JP2017040821A5 - - Google Patents

Download PDF

Info

Publication number
JP2017040821A5
JP2017040821A5 JP2015163092A JP2015163092A JP2017040821A5 JP 2017040821 A5 JP2017040821 A5 JP 2017040821A5 JP 2015163092 A JP2015163092 A JP 2015163092A JP 2015163092 A JP2015163092 A JP 2015163092A JP 2017040821 A5 JP2017040821 A5 JP 2017040821A5
Authority
JP
Japan
Prior art keywords
exposure
exposure condition
prediction formula
determination method
correlation coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015163092A
Other languages
English (en)
Japanese (ja)
Other versions
JP6613074B2 (ja
JP2017040821A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2015163092A priority Critical patent/JP6613074B2/ja
Priority claimed from JP2015163092A external-priority patent/JP6613074B2/ja
Priority to US15/233,166 priority patent/US10042266B2/en
Publication of JP2017040821A publication Critical patent/JP2017040821A/ja
Publication of JP2017040821A5 publication Critical patent/JP2017040821A5/ja
Application granted granted Critical
Publication of JP6613074B2 publication Critical patent/JP6613074B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015163092A 2015-08-20 2015-08-20 決定方法、露光装置、プログラム、および物品の製造方法 Active JP6613074B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015163092A JP6613074B2 (ja) 2015-08-20 2015-08-20 決定方法、露光装置、プログラム、および物品の製造方法
US15/233,166 US10042266B2 (en) 2015-08-20 2016-08-10 Determination method, exposure apparatus, storage medium, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015163092A JP6613074B2 (ja) 2015-08-20 2015-08-20 決定方法、露光装置、プログラム、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2017040821A JP2017040821A (ja) 2017-02-23
JP2017040821A5 true JP2017040821A5 (https=) 2018-09-20
JP6613074B2 JP6613074B2 (ja) 2019-11-27

Family

ID=58157204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015163092A Active JP6613074B2 (ja) 2015-08-20 2015-08-20 決定方法、露光装置、プログラム、および物品の製造方法

Country Status (2)

Country Link
US (1) US10042266B2 (https=)
JP (1) JP6613074B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6554141B2 (ja) * 2017-05-26 2019-07-31 キヤノン株式会社 決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法
JP6944323B2 (ja) * 2017-09-21 2021-10-06 キヤノン株式会社 計算方法、露光方法、プログラム、露光装置、および物品の製造方法
WO2026008218A1 (en) * 2024-07-05 2026-01-08 Asml Netherlands B.V. Method of controlling exposure apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0821531B2 (ja) 1986-08-29 1996-03-04 株式会社ニコン 投影光学装置
US6297877B1 (en) * 1998-08-13 2001-10-02 Micron Technology, Inc. Methods for compensating for lens heating resulting from wafer reflectance in micro-photolithography equipment
JP3265533B2 (ja) * 1999-02-03 2002-03-11 株式会社ニコン 集積回路製造方法、および投影露光装置
JP2001160533A (ja) * 1999-12-02 2001-06-12 Canon Inc 投影露光装置およびデバイス製造方法
JP2009218366A (ja) * 2008-03-10 2009-09-24 Canon Inc 露光装置、露光方法、算出方法及びデバイス製造方法
JP6039932B2 (ja) * 2012-06-22 2016-12-07 キヤノン株式会社 露光装置、露光方法及び物品の製造方法
JP6381188B2 (ja) * 2013-08-13 2018-08-29 キヤノン株式会社 露光装置およびデバイスの製造方法

Similar Documents

Publication Publication Date Title
CN107533995B (zh) 以模型为基础的热点监测
TWI612274B (zh) 評估一繞射結構之電腦實施方法、非暫時性機器可讀儲存媒體及光學量測系統
JP2013535819A5 (https=)
JP2022552191A (ja) 計測のための信号－領域適応
JP2015534267A5 (https=)
WO2016101182A1 (zh) 基于贝叶斯网络和极限学习机的区间型指标预报方法
JP2012244015A5 (https=)
JP2019512869A5 (https=)
KR102253565B1 (ko) 이미징 오버레이 계측에서 오버레이 오정렬 오차 평가치의 이용
JP2015527740A5 (https=)
IL272780B2 (en) A method for determining a parameter for building processes
CN107924390A (zh) 借助于校准曲线来确定样本的浓度范围的方法和系统
JP2016184638A5 (https=)
JP2017040821A5 (https=)
JP2019056830A5 (ja) 計算方法、露光方法、プログラム、露光装置、および物品の製造方法
JP2015061005A5 (ja) 分析方法およびプラズマエッチング装置
JP2015084053A5 (https=)
JP2017037194A5 (ja) 評価方法、露光方法、露光装置、プログラム、および物品の製造方法
US12353967B2 (en) Method and apparatus for determining feature contribution to performance
IL273145B2 (en) Metrology in lithographic processes
EP2567209B1 (en) Determination of material optical properties for optical metrology of structures
JP2016080475A5 (https=)
Ostertagová et al. Application of polynomial regression models for prediction of stress state in structural elements
US20230153582A1 (en) Configuration of an imputer model
JP2019184681A5 (https=)