JP2014001925A - 測定装置及び方法、トモグラフィ装置及び方法 - Google Patents

測定装置及び方法、トモグラフィ装置及び方法 Download PDF

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Publication number
JP2014001925A
JP2014001925A JP2012135260A JP2012135260A JP2014001925A JP 2014001925 A JP2014001925 A JP 2014001925A JP 2012135260 A JP2012135260 A JP 2012135260A JP 2012135260 A JP2012135260 A JP 2012135260A JP 2014001925 A JP2014001925 A JP 2014001925A
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Prior art keywords
measurement
measurement object
relative position
region
electromagnetic wave
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JP2012135260A
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English (en)
Japanese (ja)
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JP2014001925A5 (OSRAM
Inventor
Takeaki Itsuji
健明 井辻
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012135260A priority Critical patent/JP2014001925A/ja
Priority to US13/894,065 priority patent/US9134182B2/en
Publication of JP2014001925A publication Critical patent/JP2014001925A/ja
Publication of JP2014001925A5 publication Critical patent/JP2014001925A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/0205—Mechanical elements; Supports for optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4795—Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2012135260A 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法 Pending JP2014001925A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012135260A JP2014001925A (ja) 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法
US13/894,065 US9134182B2 (en) 2012-06-14 2013-05-14 Measurement apparatus and method, tomography apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012135260A JP2014001925A (ja) 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法

Publications (2)

Publication Number Publication Date
JP2014001925A true JP2014001925A (ja) 2014-01-09
JP2014001925A5 JP2014001925A5 (OSRAM) 2015-07-30

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JP2012135260A Pending JP2014001925A (ja) 2012-06-14 2012-06-14 測定装置及び方法、トモグラフィ装置及び方法

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US (1) US9134182B2 (OSRAM)
JP (1) JP2014001925A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190123429A (ko) * 2018-04-24 2019-11-01 아이오솔루션(주) 초점각도 조정방법 및 초점각도 조정장치

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013181929A (ja) 2012-03-04 2013-09-12 Canon Inc 測定装置及び方法、トモグラフィ装置及び方法
JP2014122875A (ja) * 2012-11-26 2014-07-03 Canon Inc 層状物体の測定装置および方法
US9998236B2 (en) * 2013-12-17 2018-06-12 Picometrix, Llc System for transmitting and receiving electromagnetic radiation
DE102014212633B4 (de) * 2014-06-30 2017-03-09 Inoex Gmbh Messvorrichtung und Verfahren zur Vermessung von Prüfobjekten
CN105181623B (zh) * 2015-08-04 2017-11-28 深圳市太赫兹科技创新研究院有限公司 一种邮件检测装置和方法
WO2018105332A1 (ja) * 2016-12-06 2018-06-14 パイオニア株式会社 検査装置、検査方法、コンピュータプログラム及び記録媒体
JP7428597B2 (ja) * 2020-06-18 2024-02-06 株式会社アドバンテスト 光超音波測定装置、方法、プログラム、記録媒体
TWI799875B (zh) * 2021-05-28 2023-04-21 國立中央大學 折射率量測系統、方法與其所使用的全反射子系統
CN116735545A (zh) * 2022-03-09 2023-09-12 三菱重工业株式会社 检查装置

Citations (13)

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JP2002538423A (ja) * 1999-02-23 2002-11-12 テラプロウブ リミテッド テラヘルツ画像形成のための方法及び装置
JP2004028618A (ja) * 2002-06-21 2004-01-29 Osaka Industrial Promotion Organization 塗装膜測定方法及び装置
JP3602925B2 (ja) * 1995-12-08 2004-12-15 独立行政法人科学技術振興機構 光干渉法による測定対象物の屈折率と厚さの同時測定装置
JP2007503582A (ja) * 2003-08-27 2007-02-22 テラビュー リミテッド 非平面的試料を調査するための方法及び装置
JP2007054251A (ja) * 2005-08-24 2007-03-08 Osaka Univ 断層計測装置及び断層計測方法
JP2008157710A (ja) * 2006-12-22 2008-07-10 Naohiro Tanno 光コヒーレンストモグラフィー装置
US20090040527A1 (en) * 2007-07-20 2009-02-12 Paul Dan Popescu Method and apparatus for speckle noise reduction in electromagnetic interference detection
US20100108889A1 (en) * 2007-01-29 2010-05-06 Yaochun Shen Method and apparatus for imaging an lcd using terahertz time domain spectroscopy
JP2010169503A (ja) * 2009-01-22 2010-08-05 Canon Inc 光断層画像撮像装置
JP2010181164A (ja) * 2009-02-03 2010-08-19 Aisin Seiki Co Ltd 非接触膜厚測定装置
JP2010190887A (ja) * 2009-01-23 2010-09-02 Canon Inc 分析装置
WO2011040350A1 (ja) * 2009-09-30 2011-04-07 株式会社アドバンテスト 電磁波測定装置
JP2012047641A (ja) * 2010-08-27 2012-03-08 Canon Inc 光パルス発生装置、テラヘルツ分光装置およびトモグラフィ装置

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US5489984A (en) * 1994-04-01 1996-02-06 Imra America, Inc. Differential ranging measurement system and method utilizing ultrashort pulses
JP4963640B2 (ja) 2006-10-10 2012-06-27 キヤノン株式会社 物体情報取得装置及び方法
US8934104B2 (en) * 2010-01-22 2015-01-13 Universitaet Stuttgart Method and arrangement for robust interferometry for detecting a feature of an object

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JP3602925B2 (ja) * 1995-12-08 2004-12-15 独立行政法人科学技術振興機構 光干渉法による測定対象物の屈折率と厚さの同時測定装置
JP2002538423A (ja) * 1999-02-23 2002-11-12 テラプロウブ リミテッド テラヘルツ画像形成のための方法及び装置
JP2004028618A (ja) * 2002-06-21 2004-01-29 Osaka Industrial Promotion Organization 塗装膜測定方法及び装置
JP2007503582A (ja) * 2003-08-27 2007-02-22 テラビュー リミテッド 非平面的試料を調査するための方法及び装置
US20070257216A1 (en) * 2003-08-27 2007-11-08 Withers Michael J Method and Apparatus for Investigating a Non-Planar Sample
JP2007054251A (ja) * 2005-08-24 2007-03-08 Osaka Univ 断層計測装置及び断層計測方法
JP2008157710A (ja) * 2006-12-22 2008-07-10 Naohiro Tanno 光コヒーレンストモグラフィー装置
US20100108889A1 (en) * 2007-01-29 2010-05-06 Yaochun Shen Method and apparatus for imaging an lcd using terahertz time domain spectroscopy
US20090040527A1 (en) * 2007-07-20 2009-02-12 Paul Dan Popescu Method and apparatus for speckle noise reduction in electromagnetic interference detection
JP2010169503A (ja) * 2009-01-22 2010-08-05 Canon Inc 光断層画像撮像装置
JP2010190887A (ja) * 2009-01-23 2010-09-02 Canon Inc 分析装置
US20110272579A1 (en) * 2009-01-23 2011-11-10 Canon Kabushiki Kaisha Analyzing apparatus
JP2010181164A (ja) * 2009-02-03 2010-08-19 Aisin Seiki Co Ltd 非接触膜厚測定装置
WO2011040350A1 (ja) * 2009-09-30 2011-04-07 株式会社アドバンテスト 電磁波測定装置
JP2012047641A (ja) * 2010-08-27 2012-03-08 Canon Inc 光パルス発生装置、テラヘルツ分光装置およびトモグラフィ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190123429A (ko) * 2018-04-24 2019-11-01 아이오솔루션(주) 초점각도 조정방법 및 초점각도 조정장치
KR102102776B1 (ko) * 2018-04-24 2020-04-21 아이오솔루션(주) 초점각도 조정방법 및 초점각도 조정장치

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US9134182B2 (en) 2015-09-15

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