JP2013506040A5 - - Google Patents

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Publication number
JP2013506040A5
JP2013506040A5 JP2012531301A JP2012531301A JP2013506040A5 JP 2013506040 A5 JP2013506040 A5 JP 2013506040A5 JP 2012531301 A JP2012531301 A JP 2012531301A JP 2012531301 A JP2012531301 A JP 2012531301A JP 2013506040 A5 JP2013506040 A5 JP 2013506040A5
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JP
Japan
Prior art keywords
silicon dioxide
paint
modified
refractive index
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012531301A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013506040A (ja
JP5734297B2 (ja
Filing date
Publication date
Priority claimed from DE102009045104A external-priority patent/DE102009045104A1/de
Application filed filed Critical
Publication of JP2013506040A publication Critical patent/JP2013506040A/ja
Publication of JP2013506040A5 publication Critical patent/JP2013506040A5/ja
Application granted granted Critical
Publication of JP5734297B2 publication Critical patent/JP5734297B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012531301A 2009-09-29 2010-08-20 Uv塗料用の新規艶消し剤 Expired - Fee Related JP5734297B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009045104.8 2009-09-29
DE102009045104A DE102009045104A1 (de) 2009-09-29 2009-09-29 Neuartige Mattierungsmittel für UV-Lacke
PCT/EP2010/062171 WO2011038991A1 (de) 2009-09-29 2010-08-20 Neuartige mattierungsmittel für uv-lacke

Publications (3)

Publication Number Publication Date
JP2013506040A JP2013506040A (ja) 2013-02-21
JP2013506040A5 true JP2013506040A5 (enExample) 2014-10-02
JP5734297B2 JP5734297B2 (ja) 2015-06-17

Family

ID=42710558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012531301A Expired - Fee Related JP5734297B2 (ja) 2009-09-29 2010-08-20 Uv塗料用の新規艶消し剤

Country Status (12)

Country Link
US (1) US9624318B2 (enExample)
EP (1) EP2483202B1 (enExample)
JP (1) JP5734297B2 (enExample)
KR (1) KR101704089B1 (enExample)
CN (1) CN102031035B (enExample)
BR (1) BR112012006955A2 (enExample)
DE (1) DE102009045104A1 (enExample)
MX (1) MX336275B (enExample)
MY (2) MY170615A (enExample)
PL (1) PL2483202T3 (enExample)
TW (1) TWI480351B (enExample)
WO (1) WO2011038991A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009045109A1 (de) * 2009-09-29 2011-03-31 Evonik Degussa Gmbh Oberflächenmodifizierte Semi-Gele
DE102010029945A1 (de) * 2010-06-10 2011-12-15 Evonik Degussa Gmbh Neuartige Mattierungsmittel für UV-Überdrucklacke
US20150210885A1 (en) 2012-07-24 2015-07-30 Akzo Nobel Coatings International B.V. Matting Paste Composition
CN103087286B (zh) * 2013-01-07 2015-04-01 中国科学院过程工程研究所 一种水性聚氨酯弹性分散体及其制备方法
CN104530770B (zh) * 2015-01-26 2016-03-30 广东海顺新材料科技有限公司 一种高透明低吸油值消光粉的制备方法
WO2018222960A1 (en) * 2017-06-02 2018-12-06 W. R. Grace & Co.-Conn. Coated particles and methods of making and using the same
BR112020002310B1 (pt) 2017-08-03 2024-01-23 W.R. Grace & Co.-Conn Agente fosqueante para composições de revestimento aquosas,método para prepará-lo, composição de revestimento compreendendo dito agente, substratos revestidos com a mesma e método para preparar um substrato revestido
CN112638490B (zh) 2018-06-15 2023-01-03 格雷斯公司 消泡剂活性物质、其制造方法和消泡制剂
JP7698632B2 (ja) * 2020-04-02 2025-06-25 株式会社トクヤマ シリカ、塗料およびシリカの製造方法
CN118322686B (zh) * 2024-03-26 2026-04-28 安徽金田高新材料股份有限公司 一种皮革用消光转移膜及其制备方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1982002403A1 (en) * 1981-01-15 1982-07-22 Nguyen Tao Van Photo setting composition for coating substrates with an abrasion-resistant transparent or translucent film
DE3144299A1 (de) 1981-11-07 1983-05-19 Degussa Ag, 6000 Frankfurt Faellungskieselsaeuren mit hoher struktur und verfahren zu ihrer herstellung
US6191122B1 (en) 1996-03-29 2001-02-20 DEGUSSA HüLS AKTIENGESELLSCHAFT Partially hydrophobic precipitated silicas
JP2000006325A (ja) 1998-06-18 2000-01-11 Dainippon Printing Co Ltd 耐摩耗性を有する化粧材
KR20000031488A (ko) * 1998-11-06 2000-06-05 장용균 자외선 경화용 소광성 조성물 및 그로부터 제조된 소광성 필름
DE10058616A1 (de) 2000-11-25 2002-05-29 Degussa Fällungskieselsäuren mit hoher Struktur
DE10062449A1 (de) 2000-12-14 2002-06-20 Degussa Dotierte Fällungskieselsäure
DE10112441A1 (de) 2001-03-15 2002-09-19 Degussa Kieselsäure durch Fällung mit konstanter Alkalizahl und deren Verwendung
DE10138492A1 (de) * 2001-08-04 2003-02-13 Degussa Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad
US20060127666A1 (en) * 2001-12-07 2006-06-15 Fuchs Iris L Multilayer sheet comprising a protective polyurethane layer
EP1318011B1 (en) 2001-12-07 2004-09-22 3M Innovative Properties Company Multi-layer sheet comprising a protective polyurethane layer
DE10241273A1 (de) 2002-09-06 2004-03-18 Degussa Ag Effiziente Mattierungsmittel basierend auf Fällungskieselsäuren
BR0317453A (pt) 2002-12-18 2005-11-16 Degussa Sìlica estruturada, tipo aerogel de superfìcie modificada
CN1320045C (zh) 2002-12-18 2007-06-06 德古萨公司 结构-涂覆的二氧化硅和其制备方法、涂料体系及其用途以及塑料体
WO2004055120A1 (en) 2002-12-18 2004-07-01 Degussa Ag Structurally modified silica
ATE368004T1 (de) 2003-05-14 2007-08-15 Degussa Oberflächenmodifizierte fällungskieselsäuren
KR101104088B1 (ko) * 2003-05-14 2012-01-12 에보닉 데구사 게엠베하 표면 개질된 침강 실리카
DE102004005409A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophile Fällungskieselsäure für Entschäumerformulierungen
DE102004005411A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophobe Fällungskieselsäure für Entschäumerformulierungen
DE102004029073A1 (de) * 2004-06-16 2005-12-29 Degussa Ag Lackformulierung mit verbesserten rheologischen Eigenschaften
DE102004029069A1 (de) 2004-06-16 2005-12-29 Degussa Ag Oberflächenmodifizierte Silicagele
US7622514B2 (en) 2005-05-09 2009-11-24 Sabic Innovative Plastics Ip B.V. Curable composition and article possessing protective layer obtained therefrom
DE102006048850A1 (de) 2006-10-16 2008-04-17 Evonik Degussa Gmbh Amorphe submicron Partikel

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