JP2014042954A - Mems素子、電子機器、およびmems素子の製造方法 - Google Patents
Mems素子、電子機器、およびmems素子の製造方法 Download PDFInfo
- Publication number
- JP2014042954A JP2014042954A JP2012186181A JP2012186181A JP2014042954A JP 2014042954 A JP2014042954 A JP 2014042954A JP 2012186181 A JP2012186181 A JP 2012186181A JP 2012186181 A JP2012186181 A JP 2012186181A JP 2014042954 A JP2014042954 A JP 2014042954A
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- Prior art keywords
- layer
- insulating layer
- wiring
- mems
- sacrificial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 238000007789 sealing Methods 0.000 claims abstract description 7
- 230000000149 penetrating effect Effects 0.000 claims abstract description 3
- 239000010410 layer Substances 0.000 claims description 289
- 238000005530 etching Methods 0.000 claims description 91
- 238000010030 laminating Methods 0.000 claims description 17
- 239000011229 interlayer Substances 0.000 claims description 14
- 239000011247 coating layer Substances 0.000 claims description 10
- 239000007769 metal material Substances 0.000 claims description 8
- 150000004767 nitrides Chemical class 0.000 abstract description 33
- 238000000034 method Methods 0.000 description 28
- 239000004065 semiconductor Substances 0.000 description 18
- 230000008569 process Effects 0.000 description 15
- 238000000206 photolithography Methods 0.000 description 13
- 230000001681 protective effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000000059 patterning Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- 229910052814 silicon oxide Inorganic materials 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 229920005591 polysilicon Polymers 0.000 description 7
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
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- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 230000036772 blood pressure Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
- B81B3/0086—Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00301—Connecting electric signal lines from the MEMS device with external electrical signal lines, e.g. through vias
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2207/00—Microstructural systems or auxiliary parts thereof
- B81B2207/09—Packages
- B81B2207/091—Arrangements for connecting external electrical signals to mechanical structures inside the package
- B81B2207/097—Interconnects arranged on the substrate or the lid, and covered by the package seal
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Micromachines (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012186181A JP2014042954A (ja) | 2012-08-27 | 2012-08-27 | Mems素子、電子機器、およびmems素子の製造方法 |
| US13/966,384 US20140054729A1 (en) | 2012-08-27 | 2013-08-14 | Mems device, electronic apparatus, and manufacturing method of mems device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012186181A JP2014042954A (ja) | 2012-08-27 | 2012-08-27 | Mems素子、電子機器、およびmems素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014042954A true JP2014042954A (ja) | 2014-03-13 |
| JP2014042954A5 JP2014042954A5 (https=) | 2014-05-01 |
Family
ID=50147269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012186181A Withdrawn JP2014042954A (ja) | 2012-08-27 | 2012-08-27 | Mems素子、電子機器、およびmems素子の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20140054729A1 (https=) |
| JP (1) | JP2014042954A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111924797A (zh) * | 2020-09-29 | 2020-11-13 | 深圳市海谱纳米光学科技有限公司 | 一种具有可动镜面的法珀腔器件及其制作工艺 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015174150A (ja) * | 2014-03-13 | 2015-10-05 | 株式会社東芝 | Memsデバイスおよびその製造方法 |
| TWI610406B (zh) * | 2015-02-09 | 2018-01-01 | 精材科技股份有限公司 | 晶片封裝體與其製備方法 |
| US10618801B2 (en) * | 2016-11-10 | 2020-04-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | MEMS structure with bilayer stopper and method for forming the same |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007035290A (ja) * | 2005-07-22 | 2007-02-08 | Hitachi Ltd | スイッチ、半導体装置およびその製造方法 |
| JP2010129371A (ja) * | 2008-11-27 | 2010-06-10 | Toshiba Corp | スイッチ及びesd保護素子 |
| JP2010158734A (ja) * | 2009-01-07 | 2010-07-22 | Seiko Epson Corp | Memsデバイス及びその製造方法 |
| JP2011049303A (ja) * | 2009-08-26 | 2011-03-10 | Toshiba Corp | 電気部品およびその製造方法 |
| JP2011223470A (ja) * | 2010-04-13 | 2011-11-04 | Seiko Epson Corp | Memsデバイス、電子機器 |
| US20120098074A1 (en) * | 2010-10-21 | 2012-04-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mems device with release aperture |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011189423A (ja) * | 2010-03-12 | 2011-09-29 | Seiko Epson Corp | Mems素子および発振器 |
-
2012
- 2012-08-27 JP JP2012186181A patent/JP2014042954A/ja not_active Withdrawn
-
2013
- 2013-08-14 US US13/966,384 patent/US20140054729A1/en not_active Abandoned
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007035290A (ja) * | 2005-07-22 | 2007-02-08 | Hitachi Ltd | スイッチ、半導体装置およびその製造方法 |
| JP2010129371A (ja) * | 2008-11-27 | 2010-06-10 | Toshiba Corp | スイッチ及びesd保護素子 |
| JP2010158734A (ja) * | 2009-01-07 | 2010-07-22 | Seiko Epson Corp | Memsデバイス及びその製造方法 |
| JP2011049303A (ja) * | 2009-08-26 | 2011-03-10 | Toshiba Corp | 電気部品およびその製造方法 |
| JP2011223470A (ja) * | 2010-04-13 | 2011-11-04 | Seiko Epson Corp | Memsデバイス、電子機器 |
| US20120098074A1 (en) * | 2010-10-21 | 2012-04-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mems device with release aperture |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111924797A (zh) * | 2020-09-29 | 2020-11-13 | 深圳市海谱纳米光学科技有限公司 | 一种具有可动镜面的法珀腔器件及其制作工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20140054729A1 (en) | 2014-02-27 |
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