JP2013538455A5 - - Google Patents
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- Publication number
- JP2013538455A5 JP2013538455A5 JP2013526482A JP2013526482A JP2013538455A5 JP 2013538455 A5 JP2013538455 A5 JP 2013538455A5 JP 2013526482 A JP2013526482 A JP 2013526482A JP 2013526482 A JP2013526482 A JP 2013526482A JP 2013538455 A5 JP2013538455 A5 JP 2013538455A5
- Authority
- JP
- Japan
- Prior art keywords
- zone
- susceptor
- substrate
- internal
- heating element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000010438 heat treatment Methods 0.000 claims 11
- 239000000758 substrate Substances 0.000 claims 11
- 238000000034 method Methods 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002243 precursor Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37987610P | 2010-09-03 | 2010-09-03 | |
| US61/379,876 | 2010-09-03 | ||
| PCT/EP2011/065168 WO2012028704A1 (en) | 2010-09-03 | 2011-09-02 | Substrate heating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013538455A JP2013538455A (ja) | 2013-10-10 |
| JP2013538455A5 true JP2013538455A5 (enExample) | 2014-06-26 |
Family
ID=44735886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013526482A Withdrawn JP2013538455A (ja) | 2010-09-03 | 2011-09-02 | 基板加熱装置 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2612351A1 (enExample) |
| JP (1) | JP2013538455A (enExample) |
| KR (1) | KR20130102577A (enExample) |
| CN (1) | CN103081084A (enExample) |
| WO (1) | WO2012028704A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103614709B (zh) * | 2013-12-12 | 2015-10-07 | 济南大学 | 用于mocvd反应室的组合基座式电磁加热装置 |
| DE102016111236A1 (de) * | 2016-06-20 | 2017-12-21 | Heraeus Noblelight Gmbh | Substrat-Trägerelement für eine Trägerhorde, sowie Trägerhorde und Vorrichtung mit dem Substrat-Trägerelement |
| US10655226B2 (en) * | 2017-05-26 | 2020-05-19 | Applied Materials, Inc. | Apparatus and methods to improve ALD uniformity |
| KR102263718B1 (ko) * | 2019-06-10 | 2021-06-11 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
| CN110396680A (zh) * | 2019-07-19 | 2019-11-01 | 西安奕斯伟硅片技术有限公司 | 一种外延反应设备 |
| CN111694181B (zh) * | 2020-07-07 | 2022-06-21 | 中航华东光电有限公司 | 低温均匀加热的液晶屏组件方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6054688A (en) * | 1997-06-25 | 2000-04-25 | Brooks Automation, Inc. | Hybrid heater with ceramic foil serrated plate and gas assist |
| US6399926B2 (en) * | 2000-04-03 | 2002-06-04 | Sigmameltec Ltd. | Heat-treating apparatus capable of high temperature uniformity |
| JP2002151412A (ja) * | 2000-10-30 | 2002-05-24 | Applied Materials Inc | 半導体製造装置 |
| US6962732B2 (en) | 2001-08-23 | 2005-11-08 | Applied Materials, Inc. | Process for controlling thin film uniformity and products produced thereby |
| CN100413024C (zh) * | 2003-08-18 | 2008-08-20 | 东京毅力科创株式会社 | 基板保持构件以及基板处理装置 |
| JP2006137650A (ja) * | 2004-11-15 | 2006-06-01 | Taiheiyo Cement Corp | 軽量高剛性セラミック部材 |
| JP4756695B2 (ja) * | 2006-02-20 | 2011-08-24 | コバレントマテリアル株式会社 | 面状ヒータ |
-
2011
- 2011-09-02 JP JP2013526482A patent/JP2013538455A/ja not_active Withdrawn
- 2011-09-02 KR KR1020137008445A patent/KR20130102577A/ko not_active Withdrawn
- 2011-09-02 EP EP11764119.1A patent/EP2612351A1/en not_active Withdrawn
- 2011-09-02 WO PCT/EP2011/065168 patent/WO2012028704A1/en not_active Ceased
- 2011-09-02 CN CN2011800426244A patent/CN103081084A/zh active Pending
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