JP2013544322A - 蒸着ユニット及び真空コーティング装置 - Google Patents

蒸着ユニット及び真空コーティング装置 Download PDF

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Publication number
JP2013544322A
JP2013544322A JP2013541216A JP2013541216A JP2013544322A JP 2013544322 A JP2013544322 A JP 2013544322A JP 2013541216 A JP2013541216 A JP 2013541216A JP 2013541216 A JP2013541216 A JP 2013541216A JP 2013544322 A JP2013544322 A JP 2013544322A
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JP
Japan
Prior art keywords
vapor deposition
coating
drum
coating drum
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013541216A
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English (en)
Japanese (ja)
Other versions
JP2013544322A5 (cg-RX-API-DMAC7.html
Inventor
ステファン ヘイン
ゲード ホフマン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2013544322A publication Critical patent/JP2013544322A/ja
Publication of JP2013544322A5 publication Critical patent/JP2013544322A5/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2013541216A 2010-12-01 2010-12-01 蒸着ユニット及び真空コーティング装置 Pending JP2013544322A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/068661 WO2012072132A1 (en) 2010-12-01 2010-12-01 Evaporation unit and vacuum coating apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015144136A Division JP6283332B2 (ja) 2015-07-21 2015-07-21 蒸着ユニット及び真空コーティング装置

Publications (2)

Publication Number Publication Date
JP2013544322A true JP2013544322A (ja) 2013-12-12
JP2013544322A5 JP2013544322A5 (cg-RX-API-DMAC7.html) 2014-01-30

Family

ID=44310090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013541216A Pending JP2013544322A (ja) 2010-12-01 2010-12-01 蒸着ユニット及び真空コーティング装置

Country Status (6)

Country Link
US (1) US20140030435A1 (cg-RX-API-DMAC7.html)
EP (1) EP2646594A1 (cg-RX-API-DMAC7.html)
JP (1) JP2013544322A (cg-RX-API-DMAC7.html)
KR (2) KR20180002912A (cg-RX-API-DMAC7.html)
CN (1) CN103249861B (cg-RX-API-DMAC7.html)
WO (1) WO2012072132A1 (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015096855A1 (en) * 2013-12-23 2015-07-02 Applied Materials, Inc. Holding arrangement for substrates
WO2015117638A1 (en) * 2014-02-04 2015-08-13 Applied Materials, Inc. Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material
EP4384648A1 (en) 2021-08-12 2024-06-19 Applied Materials, Inc. Evaporator for effective surface area evaporation
WO2024233688A1 (en) * 2023-05-11 2024-11-14 Applied Materials, Inc. Spinning disk centripetal coater

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0672762A1 (en) * 1994-03-18 1995-09-20 GALILEO VACUUM TEC S.p.A. Apparatus for continuous vacuum metallization
JP2002367847A (ja) * 2001-06-08 2002-12-20 Matsushita Electric Ind Co Ltd 両面蒸着ポリプロピレンフィルムの製造方法およびそれを用いたコンデンサ

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665226A (en) * 1950-04-27 1954-01-05 Nat Res Corp Method and apparatus for vapor coating
US2969448A (en) * 1959-03-03 1961-01-24 Continental Can Co Heater vaporizer element support
US4403002A (en) * 1979-12-10 1983-09-06 Fuji Photo Film Co., Ltd. Vacuum evaporating apparatus
DE3046564A1 (de) * 1979-12-10 1981-09-17 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa "verfahren und vorrichtung zur vakuum-bedampfung"
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法
JPH01264632A (ja) * 1988-04-15 1989-10-20 Konica Corp 磁気記録媒体の製造方法および製造装置
US5122389A (en) * 1990-03-02 1992-06-16 Fuji Photo Film Co., Ltd. Vacuum evaporation method and apparatus
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
EP2157589B1 (en) * 2001-06-08 2012-06-27 Panasonic Corporation Method of manufacturing double surface metallized film.
US8808457B2 (en) * 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
DE102004047938B4 (de) * 2004-10-01 2008-10-23 Leybold Optics Gmbh Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates
CN2910966Y (zh) * 2006-03-24 2007-06-13 潘旭祥 高速卷绕多层电容薄膜镀膜机

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0672762A1 (en) * 1994-03-18 1995-09-20 GALILEO VACUUM TEC S.p.A. Apparatus for continuous vacuum metallization
JP2002367847A (ja) * 2001-06-08 2002-12-20 Matsushita Electric Ind Co Ltd 両面蒸着ポリプロピレンフィルムの製造方法およびそれを用いたコンデンサ

Also Published As

Publication number Publication date
US20140030435A1 (en) 2014-01-30
WO2012072132A1 (en) 2012-06-07
CN103249861A (zh) 2013-08-14
CN103249861B (zh) 2017-03-15
EP2646594A1 (en) 2013-10-09
KR20180002912A (ko) 2018-01-08
KR20130121905A (ko) 2013-11-06

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