JP2013505363A5 - - Google Patents
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- Publication number
- JP2013505363A5 JP2013505363A5 JP2012530263A JP2012530263A JP2013505363A5 JP 2013505363 A5 JP2013505363 A5 JP 2013505363A5 JP 2012530263 A JP2012530263 A JP 2012530263A JP 2012530263 A JP2012530263 A JP 2012530263A JP 2013505363 A5 JP2013505363 A5 JP 2013505363A5
- Authority
- JP
- Japan
- Prior art keywords
- ruthenium
- coating
- electrode
- deposition
- electrode according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000576 coating method Methods 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 14
- 239000003054 catalyst Substances 0.000 claims description 10
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 9
- 229910052707 ruthenium Inorganic materials 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 238000005240 physical vapour deposition Methods 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 230000003197 catalytic effect Effects 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 5
- 230000008021 deposition Effects 0.000 claims 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 1
- 238000004070 electrodeposition Methods 0.000 claims 1
- 238000005868 electrolysis reaction Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 150000003303 ruthenium Chemical class 0.000 claims 1
- 238000005979 thermal decomposition reaction Methods 0.000 claims 1
- 230000008901 benefit Effects 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITMI2009A001621 | 2009-09-23 | ||
| IT001621A ITMI20091621A1 (it) | 2009-09-23 | 2009-09-23 | Elettrodo per processi elettrolitici con struttura cristallina controllata |
| PCT/EP2010/064081 WO2011036225A1 (en) | 2009-09-23 | 2010-09-23 | Electrode for electrolytic processes with controlled crystalline structure |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013505363A JP2013505363A (ja) | 2013-02-14 |
| JP2013505363A5 true JP2013505363A5 (enExample) | 2015-04-23 |
| JP5824454B2 JP5824454B2 (ja) | 2015-11-25 |
Family
ID=42138977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012530263A Expired - Fee Related JP5824454B2 (ja) | 2009-09-23 | 2010-09-23 | 制御された結晶構造を有する電解プロセス用電極 |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US9090982B2 (enExample) |
| EP (1) | EP2480705B1 (enExample) |
| JP (1) | JP5824454B2 (enExample) |
| KR (1) | KR101742011B1 (enExample) |
| CN (1) | CN102575363B (enExample) |
| AR (1) | AR078442A1 (enExample) |
| AU (1) | AU2010299850B2 (enExample) |
| BR (1) | BR112012006530A2 (enExample) |
| CA (1) | CA2769824C (enExample) |
| DK (1) | DK2480705T3 (enExample) |
| EA (1) | EA023083B1 (enExample) |
| IL (1) | IL217859A (enExample) |
| IT (1) | ITMI20091621A1 (enExample) |
| MX (1) | MX2012003517A (enExample) |
| TW (1) | TWI490372B (enExample) |
| WO (1) | WO2011036225A1 (enExample) |
| ZA (1) | ZA201201825B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITMI20122035A1 (it) * | 2012-11-29 | 2014-05-30 | Industrie De Nora Spa | Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali |
| DK3351659T3 (da) * | 2015-09-18 | 2019-12-16 | Asahi Chemical Ind | Positiv elektrode til vandelektrolyse, elektrolysecelle og fremgangsmåde til at fremstille en positiv elektrode til vandelektrolyse |
| WO2019204578A1 (en) * | 2018-04-18 | 2019-10-24 | Materion Corporation | Electrodes for biosensors |
| CN113073336B (zh) * | 2021-03-26 | 2022-07-08 | 浙江工业大学 | 一种RuO2泡沫镍复合电极及其制备方法和应用 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2088659A5 (enExample) * | 1970-04-21 | 1972-01-07 | Progil | |
| AU5889880A (en) * | 1979-07-02 | 1981-01-15 | Olin Corporation | Manufacture of low overvoltage electrodes by cathodic sputtering |
| EP0107612A3 (en) * | 1982-09-02 | 1985-12-27 | Eltech Systems Limited | Method of conditioning a porous gas-diffusion electrode |
| CN1008543B (zh) * | 1985-11-21 | 1990-06-27 | 中国科学院大连化学物理研究所 | 一种电解水方法 |
| GB8617325D0 (en) * | 1986-07-16 | 1986-08-20 | Johnson Matthey Plc | Poison-resistant cathodes |
| US6171460B1 (en) * | 1993-05-10 | 2001-01-09 | John L. Bill | Chemically protected electrode system |
| FR2775486B1 (fr) * | 1998-03-02 | 2000-04-07 | Atochem Elf Sa | Cathode specifique, utilisable pour la preparation d'un chlorate de metal alcalin et son procede de fabrication |
| WO2003016592A2 (en) * | 2001-08-14 | 2003-02-27 | 3-One-2, Llc | Electrolytic cell and electrodes for use in electrochemical processes |
| US6686308B2 (en) * | 2001-12-03 | 2004-02-03 | 3M Innovative Properties Company | Supported nanoparticle catalyst |
| BRPI0616332A2 (pt) * | 2005-09-23 | 2011-06-14 | Mecs Inc | processo para a oxidaÇço catalÍtica de diàxido de enxofre em triàxido de enxofre e processo para fabricar Ácido sulférico e/ou àleo de um gÁs de fonte que compreende dÍàxido de enxofre |
| WO2010045483A2 (en) * | 2008-10-15 | 2010-04-22 | California Institute Of Technology | Ir-doped ruthenium oxide catalyst for oxygen evolution |
| US8221599B2 (en) * | 2009-04-03 | 2012-07-17 | The Board Of Trustees Of The Leland Stanford Junior University | Corrosion-resistant anodes, devices including the anodes, and methods of using the anodes |
| CN101525760B (zh) * | 2009-04-17 | 2011-03-23 | 中南大学 | 一种用于制备超级电容器RuO2电极材料的电沉积工艺 |
-
2009
- 2009-09-23 IT IT001621A patent/ITMI20091621A1/it unknown
-
2010
- 2010-09-03 TW TW099129779A patent/TWI490372B/zh not_active IP Right Cessation
- 2010-09-23 CA CA2769824A patent/CA2769824C/en not_active Expired - Fee Related
- 2010-09-23 DK DK10755197.0T patent/DK2480705T3/en active
- 2010-09-23 EA EA201270451A patent/EA023083B1/ru not_active IP Right Cessation
- 2010-09-23 CN CN201080042171.0A patent/CN102575363B/zh not_active Expired - Fee Related
- 2010-09-23 BR BR112012006530A patent/BR112012006530A2/pt not_active IP Right Cessation
- 2010-09-23 AU AU2010299850A patent/AU2010299850B2/en not_active Ceased
- 2010-09-23 MX MX2012003517A patent/MX2012003517A/es active IP Right Grant
- 2010-09-23 AR ARP100103474A patent/AR078442A1/es active IP Right Grant
- 2010-09-23 WO PCT/EP2010/064081 patent/WO2011036225A1/en not_active Ceased
- 2010-09-23 EP EP10755197.0A patent/EP2480705B1/en not_active Not-in-force
- 2010-09-23 KR KR1020127010290A patent/KR101742011B1/ko not_active Expired - Fee Related
- 2010-09-23 JP JP2012530263A patent/JP5824454B2/ja not_active Expired - Fee Related
-
2012
- 2012-01-31 IL IL217859A patent/IL217859A/en active IP Right Grant
- 2012-03-13 ZA ZA2012/01825A patent/ZA201201825B/en unknown
- 2012-03-22 US US13/427,153 patent/US9090982B2/en not_active Expired - Fee Related
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