JP2013537254A5 - - Google Patents
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- Publication number
- JP2013537254A5 JP2013537254A5 JP2013528758A JP2013528758A JP2013537254A5 JP 2013537254 A5 JP2013537254 A5 JP 2013537254A5 JP 2013528758 A JP2013528758 A JP 2013528758A JP 2013528758 A JP2013528758 A JP 2013528758A JP 2013537254 A5 JP2013537254 A5 JP 2013537254A5
- Authority
- JP
- Japan
- Prior art keywords
- island
- solvent
- osmotic pressure
- matrix material
- islands
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 230000003204 osmotic Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
Description
前記溶媒(多くの例では酢酸)が前記マトリクス材料中に一定に拡散し、前記溶媒中の前記島成分の優先的溶解度の観点から前記島に入る。これは前記島の浸透圧を増加させる。前記浸透圧により、前記島の上部層を前記材料の外部から分離する前記マトリクス材料の薄層106が穴付き状態となり、前記溶媒及び島成分の混合物が表面穴108から逃げることで前記浸透圧を解消する。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1015673.5 | 2010-09-17 | ||
GBGB1015673.5A GB201015673D0 (en) | 2010-09-17 | 2010-09-17 | Nanoporous materials, manufacture of nanopourous materials and applications of nanopourous materials |
GBGB1020466.7A GB201020466D0 (en) | 2010-12-02 | 2010-12-02 | Nanoporous materials, manufacture of nanoporous materials and applications of nanoporous materials |
GB1020466.7 | 2010-12-02 | ||
PCT/GB2011/001324 WO2012035292A2 (en) | 2010-09-17 | 2011-09-09 | Nanoporous materials, manufacture of nanoporous materials and applications of nanoporous materials |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013537254A JP2013537254A (ja) | 2013-09-30 |
JP2013537254A5 true JP2013537254A5 (ja) | 2015-09-24 |
JP5873497B2 JP5873497B2 (ja) | 2016-03-01 |
Family
ID=45832013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013528758A Active JP5873497B2 (ja) | 2010-09-17 | 2011-09-09 | ナノ多孔質材料、その製造方法及びその応用 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9352513B2 (ja) |
EP (1) | EP2616506A2 (ja) |
JP (1) | JP5873497B2 (ja) |
CN (1) | CN103210029B (ja) |
AU (1) | AU2011303724B2 (ja) |
BR (1) | BR112013006311A2 (ja) |
WO (1) | WO2012035292A2 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012035292A2 (en) * | 2010-09-17 | 2012-03-22 | Cambridge Enterprise Limited | Nanoporous materials, manufacture of nanoporous materials and applications of nanoporous materials |
CN102930982B (zh) * | 2012-10-08 | 2015-06-03 | 中国科学院化学研究所 | 一种薄膜电容器介质膜的制备方法 |
JP2015073980A (ja) * | 2013-10-11 | 2015-04-20 | 富士フイルム株式会社 | ガス分離膜およびガス分離膜モジュール |
CN103887521B (zh) * | 2014-03-26 | 2016-04-06 | 清华大学 | 一种自增湿的有序化聚合物膜电极的制备方法 |
TWI522501B (zh) * | 2014-05-12 | 2016-02-21 | 國立清華大學 | 網狀材料與其製法 |
CN104599864B (zh) * | 2015-01-22 | 2017-10-24 | 太原理工大学 | 一种可增加mems超级电容器电极比表面积的斜光刻方法 |
WO2017161224A1 (en) | 2016-03-18 | 2017-09-21 | Massachusetts Institute Of Technology | Nanoporous semiconductor materials and manufacture thereof |
US10801985B2 (en) | 2016-06-03 | 2020-10-13 | Texas Instruments Incorporated | Sensing capacitor with a permeable electrode |
JP7053569B2 (ja) | 2016-08-16 | 2022-04-12 | ドナルドソン カンパニー,インコーポレイティド | 炭化水素流体-水分離 |
CN108948387B (zh) * | 2017-05-24 | 2020-09-04 | 北京赛特超润界面科技有限公司 | 一种离子选择性的纳米通道膜及其制备方法 |
BR112020016439A2 (pt) | 2018-02-15 | 2021-03-09 | Donaldson Company, Inc. | Configurações de meio filtrante |
JP7410039B2 (ja) * | 2018-02-15 | 2024-01-09 | ドナルドソン カンパニー,インコーポレイティド | 基材処理 |
GB201804010D0 (en) * | 2018-03-13 | 2018-04-25 | Univ Kyoto | Structured nanoporous materials, manufacture of structured nanoporous materials and applications of structured nanoporous materials |
EP3776634A4 (en) | 2018-04-05 | 2022-01-05 | Massachusetts Institute of Technology | POROUS AND NANOPOROUS SEMICONDUCTOR MATERIALS AND THEIR PRODUCTION |
US11971383B1 (en) * | 2018-11-20 | 2024-04-30 | Iowa State University Research Foundation, Inc. | Enhanced 3D porous architectured electroactive devices via impregnated porogens |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4136025A (en) * | 1977-08-18 | 1979-01-23 | Ppg Industries, Inc. | Method of cleaning membrane filter |
JPH07228718A (ja) * | 1994-02-16 | 1995-08-29 | Tonen Chem Corp | ポリオレフィン微多孔膜 |
JPH08252310A (ja) * | 1995-01-17 | 1996-10-01 | Miura Denshi Kk | 電解生成酸性水を用いた人工透析装置の洗浄殺菌方法およびその装置 |
WO1998035248A1 (en) | 1997-02-11 | 1998-08-13 | Massachusetts Institute Of Technology | Polymeric photonic band gap materials |
US5948470A (en) | 1997-04-28 | 1999-09-07 | Harrison; Christopher | Method of nanoscale patterning and products made thereby |
JPH11253768A (ja) | 1998-03-13 | 1999-09-21 | Mitsubishi Rayon Co Ltd | 複合化中空糸膜およびその製造方法 |
AU4967499A (en) | 1998-07-02 | 2000-01-24 | Massachusetts Institute Of Technology | Periodic porous and relief nanostructured articles |
JP3940546B2 (ja) * | 1999-06-07 | 2007-07-04 | 株式会社東芝 | パターン形成方法およびパターン形成材料 |
JP4012173B2 (ja) * | 1999-06-07 | 2007-11-21 | 株式会社東芝 | 多孔質構造体の製造方法、多孔質構造体形成材料、パターン形成方法、パターン形成材料、電気化学セル、および中空糸フィルター |
US6671071B1 (en) | 1999-10-19 | 2003-12-30 | Xerox Corporation | Threshold bias circuits for enhanced color error diffusion |
US7056455B2 (en) * | 2001-04-06 | 2006-06-06 | Carnegie Mellon University | Process for the preparation of nanostructured materials |
JP2003129288A (ja) | 2001-10-16 | 2003-05-08 | Canon Inc | 細孔構造体及びその製造方法 |
US8535702B2 (en) | 2005-02-01 | 2013-09-17 | Boston Scientific Scimed, Inc. | Medical devices having porous polymeric regions for controlled drug delivery and regulated biocompatibility |
US7482389B2 (en) | 2005-04-20 | 2009-01-27 | International Business Machines Corporation | Nanoporous media with lamellar structures |
JP2008297467A (ja) | 2007-05-31 | 2008-12-11 | Canon Inc | 高分子多孔膜およびパターニング基板の製造方法 |
US8420704B2 (en) | 2007-07-20 | 2013-04-16 | Regents Of The University Of Minnesota | Nano-structured polymer composites and process for preparing same |
CN101177493A (zh) * | 2007-10-26 | 2008-05-14 | 厦门大学 | 一种聚合物有序纳米多孔材料及其制备方法 |
KR101033806B1 (ko) | 2008-01-24 | 2011-05-13 | 고려대학교 산학협력단 | 나노 실린더형 템플레이트 및 나노 점 어레이 제조 방법 |
JP5274320B2 (ja) | 2009-03-18 | 2013-08-28 | 日本碍子株式会社 | ナノろ過膜製造方法 |
WO2012035292A2 (en) * | 2010-09-17 | 2012-03-22 | Cambridge Enterprise Limited | Nanoporous materials, manufacture of nanoporous materials and applications of nanoporous materials |
-
2011
- 2011-09-09 WO PCT/GB2011/001324 patent/WO2012035292A2/en active Application Filing
- 2011-09-09 US US13/823,200 patent/US9352513B2/en active Active
- 2011-09-09 JP JP2013528758A patent/JP5873497B2/ja active Active
- 2011-09-09 EP EP11760811.7A patent/EP2616506A2/en active Pending
- 2011-09-09 AU AU2011303724A patent/AU2011303724B2/en active Active
- 2011-09-09 CN CN201180049356.9A patent/CN103210029B/zh active Active
- 2011-09-09 BR BR112013006311A patent/BR112013006311A2/pt not_active Application Discontinuation
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