JP6062628B2 - 薄膜試料作製装置及び方法 - Google Patents
薄膜試料作製装置及び方法 Download PDFInfo
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- JP6062628B2 JP6062628B2 JP2011268875A JP2011268875A JP6062628B2 JP 6062628 B2 JP6062628 B2 JP 6062628B2 JP 2011268875 A JP2011268875 A JP 2011268875A JP 2011268875 A JP2011268875 A JP 2011268875A JP 6062628 B2 JP6062628 B2 JP 6062628B2
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- 239000010409 thin film Substances 0.000 title claims description 98
- 238000002360 preparation method Methods 0.000 title claims description 20
- 238000000034 method Methods 0.000 title description 15
- 238000005259 measurement Methods 0.000 claims description 69
- 238000010894 electron beam technology Methods 0.000 claims description 49
- 239000010408 film Substances 0.000 claims description 48
- 238000010884 ion-beam technique Methods 0.000 claims description 43
- 230000001678 irradiating effect Effects 0.000 claims description 13
- 239000002245 particle Substances 0.000 claims description 13
- 238000001514 detection method Methods 0.000 claims description 8
- 238000005464 sample preparation method Methods 0.000 claims description 6
- 238000004364 calculation method Methods 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000007730 finishing process Methods 0.000 claims 1
- 238000001878 scanning electron micrograph Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000009826 distribution Methods 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003917 TEM image Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000003852 thin film production method Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20207—Tilt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
- H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31749—Focused ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Description
(1)本発明に係る薄膜試料作製装置は、集束イオンビーム鏡筒から照射する集束イオンビームにより試料を加工し、薄膜試料を作製する装置であって、薄膜試料を載置する試料台と、薄膜試料に電子ビームを照射する電子ビーム鏡筒と、電子ビームの照射により薄膜試料から放出される荷電粒子を検出する荷電粒子検出器と、荷電粒子検出器の検出信号から形成される薄膜試料の観察像を表示する表示部と、を有する。さらに、本発明に係る薄膜試料作製装置は、観察像において薄膜試料の上部側に第一の測定領域と底部側に第二の測定領域とを設定する入力部と、電子ビームを照射することにより第一の測定領域と第二の測定領域から発生した荷電粒子の検出量と、第一の測定領域と第二の測定領域との距離から薄膜試料の傾斜角度を計算する傾斜角度計算部と、を有する。
本実施形態の薄膜試料作製装置は、図1に示すように、EB鏡筒1と、FIB鏡筒2と、試料室3を備えている。試料室3内に収容された試料7にEB鏡筒1から電子ビーム8を、FIB鏡筒2からイオンビーム9を照射することができる。
2…FIB鏡筒
3…試料室
4…二次電子検出器
5…反射電子検出器
6…試料台
7…試料
8…電子ビーム
9…イオンビーム
10…入力部
11…制御部
12…EB制御部
13…FIB制御部
14…像形成部
15…計算部
16…試料台制御部
17…表示部
21…薄膜試料
21a…観察面
21b…上部側の膜厚
21c…底部側の膜厚
22…加工溝
23…薄片化加工を実施していない部分
31…薄膜試料
31b…上部側の膜厚
31c…底部側の膜厚
41…上部側の測定領域
42…底部側の測定領域
43…参照領域
61…横軸
62…縦軸
63…反射電子量
64…反射電子量
71…膜厚
72…膜厚
73…距離
81…差分
82…線分
Claims (5)
- 集束イオンビーム鏡筒から照射する集束イオンビームにより試料を加工し、100nm以下の膜厚の薄膜試料を作製する薄膜試料作製装置において、
前記薄膜試料を載置する試料台と、
前記薄膜試料に電子ビームを照射する電子ビーム鏡筒と、
前記電子ビームの照射により前記薄膜試料から放出される反射電子又は二次電子を検出する荷電粒子検出器と、
前記荷電粒子検出器の検出信号から形成される前記薄膜試料の観察像を表示する表示部と、
前記観察像において、前記薄膜試料の上部側に前記電子ビームの一部が透過する厚さの第一の測定領域と、底部側に前記電子ビームの一部が透過する厚さの第二の測定領域とを設定する入力部と、
前記電子ビームを照射することにより前記第一の測定領域と前記第二の測定領域から発生した前記反射電子又は二次電子の検出量と、前記第一の測定領域と前記第二の測定領域との距離から前記薄膜試料の傾斜角度を計算する傾斜角度計算部と、からなる薄膜試料作製装置。 - 前記入力部は、前記薄膜試料周辺で前記電子ビームが透過しない厚さを有する前記試料の一部に参照領域を設定可能であり、
前記傾斜角度計算部は、前記第一の測定領域と前記第二の測定領域から発生した前記反射電子又は二次電子の検出量を前記参照領域から発生した前記反射電子又は二次電子の検出量で規格化する請求項1に記載の薄膜試料作製装置。 - 集束イオンビームにより試料を加工し、100nm以下の膜厚の薄膜試料を作製する薄膜試料作製方法において、
前記薄膜試料に電子ビームを照射し、観察像を形成する工程と、
前記観察像において、前記薄膜試料の上部側に前記電子ビームの一部が透過する厚さの第一の測定領域を、底部側に前記電子ビームの一部が透過する厚さの第二の測定領域を設定する工程と、
前記第一の測定領域と前記第二の測定領域とに前記電子ビームを照射し、発生する反射電子又は二次電子を検出する工程と、
前記第一の測定領域で検出した前記反射電子又は二次電子の検出量と、前記第二の測定領域で検出した前記反射電子又は二次電子の検出量と、前記第一の測定領域と前記第二の測定領域との距離から前記薄膜試料の傾斜角度を計算する工程と、
前記集束イオンビームに対し、前記薄膜試料を前記傾斜角度だけ傾斜させる工程と、
前記薄膜試料に前記集束イオンビームを照射し、仕上げ加工を行う工程と、からなる薄膜試料作製方法。 - 前記薄膜試料周辺で前記電子ビームが透過しない厚さを有する前記試料の一部に参照領域を設定し、前記参照領域に前記電子ビームを照射し、発生する反射電子又は二次電子を検出する工程と、を有し、
前記傾斜角度は、前記第一の測定領域と第二の測定領域から発生した前記反射電子又は二次電子の検出量を前記参照領域から発生した前記荷電粒子の検出量で規格化することにより計算する請求項3に記載の薄膜試料作製方法。 - 前記薄膜試料は、TEM観察用試料である請求項3または4に記載の薄膜試料作製方法。
Priority Applications (3)
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JP2011268875A JP6062628B2 (ja) | 2011-12-08 | 2011-12-08 | 薄膜試料作製装置及び方法 |
DE102012110651.7A DE102012110651B4 (de) | 2011-12-08 | 2012-11-07 | Verfahren und Vorrichtung zum Herstellen einer Lamelle |
US13/706,426 US9595420B2 (en) | 2011-12-08 | 2012-12-06 | Method for preparing lamella |
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CN104089801B (zh) * | 2014-06-26 | 2016-07-06 | 上海市计量测试技术研究院 | 一种氧化锆热障涂层的电子背散射衍射试样的制备方法 |
US9779914B2 (en) * | 2014-07-25 | 2017-10-03 | E.A. Fischione Instruments, Inc. | Apparatus for preparing a sample for microscopy |
JP7043057B2 (ja) * | 2017-11-28 | 2022-03-29 | 株式会社日立ハイテクサイエンス | 断面加工観察方法、荷電粒子ビーム装置 |
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JPH087121B2 (ja) | 1990-07-18 | 1996-01-29 | セイコー電子工業株式会社 | 集束荷電ビーム加工方法 |
JP3119959B2 (ja) * | 1993-02-05 | 2000-12-25 | セイコーインスツルメンツ株式会社 | 集束イオンビーム装置および加工観察装置 |
JP3221797B2 (ja) * | 1994-06-14 | 2001-10-22 | 株式会社日立製作所 | 試料作成方法及びその装置 |
TW430871B (en) * | 1998-06-18 | 2001-04-21 | United Microelectronics Corp | Method for milling test piece of transmission electron microscope |
DE60144508D1 (de) * | 2000-11-06 | 2011-06-09 | Hitachi Ltd | Verfahren zur Herstellung von Proben |
JP2003016463A (ja) * | 2001-07-05 | 2003-01-17 | Toshiba Corp | 図形の輪郭の抽出方法、パターン検査方法、パターン検査装置、プログラムおよびこれを格納したコンピュータ読み取り可能な記録媒体 |
JP3887356B2 (ja) | 2003-07-08 | 2007-02-28 | エスアイアイ・ナノテクノロジー株式会社 | 薄片試料作製方法 |
US7554096B2 (en) * | 2003-10-16 | 2009-06-30 | Alis Corporation | Ion sources, systems and methods |
JP4987486B2 (ja) | 2005-01-07 | 2012-07-25 | エスアイアイ・ナノテクノロジー株式会社 | 薄膜試料測定方法および装置ならびに薄膜試料作製方法および装置 |
US8455821B2 (en) * | 2006-10-20 | 2013-06-04 | Fei Company | Method for S/TEM sample analysis |
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JP6174584B2 (ja) * | 2011-09-12 | 2017-08-02 | エフ・イ−・アイ・カンパニー | 視射角ミル |
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US9733164B2 (en) * | 2012-06-11 | 2017-08-15 | Fei Company | Lamella creation method and device using fixed-angle beam and rotating sample stage |
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US20130175446A1 (en) | 2013-07-11 |
US9595420B2 (en) | 2017-03-14 |
JP2013120714A (ja) | 2013-06-17 |
DE102012110651A1 (de) | 2013-06-13 |
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