CN103512781A - 使用角度固定的射束和旋转样品台的薄层生成方法和装置 - Google Patents

使用角度固定的射束和旋转样品台的薄层生成方法和装置 Download PDF

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Publication number
CN103512781A
CN103512781A CN201310231578.3A CN201310231578A CN103512781A CN 103512781 A CN103512781 A CN 103512781A CN 201310231578 A CN201310231578 A CN 201310231578A CN 103512781 A CN103512781 A CN 103512781A
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CN
China
Prior art keywords
substrate
angle
post
thin layer
axis
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CN201310231578.3A
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English (en)
Chinese (zh)
Inventor
A.B.威尔斯
N.W.帕克
C.D.钱德勒
M.W.乌特劳特
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FEI Co
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FEI Co
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H01J37/3023—Program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Drying Of Semiconductors (AREA)
CN201310231578.3A 2012-06-11 2013-06-09 使用角度固定的射束和旋转样品台的薄层生成方法和装置 Pending CN103512781A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/493,735 2012-06-11
US13/493,735 US9733164B2 (en) 2012-06-11 2012-06-11 Lamella creation method and device using fixed-angle beam and rotating sample stage

Publications (1)

Publication Number Publication Date
CN103512781A true CN103512781A (zh) 2014-01-15

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CN201310231578.3A Pending CN103512781A (zh) 2012-06-11 2013-06-09 使用角度固定的射束和旋转样品台的薄层生成方法和装置

Country Status (4)

Country Link
US (1) US9733164B2 (https=)
EP (1) EP2674742A3 (https=)
JP (1) JP2013257317A (https=)
CN (1) CN103512781A (https=)

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CN103868773A (zh) * 2014-03-24 2014-06-18 上海华力微电子有限公司 透射电镜样品的制作方法
CN108020449A (zh) * 2016-11-04 2018-05-11 Fei 公司 具有改进的速度、自动化和可靠性的断层摄影术样品制备系统和方法
CN109283362A (zh) * 2017-07-20 2019-01-29 Fei 公司 双射束带电粒子显微镜中的样品制备和检查
CN114509326A (zh) * 2020-11-17 2022-05-17 卡尔蔡司显微镜有限责任公司 用于用体积样本来制备微样本的方法和显微镜系统

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WO2013082496A1 (en) 2011-12-01 2013-06-06 Fei Company High throughput tem preparation processes and hardware for backside thinning of cross-sectional view lamella
JP6062628B2 (ja) * 2011-12-08 2017-01-18 株式会社日立ハイテクサイエンス 薄膜試料作製装置及び方法
US10110854B2 (en) * 2012-07-27 2018-10-23 Gatan, Inc. Ion beam sample preparation apparatus and methods
KR102155834B1 (ko) 2012-10-05 2020-09-14 에프이아이 컴파니 높은 종횡비 구조 분석
TWI607498B (zh) 2012-10-05 2017-12-01 Fei公司 使用帶電粒子束曝露樣品中所關注特徵的方法及系統
CN104685617B (zh) 2012-10-05 2018-11-30 Fei 公司 用于减少带电粒子束样品制备中的幕化的方法和系统
EP2755226B1 (en) * 2013-01-15 2016-06-29 Fei Company Sample carrier for an electron microscope
US9821486B2 (en) 2013-10-30 2017-11-21 Fei Company Integrated lamellae extraction station
EP3069367B1 (en) 2013-11-11 2019-01-09 Howard Hughes Medical Institute Workpiece transport and positioning apparatus
EP2916342A1 (en) 2014-03-05 2015-09-09 Fei Company Fabrication of a lamella for correlative atomic-resolution tomographic analyses
EP2924710A1 (en) * 2014-03-25 2015-09-30 Fei Company Imaging a sample with multiple beams and a single detector
US9947507B2 (en) * 2015-07-09 2018-04-17 Carl Zeiss Microscopy Gmbh Method for preparing cross-sections by ion beam milling
US10546719B2 (en) 2017-06-02 2020-01-28 Fei Company Face-on, gas-assisted etching for plan-view lamellae preparation
CZ309855B6 (cs) * 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
CN112912988B (zh) * 2018-10-23 2024-12-17 应用材料公司 用于大面积基板的聚焦离子束系统
US11158487B2 (en) * 2019-03-29 2021-10-26 Fei Company Diagonal compound mill
CN112730006B (zh) * 2021-02-05 2022-11-29 上海市计量测试技术研究院 一种孔面离子通道衬度试样的制备方法
CN113984821B (zh) * 2021-12-29 2022-03-11 中国科学院地质与地球物理研究所 纳米结构三维成像系统与方法
US11784025B1 (en) 2022-05-10 2023-10-10 Plasma-Therm Nes Llc Integral sweep in ion beam system
US11658001B1 (en) * 2022-12-07 2023-05-23 Institute Of Geology And Geophysics, Chinese Academy Of Sciences Ion beam cutting calibration system and method

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CN102269772A (zh) * 2010-06-04 2011-12-07 中芯国际集成电路制造(上海)有限公司 一种纳米微粒浮栅透射电子显微镜观测样品制备方法

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103868773A (zh) * 2014-03-24 2014-06-18 上海华力微电子有限公司 透射电镜样品的制作方法
CN108020449A (zh) * 2016-11-04 2018-05-11 Fei 公司 具有改进的速度、自动化和可靠性的断层摄影术样品制备系统和方法
CN108020449B (zh) * 2016-11-04 2022-03-08 Fei 公司 具有改进的速度、自动化和可靠性的断层摄影术样品制备系统和方法
CN109283362A (zh) * 2017-07-20 2019-01-29 Fei 公司 双射束带电粒子显微镜中的样品制备和检查
CN109283362B (zh) * 2017-07-20 2022-09-27 Fei 公司 双射束带电粒子显微镜中的样品制备和检查
CN114509326A (zh) * 2020-11-17 2022-05-17 卡尔蔡司显微镜有限责任公司 用于用体积样本来制备微样本的方法和显微镜系统

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JP2013257317A (ja) 2013-12-26
EP2674742A3 (en) 2014-02-12
US9733164B2 (en) 2017-08-15
US20130328246A1 (en) 2013-12-12
EP2674742A2 (en) 2013-12-18

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Application publication date: 20140115