JP2013257317A - 角度が固定されたビームと回転する試料ステージとを使用する薄片製作方法および装置 - Google Patents

角度が固定されたビームと回転する試料ステージとを使用する薄片製作方法および装置 Download PDF

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Publication number
JP2013257317A
JP2013257317A JP2013109593A JP2013109593A JP2013257317A JP 2013257317 A JP2013257317 A JP 2013257317A JP 2013109593 A JP2013109593 A JP 2013109593A JP 2013109593 A JP2013109593 A JP 2013109593A JP 2013257317 A JP2013257317 A JP 2013257317A
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Japan
Prior art keywords
substrate
angle
milling
axis
directing
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Pending
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JP2013109593A
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Japanese (ja)
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JP2013257317A5 (https=
Inventor
Andrew B Wells
アンドリュー・ビー・ウェルズ
N William Parker
エヌ・ウィリアム・パーカー
Clive D Chandler
クライブ・ディー・チャンドラー
Mark W Utlaut
マーク・ダブリュー・ウトロート
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FEI Co
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FEI Co
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Publication of JP2013257317A publication Critical patent/JP2013257317A/ja
Publication of JP2013257317A5 publication Critical patent/JP2013257317A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H01J37/3023—Program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Drying Of Semiconductors (AREA)
JP2013109593A 2012-06-11 2013-05-24 角度が固定されたビームと回転する試料ステージとを使用する薄片製作方法および装置 Pending JP2013257317A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/493,735 2012-06-11
US13/493,735 US9733164B2 (en) 2012-06-11 2012-06-11 Lamella creation method and device using fixed-angle beam and rotating sample stage

Publications (2)

Publication Number Publication Date
JP2013257317A true JP2013257317A (ja) 2013-12-26
JP2013257317A5 JP2013257317A5 (https=) 2016-09-29

Family

ID=48740820

Family Applications (1)

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JP2013109593A Pending JP2013257317A (ja) 2012-06-11 2013-05-24 角度が固定されたビームと回転する試料ステージとを使用する薄片製作方法および装置

Country Status (4)

Country Link
US (1) US9733164B2 (https=)
EP (1) EP2674742A3 (https=)
JP (1) JP2013257317A (https=)
CN (1) CN103512781A (https=)

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WO2013082496A1 (en) 2011-12-01 2013-06-06 Fei Company High throughput tem preparation processes and hardware for backside thinning of cross-sectional view lamella
JP6062628B2 (ja) * 2011-12-08 2017-01-18 株式会社日立ハイテクサイエンス 薄膜試料作製装置及び方法
US10110854B2 (en) * 2012-07-27 2018-10-23 Gatan, Inc. Ion beam sample preparation apparatus and methods
KR102155834B1 (ko) 2012-10-05 2020-09-14 에프이아이 컴파니 높은 종횡비 구조 분석
TWI607498B (zh) 2012-10-05 2017-12-01 Fei公司 使用帶電粒子束曝露樣品中所關注特徵的方法及系統
CN104685617B (zh) 2012-10-05 2018-11-30 Fei 公司 用于减少带电粒子束样品制备中的幕化的方法和系统
EP2755226B1 (en) * 2013-01-15 2016-06-29 Fei Company Sample carrier for an electron microscope
US9821486B2 (en) 2013-10-30 2017-11-21 Fei Company Integrated lamellae extraction station
EP3069367B1 (en) 2013-11-11 2019-01-09 Howard Hughes Medical Institute Workpiece transport and positioning apparatus
EP2916342A1 (en) 2014-03-05 2015-09-09 Fei Company Fabrication of a lamella for correlative atomic-resolution tomographic analyses
CN103868773A (zh) * 2014-03-24 2014-06-18 上海华力微电子有限公司 透射电镜样品的制作方法
EP2924710A1 (en) * 2014-03-25 2015-09-30 Fei Company Imaging a sample with multiple beams and a single detector
US9947507B2 (en) * 2015-07-09 2018-04-17 Carl Zeiss Microscopy Gmbh Method for preparing cross-sections by ion beam milling
EP3318862B1 (en) * 2016-11-04 2019-08-21 FEI Company Tomography sample preparation systems and methods with improved speed, automation, and reliability
US10546719B2 (en) 2017-06-02 2020-01-28 Fei Company Face-on, gas-assisted etching for plan-view lamellae preparation
EP3432338B1 (en) * 2017-07-20 2019-10-23 FEI Company Specimen preparation and inspection in a dual-beam charged particle microscope
CZ309855B6 (cs) * 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
CN112912988B (zh) * 2018-10-23 2024-12-17 应用材料公司 用于大面积基板的聚焦离子束系统
US11158487B2 (en) * 2019-03-29 2021-10-26 Fei Company Diagonal compound mill
DE102021201686A1 (de) * 2020-11-17 2022-05-19 Carl Zeiss Microscopy Gmbh Verfahren und Vorrichtung zum Präparieren einer mikroskopischen Probe aus einer Volumenprobe
CN112730006B (zh) * 2021-02-05 2022-11-29 上海市计量测试技术研究院 一种孔面离子通道衬度试样的制备方法
CN113984821B (zh) * 2021-12-29 2022-03-11 中国科学院地质与地球物理研究所 纳米结构三维成像系统与方法
US11784025B1 (en) 2022-05-10 2023-10-10 Plasma-Therm Nes Llc Integral sweep in ion beam system
US11658001B1 (en) * 2022-12-07 2023-05-23 Institute Of Geology And Geophysics, Chinese Academy Of Sciences Ion beam cutting calibration system and method

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JP2002148159A (ja) * 2000-11-06 2002-05-22 Hitachi Ltd 試料作製方法および試料作製装置
US20020170675A1 (en) * 1999-07-22 2002-11-21 Libby Charles J. Focused particle beam systems and methods using a tilt column
JP2005030799A (ja) * 2003-07-08 2005-02-03 Sii Nanotechnology Inc 薄片試料作製方法および複合集束イオンビーム装置
JP2007220344A (ja) * 2006-02-14 2007-08-30 Sii Nanotechnology Inc 集束イオンビーム装置及び試料の加工・観察方法

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CN102812533B (zh) 2010-04-07 2015-12-02 Fei公司 组合激光器和带电粒子束系统
CN102269772A (zh) * 2010-06-04 2011-12-07 中芯国际集成电路制造(上海)有限公司 一种纳米微粒浮栅透射电子显微镜观测样品制备方法
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WO2013082496A1 (en) 2011-12-01 2013-06-06 Fei Company High throughput tem preparation processes and hardware for backside thinning of cross-sectional view lamella

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020170675A1 (en) * 1999-07-22 2002-11-21 Libby Charles J. Focused particle beam systems and methods using a tilt column
JP2002148159A (ja) * 2000-11-06 2002-05-22 Hitachi Ltd 試料作製方法および試料作製装置
JP2005030799A (ja) * 2003-07-08 2005-02-03 Sii Nanotechnology Inc 薄片試料作製方法および複合集束イオンビーム装置
JP2007220344A (ja) * 2006-02-14 2007-08-30 Sii Nanotechnology Inc 集束イオンビーム装置及び試料の加工・観察方法

Also Published As

Publication number Publication date
EP2674742A3 (en) 2014-02-12
US9733164B2 (en) 2017-08-15
CN103512781A (zh) 2014-01-15
US20130328246A1 (en) 2013-12-12
EP2674742A2 (en) 2013-12-18

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