JP2013535819A5 - - Google Patents

Download PDF

Info

Publication number
JP2013535819A5
JP2013535819A5 JP2013520058A JP2013520058A JP2013535819A5 JP 2013535819 A5 JP2013535819 A5 JP 2013535819A5 JP 2013520058 A JP2013520058 A JP 2013520058A JP 2013520058 A JP2013520058 A JP 2013520058A JP 2013535819 A5 JP2013535819 A5 JP 2013535819A5
Authority
JP
Japan
Prior art keywords
model
overlay error
asymmetry
model structure
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013520058A
Other languages
English (en)
Japanese (ja)
Other versions
JP6008851B2 (ja
JP2013535819A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2011/061822 external-priority patent/WO2012010458A1/en
Publication of JP2013535819A publication Critical patent/JP2013535819A/ja
Publication of JP2013535819A5 publication Critical patent/JP2013535819A5/ja
Application granted granted Critical
Publication of JP6008851B2 publication Critical patent/JP6008851B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013520058A 2010-07-19 2011-07-12 オーバレイ誤差を決定する方法及び装置 Active JP6008851B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36553810P 2010-07-19 2010-07-19
US61/365,538 2010-07-19
PCT/EP2011/061822 WO2012010458A1 (en) 2010-07-19 2011-07-12 Method and apparatus for determining an overlay error

Publications (3)

Publication Number Publication Date
JP2013535819A JP2013535819A (ja) 2013-09-12
JP2013535819A5 true JP2013535819A5 (https=) 2014-08-28
JP6008851B2 JP6008851B2 (ja) 2016-10-19

Family

ID=44628354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013520058A Active JP6008851B2 (ja) 2010-07-19 2011-07-12 オーバレイ誤差を決定する方法及び装置

Country Status (8)

Country Link
US (2) US8908147B2 (https=)
JP (1) JP6008851B2 (https=)
KR (1) KR101793538B1 (https=)
CN (1) CN103003754B (https=)
IL (2) IL223965A (https=)
NL (1) NL2007088A (https=)
TW (1) TWI430333B (https=)
WO (1) WO2012010458A1 (https=)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2004094A (en) 2009-02-11 2010-08-12 Asml Netherlands Bv Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method.
NL2005162A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Methods and scatterometers, lithographic systems, and lithographic processing cells.
JP6008851B2 (ja) * 2010-07-19 2016-10-19 エーエスエムエル ネザーランズ ビー.ブイ. オーバレイ誤差を決定する方法及び装置
NL2009294A (en) 2011-08-30 2013-03-04 Asml Netherlands Bv Method and apparatus for determining an overlay error.
US9163935B2 (en) 2011-12-12 2015-10-20 Asml Netherlands B.V. Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell
JP5873212B2 (ja) * 2012-04-12 2016-03-01 エーエスエムエル ネザーランズ ビー.ブイ. 位置測定方法、位置測定装置、リソグラフィ装置及びデバイス製造方法並びに光学要素
US8817273B2 (en) * 2012-04-24 2014-08-26 Nanometrics Incorporated Dark field diffraction based overlay
NL2010717A (en) 2012-05-21 2013-11-25 Asml Netherlands Bv Determining a structural parameter and correcting an asymmetry property.
NL2010734A (en) 2012-05-29 2013-12-02 Asml Netherlands Bv Metrology method and apparatus, substrate, lithographic system and device manufacturing method.
JP5975785B2 (ja) * 2012-08-14 2016-08-23 株式会社アドテックエンジニアリング 描画装置、露光描画装置、プログラム及び描画方法
WO2014082813A2 (en) * 2012-11-30 2014-06-05 Asml Netherlands B.V. Method and apparatus for determining lithographic quality of a structure
NL2011683A (en) * 2012-12-13 2014-06-16 Asml Netherlands Bv Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product.
US9909982B2 (en) 2013-03-08 2018-03-06 Kla-Tencor Corporation Pupil plane calibration for scatterometry overlay measurement
WO2014138522A1 (en) * 2013-03-08 2014-09-12 Kla-Tencor Corporation Pupil plane calibration for scatterometry overlay measurement
CN108398856B (zh) * 2013-08-07 2020-10-16 Asml荷兰有限公司 量测方法和设备、光刻系统和器件制造方法
JP6007171B2 (ja) * 2013-12-26 2016-10-12 東京エレクトロン株式会社 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
US20170146465A1 (en) * 2014-06-19 2017-05-25 Nova Measuring Instruments Ltd. Test structure design for metrology measurements in patterned samples
KR102574171B1 (ko) 2014-08-29 2023-09-06 에이에스엠엘 네델란즈 비.브이. 메트롤로지 방법, 타겟 및 기판
TWI703651B (zh) * 2014-10-03 2020-09-01 美商克萊譚克公司 驗證度量目標及其設計
WO2016078862A1 (en) * 2014-11-21 2016-05-26 Asml Netherlands B.V. Metrology method and apparatus
SG11201703585RA (en) * 2014-11-25 2017-06-29 Kla Tencor Corp Analyzing and utilizing landscapes
IL290735B2 (en) * 2014-11-26 2023-03-01 Asml Netherlands Bv Metrological method, computer product and system
KR101982694B1 (ko) 2014-12-15 2019-05-27 에이에스엠엘 홀딩 엔.브이. 광학적 퓨필 대칭화를 위한 방법 및 장치
WO2016096524A1 (en) * 2014-12-19 2016-06-23 Asml Netherlands B.V. Method of measuring asymmetry, inspection apparatus, lithographic system and device manufacturing method
WO2016124345A1 (en) * 2015-02-04 2016-08-11 Asml Netherlands B.V. Metrology method, metrology apparatus and device manufacturing method
WO2016124393A1 (en) 2015-02-04 2016-08-11 Asml Netherlands B.V. Metrology method and apparatus, computer program and lithographic system
WO2016169901A1 (en) * 2015-04-21 2016-10-27 Asml Netherlands B.V. Metrology method and apparatus, computer program and lithographic system
TWI715582B (zh) 2015-05-19 2021-01-11 美商克萊譚克公司 用於疊對測量之形貌相位控制
NL2016937A (en) 2015-06-17 2016-12-22 Asml Netherlands Bv Recipe selection based on inter-recipe consistency
US9779202B2 (en) * 2015-06-22 2017-10-03 Kla-Tencor Corporation Process-induced asymmetry detection, quantification, and control using patterned wafer geometry measurements
WO2017060054A1 (en) * 2015-10-08 2017-04-13 Asml Netherlands B.V. Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus
KR102146434B1 (ko) * 2015-12-17 2020-08-21 에이에스엠엘 네델란즈 비.브이. 측정을 향상시키기 위한 비대칭 서브 해상도 피처를 사용하는 리소그래피 공정의 광학적 메트롤로지
KR102477933B1 (ko) * 2015-12-17 2022-12-15 에이에스엠엘 네델란즈 비.브이. 메트롤로지 장치의 조정 또는 측정 타겟의 특성에 기초한 측정
US10615084B2 (en) 2016-03-01 2020-04-07 Asml Netherlands B.V. Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
CN111736436B (zh) * 2016-04-22 2023-08-18 Asml荷兰有限公司 堆叠差异的确定和使用堆叠差异的校正
CN107329373B (zh) * 2016-04-29 2019-01-18 上海微电子装备(集团)股份有限公司 一种套刻误差测量装置及方法
CN109154786B (zh) * 2016-05-17 2020-12-04 Asml荷兰有限公司 基于贯穿波长的相似性的度量强健性
US10578982B2 (en) 2016-08-17 2020-03-03 Asml Netherlands B.V. Substrate measurement recipe design of, or for, a target including a latent image
KR102265164B1 (ko) * 2016-09-27 2021-06-15 에이에스엠엘 네델란즈 비.브이. 계측 레시피 선택
US10983005B2 (en) 2016-12-15 2021-04-20 Taiwan Semiconductor Manufacturing Co., Ltd. Spectroscopic overlay metrology
US10732516B2 (en) * 2017-03-01 2020-08-04 Kla Tencor Corporation Process robust overlay metrology based on optical scatterometry
EP3422103A1 (en) * 2017-06-26 2019-01-02 ASML Netherlands B.V. Method of determining a performance parameter of a process
EP3422105A1 (en) * 2017-06-30 2019-01-02 ASML Netherlands B.V. Metrology parameter determination and metrology recipe selection
US10401738B2 (en) * 2017-08-02 2019-09-03 Kla-Tencor Corporation Overlay metrology using multiple parameter configurations
JP6942555B2 (ja) 2017-08-03 2021-09-29 東京エレクトロン株式会社 基板処理方法、コンピュータ記憶媒体及び基板処理システム
EP3457211A1 (en) 2017-09-13 2019-03-20 ASML Netherlands B.V. A method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatus
TW201923332A (zh) * 2017-10-10 2019-06-16 荷蘭商Asml荷蘭公司 度量衡方法和設備、電腦程式及微影系統
US11483981B1 (en) * 2018-05-14 2022-11-01 Crop One Holdings, Inc. Systems and methods for providing a low energy use farm
WO2019236084A1 (en) * 2018-06-07 2019-12-12 Kla-Tencor Corporation Overlay measurement using phase and amplitude modeling
EP3650940A1 (en) * 2018-11-09 2020-05-13 ASML Netherlands B.V. A method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method
EP3770682A1 (en) * 2019-07-25 2021-01-27 ASML Netherlands B.V. Method and system for determining information about a target structure
KR102755839B1 (ko) * 2021-10-21 2025-01-15 케이엘에이 코포레이션 개선된 오버레이 오차 계측을 위한 유도 변위
WO2023174648A1 (en) * 2022-03-18 2023-09-21 Stichting Vu Illumination arrangement for a metrology device and associated method
CN118859632B (zh) * 2023-04-19 2025-09-26 长鑫存储技术有限公司 套刻误差补偿方法
KR102655300B1 (ko) * 2023-08-11 2024-04-05 (주)오로스 테크놀로지 오버레이 계측 장치의 보정 방법 및 오버레이 계측 장치의 보정 시스템
US12510831B2 (en) * 2024-03-11 2025-12-30 Kla Corporation Robust and accurate overlay target design for CMP

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0400246A1 (en) * 1989-05-31 1990-12-05 Plant Genetic Systems, N.V. Prevention of Bt resistance development
JP2842362B2 (ja) 1996-02-29 1999-01-06 日本電気株式会社 重ね合わせ測定方法
US5963329A (en) * 1997-10-31 1999-10-05 International Business Machines Corporation Method and apparatus for measuring the profile of small repeating lines
US6064486A (en) * 1998-05-21 2000-05-16 Leland Stanford Junior University Systems, methods and computer program products for detecting the position of a new alignment mark on a substrate based on fitting to sample alignment signals
WO2002065545A2 (en) * 2001-02-12 2002-08-22 Sensys Instruments Corporation Overlay alignment metrology using diffraction gratings
WO2002070985A1 (en) * 2001-03-02 2002-09-12 Accent Optical Technologies, Inc. Line profile asymmetry measurement using scatterometry
US6486956B2 (en) * 2001-03-23 2002-11-26 Micron Technology, Inc. Reducing asymmetrically deposited film induced registration error
US6772084B2 (en) 2002-01-31 2004-08-03 Timbre Technologies, Inc. Overlay measurements using periodic gratings
EP1512112A4 (en) * 2002-06-05 2006-11-02 Kla Tencor Tech Corp USE OF OVERLAY DIAGNOSIS FOR ADVANCED AUTOMATIC PROCESS CONTROL
US6928628B2 (en) * 2002-06-05 2005-08-09 Kla-Tencor Technologies Corporation Use of overlay diagnostics for enhanced automatic process control
JP4095391B2 (ja) * 2002-09-24 2008-06-04 キヤノン株式会社 位置検出方法
WO2005033319A2 (en) * 2003-10-02 2005-04-14 Monsanto Technology Llc Stacking crop improvement traits in transgenic plants
JP4734261B2 (ja) * 2004-02-18 2011-07-27 ケーエルエー−テンカー コーポレイション 連続変化するオフセットマークと、オーバレイ決定方法
TWI233637B (en) * 2004-03-17 2005-06-01 Promos Technologies Inc Method of correcting lithography process and method of forming overlay mark
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7643666B2 (en) 2006-08-08 2010-01-05 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7619737B2 (en) * 2007-01-22 2009-11-17 Asml Netherlands B.V Method of measurement, an inspection apparatus and a lithographic apparatus
IL194839A0 (en) * 2007-10-25 2009-08-03 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US20090300980A1 (en) * 2008-05-02 2009-12-10 Dow Agrosciences Llc Corn with transgenic insect protection traits utilized in combination with drought tolerance and/or reduced inputs particularly fertilizer
CN101566800B (zh) * 2009-02-27 2011-05-11 上海微电子装备有限公司 一种用于光刻设备的对准系统和对准方法
KR101257453B1 (ko) * 2009-05-12 2013-04-23 에이에스엠엘 네델란즈 비.브이. 리소그래피에 사용하는 검사 방법
KR101395733B1 (ko) * 2009-06-17 2014-05-15 에이에스엠엘 네델란즈 비.브이. 오버레이 측정 방법, 리소그래피 장치, 검사 장치, 처리 장치, 및 리소그래피 처리 셀
JP6008851B2 (ja) * 2010-07-19 2016-10-19 エーエスエムエル ネザーランズ ビー.ブイ. オーバレイ誤差を決定する方法及び装置

Similar Documents

Publication Publication Date Title
JP2013535819A5 (https=)
JP6215330B2 (ja) 位置ずれ対象の不正確性を概算および補正するための方法
CN111656282B (zh) 确定衬底栅格的测量设备和方法
CN107533995B (zh) 以模型为基础的热点监测
KR101882892B1 (ko) 기판 상의 구조체를 측정하는 방법 및 장치, 오차 보정을 위한 모델, 이러한 방법 및 장치를 구현하기 위한 컴퓨터 프로그램 제품
TWI621845B (zh) 校準一模型之方法與系統及推斷圖案化程序之參數之方法
TWI612377B (zh) 微影遮罩、用於量測微影印刷裝置之聚焦改變之方法、用於判定遮罩設計之方法、用於判定目標設計之方法及微影印刷工具
JP2019512869A5 (https=)
TW201740220A (zh) 用於檢測及度量衡的方法與設備
CN107148597A (zh) 度量方法、目标和衬底
JP2016528549A5 (https=)
CN107077079A (zh) 测量目标结构的属性的方法、检查设备、光刻系统和器件制造方法
KR102262427B1 (ko) 확률적 변동을 추산하는 모델
TW201732450A (zh) 量規圖案選擇之改良
JP2009224409A5 (https=)
JP2012244015A5 (https=)
TWI703409B (zh) 微影製程之度量衡
US11579535B2 (en) Method of determining the contribution of a processing apparatus to a substrate parameter
TWI823593B (zh) 用於測量基板上的至少一個目標的方法及相關聯設備和基板
TWI803186B (zh) 預測半導體製程之度量衡偏移之方法及電腦程式
JP2019056830A5 (ja) 計算方法、露光方法、プログラム、露光装置、および物品の製造方法
TW201931003A (zh) 微影光罩、用於確定此光罩之結構之影像的邊緣位置的方法以及用於實施此方法的系統
US9726984B2 (en) Aperture alignment in scatterometry metrology systems
TWI454939B (zh) 光阻圖案計算方法及計算程式儲存媒體
JP2017040821A5 (https=)