cut entirely: ×

Pencil hardness It measured with the pencil hardness tester according to JIS-K-5400.

[Example 2]
Preparation of coating solution (2) for transparent film formation
Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1, and a mixed alcohol of methanol, ethanol and isopropyl alcohol (Japan Alcohol Sales Co., Ltd.) Manufactured by: Solmix AP-11) 76.76 g, PGME 13.24 g, dispersion of surface-treated chain conductive metal oxide particles (B-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. 4.10 g of liquid, 0.95 g of photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) was added to 1.44 g of pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight). Then, the mixture was thoroughly mixed to prepare a coating solution (2) for forming a transparent film having a solid content concentration of 3% by weight.

Preparation of substrate with transparent film (2) A substrate with transparent film (2) was prepared in the same manner as in Example 1, except that the coating liquid for forming a transparent film (2) was used. The film thickness of the transparent coating was 315 nm.
For substrate with transparent coating (2), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower parts in transparent coating The content of the conductive metal oxide particles (1) is shown in the table.

[Example 3]
Preparation of coating solution (3) for transparent film formation
Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. A mixed alcohol of methanol, ethanol and isopropyl alcohol (Japan Alcohol Sales Co., Ltd.) was added to 5.85 g of PGME dispersion. Manufactured by: Solmix AP-11) 76.76 g, PGME 13.24 g, surface-treated chain conductive metal oxide particle (B-1) dispersion 1 having a solid content concentration of 20% by weight prepared in the same manner as in Example 1. .76 g, pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100 wt%) 1.44 g was added 0.95 g of photoinitiator (Ciba Specialty Co., Ltd .: Irgacure 184). By thoroughly mixing, a coating solution (3) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent film (3) A substrate with transparent film (3) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (3) was used. The film thickness of the transparent coating was 223 nm.
For substrate with transparent coating (3), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance, and surface treatment chain of upper, middle and lower parts in transparent coating The content of the conductive metal oxide particles (B-1) is shown in the table.

[Example 4]
Preparation of surface-treated chain conductive metal oxide particle (B-2) dispersion In the same manner as in Example 1, Sb-doped tin oxide (ATO) powder was obtained, pulverized into a sol, and dealkalized. Thereafter, a conductive metal oxide particle (B-2) dispersion was prepared in the same manner except that pure water was added to dilute to a solid content concentration of 17.5% by weight. The pH of this conductive metal oxide particle (B-2) dispersion was 3.2. The average particle size of the conductive metal oxide particles (B-2) was 8 nm.

Next, 100 g of the conductive metal oxide particle (B-2) dispersion having a solid content concentration of 17.5% by weight was adjusted to 25 ° C., and tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: normal ethyl silicate, SiO ₂ concentration 28. (8% by weight) 3.0 g was added in 3 minutes, followed by stirring for 30 minutes. Thereafter, 100 g of ethanol was added over 1 minute, the temperature was raised to 50 ° C. over 30 minutes, and a heat treatment was performed for 15 hours. The solid content concentration at this time was 8.75% by weight.

Next, the dispersion medium water and ethanol are replaced with ethanol in an ultrafiltration membrane, and the surface-treated chain conductive metal oxide particle (B-2) dispersion having a solid concentration of 20.5% by weight is obtained. Was prepared.
The average number of connected primary particles constituting the surface-treated chain conductive metal oxide particles (B-2), the refractive index, and the volume resistance value were measured, and the results are shown in the table.

Preparation of coating liquid for forming transparent film (4) Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. To 4.68 g of PGME dispersion, methanol and ethanol And isopropyl alcohol mixed alcohol (Nippon Alcohol Sales Co., Ltd .: Solmix AP-11) 76.76 g, PGME 13.24 g, solid content concentration 20.5 wt% surface-treated chain conductive metal oxide particles (B-2 ) 2.93 g of dispersion, 1.44 g of pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) and 0.95 g of photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) Was added and mixed well to prepare a coating solution (4) for forming a transparent film having a solid content concentration of 3% by weight.

Preparation of substrate with transparent film (4) A substrate with transparent film (4) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (4) was used. The film thickness of the transparent coating was 230 nm.
For substrate with transparent coating (4), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower parts in transparent coating The content of the conductive metal oxide particles (B-2) is shown in the table.

[Example 5]
Preparation of surface-treated chain conductive metal oxide particle (B-3) dispersion In the same manner as in Example 1, an Sb-doped tin oxide (ATO) powder was obtained, pulverized into a sol, and dealkalized. Thereafter, a conductive metal oxide particle (B-3) dispersion was prepared in the same manner except that pure water was added to dilute to a solid concentration of 25% by weight. The pH of this conductive metal oxide particle (B-3) dispersion was 3.2. The average particle size of the conductive metal oxide particles (B-3) was 8 nm.

Next, 100 g of a conductive metal oxide particle (B-3) dispersion having a solid content concentration of 25 wt% was adjusted to 25 ° C., and tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: normal ethyl silicate, SiO ₂ concentration of 28.8 wt. %) 4.3 g was added in 3 minutes, followed by stirring for 30 minutes. Thereafter, 100 g of ethanol was added over 1 minute, the temperature was raised to 50 ° C. over 30 minutes, and a heat treatment was performed for 15 hours. The solid concentration at this time was 10% by weight.

  Disperse the dispersion medium water and ethanol with ethanol using an ultrafiltration membrane to obtain a dispersion of surface-treated conductive metal oxide particles (B-3) having a solid content of 20.5% by weight. Prepared. The average number of connected primary particles constituting the surface-treated chain conductive metal oxide particles (B-3), the refractive index, and the volume resistance value were measured, and the results are shown in the table.

Preparation of coating liquid for forming transparent film (5) Surface-treated silica-based fine particles (A-1) prepared in the same manner as in Example 1 (A-1) 4.68 g of PGME dispersion, methanol and ethanol And isopropyl alcohol mixed alcohol (Nippon Alcohol Sales Co., Ltd .: Solmix AP-11) 76.76 g, PGME 13.24 g, solid content concentration 20% by weight of surface-treated chain conductive metal oxide particles (B-3) dispersed 2.93 g of liquid, pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) 1.44 g was added 0.95 g of photoinitiator (Ciba Specialty Chemicals Co., Ltd .: Irgacure 184). Then, it was thoroughly mixed to prepare a coating solution (5) for forming a transparent film having a solid content concentration of 3% by weight.

Preparation of substrate with transparent film (5) A substrate with transparent film (5) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (5) was used. The film thickness of the transparent coating was 240 nm. For substrate with transparent coating (5), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower parts in transparent coating The content of the conductive metal oxide particles (B-3) is shown in the table.

[Example 6]
Preparation of coating solution (6) for transparent film formation
Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. A mixed alcohol of methanol, ethanol and isopropyl alcohol (Japan Alcohol Sales Co., Ltd.) was added to 5.85 g of PGME dispersion. Product: Solmix AP-11) 75.22 g, PGME 13.24 g, surface-treated chain conductive metal oxide particle (B-1) dispersion 4 having a solid concentration of 20% by weight prepared in the same manner as in Example 1. .10 g, pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) 0.96 g was added 0.63 g of photoinitiator (Ciba Specialty Co., Ltd .: Irgacure 184). By thoroughly mixing, a coating solution (6) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent film (6) A substrate with transparent film (6) was prepared in the same manner as in Example 1, except that the coating liquid for forming a transparent film (6) was used. The film thickness of the transparent coating was 150 nm.
For substrate with transparent coating (6), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower parts in transparent coating The content of the conductive metal oxide particles (B-1) is shown in the table.

[Example 7]
Preparation of coating solution (7) for transparent film formation
Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1, and a mixed alcohol of methanol, ethanol and isopropyl alcohol (Japan Alcohol Sales Co., Ltd.) Product: Solmix AP-11) 78.31 g, PGME 13.24 g, surface-treated chain conductive metal oxide particles (B-1) dispersion 1 having a solid content concentration of 20% by weight prepared in the same manner as in Example 1. .76 g, pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) 1.92 g and 1.26 g of photoinitiator (Ciba Specialty Co., Ltd .: Irgacure 184) were added. By thoroughly mixing, a coating solution (7) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent film (7) A substrate with transparent film (7) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (7) was used. The film thickness of the transparent coating was 320 nm. About substrate with transparent coating (7), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower parts in transparent coating The content of the conductive metal oxide particles (B-1) is shown in the table.

[Example 8]
Preparation of surface-treated chain conductive metal oxide particle (B-4) dispersion In Example 1, 2.78 g of tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: normal ethyl silicate, SiO ₂ concentration 28.8 wt%) was used. A surface-treated chain conductive metal oxide particle (B-4) dispersion having a solid content of 20% by weight was prepared in the same manner except that it was used.
The average number of connected primary particles constituting the surface-treated chain conductive metal oxide particles (B-4), the refractive index, and the volume resistance value were measured, and the results are shown in the table.

Preparation of coating liquid for forming transparent film (8) Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. To 4.68 g of PGME dispersion, methanol and ethanol And isopropyl alcohol mixed alcohol (Nippon Alcohol Sales Co., Ltd .: Solmix AP-11) 76.76 g, PGME 13.24 g, solid content concentration 20.5 wt% surface-treated chain conductive metal oxide particles (B-4 ) 2.93 g of dispersion, 1.44 g of pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) and 0.95 g of photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) Was added and mixed well to prepare a coating solution (8) for forming a transparent film having a solid content concentration of 3% by weight.

Preparation of substrate with transparent film (8) A substrate with transparent film (8) was prepared in the same manner as in Example 1, except that the coating liquid for forming a transparent film (8) was used. The film thickness of the transparent coating was 242 nm. For transparent coated substrate (8), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower in transparent coating The content of the conductive metal oxide particles (B-4) is shown in the table.

[Example 9]
Preparation of surface-treated chain conductive metal oxide particle (B-5) dispersion In Example 1, 4.17 g of tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: normal ethyl silicate, SiO ₂ concentration 28.8 wt%) was used. A surface-treated chain conductive metal oxide particle (B-5) dispersion having a solid concentration of 20% by weight was prepared in the same manner except that it was used.
The average number of connected primary particles constituting the surface-treated chain conductive metal oxide particles (B-5), the refractive index and the volume resistance value were measured, and the results are shown in the table.

Next, the dispersion medium water and ethanol are replaced with ethanol in an ultrafiltration membrane, and the surface-treated chain conductive metal oxide particle (B-5) dispersion having a solid concentration of 20.5% by weight is obtained. Was prepared.
The average number of connected primary particles constituting the surface-treated chain conductive metal oxide particles (B-5), the refractive index and the volume resistance value were measured, and the results are shown in the table.

Preparation of coating liquid for forming transparent film (9) Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight, prepared in the same manner as in Example 1, 4.68 g of PGME dispersion, methanol and ethanol And isopropyl alcohol mixed alcohol (Nippon Alcohol Sales Co., Ltd .: Solmix AP-11) 76.76 g, PGME 13.24 g, solid content concentration 20.5 wt% surface-treated chain conductive metal oxide particles (B-5 ) 2.93 g of dispersion, 1.44 g of pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) and 0.95 g of photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) Was added and mixed well to prepare a coating solution (9) for forming a transparent film having a solid content concentration of 3% by weight.

Preparation of substrate with transparent film (9) A substrate with transparent film (9) was prepared in the same manner as in Example 1, except that the coating liquid for forming a transparent film (9) was used. The film thickness of the transparent coating was 238 nm.
For transparent coated substrate (9), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower in transparent coating The content of the conductive metal oxide particles (B-5) is shown in the table.

[Example 10]
Preparation of surface-treated chain conductive metal oxide particle (B-6) dispersion A solution was prepared by dissolving 150.0 g of potassium stannate in 430 g of pure water. The prepared solution was added to a mixed solution in which 800 g of pure water 800 g, ammonium nitrate 1.3 g and 15% aqueous ammonia 2.0 g were dissolved at 60 ° C. for 12 hours for hydrolysis. At this time, a 10% nitric acid solution was simultaneously added so as to keep the pH at 9.0. The produced precipitate was filtered and washed, and then dispersed again in water to prepare 200 g of a metal oxide precursor hydroxide dispersion having a solid content of 20% by weight.

  To this dispersion, 3.2 g of 85% phosphoric acid solution was added and stirred for 30 minutes, and then spray dried at a temperature of 100 ° C. to prepare a metal oxide precursor hydroxide powder. The powder was heat-treated at 650 ° C. for 2 hours in an air atmosphere to obtain a Lind-Pin oxide (PTO) powder.

60 g of this powder was dispersed in 140 g of an aqueous potassium hydroxide solution having a concentration of 4.3% by weight, and the dispersion was pulverized with a sand mill for 3 hours while maintaining the temperature at 30 ° C. to prepare a sol.
Next, the sol was subjected to dealkalization treatment with an ion exchange resin until the pH became 3.3, and chain metal oxide conductive particles (B- 6) A dispersion was prepared. The chain metal oxide conductive particle (B-6) dispersion had a pH of 3.6. The average primary particle diameter of the chain metal oxide conductive particles (B-6) was 10 nm.

Further, 100 g of the chain metal oxide based conductive particle (B-6) dispersion was adjusted to 25 ° C., and 3.5 g of tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: normal ethyl silicate, SiO ₂ component 28.8 wt%). Was added in 3 minutes, followed by stirring for 30 minutes. The solid concentration at this time was 10% by weight. Next, water and ethanol as a dispersion medium are replaced with ethanol in an ultrafiltration membrane, and a surface-treated chain conductive metal oxide particle (B-6) dispersion having a solid concentration of 20.5% by weight is obtained. Was prepared.
The average number of connections, refractive index and volume resistance of the primary particles constituting the surface-treated chain conductive metal oxide particles (B-6) were measured, and the results are shown in the table.

Preparation of coating liquid for forming transparent film (10) Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. 4.68 g of PGME dispersion were mixed with methanol and ethanol. And isopropyl alcohol mixed alcohol (Nippon Alcohol Sales Co., Ltd .: Solmix AP-11) 76.76 g, PGME 13.24 g, solid content concentration 20.5 wt% surface-treated chain conductive metal oxide particles (B-6 ) 2.93 g of dispersion, 1.44 g of pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) and 0.95 g of photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) Was added and mixed well to prepare a coating solution (10) for forming a transparent film having a solid content concentration of 3% by weight.

Preparation of substrate with transparent film (10) A substrate with transparent film (10) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (10) was used. The film thickness of the transparent coating was 234 nm.
For transparent coated substrate (10), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower in transparent coating The content of the conductive metal oxide particles (B-6) is shown in the table.

[Example 11]
Preparation of surface-treated silica-based fine particle (A-2) dispersion Silica sol dispersion (manufactured by JGC Catalysts &Chemicals;SI-80P; average particle diameter 80 nm, SiO ₂ concentration 40.5 wt%) in 1000 g of ion-exchanged water 6000 g Then, 800 g of a cation exchange resin (Mitsubishi Chemical Co., Ltd .: SK-1BH) was added, and the mixture was stirred for 1 hour for dealkalization.

Then, after separating the cation exchange resin, 400 g of an anion exchange resin (Mitsubishi Chemical (manufactured): SANUPC) was added, and the mixture was stirred for 1 hour for deanion treatment. Next, 400 g of a cation exchange resin (Mitsubishi Chemical Co., Ltd .: SK-1BH) was added again, and the mixture was stirred for 1 hour and dealkalized to obtain a silica particle (A-2) dispersion having a SiO ₂ concentration of 5% by weight. Prepared.

This dispersion was subjected to solvent substitution with methanol using an ultrafiltration membrane to obtain a silica particle (A-2) methanol dispersion having a solid concentration of 40% by weight. Silica particles (A-2) having a solid content concentration of 40% by weight In 100 g of methanol dispersion, 4.93 g of γ-methacrylooxypropyltrimethoxysilane (manufactured by Shin-Etsu Silicone Co., Ltd .: KBM-503, SiO ₂ component 81.2) %) Was added, 3.1 g of ultrapure water was added, and the mixture was stirred at 50 ° C. for 20 hours to obtain a surface-treated 80 nm silica sol dispersion (solid content concentration: 40.5 wt%).
Thereafter, the solvent was replaced with propylene glycol monopropyl ether (PGME) by a rotary evaporator (solid content: 40.5% by weight).

Preparation of coating solution for forming transparent film (11) Surface-treated silica-based fine particles (A-2) with a solid content concentration of 40.5% by weight 2.37 g of PGME dispersion and a mixed alcohol of methanol, ethanol and isopropyl alcohol (Japanese alcohol) Commercially available stock: Solmix AP-11) 79.08 g, PGME 13.24 g, solid treated 20.5 wt% surface-treated chain conductive metal oxide particle (B-1) dispersion 2.93 g, pentaerythritol Add 0.95 g of photoinitiator (Ciba Specialty Co., Ltd .: Irgacure 184) to 1.44 g of triacrylate (Kyoeisha Chemical Co., Ltd .: Light acrylate PE-3A, resin concentration 100% by weight) and mix well. A coating liquid (11) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent coating (11) A substrate with transparent coating (11) was prepared in the same manner as in Example 1 except that the coating solution for forming a transparent coating (11) was used. The film thickness of the transparent coating was 240 nm. For transparent coated substrate (11), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower parts in transparent coating The content of the conductive metal oxide particles (B-1) is shown in the table.

[Example 12]
Preparation of coating liquid for forming transparent film (12)
Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1 4.68 g of PGME dispersion liquid and a mixed alcohol of methanol, ethanol and isopropyl alcohol (Japan Alcohol Sales Co., Ltd.) Manufactured by: Solmix AP-11) 76.76 g, PGME 13.24 g, dispersion of surface-treated chain conductive metal oxide particles (B-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. 2.93 g of liquid, 1.44 g of ethoxylated pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd .: NK ester ATM-4E, resin concentration 100% by weight) and photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) 0 .95 g was added and mixed well to prepare a coating solution (12) for forming a transparent film having a solid content concentration of 3% by weight.

Preparation of substrate with transparent film (12) A substrate with transparent film (12) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (12) was used. The film thickness of the transparent coating was 236 nm. For transparent coated substrate (12), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment chain of upper, middle and lower in transparent coating The content of the conductive metal oxide particles (B-1) is shown in the table.

[Comparative Example 1]
Preparation of surface-treated conductive metal oxide particle (RB-1) dispersion
Except for obtaining Sb-doped tin oxide (ATO) powder in the same manner as in Example 1, pulverizing it into a sol, dealkalizing, adding pure water, and diluting to a solid concentration of 10% by weight. Similarly, a conductive metal oxide particle (RB-1) dispersion was prepared. The pH of this conductive metal oxide particle (RB-1) dispersion was 3.2. The average particle size of the conductive metal oxide particles (RB-1) was 8 nm.

Next, 100 g of a conductive metal oxide particle (RB-1) dispersion having a solid content concentration of 10 wt% was adjusted to 25 ° C., and tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: normal ethyl silicate, SiO ₂ concentration of 28.8 wt. %) 1.7 g was added in 3 minutes, followed by stirring for 30 minutes. Thereafter, 100 g of ethanol was added over 1 minute, the temperature was raised to 50 ° C. over 30 minutes, and a heat treatment was performed for 15 hours. The solid concentration at this time was 5% by weight.

  Thereafter, the dispersion medium of water and ethanol are replaced with ethanol by ultrafiltration membrane to prepare a dispersion of surface-treated conductive metal oxide particles (RB-1) with a solid content concentration of 20.5% by weight. did. In the surface-treated conductive metal oxide particles (RB-1), almost no connection state was observed. The refractive index and volume resistance value were measured, and the results are shown in the table.

Preparation of coating liquid (R1) for forming a transparent film Surface treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1 and methanol and ethanol were added to PGME dispersion 4.68. And isopropyl alcohol mixed alcohol (Nippon Alcohol Sales Co., Ltd .: Solmix AP-11) 76.76 g, PGME 13.24 g, solid content concentration 20 wt% surface-treated conductive metal oxide particle (RB-1) dispersion 2 .93 g, 0.95 g of photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) was added to 1.44 g of pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100 wt%). By mixing well, a coating solution (R1) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent film (R1) A substrate with transparent film (R1) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (R1) was used. The film thickness of the transparent film was 237 nm.

  For substrate with transparent coating (R1), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment conductivity of upper, middle and lower parts in transparent coating The content of metal oxide particles (RB-1) is shown in the table.

[Comparative Example 2]
Preparation of dispersion of chain conductive metal oxide particles (RB-2) A mixed solution of 130 g of potassium stannate and 30 g of potassium antimonyl tartrate in 400 g of pure water was prepared. This prepared solution was dissolved in 1.0 g of ammonium nitrate under stirring at 60 ° C. over 12 hours, and added to 1000 g of pure water adjusted to pH 10.5 using potassium hydroxide for hydrolysis. At this time, a 10% nitric acid solution was simultaneously added so as to keep the pH at 10.5. The generated precipitate was washed by filtration and then dispersed again in water to prepare a metal oxide precursor hydroxide dispersion having a solid concentration of 20% by weight.

  This dispersion was spray-dried at a temperature of 100 ° C. to prepare a metal oxide precursor hydroxide powder. This powder was heat-treated at 550 ° C. for 2 hours in an air atmosphere to obtain Sb-doped tin oxide (ATO) powder. 60 g of this powder was dispersed in 140 g of an aqueous potassium hydroxide solution having a concentration of 4.3% by weight, and the dispersion was pulverized with a sand mill for 3 hours while maintaining the temperature at 30 ° C. to prepare a sol.

  Next, this sol is subjected to dealkalization treatment with an ion exchange resin until pH becomes 3.0, and conductive metal oxide particles (1) comprising Sb-doped tin oxide fine particles having a solid content concentration of 30% by weight. A dispersion was prepared. The pH of this conductive metal oxide particle (1) dispersion was 3.2. The average particle diameter of the conductive metal oxide particles (1) was 8 nm.

  In the same manner as in Example 1, a chain conductive metal oxide particle (1) dispersion was prepared. Next, the conductive metal oxide particles (1) are dispersed in an ultrafiltration membrane, and the dispersion medium water is replaced with ethanol to form chain conductive metal oxide particles having a solid content of 10.5% by weight. (RB-2) A dispersion was prepared. The average number of connected primary particles, the refractive index, and the volume resistance of the linear conductive metal oxide particles (RB-2) were measured, and the results are shown in the table.

Preparation of coating liquid for forming transparent film (R2) Surface-treated silica-based fine particles (A-1) prepared in the same manner as in Example 1 (A-1) 4.68 g of PGME dispersion, methanol and ethanol And isopropyl alcohol mixed alcohol (Nippon Alcohol Sales Co., Ltd .: Solmix AP-11) 73.98 g, PGME 13.24 g, solid content concentration 10.5 wt% conductive metal oxide particle (RB-2) dispersion 5 0.71 g, pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100% by weight) 1.44 g was added 0.95 g of photoinitiator (Ciba Specialty Co., Ltd .: Irgacure 184). By thoroughly mixing, a coating solution (R2) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent film (R2) A substrate with transparent film (R2) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (R2) was used. The film thickness of the transparent coating was 233 nm. For substrate with transparent coating (R2), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment conductivity of upper, middle and lower parts in transparent coating The content of metal oxide particles (RB-2) is shown in the table.

[Comparative Example 3]
Preparation of coating solution (R3) for transparent film formation
Surface treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1, 7.32 g of PGME dispersion, mixed alcohol of methanol, ethanol and isopropyl alcohol (Japan Alcohol Sales Co., Ltd.) Manufactured by: Solmix AP-11) 76.76 g, PGME 13.24 g, surface-treated conductive metal oxide particle (B-1) dispersion liquid having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. .29 g, 0.95 g of photoinitiator (manufactured by Ciba Specialty Co., Ltd .: Irgacure 184) was added to 1.44 g of pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100 wt%). By mixing well, a coating solution (R3) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent film (R3) A substrate with transparent film (R3) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (R3) was used. The film thickness of the transparent coating was 230 nm. For substrate with transparent coating (R3), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment conductivity of upper, middle and lower parts in transparent coating The content of the metal oxide particles (B-1) is shown in the table.

[Comparative Example 4]
Preparation of coating solution (R4) for forming transparent film
Surface-treated silica-based fine particles (A-1) having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1, 0.73 g of PGME dispersion, mixed alcohol of methanol, ethanol and isopropyl alcohol (Japan Alcohol Sales Co., Ltd.) Product: Solmix AP-11) 76.76 g, PGME 13.24 g, surface-treated conductive metal oxide particles (B-1) dispersion 6 having a solid content concentration of 20.5% by weight prepared in the same manner as in Example 1. .88 g, pentaerythritol triacrylate (manufactured by Kyoeisha Chemical Co., Ltd .: light acrylate PE-3A, resin concentration 100 wt%) 1.44 g was added 0.95 g of photoinitiator (Ciba Specialty Co., Ltd .: Irgacure 184). By thoroughly mixing, a coating solution (R4) for forming a transparent film having a solid content concentration of 3% by weight was prepared.

Preparation of substrate with transparent film (R4) A substrate with transparent film (R4) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (R4) was used. The film thickness of the transparent coating was 235 nm.

  For substrate with transparent coating (R4), total light transmittance, haze, reflectance, surface resistance, adhesion, pencil hardness, coloring, scratch resistance and surface treatment conductivity of upper, middle and lower parts in transparent coating The content of the metal oxide particles (B-1) is shown in the table.

[Comparative Example 5]
Preparation of surface-treated silica-based fine particle (RA-5) dispersion silica-based hollow fine particle dispersed sol (manufactured by Catalyst Kasei Kogyo Co., Ltd .: Thruria 1420, average particle size 60 nm, concentration 20.5 wt%, dispersion medium: isopropanol, particles 100 g of refractive index 1.30) is mixed with 10 g of perfluorooctylethyltriethoxysilane (manufactured by Toray Dow Corning: AY43-158E, solid concentration 100%), 10 g of ultrapure water is added, and then at 40 ° C. for 5 hours. By stirring, a surface-treated silica-based fine particle (RA-5) dispersion having a solid content concentration of 19.3% by weight was prepared. The surface charge amount of the particles was measured with a surface-treated silica-based fine particle (RA-5) dispersion, and it was 8.3 μeq / g.

Preparation of dispersion of surface-treated conductive metal oxide particles (RB-5) Antimony-doped tin oxide (ATO) fine particle dispersion sol (manufactured by Catalyst Kasei Kogyo Co., Ltd .: ELCOM V-3501, average particle size 8 nm, concentration 20.5 1.26 g of γ-acryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Silicone Co., Ltd .: KBM-5103 SiO ₂ component: 81.2 wt%) to 100 g of 100% by weight, dispersion medium: ethanol, particle refractive index: 1.75) After mixing, 10 g of ultrapure water was added and stirred at 40 ° C. for 5 hours to prepare a dispersion of surface-treated conductive metal oxide particles (RB-5) having a solid concentration of 19.3% by weight. The amount of surface charge of the particles in the surface-treated conductive metal oxide particle (RB-5) dispersion was measured and found to be 55.8 μeq / g.

Preparation of coating liquid (R5) for forming a transparent film 2.59 g of a surface-treated silica fine particle (RA-5) dispersion having a solid content of 19.3% by weight and a surface-treated conductive metal having a solid content of 19.3% by weight Dissolved in 5.18 g of oxide particle (RB-5) dispersion, 1.5 g of hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA), Irgacure 184 manufactured by Ciba Specialty Co., Ltd., IPA In addition, 0.4 g of a solid content concentration of 10%) and 90.33 g of a 1/1 (weight ratio) mixed solvent of isopropanol and methyl isobutyl ketone were sufficiently mixed to prepare a coating solution (R5) for forming a transparent film.

Preparation of substrate with transparent coating (R5) The coating solution for forming a transparent coating (R5) was applied on a substrate with a hard coat film prepared in the same manner as in Example 1 with a bar coater and dried at 70 ° C. for 1 minute. After that, a substrate with a transparent coating (R5) was prepared by irradiating with a high pressure mercury lamp (80 W / cm) for 1 minute to cure. The film thickness at this time was 210 nm. A portion of the transparent coating was cut perpendicularly in the vertical direction, and the cross section was observed with a transmission electron microscope. The lower part was a layer of 110 nm thick ATO fine particles, and the upper part was a silica-based hollow dispersed in a matrix. Presence of fine particles was observed.

Claims (12)

Surface-treated silica-based fine particles (A), surface-treated chain-like conductive metal oxide particles (B), a matrix-forming component and a solvent,
The average particle diameter (D _A ) of the surface-treated silica-based fine particles ( _A ) is in the range of 10 to 200 nm,
The surface-treated chain conductive metal oxide particles (B) are linked in the form of chains of 2 to 30 metal oxide particles having an average particle diameter (D _B ) in the range of 5 to 20 nm. A chain conductive particle having a volume resistivity of 10 ⁻² to 10 ⁰ Ω · cm,
The concentration of the surface-treated silica-based fine particles (A) is in the range of 0.05 to 35% by weight as a solid content,
The concentration of the surface-treated chain conductive metal oxide particles (B) is in the range of 0.025 to 25% by weight as a solid content,
The concentration of the matrix-forming component is in the range of 0.1 to 42.5% by weight as a solid content,
A coating solution for forming a transparent film, wherein the total solid concentration is in the range of 0.5 to 50% by weight.   The surface-treated chain conductive metal oxide particles (B) have a refractive index in the range of 1.60 to 1.90, and the surface-treated silica-based fine particles (A) have a refractive index of 1.15 to 1.46. The coating liquid for forming a transparent film according to claim 1, wherein the coating liquid is in the range of The surface treatment agent for the surface treated silica-based fine particles (A) is an organosilicon compound represented by the formula (1), and the surface treatment agent for the surface treated chain conductive metal oxide particles (B) is represented by the following formula (2 Is an organosilicon compound represented by
The amount ratio of silica based particles (A) and organosilicon compound (the weight of the solids / weight of silica-based particles of the organic silicon compound as a _{R n -SiX 4-n / 2} ) is 0.01 to 0.5 The ratio of the chain conductive metal oxide particles (B) to the organosilicon compound (weight of the organosilicon compound as SiO ₂ / weight as the solid content of the chain conductive metal oxide particles) The coating liquid for forming a transparent film according to claim 1 or 2, wherein the ratio is in the range of 0.005 to 0.2.
_{R n -SiX 4-n (1} )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 1 to 3)
SiX ₄ (2)
(However, in the formula, X represents an alkoxy group having 1 to 4 carbon atoms, a silanol group, halogen, or hydrogen, which may be the same or different.)   The said surface-treated chain | strand-shaped electroconductive metal oxide particle (B) is surface-treated chain | strand-shaped antimony dope tin oxide particle (ATO), The application | coating for transparent film formation in any one of Claims 1-3 characterized by the above-mentioned. liquid.   The coating liquid for forming a transparent film according to claim 1, wherein the surface-treated silica-based fine particles (A) are surface-treated silica-based hollow fine particles.   The coating liquid for forming a transparent film according to claim 1, wherein the matrix-forming component is an organic resin matrix-forming component and / or a sol-gel matrix-forming component. A substrate with a transparent coating in which a transparent coating is formed on the substrate,
The transparent coating comprises surface-treated silica-based fine particles (A), surface-treated chain-like conductive metal oxide particles (B), and a matrix component,
The average particle diameter (D _A ) of the surface-treated silica-based fine particles ( _A ) is in the range of 10 to 200 nm,
The surface-treated chain conductive metal oxide particles (B) are linked in the form of chains of 2 to 30 metal oxide particles having an average particle diameter (D _B ) in the range of 5 to 20 nm. Is a surface-treated chain conductive particle having a volume resistance value of 10 ⁻² to 10 ⁰ Ω · cm.
The content of the surface-treated silica-based fine particles (A) is in the range of 10 to 70% by weight as the solid content, and the content of the surface-treated chain conductive metal oxide particles (B) is 5 to 50% by weight as the solid content. In the range of
The content of the matrix component is in the range of 20 to 80% by weight, the content (C _U ) of the surface-treated chain conductive metal oxide particles in the lower part of the transparent coating, and the surface-treated chain conductive metal oxidation in the middle part The content of the product particles (C _M ), the content of the surface-treated chain-like conductive metal oxide particles (C _T ) in the upper part has a relationship of (C _U )> (C _M )> (C _T ), and , (C _U ) and (C _T ) are in a relationship of 1/100 ≦ (C _T ) / (C _U ) ≦ 1/2 (in addition, the upper, middle, and lower portions of the transparent coating are the cross sections of the transparent coating) The base material with a transparent coating is characterized in that the base material is equally divided into three parts, which are an upper part, a middle part and a lower part, respectively.   The surface-treated chain conductive metal oxide particles (B) have a refractive index in the range of 1.60 to 1.90, and the surface-treated silica-based fine particles (A) have a refractive index of 1.15 to 1.46. The substrate with a transparent coating according to claim 7, which is in the range of The surface treatment agent for the surface treated silica-based fine particles (A) is an organosilicon compound represented by the formula (1), and the surface treatment agent for the surface treated chain conductive metal oxide particles (B) is represented by the following formula (2 Is an organosilicon compound represented by
The amount ratio of silica based particles (A) and organosilicon compound (the weight of the solids / weight of silica-based particles of the organic silicon compound as a _{R n -SiX 4-n / 2} ) is 0.01 to 0.5 The ratio of the chain conductive metal oxide particles (B) to the organosilicon compound (weight of the organosilicon compound as SiO ₂ / weight as the solid content of the chain conductive metal oxide particles) Is in the range of 0.005 to 0.2, The substrate with a transparent coating according to claim 7 or 8.
_{R n -SiX 4-n (1} )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 1 to 3)
SiX ₄ (2)
(However, in the formula, X represents an alkoxy group having 1 to 4 carbon atoms, a silanol group, halogen, or hydrogen, which may be the same or different.)   The substrate with a transparent coating according to any one of claims 7 to 9, wherein the surface-treated chain conductive metal oxide particles (B) are surface-treated chain antimony-doped tin oxide particles.   The substrate with a transparent film according to any one of claims 7 to 9, wherein the surface-treated silica-based fine particles (A) are surface-treated silica-based hollow fine particles.   The substrate with a transparent coating according to claim 7, wherein the matrix component is an organic resin matrix component and / or a sol-gel matrix component.