JP2013544322A5 - - Google Patents

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Publication number
JP2013544322A5
JP2013544322A5 JP2013541216A JP2013541216A JP2013544322A5 JP 2013544322 A5 JP2013544322 A5 JP 2013544322A5 JP 2013541216 A JP2013541216 A JP 2013541216A JP 2013541216 A JP2013541216 A JP 2013541216A JP 2013544322 A5 JP2013544322 A5 JP 2013544322A5
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JP
Japan
Prior art keywords
coating
vapor deposition
drum
coating drum
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013541216A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013544322A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2010/068661 external-priority patent/WO2012072132A1/en
Publication of JP2013544322A publication Critical patent/JP2013544322A/ja
Publication of JP2013544322A5 publication Critical patent/JP2013544322A5/ja
Pending legal-status Critical Current

Links

JP2013541216A 2010-12-01 2010-12-01 蒸着ユニット及び真空コーティング装置 Pending JP2013544322A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/068661 WO2012072132A1 (en) 2010-12-01 2010-12-01 Evaporation unit and vacuum coating apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015144136A Division JP6283332B2 (ja) 2015-07-21 2015-07-21 蒸着ユニット及び真空コーティング装置

Publications (2)

Publication Number Publication Date
JP2013544322A JP2013544322A (ja) 2013-12-12
JP2013544322A5 true JP2013544322A5 (OSRAM) 2014-01-30

Family

ID=44310090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013541216A Pending JP2013544322A (ja) 2010-12-01 2010-12-01 蒸着ユニット及び真空コーティング装置

Country Status (6)

Country Link
US (1) US20140030435A1 (OSRAM)
EP (1) EP2646594A1 (OSRAM)
JP (1) JP2013544322A (OSRAM)
KR (2) KR20130121905A (OSRAM)
CN (1) CN103249861B (OSRAM)
WO (1) WO2012072132A1 (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101962787B1 (ko) * 2013-12-23 2019-03-27 어플라이드 머티어리얼스, 인코포레이티드 진공 프로세스 동안 기판을 유지하기 위한 유지 배열체, 기판 상에 층을 증착시키기 위한 장치, 및 유지 배열체를 컨베잉하기 위한 방법
EP3102715A1 (en) * 2014-02-04 2016-12-14 Applied Materials, Inc. Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material
EP4384648A1 (en) 2021-08-12 2024-06-19 Applied Materials, Inc. Evaporator for effective surface area evaporation
WO2024233688A1 (en) * 2023-05-11 2024-11-14 Applied Materials, Inc. Spinning disk centripetal coater

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665226A (en) * 1950-04-27 1954-01-05 Nat Res Corp Method and apparatus for vapor coating
US2969448A (en) * 1959-03-03 1961-01-24 Continental Can Co Heater vaporizer element support
DE3046564A1 (de) * 1979-12-10 1981-09-17 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa "verfahren und vorrichtung zur vakuum-bedampfung"
US4403002A (en) * 1979-12-10 1983-09-06 Fuji Photo Film Co., Ltd. Vacuum evaporating apparatus
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法
JPH01264632A (ja) * 1988-04-15 1989-10-20 Konica Corp 磁気記録媒体の製造方法および製造装置
US5122389A (en) * 1990-03-02 1992-06-16 Fuji Photo Film Co., Ltd. Vacuum evaporation method and apparatus
IT1269042B (it) * 1994-03-18 1997-03-18 Galileo Vacuum Tec Spa Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span)
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
JP3608529B2 (ja) * 2001-06-08 2005-01-12 松下電器産業株式会社 両面蒸着ポリプロピレンフィルムの製造方法およびそれを用いたコンデンサ
WO2002101768A1 (en) * 2001-06-08 2002-12-19 Matsushita Electric Industrial Co., Ltd. Method of manufacturing double surface metallized film, and metallized film capacitor using the method
US8808457B2 (en) * 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
DE102004047938B4 (de) * 2004-10-01 2008-10-23 Leybold Optics Gmbh Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates
CN2910966Y (zh) * 2006-03-24 2007-06-13 潘旭祥 高速卷绕多层电容薄膜镀膜机

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