JP2013510422A - フリップチップledのためのシリコーンベースの反射性アンダーフィル及び熱カプラ - Google Patents
フリップチップledのためのシリコーンベースの反射性アンダーフィル及び熱カプラ Download PDFInfo
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- JP2013510422A JP2013510422A JP2012535971A JP2012535971A JP2013510422A JP 2013510422 A JP2013510422 A JP 2013510422A JP 2012535971 A JP2012535971 A JP 2012535971A JP 2012535971 A JP2012535971 A JP 2012535971A JP 2013510422 A JP2013510422 A JP 2013510422A
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- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 21
- 239000010931 gold Substances 0.000 claims abstract description 53
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 51
- 229910052737 gold Inorganic materials 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims abstract description 35
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229910010413 TiO 2 Inorganic materials 0.000 claims abstract description 12
- 238000000465 moulding Methods 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- 239000011800 void material Substances 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 33
- 239000002184 metal Substances 0.000 claims description 33
- 230000009477 glass transition Effects 0.000 claims description 4
- 238000011049 filling Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 20
- 238000000034 method Methods 0.000 abstract description 14
- 230000008569 process Effects 0.000 abstract description 12
- 238000002310 reflectometry Methods 0.000 abstract description 9
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 8
- 239000000377 silicon dioxide Substances 0.000 abstract description 8
- 238000000605 extraction Methods 0.000 abstract description 4
- 238000000149 argon plasma sintering Methods 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 15
- 229910052709 silver Inorganic materials 0.000 description 14
- 239000004332 silver Substances 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 230000008901 benefit Effects 0.000 description 7
- 239000004593 Epoxy Substances 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- -1 AMZO Chemical compound 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 241001085205 Prenanthella exigua Species 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 229920006336 epoxy molding compound Polymers 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- SKJCKYVIQGBWTN-UHFFFAOYSA-N (4-hydroxyphenyl) methanesulfonate Chemical compound CS(=O)(=O)OC1=CC=C(O)C=C1 SKJCKYVIQGBWTN-UHFFFAOYSA-N 0.000 description 1
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- 229910017750 AgSn Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000505 Al2TiO5 Inorganic materials 0.000 description 1
- 229910017083 AlN Inorganic materials 0.000 description 1
- 229910017109 AlON Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-BJUDXGSMSA-N Aluminum-26 Chemical compound [26Al] XAGFODPZIPBFFR-BJUDXGSMSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910003564 SiAlON Inorganic materials 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- CJDPJFRMHVXWPT-UHFFFAOYSA-N barium sulfide Chemical compound [S-2].[Ba+2] CJDPJFRMHVXWPT-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000010987 cubic zirconia Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910003439 heavy metal oxide Inorganic materials 0.000 description 1
- BDVZHDCXCXJPSO-UHFFFAOYSA-N indium(3+) oxygen(2-) titanium(4+) Chemical compound [O-2].[Ti+4].[In+3] BDVZHDCXCXJPSO-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- PUIYMUZLKQOUOZ-UHFFFAOYSA-N isoproturon Chemical compound CC(C)C1=CC=C(NC(=O)N(C)C)C=C1 PUIYMUZLKQOUOZ-UHFFFAOYSA-N 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000011325 microbead Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012667 polymer degradation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- AABBHSMFGKYLKE-SNAWJCMRSA-N propan-2-yl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(C)C AABBHSMFGKYLKE-SNAWJCMRSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 229910019655 synthetic inorganic crystalline material Inorganic materials 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/64—Heat extraction or cooling elements
- H01L33/641—Heat extraction or cooling elements characterized by the materials
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/64—Heat extraction or cooling elements
- H01L33/647—Heat extraction or cooling elements the elements conducting electric current to or from the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0091—Scattering means in or on the semiconductor body or semiconductor body package
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- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
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- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
Abstract
Description
前記アルミニウムは、約5ミクロンの高さを有する金のポスト28が形成されるまで露出されたアルミニウムを金でメッキするように(n型層10を介して)電気的にバイアスをかけられる(ステップ107)。他の高さも、適切である。金によるアルミニウムのメッキは、よく知られている処理である。Alと金との間の適切な障壁層が、使用されることができる。図11は、後述されるように、LEDの底面上の金のポスト28の1つの適切なパターンを示している。一実施例において、前記n型層に電気的に接触している金のポスト28間の空間は、200ミクロン未満でなければならない。
少量の前記アルミナの小さい量(例えば、5―10重量%)は、96%と同じ程度まで反射率を増大させるために、チタン酸化物(TiO2)(明るい白色の粉体)と置換されても良い。約90%よりも大きいSMCの反射率は、十分である。前記アルミナを含んでいるSMC及びTiO2は、前記光を反射するだけでなく、前記反射をランダム化する。付着促進剤及び溶媒が、硬化特性及び粘性性を変更するために、前記SMCに加えられることもできる。前記SMCの熱膨張係数は、前記LEDの熱膨張係数に近いものであることができ、この結果、最悪の場合の条件における(例えば、AuSn又はAgSnはんだリフローの間における)前記SMC及びダイの熱膨張率の違いは殆どない。
Claims (15)
- 底面を有する発光ダイオード(LED)ダイと、
前記LEDダイが取り付けられるサブマウントであって、前記LEDダイと前記サブマウントとの間に間隙が設けられている、前記サブマウントと、
を有する発光装置であって、
前記LEDダイは、前記底面に電気的に接続されている複数の金属ポストを有し、前記LEDダイによって下方に発された光が金属ポスト間を通過するように、前記LEDダイの底面に沿って前記金属ポスト間の実質的に透明な領域が設けられており、
実質的に反射性のアンダーフィル材料が、前記LEDダイの底面と前記サブマウントとの間のボイドを充填しており、前記アンダーフィル材料は、20W/m/Kより大きい熱伝導率を有する反射性粉体及びシリコーンを有し、前記アンダーフィル材料は、前記LEDダイからの光を概ね上方へ反射し、前記LEDダイと前記サブマウントとの間で熱を伝達する、
発光装置。 - 前記アンダーフィル材料は、TiO2を注入されているシリコーンを更に有し、前記TiO2は、前記アンダーフィル材料中で、約5重量%よりも多い、請求項1に記載の発光装置。
- 前記LEDダイがフリップチップである、請求項1に記載の発光装置。
- 前記反射性粉体が、前記アンダーフィル材料中で、少なくとも70重量%であるアルミナを有している、請求項1に記載の発光装置。
- 前記アンダーフィル材料が、可視光に対して、少なくとも90%の反射性を有し、少なくとも約20W/m/Kの熱伝導率を有する、請求項1に記載の発光装置。
- 前記金属ポストが、50ミクロン未満の間隔をあけられている、請求項1に記載の発光装置。
- 前記LEDダイは、前記サブマウントに面しているp型層を有している、請求項1に記載の発光装置であって、前記p型層上、及び前記p型層と前記金属ポストとの間に、非半導体の実質的に透明な伝導層を更に有する、請求項1に記載の発光装置。
- 前記LEDダイが、前記サブマウントに面しているp型層を有しており、前記金属ポストは、前記p型層上にメッキされる金のポストである、請求項1に記載の発光装置。
- 前記LEDダイが、前記サブマウントに面しているp型層を有している、請求項1に記載の発光装置であって、
前記p型層上の非半導体の実質的に透明な伝導層と、
前記実質的に透明な伝導層上に堆積されている金属パッドと、
を更に有し、
前記金属ポストは、前記金属パッド上にメッキされている金のポストを有する、
発光装置。 - 前記金属ポストは、3―7ミクロンの間の長さである、請求項1に記載の発光装置。
- 前記LEDダイ内のp型層に電気的に接触している金のポストの1つの集合と、前記LEDダイ内のn型層に電気的に接触している金のポストの他の集合とを更に有する、請求項1に記載の発光装置。
- 前記金属ポストは、10―20ミクロンの間の厚さを有し、50ミクロン未満の間隔をあけられている、請求項1に記載の発光装置。
- 前記反射アンダーフィル材料が前記LEDダイからの光を拡散的に反射する、請求項1に記載の発光装置。
- 前記LEDダイのための成長基板が除去されている、請求項1に記載の発光装置。
- 底面を有する発光ダイオード(LED)ダイと、
前記LEDダイが取り付けられるサブマウントであって、前記LEDダイと前記サブマウント間に間隙が設けられている、前記サブマウントと、
前記LEDダイの底面と前記サブマウントとの間のボイドを充填するアンダーフィル材料であって、室温未満のガラス転移温度を有するシリコーン成形コンパウンドを有するアンダーフィル材料と、
を有する発光装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/613,924 US8471280B2 (en) | 2009-11-06 | 2009-11-06 | Silicone based reflective underfill and thermal coupler |
US12/613,924 | 2009-11-06 | ||
PCT/IB2010/054588 WO2011055249A2 (en) | 2009-11-06 | 2010-10-11 | Silicone based reflective underfill and thermal coupler for flip chip led |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013510422A true JP2013510422A (ja) | 2013-03-21 |
JP2013510422A5 JP2013510422A5 (ja) | 2013-11-28 |
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KR (1) | KR101833786B1 (ja) |
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WO2011055249A3 (en) | 2015-11-26 |
US8471280B2 (en) | 2013-06-25 |
TWI504029B (zh) | 2015-10-11 |
KR101833786B1 (ko) | 2018-03-14 |
TW201123565A (en) | 2011-07-01 |
EP2497126B1 (en) | 2018-07-25 |
EP2497126A2 (en) | 2012-09-12 |
US20110108865A1 (en) | 2011-05-12 |
KR20120109497A (ko) | 2012-10-08 |
CN102971877B (zh) | 2016-06-29 |
WO2011055249A2 (en) | 2011-05-12 |
CN102971877A (zh) | 2013-03-13 |
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