KR101704089B1 - Ｕｖ 바니쉬용 신규 소광제 - Google Patents

Ｕｖ 바니쉬용 신규 소광제 Download PDF

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Publication number
KR101704089B1
KR101704089B1 KR1020127007981A KR20127007981A KR101704089B1 KR 101704089 B1 KR101704089 B1 KR 101704089B1 KR 1020127007981 A KR1020127007981 A KR 1020127007981A KR 20127007981 A KR20127007981 A KR 20127007981A KR 101704089 B1 KR101704089 B1 KR 101704089B1
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KR
South Korea
Prior art keywords
radical
silicon dioxide
formula
organopolysiloxane
coating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020127007981A
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English (en)
Korean (ko)
Other versions
KR20120093178A (ko
Inventor
클라우스 벤너
한스-디터 크리스티안
고틀리브 린드너
카를 마이어
Original Assignee
에보니크 데구사 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에보니크 데구사 게엠베하 filed Critical 에보니크 데구사 게엠베하
Publication of KR20120093178A publication Critical patent/KR20120093178A/ko
Application granted granted Critical
Publication of KR101704089B1 publication Critical patent/KR101704089B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Dispersion Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Medicinal Preparation (AREA)
  • Detergent Compositions (AREA)
  • Cosmetics (AREA)
  • Silicon Compounds (AREA)
KR1020127007981A 2009-09-29 2010-08-20 Ｕｖ 바니쉬용 신규 소광제 Expired - Fee Related KR101704089B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009045104.8 2009-09-29
DE102009045104A DE102009045104A1 (de) 2009-09-29 2009-09-29 Neuartige Mattierungsmittel für UV-Lacke
PCT/EP2010/062171 WO2011038991A1 (de) 2009-09-29 2010-08-20 Neuartige mattierungsmittel für uv-lacke

Publications (2)

Publication Number Publication Date
KR20120093178A KR20120093178A (ko) 2012-08-22
KR101704089B1 true KR101704089B1 (ko) 2017-02-07

Family

ID=42710558

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127007981A Expired - Fee Related KR101704089B1 (ko) 2009-09-29 2010-08-20 Ｕｖ 바니쉬용 신규 소광제

Country Status (12)

Country Link
US (1) US9624318B2 (enExample)
EP (1) EP2483202B1 (enExample)
JP (1) JP5734297B2 (enExample)
KR (1) KR101704089B1 (enExample)
CN (1) CN102031035B (enExample)
BR (1) BR112012006955A2 (enExample)
DE (1) DE102009045104A1 (enExample)
MX (1) MX336275B (enExample)
MY (2) MY170615A (enExample)
PL (1) PL2483202T3 (enExample)
TW (1) TWI480351B (enExample)
WO (1) WO2011038991A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009045109A1 (de) * 2009-09-29 2011-03-31 Evonik Degussa Gmbh Oberflächenmodifizierte Semi-Gele
DE102010029945A1 (de) * 2010-06-10 2011-12-15 Evonik Degussa Gmbh Neuartige Mattierungsmittel für UV-Überdrucklacke
US20150210885A1 (en) 2012-07-24 2015-07-30 Akzo Nobel Coatings International B.V. Matting Paste Composition
CN103087286B (zh) * 2013-01-07 2015-04-01 中国科学院过程工程研究所 一种水性聚氨酯弹性分散体及其制备方法
CN104530770B (zh) * 2015-01-26 2016-03-30 广东海顺新材料科技有限公司 一种高透明低吸油值消光粉的制备方法
WO2018222960A1 (en) * 2017-06-02 2018-12-06 W. R. Grace & Co.-Conn. Coated particles and methods of making and using the same
BR112020002310B1 (pt) 2017-08-03 2024-01-23 W.R. Grace & Co.-Conn Agente fosqueante para composições de revestimento aquosas,método para prepará-lo, composição de revestimento compreendendo dito agente, substratos revestidos com a mesma e método para preparar um substrato revestido
CN112638490B (zh) 2018-06-15 2023-01-03 格雷斯公司 消泡剂活性物质、其制造方法和消泡制剂
JP7698632B2 (ja) * 2020-04-02 2025-06-25 株式会社トクヤマ シリカ、塗料およびシリカの製造方法
CN118322686B (zh) * 2024-03-26 2026-04-28 安徽金田高新材料股份有限公司 一种皮革用消光转移膜及其制备方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1982002403A1 (en) * 1981-01-15 1982-07-22 Nguyen Tao Van Photo setting composition for coating substrates with an abrasion-resistant transparent or translucent film
DE3144299A1 (de) 1981-11-07 1983-05-19 Degussa Ag, 6000 Frankfurt Faellungskieselsaeuren mit hoher struktur und verfahren zu ihrer herstellung
US6191122B1 (en) 1996-03-29 2001-02-20 DEGUSSA HüLS AKTIENGESELLSCHAFT Partially hydrophobic precipitated silicas
JP2000006325A (ja) 1998-06-18 2000-01-11 Dainippon Printing Co Ltd 耐摩耗性を有する化粧材
KR20000031488A (ko) * 1998-11-06 2000-06-05 장용균 자외선 경화용 소광성 조성물 및 그로부터 제조된 소광성 필름
DE10058616A1 (de) 2000-11-25 2002-05-29 Degussa Fällungskieselsäuren mit hoher Struktur
DE10062449A1 (de) 2000-12-14 2002-06-20 Degussa Dotierte Fällungskieselsäure
DE10112441A1 (de) 2001-03-15 2002-09-19 Degussa Kieselsäure durch Fällung mit konstanter Alkalizahl und deren Verwendung
DE10138492A1 (de) * 2001-08-04 2003-02-13 Degussa Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad
US20060127666A1 (en) * 2001-12-07 2006-06-15 Fuchs Iris L Multilayer sheet comprising a protective polyurethane layer
EP1318011B1 (en) 2001-12-07 2004-09-22 3M Innovative Properties Company Multi-layer sheet comprising a protective polyurethane layer
DE10241273A1 (de) 2002-09-06 2004-03-18 Degussa Ag Effiziente Mattierungsmittel basierend auf Fällungskieselsäuren
BR0317453A (pt) 2002-12-18 2005-11-16 Degussa Sìlica estruturada, tipo aerogel de superfìcie modificada
CN1320045C (zh) 2002-12-18 2007-06-06 德古萨公司 结构－涂覆的二氧化硅和其制备方法、涂料体系及其用途以及塑料体
WO2004055120A1 (en) 2002-12-18 2004-07-01 Degussa Ag Structurally modified silica
ATE368004T1 (de) 2003-05-14 2007-08-15 Degussa Oberflächenmodifizierte fällungskieselsäuren
KR101104088B1 (ko) * 2003-05-14 2012-01-12 에보닉 데구사 게엠베하 표면 개질된 침강 실리카
DE102004005409A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophile Fällungskieselsäure für Entschäumerformulierungen
DE102004005411A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophobe Fällungskieselsäure für Entschäumerformulierungen
DE102004029073A1 (de) * 2004-06-16 2005-12-29 Degussa Ag Lackformulierung mit verbesserten rheologischen Eigenschaften
DE102004029069A1 (de) 2004-06-16 2005-12-29 Degussa Ag Oberflächenmodifizierte Silicagele
US7622514B2 (en) 2005-05-09 2009-11-24 Sabic Innovative Plastics Ip B.V. Curable composition and article possessing protective layer obtained therefrom
DE102006048850A1 (de) 2006-10-16 2008-04-17 Evonik Degussa Gmbh Amorphe submicron Partikel

Also Published As

Publication number Publication date
CN102031035B (zh) 2014-12-17
MY170615A (en) 2019-08-21
MY158910A (en) 2016-11-30
KR20120093178A (ko) 2012-08-22
US9624318B2 (en) 2017-04-18
MX336275B (es) 2016-01-13
HK1156962A1 (en) 2012-06-22
EP2483202B1 (de) 2019-10-09
JP2013506040A (ja) 2013-02-21
EP2483202A1 (de) 2012-08-08
TWI480351B (zh) 2015-04-11
MX2012003887A (es) 2012-04-20
WO2011038991A1 (de) 2011-04-07
TW201129658A (en) 2011-09-01
BR112012006955A2 (pt) 2016-06-14
US20120202914A1 (en) 2012-08-09
PL2483202T3 (pl) 2020-04-30
JP5734297B2 (ja) 2015-06-17
CN102031035A (zh) 2011-04-27
DE102009045104A1 (de) 2011-03-31

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