JP2013165234A - 荷電粒子光学系、荷電粒子線装置、および物品の製造方法 - Google Patents

荷電粒子光学系、荷電粒子線装置、および物品の製造方法 Download PDF

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JP2013165234A
JP2013165234A JP2012028602A JP2012028602A JP2013165234A JP 2013165234 A JP2013165234 A JP 2013165234A JP 2012028602 A JP2012028602 A JP 2012028602A JP 2012028602 A JP2012028602 A JP 2012028602A JP 2013165234 A JP2013165234 A JP 2013165234A
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Prior art keywords
charged particle
optical system
lens array
lens
particle beam
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Pending
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JP2012028602A
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Japanese (ja)
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JP2013165234A5 (enExample
Inventor
Noburo Imaoka
伸郎 今岡
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Canon Inc
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Canon Inc
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JP2012028602A 2012-02-13 2012-02-13 荷電粒子光学系、荷電粒子線装置、および物品の製造方法 Pending JP2013165234A (ja)

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JP2013165234A5 JP2013165234A5 (enExample) 2015-03-19

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115152000A (zh) * 2020-02-21 2022-10-04 Asml荷兰有限公司 带电粒子评估工具及检查方法
JP2024105368A (ja) * 2020-02-21 2024-08-06 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置
EP4734147A1 (en) * 2024-10-24 2026-04-29 ASML Netherlands B.V. Charged particle-optical arrangement for a charged particle beam apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02121251A (ja) * 1988-09-16 1990-05-09 Siemens Ag 対象物構造化用リソグラフィ装置
JP2005101668A (ja) * 2005-01-07 2005-04-14 Canon Inc 電子ビーム露光装置とその露光方法
JP2006210503A (ja) * 2005-01-26 2006-08-10 Canon Inc 収差調整方法、デバイス製造方法及び荷電粒子線露光装置
JP2009507351A (ja) * 2005-09-06 2009-02-19 カール・ツァイス・エスエムティー・アーゲー 粒子光学部品

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02121251A (ja) * 1988-09-16 1990-05-09 Siemens Ag 対象物構造化用リソグラフィ装置
JP2005101668A (ja) * 2005-01-07 2005-04-14 Canon Inc 電子ビーム露光装置とその露光方法
JP2006210503A (ja) * 2005-01-26 2006-08-10 Canon Inc 収差調整方法、デバイス製造方法及び荷電粒子線露光装置
JP2009507351A (ja) * 2005-09-06 2009-02-19 カール・ツァイス・エスエムティー・アーゲー 粒子光学部品

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115152000A (zh) * 2020-02-21 2022-10-04 Asml荷兰有限公司 带电粒子评估工具及检查方法
JP2024079725A (ja) * 2020-02-21 2024-06-11 エーエスエムエル ネザーランズ ビー．ブイ． 荷電粒子検査ツール、検査方法
JP2024105368A (ja) * 2020-02-21 2024-08-06 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置
JP7708923B2 (ja) 2020-02-21 2025-07-15 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置
JP7765529B2 (ja) 2020-02-21 2025-11-06 エーエスエムエル ネザーランズ ビー．ブイ． 荷電粒子検査ツール、検査方法
US12505978B2 (en) 2020-02-21 2025-12-23 Asml Netherlands B.V. Charged particle assessment tool, inspection method
EP4734147A1 (en) * 2024-10-24 2026-04-29 ASML Netherlands B.V. Charged particle-optical arrangement for a charged particle beam apparatus
WO2026087168A1 (en) * 2024-10-24 2026-04-30 Asml Netherlands B.V. Charged particle-optical arrangement for a charged particle beam apparatus.

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