JP2014037536A - エポキシ樹脂組成物及びこれを利用した放熱回路基板 - Google Patents
エポキシ樹脂組成物及びこれを利用した放熱回路基板 Download PDFInfo
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- JP2014037536A JP2014037536A JP2013169266A JP2013169266A JP2014037536A JP 2014037536 A JP2014037536 A JP 2014037536A JP 2013169266 A JP2013169266 A JP 2013169266A JP 2013169266 A JP2013169266 A JP 2013169266A JP 2014037536 A JP2014037536 A JP 2014037536A
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- epoxy resin
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- epoxy
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- 239000003795 chemical substances by application Substances 0.000 claims abstract description 40
- 239000011256 inorganic filler Substances 0.000 claims abstract description 32
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 32
- 239000004593 Epoxy Substances 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 229910052799 carbon Inorganic materials 0.000 claims description 8
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- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
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- 238000000034 method Methods 0.000 description 3
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- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- XOOMNEFVDUTJPP-UHFFFAOYSA-N naphthalene-1,3-diol Chemical compound C1=CC=CC2=CC(O)=CC(O)=C21 XOOMNEFVDUTJPP-UHFFFAOYSA-N 0.000 description 2
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 2
- ZUVBIBLYOCVYJU-UHFFFAOYSA-N naphthalene-1,7-diol Chemical compound C1=CC=C(O)C2=CC(O)=CC=C21 ZUVBIBLYOCVYJU-UHFFFAOYSA-N 0.000 description 2
- OENHRRVNRZBNNS-UHFFFAOYSA-N naphthalene-1,8-diol Chemical compound C1=CC(O)=C2C(O)=CC=CC2=C1 OENHRRVNRZBNNS-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
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- 125000004430 oxygen atom Chemical group O* 0.000 description 2
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- 150000001555 benzenes Chemical class 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- MRNZSTMRDWRNNR-UHFFFAOYSA-N bis(hexamethylene)triamine Chemical compound NCCCCCCNCCCCCCN MRNZSTMRDWRNNR-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
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- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 235000013872 montan acid ester Nutrition 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LSHROXHEILXKHM-UHFFFAOYSA-N n'-[2-[2-[2-(2-aminoethylamino)ethylamino]ethylamino]ethyl]ethane-1,2-diamine Chemical compound NCCNCCNCCNCCNCCN LSHROXHEILXKHM-UHFFFAOYSA-N 0.000 description 1
- ZETYUTMSJWMKNQ-UHFFFAOYSA-N n,n',n'-trimethylhexane-1,6-diamine Chemical compound CNCCCCCCN(C)C ZETYUTMSJWMKNQ-UHFFFAOYSA-N 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 1
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 1
- DFQICHCWIIJABH-UHFFFAOYSA-N naphthalene-2,7-diol Chemical compound C1=CC(O)=CC2=CC(O)=CC=C21 DFQICHCWIIJABH-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
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Abstract
【解決手段】本発明の実施例によるエポキシ樹脂組成物は、結晶性エポキシを含むエポキシ樹脂、硬化剤及び無機充填材を含む。本発明の実施例による放熱回路基板は、金属プレートと前記金属プレートの上に形成される絶縁層と、前記絶縁層上に形成される回路パターンと、を含み、前記絶縁層は、結晶性エポキシを含むエポキシ樹脂、硬化剤及び無機充填材を含むエポキシ樹脂組成物を硬化して形成される。
【選択図】図1
Description
ビスフェノールA4.5wt%、ジヒドロキシナプタレン12.2wt%、アゾメチンエポキシ3wt%を含む非結晶性エポキシ樹脂と前記化学式2の結晶性エポキシ樹脂1.7wt%を含むエポキシ樹脂、アミン系硬化剤として、4,4'−ジアミノスチルベン1.3wt%、2−メチルイミダゾール硬化促進剤0.2wt%とBYK−W980添加剤1wt%を全部混合して、40℃で10分間撹拌した後、アルミニウムや無機充填材76.1wt%を投入して常温で20〜30分間撹拌して、実施例1の結晶性エポキシ樹脂組成物を得た。
ジヒドロキシナプタレン3.5wt%、アゾメチンエポキシ9.7wt%を含む非結晶性エポキシ樹脂と前記化学式2の結晶性エポキシ樹脂3.5wt%を含むエポキシ樹脂、アミン系硬化剤として、4,4'−ジアミノスチルベ2wt%、2−メチルイミダゾール硬化促進剤0.1wt%とBYK−W980添加剤0.5wt%を全部混合して、40℃で10分間撹拌した後、アルミニウムや無機充填材80.7wt%を投入して常温で20〜30分間撹拌して、実施例2の結晶性エポキシ樹脂組成物を得た。
ビスフェノールA7wt%、アゾメチンエポキシ3.5wt%を含む非結晶性エポキシ樹脂と前記化学式2の結晶性エポキシ樹脂4.8wt%、アミン系硬化剤として、4,4'−ジアミノスチルベン1.1wt%、2−メチルイミダゾール硬化促進剤0.2wt%とBYK−W980添加剤1wt%を全部混合して、40℃で10分間撹拌した後、アルミニウムや無機充填材82.4wt%を投入して常温で20〜30分間撹拌して、実施例3の結晶性エポキシ樹脂組成物を得た。
ビスフェノールA5wt%、アゾメチンエポキシ2wt%を含む非結晶性エポキシ樹脂と前記化学式2の結晶性エポキシ樹脂9.2wt%、アミン系硬化剤として、4,4'−ジアミノスチルベン1wt%、2−メチルイミダゾール硬化促進剤0.1wt%とBYK−W980添加剤1wt%を全部混合して、40℃で10分間撹拌した後、アルミニウムや無機充填材81.9wt%を投入して常温で20〜30分間撹拌して、実施例4の結晶性エポキシ樹脂組成物を得た。
ビスフェノールA5wt%、アゾメチンエポキシ1.2wt%を含む非結晶性エポキシ樹脂と前記化学式2の結晶性エポキシ樹脂6wt%、アミン系硬化剤として、4,4'−ジアミノスチルベン1.2wt%、2−メチルイミダゾール硬化促進剤0.1wt%とBYK−W980添加剤1wt%とを全部混合して、40℃で10分間撹拌した後、アルミニウムや無機充填材85.5wt%を投入して常温で20〜30分間撹拌して、実施例5の結晶性エポキシ樹脂組成物を得た。
ビスフェノールA15wt%、ビスフェノールF3wt%、ジヒドロキシナプタレン3wt%、アゾメチンエポキシ4.5wt%を含む非結晶性エポキシ樹脂と、バイフェノール硬化剤2.1wt%、2−メチルイミダゾール硬化促進剤1wt%とBYK−W980添加剤1wt%を全部混合して、40℃で10分間撹拌した後、アルミナ無機充填材70.4wt%を投入して常温で20〜30分間撹拌して、比較例1の結晶性エポキシ樹脂組成物を得た。
ビスフェノールA12wt%、ビスフェノールF3.3wt%、ジヒドロキシナプタレン3.3wt%、アゾメチンエポキシ7.6wt%を含む非結晶性エポキシ樹脂と、バイフェノール硬化剤2.7wt%、2−メチルイミダゾール硬化促進剤0.3wt%とBYK−W980添加剤0.5wt%を全部混合して、40℃で10分間撹拌した後、アルミナ無機充填材70.3wt%を投入して常温で20〜30分間撹拌して、比較例2の結晶性エポキシ樹脂組成物を得た。
ビスフェノールA11.7wt%、ビスフェノールF1.5wt%、ジヒドロキシナプタレン1.5wt%、アゾメチンエポキシ4.2wt%を含む非結晶性エポキシ樹脂と、バイフェノール硬化剤1.1wt%、2−メチルイミダゾール硬化促進剤0.6wt%とBYK−W980添加剤0.6wt%を全部混合して、40℃で10分間撹拌した後、アルミナ無機充填材78.8wt%を投入して常温で20〜30分間撹拌して、比較例3の結晶性エポキシ樹脂組成物を得た。
熱伝導度の測定
NETZSCH社製のLFA447型熱伝導率計を使用して非定常熱線法により各実施例及び比較例の熱伝導度を測定して、表1に記載した。
ガラス転移温度は、TA社製のDSC Q100熱機械測定装置を使用して昇温速度10℃/分で測定して、表1に記載した。
Claims (13)
- 結晶性エポキシ樹脂を含むエポキシ樹脂と、無機充電剤と、を含み、
熱伝導度が2.13(W/m・K)以上であることを特徴とするエポキシ樹脂組成物。 - ガラス転移温度が125(℃)以上であることを特徴とする請求項1に記載のエポキシ樹脂組成物。
- 前記結晶性エポキシは、分子構造内にCとNの二重結合(−C=N−)を含むことを特徴とする請求項1に記載のエポキシ樹脂組成物。
- 前記結晶性エポキシは、下記化学式1で表現されることを特徴とする請求項1に記載のエポキシ樹脂組成物。
ここで、R1〜R7の水素は、C1〜C4のアルキル基、C6〜C18のアリール基及びシアン化基よりなる群から選択された1種以上の置換基で置換することができる。 - 前記エポキシ樹脂は、前記エポキシ樹脂組成物の全体重量に対して3wt%〜60wt%含まれることを特徴とする請求項1に記載のエポキシ樹脂組成物。
- 前記結晶性エポキシは、前記エポキシ樹脂の全体重量に対して12wt%以上含まれることを特徴とする請求項5に記載のエポキシ樹脂組成物。
- 前記エポキシ樹脂は、非結晶性エポキシをさらに含むことを特徴とする請求項1に記載のエポキシ樹脂組成物。
- 前記無機充填材は、前記エポキシ樹脂組成物の全体重量に対して40wt%〜97wt%含まれることを特徴とする請求項1に記載のエポキシ樹脂組成物。
- 硬化剤をさらに含み、前記硬化剤は、前記エポキシ樹脂組成物の全体重量に対して0.5wt%〜5wt%含まれることを特徴とする請求項1に記載のエポキシ樹脂組成物。
- 金属プレートと、
前記金属プレート上に形成される絶縁層と、
前記絶縁層上に形成される回路パターンと、を含み、
前記絶縁層は、結晶性エポキシ樹脂を含むエポキシ樹脂及び無機充填材を含むエポキシ樹脂を含むことを特徴とする放熱回路基板。 - 前記結晶性エポキシは、下記化学式1で表現されることを特徴とする請求項10に記載の放熱回路基板。
ここで、R1〜R7の水素は、C1〜C4のアルキル基、C6〜C18のアリール基及びシアン化基よりなる群から選択された1種以上の置換基で置換すれることができる。 - 前記エポキシ樹脂は、前記エポキシ樹脂組成物の全体重量に対して3wt%〜60wt%を含み、
前記硬化剤は、前記エポキシ樹脂組成物の全体重量に対して0.5wt%〜5wt%を含み、
前記無機充填材は、前記エポキシ樹脂組成物の全体重量に対して40wt%〜97wt%を含み、
前記エポキシ樹脂組成物の全体重量は、100wt%であることを特徴とする請求項10に記載の放熱回路基板。 - 前記結晶性エポキシは、全体エポキシ樹脂の全体重量に対して12wt%以上含まれることを特徴とする請求項10に記載の放熱回路基板。
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