JP2013211386A - Led mounting substrate - Google Patents

Led mounting substrate Download PDF

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JP2013211386A
JP2013211386A JP2012080080A JP2012080080A JP2013211386A JP 2013211386 A JP2013211386 A JP 2013211386A JP 2012080080 A JP2012080080 A JP 2012080080A JP 2012080080 A JP2012080080 A JP 2012080080A JP 2013211386 A JP2013211386 A JP 2013211386A
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solder resist
hole
plating
film
layer
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Hideki Yoshida
英樹 吉田
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide an LED mounting substrate equipped with a solder resist which is capable of suppressing soaking of silver plating thereinto, capable of roll lamination and capable of obtaining adhesion to a reflection layer of silicon based resin while surely closing a through-hole for an end surface electrode formation.SOLUTION: An LED mounting substrate includes: a through-hole for an end surface electrode; a reflection resin layer which is filled into a gap of a surface layer circuit including a land of this through-hole; a liquid solder resist having a silver plating layer and a base plating formed in the surface layer circuit and the through-hole and formed in a boundary area between the reflection resin layer of the land end of the through-hole; and a film-like solder resist formed on this liquid solder resist.

Description

本発明は、LED搭載用配線基板及びその製造方法に関し、特には、フィルム状ソルダーレジストでテンティングされた端面電極用スルーホールを有するLED搭載用配線基板及びその製造方法に関する。   The present invention relates to an LED mounting wiring board and a manufacturing method thereof, and more particularly to an LED mounting wiring board having end face electrode through holes tented with a film solder resist and a manufacturing method thereof.

近年、LEDの普及に伴い、LED搭載用配線板においては、フィルム状ソルダーレジストでテンティングされた端面電極用スルーホールを有するものが多く生産されている。   In recent years, with the widespread use of LEDs, many LED mounting wiring boards having end face electrode through holes tented with a film-like solder resist are produced.

このようなフィルム状ソルダーレジストでテンティングされた端面電極用スルーホールを形成する方法としては、フィルム状ソルダーレジストのみでテンティングする方法(特許文献1)や、フィルム状ソルダーレジストの上に液状ソルダーレジストをかぶせる方法(特許文献2、特許文献3)などが開示されている。   As a method of forming the through hole for the end face electrode tented with such a film-like solder resist, a method of patenting with only the film-like solder resist (Patent Document 1), or a liquid solder on the film-like solder resist A method of applying a resist (Patent Document 2, Patent Document 3) and the like are disclosed.

特開平11−351704号公報JP 11-351704 A 特開2005−064087号公報Japanese Patent Laying-Open No. 2005-064087 特開2008−166634号公報JP 2008-166634 A

しかしながら、端面電極用スルーホールをテンティングするフィルム状ソルダーレジストは、一般的な液状ソルダーレジストに比較して、貴金属めっきに対する耐性の弱いものが多く、貴金属めっき後にフィルム状ソルダーレジストと銅箔の界面に貴金属めっき液がしみこんだ形跡が確認でき、十分な密着力を確保することが難しい。   However, film solder resists that tent through-holes for end-face electrodes are less resistant to precious metal plating than general liquid solder resists, and the interface between film solder resist and copper foil after precious metal plating As a result, it is difficult to ensure sufficient adhesion.

特許文献1の方法では、テンティングした面のフィルム状ソルダーレジストと銅箔の界面とスルーホールの内側のフィルム状ソルダーレジストと銅箔の界面の両方から貴金属めっき液のしみこみが発生してしまうため、フィルム状ソルダーレジストと銅の密着力を十分に確保することは難しいという問題がある。   In the method of Patent Document 1, the penetration of the noble metal plating solution occurs from both the interface between the film-like solder resist and the copper foil on the tented surface and the interface between the film-like solder resist and the copper foil inside the through hole. There is a problem that it is difficult to ensure sufficient adhesion between the film-like solder resist and copper.

特許文献2、特許文献3の方法では、スルーホールの内側のフィルム状ソルダーレジストと銅箔の界面から、貴金属めっき液のしみこみが発生してしまうため、フィルム状ソルダーレジストと銅箔の密着力を十分に確保することは難しいという問題がある。   In the methods of Patent Document 2 and Patent Document 3, since the penetration of the noble metal plating solution occurs from the interface between the film-like solder resist and the copper foil inside the through hole, the adhesion between the film-like solder resist and the copper foil is increased. There is a problem that it is difficult to secure enough.

本発明は、上記問題点に鑑み成されたものであり、端面電極形成用のスルーホールを確実に塞ぎつつ、銀めっきの染み込みを抑制でき、ロールラミネートが可能で、しかも、シリコーン系樹脂の反射層との密着が得られるソルダーレジストを備えたLED搭載用配線基板を提供することを目的とする。   The present invention has been made in view of the above-mentioned problems, and can reliably suppress penetration of silver plating, roll lamination while reliably closing the through hole for forming the end face electrode, and can also reflect the reflection of the silicone resin. It aims at providing the wiring board for LED mounting provided with the soldering resist from which adhesion | attachment with a layer is obtained.

本発明は以下を特徴とする。
1. 端面電極用スルーホールと、このスルーホールのランドを含む表層回路の間隙に充填された反射樹脂層と、前記表層回路に形成された銀めっき層とを有し、前記スルーホールのランド端部の反射樹脂層との境界領域上に形成された液状ソルダーレジストと、この液状ソルダーレジスト上に形成されたフィルム状ソルダーレジストとを有するLED搭載用配線基板。
2. 項1において、液状ソルダーレジスト上に形成されたフィルム状ソルダーレジストの端部が、液状ソルダーレジスト上に形成されるLED搭載用配線基板。
3. 項1又は2において、スルーホールのランド端部の反射層との境界領域上に形成された液状ソルダーレジストが、銀めっき層の下地めっき表面上に形成されるLED搭載用配線基板。
4. 項1から3の何れかにおいて、表層回路の間隙に充填される反射樹脂層が、シリコーン系樹脂を含有するLED搭載用配線基板。
The present invention is characterized by the following.
1. A through hole for an end face electrode, a reflective resin layer filled in a gap of a surface layer circuit including a land of the through hole, and a silver plating layer formed in the surface layer circuit, and a land end of the through hole A wiring board for mounting LED having a liquid solder resist formed on a boundary region with a reflective resin layer of a portion and a film solder resist formed on the liquid solder resist.
2. The wiring board for mounting an LED according to item 1, wherein an end portion of the film-like solder resist formed on the liquid solder resist is formed on the liquid solder resist.
3. The LED mounting wiring board according to Item 1 or 2, wherein the liquid solder resist formed on the boundary region with the reflective layer at the land end of the through hole is formed on the base plating surface of the silver plating layer.
4. The LED mounting wiring board according to any one of items 1 to 3, wherein the reflective resin layer filled in the gap of the surface layer circuit contains a silicone resin.

本発明によれば端面電極形成用のスルーホールを確実に塞ぎつつ、銀めっきの染み込みを抑制でき、ロールラミネートが可能で、しかも、シリコーン系樹脂の反射層との密着が得られるソルダーレジストを備えたLED搭載用配線基板を提供することができる。   According to the present invention, a solder resist capable of suppressing penetration of silver plating, capable of roll laminating while securely closing a through hole for forming an end face electrode, and having adhesion with a reflective layer of a silicone resin is provided. In addition, an LED mounting wiring board can be provided.

本発明の実施例1(第1の実施形態)に係るLED搭載用配線基板の断面図である。It is sectional drawing of the wiring board for LED mounting which concerns on Example 1 (1st Embodiment) of this invention. 本発明の実施例2(第2の実施形態)に係るLED搭載用配線基板の断面図である。It is sectional drawing of the wiring board for LED mounting which concerns on Example 2 (2nd Embodiment) of this invention. 従来のLED搭載用配線基板の断面図である。It is sectional drawing of the conventional wiring board for LED mounting. 本発明の実施例1(第1の実施形態)に係るLED搭載用配線基板の工程を表す断面図である。It is sectional drawing showing the process of the wiring board for LED mounting which concerns on Example 1 (1st Embodiment) of this invention. 本発明の実施例2(第2の実施形態)に係るLED搭載用配線基板の工程を表す断面図である。It is sectional drawing showing the process of the wiring board for LED mounting which concerns on Example 2 (2nd Embodiment) of this invention.

本発明の配線基板の実施形態の例を、図1及び図2に示す。図1に示した第1の実施形態は、端面電極用スルーホール4と、このスルーホール4のランド11を含む表層回路10の間隙に充填された反射樹脂層3とを有する。また、銅5(銅箔や銅めっき)で形成される表層回路10には、下地めっき層であるニッケルめっき6と金めっき層7と銀めっき8めっきを有する。また、スルーホール4には、下地めっき層であるニッケルめっき6と金めっき層7とを有する。また、前記スルーホール4のランド11端部の反射樹脂層3との境界領域上に形成された液状ソルダーレジスト2と、この液状ソルダーレジスト2上に形成されたフィルム状ソルダーレジスト1とを有する。   Examples of embodiments of the wiring board of the present invention are shown in FIGS. The first embodiment shown in FIG. 1 has an end face electrode through hole 4 and a reflective resin layer 3 filled in a gap of a surface layer circuit 10 including a land 11 of the through hole 4. Further, the surface layer circuit 10 formed of copper 5 (copper foil or copper plating) has a nickel plating 6, a gold plating layer 7, and a silver plating 8 plating which are base plating layers. Further, the through hole 4 has a nickel plating 6 and a gold plating layer 7 which are base plating layers. Further, the liquid solder resist 2 is formed on the boundary area between the end of the land 11 of the through hole 4 and the reflective resin layer 3, and the film solder resist 1 is formed on the liquid solder resist 2.

また、図2に示した第2の実施形態は、端面電極用スルーホール4と、このスルーホール4のランド11を含む表層回路10の間隙に充填された反射樹脂層3とを有する。また、銅5(銅箔や銅めっき)で形成される表層回路10には、下地めっき層であるニッケルめっき6と銀めっき8めっきを有する。また、スルーホール4にも同様に、下地めっき層であるニッケルめっき6と銀めっき層8とを有する。また、前記スルーホール4のランド11端部の反射樹脂層3との境界領域上に形成された液状ソルダーレジスト2と、この液状ソルダーレジスト2上に形成されたフィルム状ソルダーレジスト1とを有する。   Further, the second embodiment shown in FIG. 2 includes the end face electrode through hole 4 and the reflective resin layer 3 filled in the gap of the surface layer circuit 10 including the land 11 of the through hole 4. Moreover, the surface layer circuit 10 formed of copper 5 (copper foil or copper plating) has nickel plating 6 and silver plating 8 which are base plating layers. Similarly, the through hole 4 has a nickel plating 6 and a silver plating layer 8 which are base plating layers. Further, the liquid solder resist 2 is formed on the boundary area between the end of the land 11 of the through hole 4 and the reflective resin layer 3, and the film solder resist 1 is formed on the liquid solder resist 2.

端面電極用スルーホール4は、LEDを搭載し、モールド樹脂等でモールドした後、端面電極用スルーホール4を、その中心を通るようにダイシング等で半裁することにより、端面電極用スルーホール4の露出した内壁(端面)が、はんだ付け用の電極となるものである。   The end face electrode through hole 4 is mounted with an LED, molded with mold resin or the like, and then half cut by dicing or the like so that the end face electrode through hole 4 passes through the center of the end face electrode through hole 4. The exposed inner wall (end face) becomes an electrode for soldering.

反射樹脂層3は、LEDから発光される光を反射するものであって、LED搭載用配線基板に用いられる基材よりも、460nmの波長における反射率が高いものをいう。ここで、LEDとは、発光ダイオードを用いた発光素子のことをいう。反射樹脂層に用いる材料としては、シリコーン系樹脂やエポキシ系樹脂に、微粒状の酸化チタン等を混合したもの等が挙げられる。反射樹脂層3は、例えば、インクの状態のものを、印刷等によって表面回路10の間隙を含めて表面回路10上にオーバーラップするように塗布し、硬化させた後、表面回路10の全体が露出するように、全面を研磨すること等により、表面回路10の間隙に充填することができる。このように、表面回路10の間隙に反射樹脂層3が充填されることにより、表面回路10の間隙に露出していた比較的反射率の低い基材が、より反射率の高い反射樹脂層3によって覆われるので、全体としての反射率を向上することができる。反射樹脂層3には、シリコーン系樹脂を使用することにより、LED搭載後の輝度低下を小さくすることができる。   The reflective resin layer 3 reflects light emitted from the LED, and has a higher reflectance at a wavelength of 460 nm than a base material used for the LED mounting wiring board. Here, the LED refers to a light emitting element using a light emitting diode. Examples of the material used for the reflective resin layer include a silicone resin or an epoxy resin mixed with finely divided titanium oxide or the like. The reflective resin layer 3 is, for example, applied in an ink state so as to overlap the surface circuit 10 including the gap of the surface circuit 10 by printing or the like, and cured, and then the entire surface circuit 10 is formed. The gap of the surface circuit 10 can be filled by polishing the entire surface so as to be exposed. As described above, the reflective resin layer 3 filled in the gap between the surface circuits 10 allows the base material having a relatively low reflectance exposed in the gap between the surface circuits 10 to have a higher reflectance. Therefore, the reflectance as a whole can be improved. By using a silicone-based resin for the reflective resin layer 3, it is possible to reduce a decrease in luminance after LED mounting.

表層回路10及びスルーホール4に形成された、下地めっき層と金めっき層、又は下地めっき層と銀めっき層とを有する。これにより、表面回路10上のLEDからの光の反射率を向上することができる。   It has a base plating layer and a gold plating layer or a base plating layer and a silver plating layer formed in the surface layer circuit 10 and the through hole 4. Thereby, the reflectance of the light from LED on the surface circuit 10 can be improved.

スルーホール4のランド11端部の反射樹脂層3との境界領域上に形成された液状ソルダーレジスト2と、この液状ソルダーレジスト2上に形成されたフィルム状ソルダーレジスト1とを有する。下地の液状ソルダーレジスト2は、密着性が高く、ニッケルメッキ層6等の下地めっき層や金めっき層7、銀めっき層8を形成する際のめっき液に曝されても、密着を確保することができる。また、この液状ソルダーレジスト2の上に重ねて形成したフィルム状ソルダーレジスト1によって、スルーホール4上に確実にテントを形成することができる。つまり、表面回路10を形成する銅5と液状レジスト2との界面、液状レジスト2とフィルム状レジスト1との界面は、ニッケルめっき液、金めっき液、銀めっき液からの影響を受けにくく、それぞれのめっき後にめっき液のしみこみはなく、液状レジスト2、フィルム状レジスト1の密着を十分確保することができる。液状レジスト2と銅5の密着力を向上させるために銅5の表面を粗化処理することが望ましい。   It has a liquid solder resist 2 formed on a boundary region with the reflective resin layer 3 at the end of the land 11 of the through hole 4 and a film-like solder resist 1 formed on the liquid solder resist 2. The underlying liquid solder resist 2 has high adhesion and ensures adhesion even when exposed to a plating solution for forming an underlying plating layer such as the nickel plating layer 6, a gold plating layer 7, or a silver plating layer 8. Can do. In addition, a tent can be reliably formed on the through hole 4 by the film solder resist 1 formed on the liquid solder resist 2. That is, the interface between the copper 5 and the liquid resist 2 forming the surface circuit 10 and the interface between the liquid resist 2 and the film resist 1 are not easily affected by the nickel plating solution, the gold plating solution, and the silver plating solution. There is no penetration of the plating solution after plating, and sufficient adhesion between the liquid resist 2 and the film-like resist 1 can be ensured. In order to improve the adhesion between the liquid resist 2 and the copper 5, it is desirable to roughen the surface of the copper 5.

本発明のLED搭載用配線基板の製造方法の例は、図4(A)〜(F)、図5(A)〜(E)に示すように、シリコーン系反射樹脂層3を形成する工程と液状レジスト2を形成する工程と液状レジスト2の上にフィルム状ソルダーレジスト1を形成する工程を有する。   Examples of the method for manufacturing an LED mounting wiring board of the present invention include a step of forming a silicone-based reflective resin layer 3 as shown in FIGS. 4 (A) to (F) and FIGS. 5 (A) to (E). A step of forming a liquid resist 2 and a step of forming a film-like solder resist 1 on the liquid resist 2;

図4に示す工法のように、フィルム状ソルダーレジスト1を形成する前に、ニッケルめっき6と金めっき7を行い、その後LED搭載面のみ銀めっき8を行うことにより、高アスペクト比(アスペクト比1以上)のスルーホール内へのめっき析出も問題ない。ここで、アスペクト比とは、板厚:スルーホール穴径の比をいう。   As shown in FIG. 4, before forming the film-like solder resist 1, nickel plating 6 and gold plating 7 are performed, and then the silver mounting 8 is performed only on the LED mounting surface, thereby achieving a high aspect ratio (aspect ratio 1). There is also no problem with plating deposition in the through hole. Here, the aspect ratio refers to the ratio of plate thickness: through-hole hole diameter.

アスペクト比1以下の場合、スルーホール内のめっき析出性がよくなるため、図5に示す工法のように、フィルム状ソルダーレジスト1を形成した後に、ニッケルめっき6と銀めっき8を行う工法も用いることができる。   When the aspect ratio is 1 or less, the plating depositability in the through hole is improved. Therefore, a method of performing nickel plating 6 and silver plating 8 after forming the film-like solder resist 1 as shown in FIG. 5 is also used. Can do.

以下、本発明の実施例を説明するが、本発明は、本実施例に限定されない。   Examples of the present invention will be described below, but the present invention is not limited to the examples.

(実施例1)
板厚0.4mm、銅箔厚さ18μmのCCL−HL820(三菱ガス化学株式会社製、商品名)に、端面電極用スルーホール4用として、直径0.4mmのドリルで穴あけを行った後、スルーホールめっきを厚さ20μm施し、表面回路10を形成した基板を準備した(図4(A))。この基板は、ドリル径が0.4mmであり、スルーホールめっきの厚みが20μmであるため、スルーホールめっき後の穴径は0.36mmである。また、板厚が0.4、銅箔厚さが18μm、スルーホールめっきが20μmであることから、スルーホール4の深さは、0.476mmである。このため、この基板は、アスペクト比が1を超えるものである。
Example 1
After drilling with a drill with a diameter of 0.4 mm for the end face electrode through hole 4 in CCL-HL820 (trade name, manufactured by Mitsubishi Gas Chemical Co., Ltd.) having a plate thickness of 0.4 mm and a copper foil thickness of 18 μm, Through-hole plating was applied to a thickness of 20 μm to prepare a substrate on which the surface circuit 10 was formed (FIG. 4A). Since this substrate has a drill diameter of 0.4 mm and a through-hole plating thickness of 20 μm, the hole diameter after through-hole plating is 0.36 mm. Further, since the plate thickness is 0.4, the copper foil thickness is 18 μm, and the through-hole plating is 20 μm, the depth of the through-hole 4 is 0.476 mm. For this reason, this substrate has an aspect ratio exceeding 1.

この表面回路10を形成した基板に対し、反射樹脂層3として、シリコーン系反射樹脂RG−12−6−2(株式会社アイン製、商品名)をスクリーン印刷し、表面回路10の間隙にシリコーン系反射樹脂を充填した。このとき、表面回路10の間隙を含めて、表面回路10上に0.2mm程度オーバーラップするように印刷を行い、80℃、30分の仮乾燥後、基板表面をバフ研磨した。これにより、表面回路10の間隙を隙間無くシリコーン系反射樹脂で充填することができた(図4(B))。バフ研磨後、150℃、1時間で本硬化した。   A silicone-based reflective resin RG-12-6-2 (trade name, manufactured by Ein Co., Ltd.) is screen-printed as the reflective resin layer 3 on the substrate on which the surface circuit 10 is formed. Filled with reflective resin. At this time, printing was performed so as to overlap about 0.2 mm on the surface circuit 10 including the gap of the surface circuit 10, and after temporary drying at 80 ° C. for 30 minutes, the substrate surface was buffed. Thereby, the gap of the surface circuit 10 could be filled with the silicone-based reflective resin without any gap (FIG. 4B). After buffing, the film was fully cured at 150 ° C. for 1 hour.

次に、銅5で形成した表面回路10の表面に対して、粗化処理CZ8100(株式会社メック製、商品名)を行った後、スルーホール4のランド11端部の反射樹脂層3との境界領域上に、液状ソルダーレジスト2であるPSR4000 G30(太陽インキ製造株式会社製、商品名)を形成した(図4(C))。   Next, the surface of the surface circuit 10 formed of copper 5 is subjected to a roughening treatment CZ8100 (trade name, manufactured by MEC Co., Ltd.), and then the reflective resin layer 3 at the end of the land 11 of the through hole 4 On the boundary region, PSR4000 G30 (trade name, manufactured by Taiyo Ink Manufacturing Co., Ltd.), which is a liquid solder resist 2, was formed (FIG. 4C).

次に、下地めっきである無電解ニッケルめっき(厚さ5μm)、及びその上の無電解金めっき(厚さ0.05μm)のめっき処理を行った(図4(D))。   Next, electroless nickel plating (thickness 5 μm) as an undercoat and electroless gold plating (thickness 0.05 μm) thereon were performed (FIG. 4D).

次に、フィルム状ソルダーレジスト1として、DM155(ニチゴーモートン株式会社製)を液状ソルダーレジスト2であるPSR4000 G30(太陽インキ製造株式会社製)の上に形成した(図4(E))。   Next, DM155 (manufactured by Nichigo Morton Co., Ltd.) was formed as a film solder resist 1 on PSR4000 G30 (manufactured by Taiyo Ink Manufacturing Co., Ltd.), which is a liquid solder resist 2 (FIG. 4E).

次にフィルム状ソルダーレジスト1を形成した同じ面のみに、電解銀めっき(厚さ1μm)を行った。このとき、フィルム状ソルダーレジスト1を形成していない面は、マスキングテープN380(日東電工株式会社製、商品名)で完全にマスキングした。銀めっき処理後、マスキングテープをはがした(図4(F))。   Next, electrolytic silver plating (thickness: 1 μm) was performed only on the same surface on which the film-like solder resist 1 was formed. At this time, the surface where the film-like solder resist 1 was not formed was completely masked with a masking tape N380 (trade name, manufactured by Nitto Denko Corporation). After the silver plating treatment, the masking tape was peeled off (FIG. 4 (F)).

実施例1の工法(図4(A)〜(F))の工法で作成した基板において、フィルム状ソルダーレジスト1周りでのめっき液のしみこみは確認されなかった。完成品でのフィルム状ソルダーレジスト1の破れは無く、テープピール試験でのフィルム状ソルダーレジスト1のはがれの発生も確認されなかった。なお、テープピール試験は、テープ(JISZ1522に規定の幅12mmの透明粘着テープ)の新しい接着面を、気泡が残らないように圧着し、約10秒経過後、基板面に直角方向に素早くテープを引きはがす方法で行った。以下、テープピール試験の方法・条件は同様である。   In the substrate produced by the construction method of Example 1 (FIGS. 4A to 4F), no penetration of the plating solution around the film solder resist 1 was confirmed. There was no tear of the film-like solder resist 1 in the finished product, and no occurrence of peeling of the film-like solder resist 1 in the tape peel test was confirmed. In the tape peel test, the new adhesive surface of the tape (transparent adhesive tape with a width of 12 mm specified in JISZ1522) is pressure-bonded so that no bubbles remain. After about 10 seconds, the tape is quickly applied in a direction perpendicular to the substrate surface. It was done by the method of peeling. Hereinafter, the method and conditions of the tape peel test are the same.

端面電極用スルーホール4内のめっきつきまわりは、良好であり、ニッケルめっき層6、金めっき層7が析出していない端面電極用スルーホール1は、確認されなかった。   The plating coverage in the end face electrode through hole 4 was good, and the end face electrode through hole 1 in which the nickel plating layer 6 and the gold plating layer 7 were not deposited was not confirmed.

(実施例2)
板厚0.2mm、銅箔厚さ18μmのCCL−HL820(三菱ガス化学株式会社製、商品名)に、端面電極用スルーホール4用として、直径0.4mmのドリルで穴あけを行った後、スルーホールめっきを厚さ20μm施し、表面回路10を形成した基板を準備した(図5(A))。この基板は、ドリル径が0.4mmであり、スルーホールめっきの厚みが20μmであるため、スルーホールめっき後の穴径は0.36mmである。また、板厚が0.2、銅箔厚さが18μm、スルーホールめっきが20μmであることから、スルーホール4の深さは、0.276mmである。このため、この基板は、アスペクト比が1未満のものである。
(Example 2)
After drilling with a 0.4 mm diameter drill for the end face electrode through hole 4 in CCL-HL820 (trade name, manufactured by Mitsubishi Gas Chemical Co., Ltd.) having a plate thickness of 0.2 mm and a copper foil thickness of 18 μm, Through-hole plating was applied to a thickness of 20 μm to prepare a substrate on which the surface circuit 10 was formed (FIG. 5A). Since this substrate has a drill diameter of 0.4 mm and a through-hole plating thickness of 20 μm, the hole diameter after through-hole plating is 0.36 mm. Further, since the plate thickness is 0.2, the copper foil thickness is 18 μm, and the through hole plating is 20 μm, the depth of the through hole 4 is 0.276 mm. For this reason, this substrate has an aspect ratio of less than 1.

その後、反射樹脂層3であるシリコーン系反射樹脂RG−12−6−2(株式会社アイン製、商品名)の形成と、液状ソルダーレジスト2であるPSR4000 G30(太陽インキ製造株式会社製、商品名)の形成は、実施例1と同様に行った(図5(B)(C))。   Thereafter, formation of a silicone-based reflective resin RG-12-6-2 (trade name, manufactured by Ein Co., Ltd.), which is the reflective resin layer 3, and PSR4000 G30 (trade name, manufactured by Taiyo Ink Manufacturing Co., Ltd.), which is the liquid solder resist 2 ) Was formed in the same manner as in Example 1 (FIGS. 5B and 5C).

次に、フィルム状ソルダーレジスト1であるDM155(ニチゴーモートン株式会社製、商品名)を、液状ソルダーレジスト2であるPSR4000 G30(太陽インキ製造株式会社製、商品名)の上に形成した(図5(D))。   Next, DM155 (trade name, manufactured by Nichigo Morton Co., Ltd.), which is a film-like solder resist 1, was formed on PSR4000 G30 (trade name, manufactured by Taiyo Ink Manufacturing Co., Ltd.), which is a liquid solder resist 2 (FIG. 5). (D)).

次に、下地めっきである電解ニッケルめっき(厚さ5μm)、及びその上の電解銀めっき(厚さ1μm)のめっき処理を行った(図5(E))。   Next, plating treatment of electrolytic nickel plating (thickness 5 μm) as an underlying plating and electrolytic silver plating (thickness 1 μm) thereon was performed (FIG. 5E).

実施例2の工法(図5(A)〜(E))の工法で作成した基板において、フィルム状ソルダーレジスト1周りでのめっき液のしみこみは確認されなかった。完成品でのフィルム状ソルダーレジスト1の破れは無く、テープピール試験でのフィルム状ソルダーレジスト1のはがれの発生も確認されなかった。なお、テープピール試験は、実施例1と同様に行った。   In the substrate produced by the construction method of Example 2 (FIGS. 5A to 5E), no penetration of the plating solution around the film solder resist 1 was confirmed. There was no tear of the film-like solder resist 1 in the finished product, and no occurrence of peeling of the film-like solder resist 1 in the tape peel test was confirmed. The tape peel test was conducted in the same manner as in Example 1.

端面電極用スルーホール4内のめっきつきまわりは、良好であり、ニッケルめっき層6、銀めっき層8が析出していない端面電極用スルーホール1は、確認されなかった。   The plating coverage in the end face electrode through hole 4 was good, and the end face electrode through hole 1 in which the nickel plating layer 6 and the silver plating layer 8 were not deposited was not confirmed.

(比較例)
板厚0.4mm、銅箔厚さ18μmのCCL−HL820(三菱ガス化学株式会社製、商品名)に、端面電極用スルーホール4用として、直径0.4mmのドリルで穴あけを行った後、スルーホールめっきを厚さ20μm施し、表面回路10を形成した基板を準備した図4(A)。この基板は、実施例1と同様に、アスペクト比が1を超えるものである。
(Comparative example)
After drilling with a drill with a diameter of 0.4 mm for the end face electrode through hole 4 in CCL-HL820 (trade name, manufactured by Mitsubishi Gas Chemical Co., Ltd.) having a plate thickness of 0.4 mm and a copper foil thickness of 18 μm, FIG. 4A shows a substrate on which through-hole plating is applied to a thickness of 20 μm and a surface circuit 10 is formed. This substrate has an aspect ratio exceeding 1 as in the first embodiment.

次に、フィルム状ソルダーレジスト1であるDM155(ニチゴーモートン株式会社製、商品名)を、端面電極用スルーホール4の上に形成した(図3)。   Next, DM155 (trade name, manufactured by Nichigo Morton Co., Ltd.), which is a film-like solder resist 1, was formed on the through hole 4 for the end face electrode (FIG. 3).

次に、下地めっきである無電解ニッケルめっき(厚さ5μm)、及びその上の無電解金めっき(厚さ0.05μm)のめっき処理を行った。   Next, electroless nickel plating (thickness 5 μm) as an undercoat and electroless gold plating (thickness 0.05 μm) thereon were performed.

次にフィルム状ソルダーレジスト1を形成した同じ面に、電解銀めっき(厚さ1μm)を行った。このときフィルム状ソルダーレジスト1を形成していない面は、マスキングテープN380(日東電工株式会社製、商品名)で完全にマスキングした。銀めっき処理後、マスキングテープをはがした。   Next, electrolytic silver plating (thickness: 1 μm) was performed on the same surface on which the film-like solder resist 1 was formed. At this time, the surface where the film-like solder resist 1 was not formed was completely masked with a masking tape N380 (trade name, manufactured by Nitto Denko Corporation). After the silver plating treatment, the masking tape was peeled off.

比較例の工法で作成した基板において、フィルム状ソルダーレジスト1周りでのめっき液のしみこみがはっきりと確認された。完成品でのフィルム状ソルダーレジスト1の破れ、はがれが散見し、テープピール試験でフィルム状ソルダーレジストは、ほぼ、全数はがれてしまった。なお、テープピール試験は、実施例1と同様に行った。   In the substrate prepared by the method of the comparative example, the penetration of the plating solution around the film solder resist 1 was clearly confirmed. The film-like solder resist 1 in the finished product was broken and peeled off, and almost all the film-like solder resists were peeled off in the tape peel test. The tape peel test was conducted in the same manner as in Example 1.

端面電極用スルーホール4内のめっきつきまわりも悪く、ニッケルめっき層6、金めっき層7のついていない端面電極用スルーホール1が高確率で確認された。   The plating around the end face electrode through hole 4 was poor, and the end face electrode through hole 1 without the nickel plating layer 6 and the gold plating layer 7 was confirmed with high probability.

1.フィルム状ソルダーレジスト
2.液状ソルダーレジスト
3.反射樹脂層
4.端面電極用スルーホール
5.銅
6.ニッケルめっき層
7.金めっき層
8.銀めっき層
9.基材
10.表面回路
11.ランド
1. 1. Film-like solder resist 2. Liquid solder resist Reflective resin layer4. 4. Through hole for end face electrode Copper 6. 6. Nickel plating layer Gold plating layer8. 8. Silver plating layer Base material 10. Surface circuit 11. land

Claims (4)

端面電極用スルーホールと、このスルーホールのランドを含む表層回路の間隙に充填された反射樹脂層と、前記表層回路に形成された銀めっき層とを有し、前記スルーホールのランド端部の反射樹脂層との境界領域上に形成された液状ソルダーレジストと、この液状ソルダーレジスト上に形成されたフィルム状ソルダーレジストとを有するLED搭載用配線基板。   A through hole for an end face electrode; a reflective resin layer filled in a gap of a surface layer circuit including a land of the through hole; and a silver plating layer formed in the surface layer circuit; An LED-mounting wiring board having a liquid solder resist formed on a boundary region with a reflective resin layer and a film-like solder resist formed on the liquid solder resist. 請求項1において、液状ソルダーレジスト上に形成されたフィルム状ソルダーレジストの端部が、液状ソルダーレジスト上に形成されるLED搭載用配線基板。   2. The LED mounting wiring board according to claim 1, wherein an end portion of the film-like solder resist formed on the liquid solder resist is formed on the liquid solder resist. 請求項1又は2において、スルーホールのランド端部の反射樹脂層との境界領域上に形成された液状ソルダーレジストが、銀めっき層の下地めっき表面上に形成されるLED搭載用配線基板。   3. The LED mounting wiring board according to claim 1, wherein the liquid solder resist formed on the boundary region between the land end portion of the through hole and the reflective resin layer is formed on the base plating surface of the silver plating layer. 請求項1から3の何れかにおいて、表層回路の間隙に充填される反射樹脂層が、シリコーン系樹脂を含有するLED搭載用配線基板。   4. The LED mounting wiring board according to claim 1, wherein the reflective resin layer filled in the gap of the surface layer circuit contains a silicone resin.
JP2012080080A 2012-03-30 2012-03-30 Led mounting substrate Pending JP2013211386A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015141998A (en) * 2014-01-28 2015-08-03 ファナック株式会社 Printed circuit board including structure for preventing disconnection of wiring pattern due to corrosion
CN113840470A (en) * 2020-06-24 2021-12-24 庆鼎精密电子(淮安)有限公司 Circuit board and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015141998A (en) * 2014-01-28 2015-08-03 ファナック株式会社 Printed circuit board including structure for preventing disconnection of wiring pattern due to corrosion
CN113840470A (en) * 2020-06-24 2021-12-24 庆鼎精密电子(淮安)有限公司 Circuit board and manufacturing method thereof

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